公开(公告)号：US06541781B1

公开(公告)日：2003-04-01

申请号：US09625718

申请日：2000-07-25

申请人： Victor M. Benveniste ,  John Ye ,  William F. DiVergilio

发明人： Victor M. Benveniste ,  John Ye ,  William F. DiVergilio

IPC分类号： G21K510

CPC分类号： H01J37/32678 ,  H01J37/05 ,  H01J37/3171

摘要： An apparatus and method for providing a low energy, high current ion beam for ion implantation applications are disclosed. The apparatus includes a mass analysis magnet mounted in a passageway along the path of an ion beam, a power source adapted to provide an electric field in the passageway, and a magnetic device adapted to provide a multi-cusped magnetic field in the passageway, which may include a plurality of magnets mounted along at least a portion of the passageway. The power source and the magnets may cooperatively interact to provide an electron cyclotron resonance (ECR) condition along at least a portion of the passageway. The multi-cusped magnetic field may be superimposed on the dipole field at a specified field strength in a region of the mass analyzer passageway to interact with an electric field of a known RF or microwave frequency for a given low energy ion beam. The invention further comprises a mass analyzer waveguide adapted to couple the electric field to the beam plasma consistently along the length of the mass analyzer passageway to thereby improve the creation of the ECR condition. The invention thus provides enhancement of beam plasma within a mass analyzer dipole magnetic field for low energy ion beams without the introduction of externally generated plasma. The invention further includes a method of providing ion beam containment in a low energy ion implantation system, as well as an ion implantation system.

摘要翻译： 公开了一种用于提供用于离子注入应用的低能量高电流离子束的装置和方法。 该装置包括安装在沿着离子束的路径的通道中的质量分析磁体，适于在通道中提供电场的电源以及适于在通道中提供多通道磁场的磁性装置，其中 可以包括沿通道的至少一部分安装的多个磁体。 电源和磁体可以协同地相互作用以沿着通道的至少一部分提供电子回旋共振（ECR）状态。 多质量磁场可以在质量分析器通道的区域中以指定的场强叠加在偶极子场上，以与给定的低能离子束的已知RF或微波频率的电场相互作用。 本发明还包括质量分析器波导，其适于沿着质量分析器通道的长度一致地将电场耦合到束等离子体，从而改善ECR条件的产生。 因此，本发明在低能量离子束的质量分析器偶极磁场内提供束等离子体的增强，而不引入外部产生的等离子体。 本发明还包括一种在低能离子注入系统中提供离子束容纳的方法以及离子注入系统。

公开(公告)号：US06525326B1

公开(公告)日：2003-02-25

申请号：US09654381

申请日：2000-09-01

申请人： Eric R. Harrington ,  Victor M. Benveniste ,  Jeffrey A. Burgess ,  John Z. Ye

发明人： Eric R. Harrington ,  Victor M. Benveniste ,  Jeffrey A. Burgess ,  John Z. Ye

IPC分类号： H01J3730

CPC分类号： H01J3/40 ,  H01J37/026 ,  H01J37/3002 ,  H01J37/3171 ,  H01J2237/004 ,  H01J2237/022 ,  H01J2237/31705

摘要： A system for inhibiting the transport of contaminant particles with an ion beam includes an electric field generator for generating an electric field relative to a path of travel for the ion beam. A particle located in the ion beam and in a region of the electric field is charged to a polarity according to the ion beam, so that the electric field may urge the charged particle out of the ion beam.

摘要翻译： 用于抑制用离子束输送污染物颗粒的系统包括用于相对于离子束的行进路径产生电场的电场发生器。 位于离子束中并且在电场的区域中的粒子根据离子束被充电到极性，使得电场可以将带电粒子推出离子束。

公开(公告)号：US06476399B1

公开(公告)日：2002-11-05

申请号：US09654379

申请日：2000-09-01

申请人： Eric R. Harrington ,  Victor M. Benveniste ,  Michael A. Graf ,  Robert D. Rathmell

发明人： Eric R. Harrington ,  Victor M. Benveniste ,  Michael A. Graf ,  Robert D. Rathmell

IPC分类号： H01J3730

CPC分类号： H01J37/026 ,  H01J37/3002 ,  H01J37/3171 ,  H01J2237/004 ,  H01J2237/022 ,  H01J2237/31705

摘要： A system for inhibiting the transport of contaminant particles with an ion beam includes a particle charging system for charging particles within a region through which the ion beam travels. An electric field is generated downstream relative to the charged region so as to urge charged particles away from a direction of travel for the ion beam.

