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公开(公告)号：US20240324089A1
公开(公告)日：2024-09-26
申请号：US18268122
申请日：2021-11-23
Applicant: ASML Netherlands B.V.
Inventor： Petrus Wilhelmus SMORENBURG , Jan Otger LUITEN , Herman Brian SCHAAP , Gerardus, Hubertus Jim FRANSSEN
IPC: H05G2/00
CPC classification number: H05G2/00
Abstract: A method for controlling a density distribution of electrons provided by an electron source for use in hard X-ray, soft X-ray and/or extreme ultraviolet generation, the method comprising generating a plurality of electrons from a pattern of ultracold excited atoms using an ionization laser inside a cavity, wherein the electrons have a density distribution determined by at least one of the patterns of excited atoms and the ionization laser, and accelerating the electrons out of the cavity using a non-static acceleration profile, wherein the acceleration profile controls the density distribution of the electrons as they exit the cavity.
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公开(公告)号：US20240321547A1
公开(公告)日：2024-09-26
申请号：US18580269
申请日：2022-07-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Marco Jan-Jaco WIELAND
IPC: H01J37/22 , H01J37/10 , H01J37/147 , H01J37/244 , H01J37/317
CPC classification number: H01J37/226 , H01J37/10 , H01J37/1474 , H01J37/244 , H01J37/3177 , H01J2237/0453 , H01J2237/2443 , H01J2237/24592
Abstract: Charged-particle optical devices are disclosed. In one arrangement, a device includes a charged particle column and a light sensor. An objective lens array projects a plurality of beams towards a sample and has a plurality of electrodes arranged along a path of the plurality of beams. A plurality of scintillators receives signal particles emitted from the sample. Light is generated in response to the received signal particles. A light guiding arrangement guides light generated by the scintillators to the light sensor. The light guiding arrangement includes a mirror defining a plurality of apertures to allow passage of the plurality of beams through the mirror towards the sample.
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63.发明公开公开(公告)号：US20240319123A1
公开(公告)日：2024-09-26
申请号：US18691828
申请日：2022-08-16
Applicant: ASML Netherlands B.V.
Inventor： Achim WOESSNER , Younghoon SONG , Pioter NIKOLSKI , Yun A SUNG , Antonio CORRADI , Hermanus Adrianus DILLEN
IPC: G01N23/2251
CPC classification number: G01N23/2251 , G01N2223/304 , G01N2223/306 , G01N2223/401 , G01N2223/418 , G01N2223/6116 , G01N2223/646
Abstract: Apparatuses, systems, and methods for providing beams for classifying and identifying failure mechanisms associated with a sample of charged particle beam systems. In some embodiments, a method may include analyzing a first plurality of voltage contrast images of a sample to identify a plurality of defects; and analyzing a pattern of a subset of the plurality of defects to determine a failure mechanism for the subset of the plurality of defects.
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公开(公告)号：US12099307B2
公开(公告)日：2024-09-24
申请号：US17920763
申请日：2021-03-19
Applicant: ASML Netherlands B.V.
Inventor： Sjoerd Martijn Huiberts , René Josephus Johannes Van Der Meulen , Johannes Petrus Martinus Bernardus Vermeulen
CPC classification number: G03F7/70258 , G02B7/1828 , G03F7/70141
Abstract: Disclosed is an actuator unit for positioning an optical element, comprising a first reluctance actuator comprising a first stator part and a first mover part separated by a gap in a first direction. The first mover part is constructed and arranged to be connected to the optical element and for moving the optical element. The first stator part is constructed and arranged to exert a magnetic force on the first mover part along a first line of actuation. The first mover part is movable relative to the first stator part in the first direction. The first stator part and the first mover part are constructed and arranged such that the first line of actuation is, in operational use, moving along with the first mover part in a second direction perpendicular to the first direction, for at least a predetermined movement range of the first mover part in the second direction.
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公开(公告)号：US12099306B2
公开(公告)日：2024-09-24
申请号：US17441168
申请日：2020-02-20
Applicant: ASML Netherlands B.V.
Inventor： Oscar Franciscus Jozephus Noordman , Antonius Theodorus Wilhelmus Kempen , Jan Bernard Plechelmus Van Schoot , Marinus Aart Van Den Brink
IPC: G03F7/00
CPC classification number: G03F7/70033 , G03F7/70425 , G03F7/70558
Abstract: A lithographic system comprises a radiation source and a lithographic apparatus. The radiation source provides radiation to the lithographic apparatus. The lithographic apparatus uses the radiation for imaging a pattern onto multiple target areas on a layer of photo-resist on a semiconductor substrate. The imaging requires a pre-determined dose of radiation. The system is controlled so as to set a level of a power of the radiation in dependence on a magnitude of the pre-determined dose.
