Isoflavone Glycosides as Peroxisome Proliferator-Activated Receptor-alpha Modulator
    61.
    发明申请
    Isoflavone Glycosides as Peroxisome Proliferator-Activated Receptor-alpha Modulator 审中-公开
    异黄酮糖苷作为过氧化物酶体增殖物激活受体-α调节剂

    公开(公告)号:US20090099099A1

    公开(公告)日:2009-04-16

    申请号:US11872771

    申请日:2007-10-16

    IPC分类号: A61K31/7048 C07H3/02 A61P3/04

    CPC分类号: C07H3/02

    摘要: A method of treating or preventing diseases related to modulation of PPAR-α in comprising administering to a human or other mammals in need of such treatment an effective amount of plant material derived from plants of the genera Puerila Lobata.

    摘要翻译: 一种治疗或预​​防与PPAR-α调节有关的疾病的方法,其包括对需要这种治疗的人或其他哺乳动物施用有效量的源自普拉里巴拉杜鹃属植物的植物材料。

    METHODS AND APPARATUS TO PROVIDE PARAMETERIZED OFFLOADING ON MULTIPROCESSOR ARCHITECTURES
    66.
    发明申请
    METHODS AND APPARATUS TO PROVIDE PARAMETERIZED OFFLOADING ON MULTIPROCESSOR ARCHITECTURES 审中-公开
    在多处理器架构上提供参数化卸载的方法和装置

    公开(公告)号:US20080163183A1

    公开(公告)日:2008-07-03

    申请号:US11618143

    申请日:2006-12-29

    IPC分类号: G06F9/45

    CPC分类号: G06F8/456 G06F2209/509

    摘要: Methods and apparatus to provide parameterized offloading in multiprocessor systems are disclosed. An example method includes partitioning source code into a first task and a second task, and compiling object code from the source code, such that the first task is compiled to execute on a first processor core and the second task is compiled to execute on a second processor core, the assignment of the first task to the first core being dependent on an input parameter.

    摘要翻译: 公开了在多处理器系统中提供参数化卸载的方法和装置。 示例性方法包括将源代码分割成第一任务和第二任务,以及从源代码编译目标代码,使得第一任务被编译为在第一处理器核上执行,并且第二任务被编译为在第二任务上执行 处理器核心,将第一个任务分配给第一个内核取决于输入参数。

    EDGE REMOVAL OF SILICON-ON-INSULATOR TRANSFER WAFER
    69.
    发明申请
    EDGE REMOVAL OF SILICON-ON-INSULATOR TRANSFER WAFER 有权
    绝缘体绝缘子转移膜的边缘去除

    公开(公告)号:US20080138987A1

    公开(公告)日:2008-06-12

    申请号:US12033727

    申请日:2008-02-19

    IPC分类号: H01L21/302

    摘要: A silicon-on-insulator transfer wafer having a front surface with a circumferential lip around a circular recess is polished. In one version, the circular recess on the front surface of the wafer is masked by filling the recess with spin-on-glass. The front surface of the wafer is exposed to an etchant to preferentially etch away the circumferential lip, while the circular recess is masked by the spin-on-glass. The spin-on glass is removed, and the front surface of the transfer wafer is polished. Other methods of removing the circumferential lip include applying a higher pressure to the circumferential lip in a polishing process, and directing a pressurized fluid jet at the base of the circumferential lip.

    摘要翻译: 抛光具有围绕圆形凹槽的具有周向唇缘的前表面的绝缘体上硅转移晶片。 在一个版本中,通过用旋转玻璃填充凹槽来掩蔽晶片前表面上的圆形凹槽。 将晶片的前表面暴露于蚀刻剂以优先蚀刻掉周缘,同时圆形凹槽被旋涂玻璃掩蔽。 去除旋涂玻璃,并且转印晶片的前表面被抛光。 去除圆周唇缘的其它方法包括在抛光过程中向周缘施加更高的压力,并且在周向唇缘的底部引导加压流体射流。