摘要翻译： 用于抑制用离子束输送污染物颗粒的系统包括用于在离子束行进的区域内填充颗粒的颗粒装料系统。 在相对于带电区域的下游产生电场，以便使带电粒子远离离子束的行进方向。

公开(公告)号：US6065499A

公开(公告)日：2000-05-23

申请号：US217677

申请日：1998-12-21

申请人： Alexander F. Pless ,  Gary J. Rosen ,  Allan D. Weed ,  Ernest E. Allen ,  Victor M. Benveniste ,  Perry J. I. Justesen

发明人： Alexander F. Pless ,  Gary J. Rosen ,  Allan D. Weed ,  Ernest E. Allen ,  Victor M. Benveniste ,  Perry J. I. Justesen

IPC分类号： H01L21/265 ,  F16J3/04 ,  F16L51/02 ,  F16L11/00 ,  F16L11/16

CPC分类号： F16L51/025 ,  H01J37/16 ,  H01J37/3171

摘要： An improved bellows assembly (18) is provided for use in, for example, an ion implanter (10). The bellows assembly comprises a first mounting portion (56) located at one end of the bellows assembly for fixedly mounting the bellows assembly to a first vacuum chamber (16); a second mounting portion (52) located at an opposite end of the bellows assembly for slidably mounting the bellows assembly to a second vacuum chamber (15); and a steel bellows (54) located between the first and second mounting portions. The bellows extends generally along a longitudinal axis (64) and is expansible and contractible along this axis. The second mounting portion permits radial slidable movement of the bellows assembly with respect to the second chamber in a first plane substantially perpendicular to this axis. The second mounting portion comprises at least one sliding seal subassembly (80) for maintaining the vacuum, and a support ring (78) and a slide plate (82) located on opposite ends of the sliding seal subassembly. The slide plate and the sliding seal subassembly provide a slidable vacuum-tight mating surface therebetween.

摘要翻译： 改进的波纹管组件（18）被提供用于例如离子注入机（10）。 波纹管组件包括位于波纹管组件一端的第一安装部分（56），用于将波纹管组件固定地安装到第一真空室（16）上; 位于波纹管组件的相对端的第二安装部分（52），用于将波纹管组件可滑动地安装到第二真空室（15）; 和位于第一和第二安装部之间的钢质波纹管（54）。 波纹管大致沿着纵向轴线（64）延伸并且沿该轴线可膨胀和收缩。 第二安装部分允许波纹管组件在基本上垂直于该轴线的第一平面中相对于第二腔室径向滑动运动。 第二安装部分包括用于维持真空的至少一个滑动密封子组件（80）以及位于滑动密封子组件的相对端上的支撑环（78）和滑动板（82）。 滑板和滑动密封子组件在其间提供可滑动的真空密封配合表面。

公开(公告)号：US5703375A

公开(公告)日：1997-12-30

申请号：US691467

申请日：1996-08-02

申请人： Jiong Chen ,  Victor M. Benveniste

发明人： Jiong Chen ,  Victor M. Benveniste

IPC分类号： C23C14/48 ,  H01J37/02 ,  H01J37/20 ,  H01J37/317 ,  H01L21/265

CPC分类号： H01J37/026 ,  H01J2237/0041 ,  H01J2237/31701

摘要： Method and apparatus for maintaining an ion beam along a beam path from an ion source to an ion implantation station where workpieces are treated with the ion beam. An ion beam neutralizer is positioned upstream from the ion treatment station and includes confinement structure which bounds the ion beam path. An electron source positioned within the confinement structure emits electrons into the ion beam. An array of magnets supported by the confinement structure creates a magnetic field which tends to confine the electrons moving within the confinement structure. An interior magnetic filter field is created inside the confinement structure by a plurality of axially elongated filter rods having encapsulated magnets bounding the ion beam and oriented generally parallel to the ion beam path. This interior magnetic field confines higher energy electrons from leaving the ion beam path and permits lower energy electrons to drift along the ion beam.

摘要翻译： 用于将离子束沿着从离子源到离子注入工位的束路保持离子束的方法和装置，其中用离子束处理工件。 离子束中和器位于离子处理站的上游，并且包括界定离子束路径的约束结构。 位于限制结构内的电子源将电子发射到离子束中。 由限制结构支撑的磁体阵列产生趋向于限制在限制结构内移动的电子的磁场。 通过多个轴向细长的过滤棒在限制结构内部产生内部磁性过滤器场，所述过滤棒具有包围离子束并且大致平行于离子束路径定向取向的封装的磁体。 该内部磁场限制较高能量的电子离开离子束路径，并允许较低能量的电子沿离子束漂移。

公开(公告)号：US5164599A

公开(公告)日：1992-11-17

申请号：US732778

申请日：1991-07-19

申请人： Victor M. Benveniste

发明人： Victor M. Benveniste

IPC分类号： H01J37/317 ,  C23C14/48 ,  H01J37/02 ,  H01L21/265

CPC分类号： H01J37/026 ,  H01J2237/0045 ,  H01J2237/31701

摘要： An ion implantation featuring an improved beam neutralizer. A cylindrical electron source encircles the ion beam at a location just before the ion beam enters an implantation chamber. Regularly spaced cavities in the electron source contain wire filaments which are energized to emit electrons. The electrons are accelerated through the region of the ion beam and impact an inwardly facing wall of the cylindrical electron support. This causes low-energy electron emissions which neutralize the ion beam. Performance of the beam neutralizer is enhanced by injecting an ionizable gas into the region between the electron emitting surface and the ion beam.

公开(公告)号：US5023458A

公开(公告)日：1991-06-11

申请号：US487158

申请日：1990-03-01

申请人： Victor M. Benveniste ,  Edward K. McIntyre, Jr.

