Double Wavelength Semiconductor Light Emitting Device and Method of Manufacturing the Same
    61.
    发明申请
    Double Wavelength Semiconductor Light Emitting Device and Method of Manufacturing the Same 失效
    双波长半导体发光器件及其制造方法

    公开(公告)号:US20090127570A1

    公开(公告)日:2009-05-21

    申请号:US12224287

    申请日:2007-02-23

    IPC分类号: H01L21/20 H01L33/00

    摘要: Provided are a double wavelength semiconductor light emitting device, having an n electrode and p electrode disposed on the same surface side, in which the area of a chip is reduced to increase the number of chips taken from one single wafer, in which light focusing performance of double wavelength optical beams are improved, and in which an active layer of a light emitting element having a longer wavelength can be prevented from deteriorating in a process of manufacturing; and a method of manufacturing the same.Semiconductor lasers D1 and D2 as two light emitting elements having different wavelengths are integrally formed on a common substrate 1. A semiconductor laminate A is deposited on an n-type contact layer 21 in a semiconductor laser D1, and a semiconductor laminate B is deposited in a semiconductor laser D2. The semiconductor laminate A and semiconductor laminate B are configured to have different layer structures. An n electrode 12 formed between the semiconductor lasers D1 and D2 is shared by the semiconductor lasers D1 and D2, and serves as a common electrode on an n side. Additionally, the semiconductor laminate having a shorter wavelength is crystal-grown firstly.

    摘要翻译: 提供了一种双波长半导体发光器件,其具有设置在同一表面侧的n电极和p电极,其中芯片的面积减小以增加从单个晶片获取的芯片的数量,其中光聚焦性能 双波长光束的改善,其中可以防止在制造过程中具有较长波长的发光元件的有源层劣化; 及其制造方法。 作为具有不同波长的两个发光元件的半导体激光器D1和D2一体地形成在公共基板1上。半导体层叠体A沉积在半导体激光器D1中的n型接触层21上,并且半导体层叠体B沉积在 半导体激光器D2。 半导体层叠体A和半导体层叠体B具有不同的层结构。 形成在半导体激光器D1和D2之间的n电极12由半导体激光器D1和D2共享,并且用作n侧的公共电极。 此外,首先将具有较短波长的半导体层叠体晶体生长。

    Semiconductor Light Emitting Device and Method for Manufacturing the Same
    62.
    发明申请
    Semiconductor Light Emitting Device and Method for Manufacturing the Same 有权
    半导体发光器件及其制造方法

    公开(公告)号:US20090026475A1

    公开(公告)日:2009-01-29

    申请号:US12087173

    申请日:2006-12-28

    IPC分类号: H01L33/00

    摘要: Concaves and convexes are formed in a light transmitting conductive layer provided on a surface of a light emitting device made of nitride semiconductor, thereby light emitted from a light emitting layer is totally reflected repeatedly in a semiconductor lamination portion and a substrate and can be effectively taken out without attenuation, and external quantum efficiency can be improved. A semiconductor lamination portion (6) is formed by laminating nitride semiconductor layers including an n-type layer (3) and a p-type layer (5) on one side of a substrate (1) so as to form a light emitting layer, and a light transmitting conductive layer (7) is provided at a surface side of the semiconductor lamination portion. A concave-convex pattern, i.e., concaves (7a), is provided on a surface of the light transmitting conductive layer. A p-side electrode (8) is provided on the light transmitting conductive layer, and an n-side electrode (9) is electrically connected to the n-type layer exposed by etching a part of the semiconductor lamination portion.

    摘要翻译: 凹凸形成在由氮化物半导体制成的发光元件的表面上的透光性导电层中,从发光层发出的光在半导体层叠部和基板中反复全反射,能够有效地取出 没有衰减,可以提高外部量子效率。 通过在衬底(1)的一侧层叠包括n型层(3)和p型层(5)的氮化物半导体层以形成发光层,形成半导体层叠部(6) 并且在半导体层叠部的表面侧设置有透光性导电层(7)。 在透光导电层的表面上设置凹凸图案,即凹部(7a)。 p侧电极(8)设置在透光导电层上,n侧电极(9)与通过蚀刻半导体层叠部分的一部分露出的n型层电连接。

    Semiconductor Light Emitting Device and Method for Manufacturing the Same
    63.
    发明申请
    Semiconductor Light Emitting Device and Method for Manufacturing the Same 审中-公开
    半导体发光器件及其制造方法

