公开(公告)号：US20150235824A1

公开(公告)日：2015-08-20

申请号：US14290917

申请日：2014-05-29

Applicant: Intevac, Inc.

Inventor： David Ward Brown ,  Terry Bluck

IPC: H01J37/34

CPC classification number: H01J37/3455 ,  C23C14/35 ,  C23C14/56 ,  G11B5/851 ,  H01F41/183 ,  H01J37/3405 ,  H01J37/3408 ,  H01J37/3417 ,  H01J37/3426 ,  H01J37/3435 ,  H01J37/3452 ,  H01J37/347

Abstract: A system for depositing material from a target onto substrates, comprising a processing chamber; a sputtering target having length L and having highly magnetic sputtering material provided on front surface thereof a magnet assembly operable to reciprocally scan across the length L in close proximity to rear surface of the target and the magnet assembly comprises: a back plate made of magnetic material; a first group of magnets arranged in a single line central to the back plate and having a first pole positioned to face the rear surface of the target; and, a second group of magnets provided around periphery of the back plate so as to surround the first group of magnets, the second group of magnets having a second pole, opposite the first pole, positioned to face the rear surface of the target.

Abstract translation: 一种用于将材料从靶材沉积到基材上的系统，包括处理室; 具有长度为L并且具有高磁性溅射材料的溅射靶，其前表面设置有磁体组件，该磁体组件可操作以在紧邻靶的后表面和磁体组件之间的长度L上往复扫描，包括：由磁性材料制成的背板 ; 第一组磁体，其布置在与所述背板中心的单线中，并且具有定位成面对所述目标的后表面的第一极; 以及围绕所述第一组磁体设置在所述背板的周围的第二组磁体，所述第二组磁体具有与所述第一极相对的第二极，所述第二极定位成面对所述靶的后表面。

公开(公告)号：US20150170947A1

公开(公告)日：2015-06-18

申请号：US14627667

申请日：2015-02-20

Applicant: Intevac, Inc.

Inventor： Terry Bluck ,  Vinay Shah ,  Ian Latchford ,  Alexandru Riposan

IPC: H01L21/677 ,  H01L21/687 ,  H01L21/67

CPC classification number: H01L21/68785 ,  H01L21/67173 ,  H01L21/67736 ,  H01L21/67754

Abstract: A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry area after processing is completed. The carriers are configured for supporting substrates of different sizes. The carriers are also configured for flipping the substrates such that both surfaces of the substrates may be processed.

Abstract translation: 用于处理等离子体室中的衬底的系统，使得在大气环境中执行所有衬底的输送和加载/卸载操作，但是在真空环境中进行处理。 基板在载体上通过系统传送。 系统的室线性布置，使得载体从一个室直接移动到下一个室。 放置在系统腔室上方或下方的输送机在处理完成后将载体返回到系统的进入区域。 载体构造成用于支撑不同尺寸的基底。 载体也构造成用于翻转基板，使得可以处理基板的两个表面。

公开(公告)号：US20140311893A1

公开(公告)日：2014-10-23

申请号：US14185859

申请日：2014-02-20

Applicant: Intevac, Inc.

Inventor： Vinay Shah ,  Alexandru Riposan ,  Terry Bluck ,  Vladimir Kudriavtsev

IPC: C23C14/35 ,  H01J37/34

CPC classification number: C23C14/35 ,  C23C14/56 ,  H01J37/32669 ,  H01J37/32779 ,  H01J37/32899 ,  H01J37/3405 ,  H01J37/3417 ,  H01J37/3452 ,  H01J37/3455

Abstract: A sputtering system having a processing chamber with an inlet port and an outlet port, and a sputtering target positioned on a wall of the processing chamber. A movable magnet arrangement is positioned behind the sputtering target and reciprocally slides behind the target. A conveyor continuously transports substrates at a constant speed past the sputtering target, such that at any given time, several substrates face the target between the leading edge and the trailing edge. In certain embodiments, the movable magnet arrangement slides at a speed that is at least several times faster than the constant speed of the conveyor. A rotating zone is defined behind the leading edge and trailing edge of the target, wherein the magnet arrangement decelerates when it enters the rotating zone and accelerates as it reverses direction of sliding within the rotating zone. In certain embodiments, magnet power and/or speed varies as function of direction of magnet travel.