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Patent Agency Ranking
公开(公告)号：US20240313684A1
公开(公告)日：2024-09-19
申请号：US18577062
申请日：2022-06-30
Applicant: ASML Netherlands B.V.
Inventor： Hans BUTLER
IPC: H02P25/064 , G03F7/00 , H02P23/00
CPC classification number: H02P25/064 , G03F7/70516 , G03F7/70725 , G03F7/70758 , G03F7/70775 , H02P23/0022
Abstract: The invention provides a method of determining a motor-dependent commutation model for an electromagnetic motor, whereby the electromagnetic motor comprises a first member comprising a coil array comprising at least M coils, and a second member comprising a magnet array configured to generate a spatially alternating magnetic field, whereby the first member and the second member are configured to displace relative to each other in N degrees of freedom, N
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67.发明公开公开(公告)号：US20240312758A1
公开(公告)日：2024-09-19
申请号：US18571186
申请日：2022-05-30
Inventor： Zheng FAN , Bruno LA FONTAINE , He Sheng LU , Gao Xing YIN , Shun ZHANG , Zhenfeng ZHAO
IPC: H01J37/24 , H01J37/065 , H01J37/28
CPC classification number: H01J37/243 , H01J37/065 , H01J37/28 , H01J2237/04735 , H01J2237/24535
Abstract: Apparatuses, systems, and methods for adjusting beam current using a feedback loop are provided. In some embodiments, a system may include a first anode aperture configured to measure a current of an emitted beam during inspection of a sample, wherein the first anode aperture is positioned in an environment that is configured to support a vacuum pressure of less than 3×10−10 torr and a controller including circuitry configured to cause the system to perform: generating a feedback signal when a difference between the measured current and a setpoint current exceeds a threshold value and adjusting a voltage of an extractor voltage supply based on the feedback signal during inspection of the sample such that a difference between an adjusted current of the emitted beam and the setpoint current is below the threshold value.
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68.发明公开公开(公告)号：US20240312756A1
公开(公告)日：2024-09-19
申请号：US18674282
申请日：2024-05-24
Applicant: ASML Netherlands B.V.
Inventor： Jasper Hendrik GRASMAN , Niels Johannes Maria BOSCH , Patrick Peter Hubert Helena PHILIPS , Peter Paul HEMPENIUS , Joan SANS MERCADER , Gerardus Wilhelmus SARS , Hans BUTLER , Willem Henk URBANUS
IPC: H01J37/20
CPC classification number: H01J37/20 , H01J2237/20235
Abstract: Disclosed herein is a platform for a charged particle apparatus, the platform comprising: a base frame; a chamber arranged to comprise a substrate; a metrology frame arranged to support a charged particle beam generator for irradiating a substrate in the chamber with a charged particle beam; and a bellow arranged between the metrology frame and the chamber; wherein: the chamber is rigidly connected to the base frame; the bellow comprises a flexible material such that the metrology frame is substantially isolated from any vibrations that are generated in the chamber; and the bellow is air tight so that a substantial vacuum may be established in the chamber.
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公开(公告)号：US12087541B2
公开(公告)日：2024-09-10
申请号：US17460381
申请日：2021-08-30
Applicant: ASML Netherlands B.V.
Inventor： Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen
IPC: H01J37/28 , H01J37/12 , H01J37/147
CPC classification number: H01J37/28 , H01J37/12 , H01J37/1472 , H01J37/1477 , H01J2237/04924 , H01J2237/083 , H01J2237/1205 , H01J2237/1516 , H01J2237/2817
Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
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70.发明授权公开(公告)号：US12086973B2
公开(公告)日：2024-09-10
申请号：US17608015
申请日：2020-04-02
Applicant: ASML Netherlands B.V.
Inventor： Teunis Willem Tukker , Arie Jeffrey Den Boef , Nitesh Pandey , Marinus Petrus Reijnders , Ferry Zijp
CPC classification number: G06T7/0004 , G01N21/4788 , G02B5/3083 , G02B27/283 , G02B27/4205 , G03F7/70616 , G03F7/706851 , G06T2207/10148 , G06T2207/30148
Abstract: Disclosed is a detection apparatus for simultaneous acquisition of multiple images of an object at a plurality of different focus levels; comprising: a modulator for obtaining multiple beam copies of an incoming beam; and a detector operable to capture said multiple beam copies, such that at two of said multiple beam copies are captured at different focus levels. Also disclosed is an inspection apparatus comprising such a detection system.
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