发明人： Victor M. Benveniste ,  Edward K. McIntyre, Jr.

IPC分类号： C23C14/48 ,  H01J27/02 ,  H01J37/08 ,  H01J37/317 ,  H01L21/265

CPC分类号： H01J37/08 ,  H01J37/3172

摘要： An ion implantation source used in an ion implantation system. The source produces multiple beam portions which combine to form a large diameter beam of the size of a workpiece. By controlling beam neutralization of the individual beam portions the ion density as a function of position within the cross-section of the beam can be controlled.

摘要翻译： 用于离子注入系统的离子注入源。 源产生多个光束部分，其结合以形成工件尺寸的大直径光束。 通过控制单个光束部分的光束中和，可以控制作为光束横截面内的位置的函数的离子密度。

公开(公告)号：US07675047B2

公开(公告)日：2010-03-09

申请号：US11536992

申请日：2006-09-29

申请人： Svetlana B. Radovanov ,  Peter L. Kellerman ,  Victor M. Benveniste ,  Robert C. Lindberg ,  Kenneth H. Purser ,  Tyler B. Rockwell ,  James S. Buff ,  Anthony Renau

发明人： Svetlana B. Radovanov ,  Peter L. Kellerman ,  Victor M. Benveniste ,  Robert C. Lindberg ,  Kenneth H. Purser ,  Tyler B. Rockwell ,  James S. Buff ,  Anthony Renau

IPC分类号： H01J37/10 ,  H01J37/317

CPC分类号： H01J37/12 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/083 ,  H01J2237/121

摘要： A technique for shaping a ribbon-shaped ion beam is disclosed. In one particular exemplary embodiment, the technique may be realized as an apparatus for shaping a ribbon-shaped ion beam. The apparatus may comprise an electrostatic lens having a substantially rectangular aperture for a ribbon-shaped ion beam to pass through, wherein a plurality of focusing elements are positioned along short edges of the aperture, and wherein each focusing element is separately biased and oriented to shape the ribbon-shaped ion beam.

摘要翻译： 公开了一种用于成形带状离子束的技术。 在一个特定的示例性实施例中，该技术可以被实现为用于成形带状离子束的装置。 该设备可以包括具有用于带状离子束通过的基本上矩形的孔的静电透镜，其中多个聚焦元件沿着孔的短边缘定位，并且其中每个聚焦元件被单独偏置并定向成形 带状离子束。

公开(公告)号：US07550751B2

公开(公告)日：2009-06-23

申请号：US11784709

申请日：2007-04-09

申请人： Victor M. Benveniste ,  Edward C. Eisner ,  Bo H. Vanderberg

发明人： Victor M. Benveniste ,  Edward C. Eisner ,  Bo H. Vanderberg

IPC分类号： H01J37/08

CPC分类号： H01J37/3171 ,  G21K5/04 ,  H01J37/304 ,  H01J2237/24507 ,  H01J2237/3045 ,  H01J2237/30455 ,  H01J2237/31703

摘要： One embodiment of the invention relates to a method for adjusting the ribbon beam flux of a scanned ion beam. In this method, an ion beam is scanned at a scan rate, and a plurality of dynamic beam profiles are measured as the ion beam is scanned. A corrected scan rate is calculated based on the plurality of measured dynamic beam profiles of the scanned beam. The ion beam is scanned at the corrected scan rate to produce a corrected ribbon ion beam. Other methods and systems are also disclosed.

摘要翻译： 本发明的一个实施例涉及一种用于调整扫描离子束的带状光束通量的方法。 在该方法中，以扫描速率扫描离子束，并且当扫描离子束时测量多个动态光束分布。 基于扫描光束的多个测量的动态光束分布来计算校正的扫描速率。 以校正的扫描速率扫描离子束以产生校正的带状离子束。 还公开了其它方法和系统。

公开(公告)号：US07112809B2

公开(公告)日：2006-09-26

申请号：US10894209

申请日：2004-07-19

申请人： Robert D. Rathmell ,  Victor M. Benveniste

发明人： Robert D. Rathmell ,  Victor M. Benveniste

IPC分类号： H01J37/317

CPC分类号： H01J37/12 ,  H01J37/3171

摘要： A lens structure for use with an ion beam implanter. The lens structure includes first and second electrodes spaced apart along a direction of ion movement. The lens structure extends across a width of the ion beam for deflecting ions entering the lens structure. The lens structure includes a first electrode for decelerating ions and a second electrode for accelerating the ions. A lens structure mode controller selectively activates either the accelerating or decelerating electrode to to cause ions entering the lens structure to exit said lens structure with a desired trajectory regardless of the trajectory ions enter the lens structure.

摘要翻译： 用于离子束注入机的透镜结构。 透镜结构包括沿离子运动方向间隔开的第一和第二电极。 透镜结构横跨离子束的宽度延伸，用于偏离进入透镜结构的离子。 透镜结构包括用于减速的第一电极和用于加速离子的第二电极。 透镜结构模式控制器选择性地激活加速或减速电极以使离子进入透镜结构以期望的轨迹离开所述透镜结构，而不管轨迹离子进入透镜结构。