Method and apparatus for discharging memory array lines
    62.
    发明授权
    Method and apparatus for discharging memory array lines 有权
    用于放电存储器阵列线的方法和装置

    公开(公告)号:US06504753B1

    公开(公告)日:2003-01-07

    申请号:US09897784

    申请日:2001-06-29

    IPC分类号: G11C1136

    摘要: A passive element memory array preferably biases selected X-lines to an externally received VPP voltage and selected Y-lines to ground. Unselected Y-lines are preferably biased to VPP minus a first offset voltage, and unselected X-lines biased to a second offset voltage (relative to ground). The first and second offset voltages preferably are identical and have a value of about 0.5 to 2 volts. The VPP voltage depends upon the memory cell technology used, and preferably falls within the range of 5 to 20 volts. The area otherwise required for an on-chip VPP generator and saves the power that would be consumed by such a generator. In addition, the operating temperature of the integrated circuit during the programming operation decreases, which further decreases power dissipation. When discharging the memory array, the capacitance between layers is preferably discharged first, then the layers are discharged to ground.

    摘要翻译: 无源元件存储器阵列优选地将所选择的X线偏置到外部接收的VPP电压,并将选定的Y线偏置到地。 未选择的Y线优选地偏置到VPP减去第一偏移电压,并且偏置到第二偏移电压(相对于地)的未选择的X线。 第一和第二偏移电压优选地相同并且具有约0.5至2伏特的值。 VPP电压取决于所使用的存储器单元技术,优选落在5至20伏的范围内。 片上VPP发生器所需的区域,并节省了这种发电机将消耗的功率。 此外,编程操作期间集成电路的工作温度降低,这进一步降低了功耗。 当放电存储器阵列时,层间的电容最好首先放电,然后将这些层放电到地。

    One device field effect transistor (FET) AC stable random access memory
(RAM) array
    63.
    再颁专利
    One device field effect transistor (FET) AC stable random access memory (RAM) array 失效
    一个器件场效应晶体管(FET)AC稳定随机存取存储器(RAM)阵列

    公开(公告)号:USRE32236E

    公开(公告)日:1986-08-26

    申请号:US763171

    申请日:1985-08-07

    摘要: Disclosed is an integrated circuit electrode memory array having a plurality of FET memory cells arranged in rows and columns and formed on the same integrated circuit chip with associated support circuits. Each memory cell of the array has a capacitive storage region, an adjacent channel region, and a gate region for controlling the transfer of binary information through the channel region in and out of the capacitive storage region. Each memory cell also has a bit line contact region which is shared with an adjacent memory cell. The word lines are arranged in rows in a substantially equidistant parallel relationship, each word line passing, in succession, over the storage region of a first one of the memory cells and electrically integral with the gate region of a second one of the memory cells. The column arrangement of memory cells is interdigitated such that the memory cells associated with a single bit line are arranged in first and second parallel lines along both the left and right sides of each bit line. Thus, the bit line is arranged in a zig-zag configuration alternatively contacting memory cells arranged along its left and right side.

    Apparatus and methods of forming memory lines and structures using double sidewall patterning for four times half pitch relief patterning
    64.
    发明授权
    Apparatus and methods of forming memory lines and structures using double sidewall patterning for four times half pitch relief patterning 有权
    使用双侧壁图案形成存储器线和结构的装置和方法,用于四次半间距浮雕图案化

    公开(公告)号:US08679967B2

    公开(公告)日:2014-03-25

    申请号:US12911887

    申请日:2010-10-26

    IPC分类号: H01L21/4763

    摘要: The present invention provides apparatus, methods, and systems for fabricating memory lines and structures using double sidewall patterning for four times half pitch relief patterning. The invention includes forming features from a first template layer disposed above a substrate, forming half-pitch sidewall spacers adjacent the features, forming smaller features in a second template layer by using the half-pitch sidewall spacers as a hardmask, forming quarter-pitch sidewall spacers adjacent the smaller features, and forming conductor features from a conductor layer by using the quarter-pitch sidewall spacers as a hardmask. Numerous additional aspects are disclosed.

    摘要翻译: 本发明提供用于制造使用双重侧壁图案化四次半间距浮雕图案化的存储器线和结构的装置,方法和系统。 本发明包括从设置在基板上方的第一模板层形成特征,形成邻近特征的半间距侧壁间隔,通过使用半间距侧壁间隔物作为硬掩模在第二模板层中形成更小的特征,形成四分之一间距侧壁 靠近较小特征的间隔物,并且通过使用四分之一间距侧壁间隔物作为硬掩模,从导体层形成导体特征。 公开了许多附加方面。

    Multi-bit resistance-switching memory cell
    66.
    发明授权
    Multi-bit resistance-switching memory cell 有权
    多位电阻切换存储单元

    公开(公告)号:US08649206B2

    公开(公告)日:2014-02-11

    申请号:US13396489

    申请日:2012-02-14

    IPC分类号: G11C11/00

    摘要: A non-volatile storage apparatus comprises a set of Y lines, a set of X lines and a plurality of memory cells in communication with the set of X lines and the set of Y lines. Each memory cell of the plurality of memory cells includes a resistance element in a static resistance condition and two or more reversible resistance-switching elements. The resistance element in the static resistance condition and the two or more reversible resistance-switching elements are connected to different Y lines of the set of Y lines. The resistance element in the low resistance state and the two or more reversible resistance-switching elements are connected to a common X line of the set of X lines. One or multiple bits of data are programmed into a particular memory cell of the plurality of memory cells by causing current flow between Y lines connected to the particular memory cell.