    公开(公告)号:US20080258166A1

    公开(公告)日:2008-10-23

    申请号:US11596124

    申请日:2005-05-10

    IPC分类号: H01L33/00

    CPC分类号: H01L33/40 H01L33/32

    摘要: There is provided a semiconductor light emitting semiconductor device including an n-side electrode which has a structure capable of stably suppressing the contact resistance between the n-side electrode and a nitride semiconductor layer. Further, there is provided a light emitting device and a manufacturing method wherein an ohmic contact between the n-side electrode and the nitride semiconductor layer can be obtained by a simple manufacturing process, and the n-side electrode has an Au layer on a top surface to facilitate wire bonding. Semiconductor layers (2-8) to form a light emitting layer are laminated on a surface of a substrate (1) made of, for example, a sapphire (Al2O3 single crystal) or the like and a p-side electrode (10) is formed on the surface thereof thorough a light transmitting conductive layer (9). An n-side electrode (11) is formed on an exposed surface of an n-type layer (4), exposed by removing a part of the semiconductor layers (4-8) by etching. The n-side electrode includes actually an Al layer (11a) in contact with the n-type layer, a barrier metal layer (11b) and an Au layer (11c).

    摘要翻译: 提供一种包括具有能够稳定地抑制n侧电极和氮化物半导体层之间的接触电阻的结构的n侧电极的半导体发光半导体器件。 此外,提供了一种发光器件及其制造方法,其中通过简单的制造工艺可以获得n侧电极和氮化物半导体层之间的欧姆接触,并且n侧电极在顶部具有Au层 表面方便引线接合。 形成发光层的半导体层(2〜8)层压在由例如蓝宝石(Al 2 O 3·N 3)构成的基板(1)的表面上 >单晶)等,并且通过透光导电层(9)在其表面上形成p侧电极(10)。 在n型层(4)的暴露表面上形成n侧电极(11),通过蚀刻去除一部分半导体层(4-8)而露出。 n侧电极实际上包括与n型层接触的Al层(11a),阻挡金属层(11b)和Au层(11c)。

    Transparent electrode
    64.
    发明授权
    Transparent electrode 有权
    透明电极

    公开(公告)号:US07417263B2

    公开(公告)日:2008-08-26

    申请号:US10748734

    申请日:2003-12-30

    申请人: Ken Nakahara

    发明人: Ken Nakahara

    IPC分类号: H01L33/00 H01L23/29

    CPC分类号: H01L33/42

    摘要: In order to emit a light from an electrode side, in semiconductor light emitting devices such as LED and the like, and liquid crystal, the electrode is formed of a transparent material so as to transmit a light through the transparent electrode and exit the light. A ZnO, which constitutes a material for the transparent electrode, is subject to erosion by acid and alkali, thus, as the case may cause loss of a reliability of the electrode under the influence of ion-containing moisture. In order to solve such a problem, this invention has as its aim a transparent electrode film provided with stability capable of preventing any degradation under the influence of any ion-containing moisture, while being kept acid-proof and alkali-proof. In order to accomplish the above-mentioned aim, this invention provides a transparent electrode made up of a ZnO as its main material, wherein its surface is covered with a Mg-doped ZnO film.

    摘要翻译: 为了从电极侧发出光,在诸如LED等的半导体发光器件和液晶中,电极由透明材料形成,以便透过透明电极发出光并离开光。 构成透明电极的材料的ZnO被酸碱侵蚀,因此在离子含水分的影响的情况下可能导致电极的可靠性降低。 为了解决这个问题,本发明的目的是提供具有稳定性的透明电极膜,其能够在保持耐酸碱性的同时防止在任何含离子的水分的影响下的任何劣化。 为了实现上述目的,本发明提供一种由ZnO作为其主要材料的透明电极,其表面被掺杂了Mg的ZnO膜覆盖。

    ZnO system semiconductor device
    66.
    发明授权
    ZnO system semiconductor device 失效
    ZnO系半导体器件

    公开(公告)号:US07002179B2

    公开(公告)日:2006-02-21

    申请号:US10772077

    申请日:2004-02-04

    申请人: Ken Nakahara

    发明人: Ken Nakahara

    IPC分类号: H01L29/15

    摘要: In order to provide ZnO system semiconductor devices having a stable p-type ZnO layer, a ZnO thin film is doped with nitrogen atoms having a high concentration. By fabricating the stable p-type ZnO layer, combinations with n-type ZnO layers easy of fabrication, or combinations with different compositions of p-type layers or n-type layers are made possible, thereby it enables to provide various configurations of ZnO system semiconductor devices.A ZnO system semiconductor device according to the present invention is characterized in that in a semiconductor device comprising one or more layers of n-type layer and p-type layers respectively, at least one layer of said p-type layers is (are) formed of the Zn-polar ZnO system semiconductor film doped with nitrogen atoms such that the thin film growth direction of said Zn-polar ZnO system semiconductor film is conformed to the direction of Zn polarity (0001).