Abstract translation: 一种溅射系统，具有具有入口和出口的处理室和位于处理室的壁上的溅射靶。 可移动磁体布置位于溅射靶的后面并在目标之后往复滑动。 输送机以恒定速度连续输送基板通过溅射靶，使得在任何给定时间，几个基板在前缘和后缘之间面对目标。 在某些实施例中，可动磁体装置以比传送带的恒定速度快至少几倍的速度滑动。 旋转区域被限定在目标的前缘和后缘之后，其中磁体装置进入旋转区域时减速，并且当其在旋转区域内反转滑动方向时加速。 在某些实施例中，磁体功率和/或速度随着磁铁行进方向的变化而变化。

公开(公告)号：US20130105087A1

公开(公告)日：2013-05-02

申请号：US13666917

申请日：2012-11-01

Applicant: Intevac, Inc.

Inventor： Young Kyu Cho ,  Karthik Janakiraman ,  Terry Bluck ,  Diwakar Kedlaya

IPC: H02N13/00 ,  H01L31/18

CPC classification number: H02N13/00 ,  H01J2237/16 ,  H01L21/6833 ,  H01L31/18 ,  Y10T29/49117

Abstract: An electrostatic chuck is disclosed, which is especially suitable for fabrication of substrates at high throughput. The disclosed chuck may be used for fabricating large substrates or several smaller substrates simultaneously. For example, disclosed embodiments can be used for fabrication of multiple solar cells simultaneously, providing high throughput. An electrostatic chuck body is constructed using aluminum body having sufficient thermal mass to control temperature rise of the chuck, and anodizing the top surface of the body. A ceramic frame is provided around the chuck's body to protect it from plasma corrosion. If needed, conductive contacts are provided to apply voltage bias to the wafer. The contacts are exposed through the anodization.

Abstract translation: 公开了一种静电卡盘，其特别适用于以高产量制造基板。 所公开的卡盘可以用于同时制造大的基板或几个较小的基板。 例如，所公开的实施例可以同时用于制造多个太阳能电池，从而提供高通量。 使用具有足够热质量的铝体来控制卡盘的温度升高并且阳极氧化主体的顶表面构成静电卡盘体​​。 在卡盘的主体周围设置陶瓷框架，以防止其等离子体腐蚀。 如果需要，提供导电触点以向晶片施加电压偏压。 触点通过阳极氧化暴露。

公开(公告)号：US12077851B2

公开(公告)日：2024-09-03

申请号：US17306054

申请日：2021-05-03

Applicant: INTEVAC, INC.

Inventor： Terry Bluck ,  Samuel D. Harkness, IV

IPC: C23C14/58 ,  C03C17/34 ,  C23C14/04 ,  H04M1/02

CPC classification number: C23C14/5873 ,  C03C17/3411 ,  C23C14/042 ,  H04M1/0283 ,  C03C2217/425 ,  C03C2217/45

Abstract: A method for forming thin film layer having micro-voids therein. The method proceeds by dispersing micro-particles over the surface of a substrate. The micro particles are made of sublimable material. Then the thin film layer is formed over the surface, so as to cover the particles. The thin film is then etched back so as to expose the particles at least partially. The material of the particles is then sublimed, e.g., by heating the substrate, thereby leaving micro-voids inside the thin film layer. The micro voids can be filled or remain exposed to generate textured surface.

公开(公告)号：US20220185726A1

公开(公告)日：2022-06-16

申请号：US17589498

申请日：2022-01-31

Applicant: INTEVAC, INC.