    摘要翻译: 非易失性存储装置包括一组Y线,一组X线和与该X线组和Y线组通信的多个存储单元。 多个存储单元的每个存储单元包括静态电阻状态的电阻元件和两个或多个可逆电阻切换元件。 静态电阻状态下的电阻元件和两个以上的可逆电阻切换元件被连接到该Y线组的不同Y线。 低电阻状态下的电阻元件和两个或更多个可逆电阻切换元件连接到该X线组的公共X线。 一个或多个数据位通过在连接到特定存储单元的Y线之间引起电流而编程到多个存储单元的特定存储单元中。

    Methods and apparatus for extending the effective thermal operating range of a memory
    68.
    发明授权
    Methods and apparatus for extending the effective thermal operating range of a memory 有权
    扩展存储器的有效热操作范围的方法和装置

    公开(公告)号:US08531904B2

    公开(公告)日:2013-09-10

    申请号:US13205820

    申请日:2011-08-09

    IPC分类号: G11C7/04

    CPC分类号: G11C7/04 G11C16/06

    摘要: Apparatus and systems are provided for thermal regulation of a memory integrated circuit (“IC”). The apparatus and systems may include a thermal sensor on a memory IC, and a heating element coupled to the thermal sensor. The heating element is adapted to heat the memory IC in response to a signal from the thermal sensor. Other aspects are also provided.

    摘要翻译: 提供了用于存储器集成电路(“IC”)的热调节的装置和系统。 该装置和系统可以包括存储器IC上的热传感器和耦合到热传感器的加热元件。 加热元件适于响应于来自热传感器的信号来加热存储器IC。 还提供其他方面。

    Memory array circuit incorporating multiple array block selection and related method
    69.
    发明授权
    Memory array circuit incorporating multiple array block selection and related method 有权
    包含多个阵列块选择和相关方法的存储阵列电路

    公开(公告)号:US08509025B2

    公开(公告)日:2013-08-13

    申请号:US13215134

    申请日:2011-08-22

    IPC分类号: G11C8/00

    摘要: Circuits and methods are described for decoding exemplary memory arrays of programmable and, in some embodiments, re-writable passive element memory cells, which are particularly useful for extremely dense three-dimensional memory arrays having more than one memory plane. In addition, circuits and methods are described for selecting one or more array blocks of such a memory array, for selecting one or more word lines and bit lines within selected array blocks, for conveying data information to and from selected memory cells within selected array blocks, and for conveying unselected bias conditions to unselected array blocks.

    摘要翻译: 描述了用于解码可编程的示例性存储器阵列的电路和方法,在一些实施例中,可重写无源元件存储器单元,其对于具有多于一个存储器平面的非常密集的三维存储器阵列特别有用。 此外,描述了用于选择这种存储器阵列的一个或多个阵列块的电路和方法,用于选择所选择的阵列块内的一个或多个字线和位线,用于将数据信息传送到选定的阵列块内的选定的存储器单元 并且用于将未选择的偏置条件传送到未选择的阵列块。

    Methods and apparatus for forming memory lines and vias in three dimensional memory arrays using dual damascene process and imprint lithography
    70.
    发明授权
    Methods and apparatus for forming memory lines and vias in three dimensional memory arrays using dual damascene process and imprint lithography 有权
    在使用双镶嵌工艺和压印光刻的三维存储阵列中形成记忆线和通孔的方法和装置

    公开(公告)号:US08466068B2

    公开(公告)日:2013-06-18

    申请号:US11967638

    申请日:2007-12-31

    IPC分类号: H01L21/311 H01L21/302

    摘要: The present invention provides systems, apparatus, and methods for forming three dimensional memory arrays using a multi-depth imprint lithography mask and a damascene process. An imprint lithography mask for manufacturing a memory layer in a three dimensional memory is described. The mask includes a translucent material formed with features for making an imprint in a transfer material to be used in a damascene process, the mask having a plurality of imprint depths. At least one imprint depth corresponds to trenches for forming memory lines and at least one depth corresponds to holes for forming vias. Numerous other aspects are disclosed.

    摘要翻译: 本发明提供使用多深度压印光刻掩模和镶嵌工艺形成三维存储器阵列的系统,装置和方法。 描述了用于制造三维存储器中的存储层的压印光刻掩模。 掩模包括半透明材料,其形成有用于在用于镶嵌工艺中的转印材料中进行印记的特征,所述掩模具有多个印痕深度。 至少一个压印深度对应于用于形成存储器线的沟槽,并且至少一个深度对应于用于形成通孔的孔。 公开了许多其他方面。