    摘要翻译: 为了提供具有稳定的p型ZnO层的ZnO系半导体器件,ZnO薄膜掺杂有高浓度的氮原子。 通过制造稳定的p型ZnO层,可以容易地制造与n型ZnO层的组合,或者与p型层或n型层的组合不同的组合,从而能够提供各种构造的ZnO系 半导体器件。

    ZnO based compound semiconductor light emitting device and method for manufacturing the same
    67.
    发明申请
    ZnO based compound semiconductor light emitting device and method for manufacturing the same 失效
    ZnO系化合物半导体发光元件及其制造方法

    公开(公告)号:US20050247954A1

    公开(公告)日:2005-11-10

    申请号:US11166254

    申请日:2005-06-27

    摘要: A light emitting device includes a silicon substrate (1), a silicon nitride film (2) formed on the surface of the silicon substrate (1), at least an n-type layer (3), (4) and a p-type layer (6), (7) which are formed on the silicon nitride film (2) and also which are made of a ZnO based compound semiconductor, and a semiconductor layer lamination (11) in which layers are laminated to form a light emitting layer. Preferably this silicon nitride film (2) is formed by thermal treatment conducted in an atmosphere containing nitrogen such as an ammonium gas. Also, in another embodiment, a light emitting device is formed by growing a ZnO based compound semiconductor layer on a main face of a sapphire substrate, the main face being perpendicular to the C-face thereof. As a result, it is possible to obtain a device using a ZnO based compound with high properties such as an LED very excellent in crystallinity and having a high light emitting efficiency.

    摘要翻译: 发光器件包括:硅衬底(1),形成在硅衬底(1)的表面上的氮化硅膜(2),至少n型层(3),(4)和p型 形成在氮化硅膜(2)上并且由ZnO基化合物半导体制成的层(6),(7)和层叠层以形成发光层的半导体层层叠体 。 优选地,该氮化硅膜(2)通过在含氮气体的气氛中进行热处理而形成。 此外,在另一实施例中,通过在蓝宝石衬底的主面上生长ZnO基化合物半导体层,主面垂直于其C面而形成发光器件。 结果,可以获得使用具有高性能的ZnO基化合物的器件,例如非常优异的结晶度并且具有高发光效率的LED。

    Radical cell device and method for manufacturing groups II-VI compound semiconductor device
    69.
    发明授权
    Radical cell device and method for manufacturing groups II-VI compound semiconductor device 有权
    激光电池器件及其制造方法II-VI族化合物半导体器件

    公开(公告)号:US06472241B2

    公开(公告)日:2002-10-29

    申请号:US09939719

    申请日:2001-08-28

    IPC分类号: H01L2100

    CPC分类号: C30B23/06 H01L33/0087

    摘要: The closing plates (61b), (61c) are provided on the both end portions of the cylindrical insulator body (61a), the gas introduction tube for introducing a gaseous substance is inserted into one plate (61b) of the closing plates of the plasma chamber (61) for making the gaseous substance plasmatic within it, and on the other plate (61c), the plasma radiation outlet (61d) is provided. Then, nearby the plasma jet (63) outgoing from the radiation outlet, the electrode (64) for applying a high electric field of an ion trapper is provided so as to be opposed to the grounded electrode (65) interposed the plasma jet between them. This electrode for applying a high electric field is fixed on the grounded metal plate (61e) provided on the other plate (61c) via the insulation porcelain (66) made of MgO or quartz. As a result, a radical cell device which does not blow-off and mix up Al into the layer epitaxially grown is obtained ,and a Groups II-VI compound semiconductor device because undoped Al is not contained in the semiconductor layers.

    摘要翻译: 封闭板(61b),(61c)设置在圆筒形绝缘体(61a)的两端部,将用于引入气态物质的气体导入管插入等离子体的封闭板的一个板(61b) 用于在其内制备气态物质的室(61),在另一个板(61c)上设置有等离子体辐射出口(61d)。 然后,在从辐射出口排出的等离子体射流(63)附近,设置用于施加离子捕获器的高电场的电极(64),以与插入其间的等离子体射流的接地电极(65)相对 。 用于施加高电场的电极经由由MgO或石英制成的绝缘瓷(66)固定在设置在另一板(61c)上的接地金属板(61e)上。 结果,可以获得不将Al吹出和外延生长的层的自由基电池器件,由于在半导体层中不含有未掺杂的Al的II-VI族化合物半导体器件。