Abstract:
A pellicle for a photomask, a reticle including the same, and an exposure apparatus for lithography are provided. The pellicle may include a pellicle membrane, and the pellicle membrane may include nanocrystalline graphene. The nanocrystalline graphene may have defects. The nanocrystalline graphene may include a plurality of nanoscale crystal grains, and the nanoscale crystal grains may include a two-dimensional (2D) carbon structure having an aromatic ring structure. The defects of the nanocrystalline graphene may include at least one of an sp3 carbon atom, an oxygen atom, a nitrogen atom, or a carbon vacancy.
Abstract:
A hybrid interconnect structure includes a graphene layer between a non-metallic material layer and a metal layer, and a first interfacial bonding layer between the non-metallic material layer and the graphene layer, or the metal layer and the graphene layer. The graphene layer connects the non-metallic material layer and the metal layer, and the first bonding layer includes a metallic material.
Abstract:
A wiring structure may include at least two conductive material layers and a two-dimensional layered material layer in an interface between the at least two conductive material layers. The two-dimensional layered material layer may include a grain expander layer which causes grain size of a conductive material layer which is on the two-dimensional layered material layer to be increased. Increased grain size may result in resistance of the second conductive material layer to be reduced. As a result, the total resistance of the wiring structure may be reduced. The two-dimensional layered material layer may contribute to reducing a total thickness of the wiring structure. Thus, a low-resistance and high-performance wiring structure without an increase in a thickness thereof may be implemented.
Abstract:
Example embodiments relate to electrode materials, secondary batteries including the electrode materials, and methods of manufacturing the electrode materials and the secondary batteries. An electrode material may include a foam structure having a plurality of pores and a plurality of nanostructures disposed in the plurality of pores. The foam structure may include a graphene foam structure. The plurality of nanostructures may include at least one of a nanoparticle and a nanorod. The plurality of nanostructures may include a material capable of accommodating/discharging ions. The electrode material may be used as an anode material of a secondary battery.
Abstract:
An electronic device includes a 2D material layer having a bandgap. The 2D material layer includes two multilayer 2D material regions and a channel region therebetween. A first electrode electrically contacts one of the multilayer 2D material regions, and a second electrode electrically contacts the other of the multilayer 2D material regions.
Abstract:
Provided are electronic devices and methods of manufacturing same. An electronic device includes an energy barrier forming layer on a substrate, an upper channel material layer on the substrate, and a gate electrode that covers the upper channel material layer and the energy barrier forming layer. The gate electrode includes a side gate electrode portion that faces a side surface of the energy barrier forming layer. The side gate electrode may be configured to cause an electric field to be applied directly on the energy barrier forming layer via the side surface of the energy barrier forming layer, thereby enabling adjustment of the energy barrier between the energy barrier forming layer and the upper channel material layer. The electronic device may further include a lower channel material layer that is provided on the substrate and does not contact the upper channel material layer.
Abstract:
Provided are a stretchable and/or foldable optoelectronic device, a method of manufacturing the same, and an apparatus including the stretchable and/or foldable optoelectronic device. A stretchable and/or foldable optoelectronic device may include an optoelectronic device portion on a substrate. The substrate may include an elastomeric polymer and may be stretchable. The optoelectronic device portion may be configured to have a wavy structure to be stretchable. The optoelectronic device portion may include a graphene layer and a quantum dot (QD)-containing layer. The stretchable and/or foldable optoelectronic device may further include a capping layer that includes an elastomeric polymer and is on the optoelectronic device portion. The stretchable and/or foldable optoelectronic device may further include a plastic material layer that contacts at least one surface of the optoelectronic device portion.
Abstract:
A semiconductor package includes a semiconductor chip on a substrate, a thermal conductive film on a lower surface of the semiconductor chip, the thermal conductive film facing the substrate, and a molding member on the substrate and surrounding a sidewall of the semiconductor chip.
Abstract:
A hardmask composition includes a first material including one of an aromatic ring-containing monomer and a polymer containing a repeating unit including an aromatic ring-containing monomer, a second material including at least one of a hexagonal boron nitride and a precursor thereof, a chalcogenide-based material and a precursor thereof, and a two-dimensional carbon nanostructure and a precursor thereof, the two-dimensional carbon nanostructure containing about 0.01 atom % to about 40 atom % of oxygen, and a solvent.
Abstract:
Example embodiments relate to a wiring structure, a method of forming the same, and an electronic device employing the same. The wiring structure includes a first conductive material layer and a nanocrystalline graphene layer on the first conductive material layer in direct contact with the metal layer.