摘要:
A laser tracking interferometer directs a laser beam to a retroreflector serving as an object to be measured to sense a displacement of the retroreflector using interference with a laser beam back reflected from the retroreflector. The laser tracking interferometer includes: a reference sphere; a carriage that rotates about a center of the reference sphere; a laser interferometer; a displacement gage for providing a displacement signal corresponding to a relative displacement between the reference sphere and the displacement gage; a data processing apparatus for computing a displacement of the retroreflector; a position sensitive detector for providing a position signal corresponding to deviation of a laser beam; and a controller for controlling rotation of the carriage based on the position signal so that the amount of deviation becomes zero.
摘要:
A method of correcting a magnification of a mask pattern formed on a mask substrate. The method includes applying forces to four pressurizing points of an outer periphery of an approximately ring-shaped frame, which supports the mask substrate and has a rectangular window, on substantially extended lines of two diagonal lines of the rectangular window, and adjusting at least an angle, to the extended lines, of a vector of the forces applied to each of the pressurizing points.
摘要:
A substrate processing system has a first processing device which processes a substrate with a first process in a first gas atmosphere within a process chamber and a transfer device that transfers a substrate in a second gas atmosphere within a clean booth, the transfer device transferring a substrate which has been processed with a second process by a second processing device or a substrate which is to be processed by that second processing device. A load-lock chamber has a substrate transfer path between the first processing device and the transfer device and there is a gas supply device which supplies the first gas from the process chamber to the load-lock chamber when the substrate is transferred between the load-lock chamber and a first processing device, and supplies the second gas from the clean booth to the load-lock chamber when the substrate is transferred between the load-lock chamber and the transfer device.
摘要:
A semiconductor device manufacturing system is provided in which chip position information is read without removing resin from a package so that the cause of a failure can be quickly identified and removed and the yield of chips can be rapidly improved. A replacement address reading device reads redundancy addresses from a semiconductor device which is determined as faulty in a test performed after the semiconductor device has been sealed into a package. A chip position analyzing device estimates, from the combination of these redundancy addresses, a lot number, a wafer number and a chip number of the faulty semiconductor device. A failure distribution mapping device maps the distribution of faulty chips in each wafer in the lot based on these numbers thus obtained. A failure cause determining device identifies which manufacturing device or processing step has caused the failures in the wafer process based on the above distribution.
摘要:
An X-ray projection exposure apparatus includes a mask chuck, a wafer chuck, an X-ray illuminating system, and an X-ray projection system. The masks chuck holds a reflection X-ray mask having a mask pattern thereon. The wafer chuck holds a wafer onto which the mask pattern is transferred. The X-ray illuminating system illuminates the reflection X-ray mask, held by the mask chuck, with X-rays. The X-ray projection optical system projects the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification. The mask chuck includes a mechanism for generating static electricity for attracting and holding the reflection X-ray mask by an electrostatic force. The invention also includes a device manufacturing method using such an X-ray projection exposure apparatus to transfer a mask pattern onto the wafer using the X-ray projection exposure apparatus.
摘要:
A holding mechanism includes a box body for providing a space for accommodating an X-ray mask, at least one opening formed at the side of the box body and a holding mechanism for holding the X-ray mask within the space by a kinematic mount system.
摘要:
A scanning exposure method includes steps of relatively scanning a mask and a wafer relative to exposure light of a slit beam, to transfer a pattern of the mask onto the wafer and applying a relative speed between the mask and the wafer in a scan direction, during the scan exposure in one shot area, wherein the relative speed is changed in accordance with thermal distortion of the mask pattern caused during the scan exposure.
摘要:
An air cleaning apparatus for vehicles includes an ozone generator, diffusing plate, and activated charcoal filter, which are disposed sequentially from the upstream side of air flow in an air cleaning duct. The activated charcoal filter contains acid treated activated charcoal and alkali treated activated charcoal. Thus, in the air cleaning apparatus for vehicles, the ozone generator oxidizes ammonia and acetaldehyde and then absorbs and removes the products by acid activated charcoal and alkali activated charcoal. As a result, ammonia, acetaldehyde and acetic acid which are bad odor components of cigarette smoke can be removed sufficiently and effectively.
摘要:
Novel peptides are described which are biologically active derivatives of the EGF-like domain of NDF/heregulins and which stimulate the proliferation and differentiation of colon epithelial cells and support the survival and growth of Schwann cells.
摘要:
A disordered fluorite-type photochemical hole burning crystal contains Sm.sup.2+ as active ions, and a composition except Sm.sup.2+ is represented by a general formula .alpha.-(MALn)F.sub.6-v X.sub.v where 0.ltoreq.v.ltoreq.1, and M is an element selected from Ca, Sr and Ba, A is an element selected from Na, K, Rb and Cs, Ln is an element selected from Y, La, Gd and Ce, and X is an element selected from Cl, Br and I. Stable hole burning occurs at the room temperature to create narrow holes. The crystal can be used as a superior optical recording material for a room temperature operation.