Inventor： Terry Bluck ,  Wendell Thomas Blonigan

IPC: C03C17/34 ,  C23C14/34 ,  C23C14/54 ,  C23C14/00 ,  C23C14/10 ,  C23C14/08 ,  C23C14/50 ,  C08J7/04 ,  B05D5/06 ,  B32B17/10 ,  C03C17/42 ,  G02B1/111 ,  G02B1/116

Abstract: A processing system for forming an optical coating on a substrate is provided, wherein the optical coating including an anti-reflective coating and an oleophobic coating, the system comprising: a linear transport processing section configured for processing and transporting substrate carriers individually and one at a time in a linear direction; at least one evaporation processing system positioned in the linear transport processing system, the evaporation processing system configured to form the oleophobic coating; a batch processing section configured to transport substrate carriers in unison about an axis; at least one ion beam assisted deposition processing chamber positioned in the batch processing section, the ion beam assisted deposition processing chamber configured to deposit layer of the anti-reflective coating; a plurality of substrate carriers for mounting substrates; and, means for transferring the substrate carriers between the linear transport processing section and the batch processing section without exposing the substrate carrier to atmosphere.

公开(公告)号：US20210087674A1

公开(公告)日：2021-03-25

申请号：US16583165

申请日：2019-09-25

Applicant: Intevac, Inc.

Inventor： Terry Bluck

IPC: C23C14/56 ,  C23C14/34 ,  C23C14/50 ,  H01L21/67 ,  H01L21/677

Abstract: A processing system is provided, including a vacuum enclosure having a plurality of process windows and a continuous track positioned therein; a plurality of processing chambers attached sidewalls of the vacuum enclosures, each processing chamber about one of the process windows; a loadlock attached at one end of the vacuum enclosure and having a loading track positioned therein; at least one gate valve separating the loadlock from the vacuum enclosure; a plurality of substrate carriers configured to travel on the continuous track and the loading track; at least one track exchanger positioned within the vacuum enclosure, the track exchangers movable between a first position, wherein substrate carriers are made to continuously move on the continuous track, and a second position wherein the substrate carriers are made to transfer between the continuous track and the loading track.

公开(公告)号：US20200350188A1

公开(公告)日：2020-11-05

申请号：US15929378

申请日：2020-04-29

Applicant: INTEVAC, INC.

Inventor： Terry Bluck ,  Arun Karamcheti

IPC: H01L21/67 ,  H01L21/677 ,  H01L21/203

Abstract: A substrate processing system, including a processing module having at least one sputtering source; a first buffer module positioned on a first side of the processing module; a second buffer module positioned on a second side of the processing module directly opposite the first side; a first cooling module attached to the first buffer module; a second cooling module attached to the second buffer module; a transport system transporting substrate carriers in a straight line through the first cooling module, the first buffer module, the processing module, the second buffer module and the second cooling module; wherein the system is arranged linearly in the order: first cooling module, the first buffer module, the processing module, the second buffer module and the second cooling module.

公开(公告)号：US10559710B2

公开(公告)日：2020-02-11

申请号：US16040423

申请日：2018-07-19

Applicant: Intevac, Inc.

Inventor： William Eugene Runstadler, Jr. ,  Babak Adibi ,  Terry Bluck

IPC: H01J37/20 ,  H01J37/18 ,  H01J37/317 ,  H01L31/18

Abstract: A system for transporting substrates and precisely alignment the substrates to shadow masks. The system decouples the functions of transporting the substrates, vertically aligning the substrates, and horizontally aligning the substrates. The transport system includes a carriage upon which plurality of pedestals are loosely positioned, each of the pedestals includes a base having vertical alignment wheels to place the substrate in precise vertical alignment. Two sidebars are configured to freely slide on the base. Each of the sidebars includes a set of horizontal alignment wheels that precisely align the substrate in the horizontal direction. Substrate support claws are attached to the sidebars in precise alignment to the vertical alignment wheels and the horizontal alignment wheels.

公开(公告)号：US20190383977A1

公开(公告)日：2019-12-19

申请号：US16442133

申请日：2019-06-14

Applicant: Intevac, Inc.

Inventor： Terry Bluck ,  Arun Karamcheti

IPC: G02B5/08 ,  C03C17/34 ,  H01L51/52 ,  H01L27/32

Abstract: A multi-color dielectric coating is formed using interleaved layers of dielectric material, having alternating refractive index, to create reflections at selected wavelengths, thus appearing as different colors. Etching of selected layers at selected locations changes the color appearance of the etched locations, thus generating a coating having multiple colors. The thicknesses of the layers are chosen such that the path-length differences for reflections from different high-index layers are integer multiples of the wavelength for which the coating is designed. Inkjet printer is used to print a design and the design is cured using UV radiation.