Electron beam generator
    61.
    发明授权
    Electron beam generator 失效
    电子束发生器

    公开(公告)号:US3857014A

    公开(公告)日:1974-12-24

    申请号:US32067873

    申请日:1973-01-02

    CPC classification number: H01J37/063

    Abstract: An electron-beam generator comprises a cathode with a thermionic emitter, an anode and an electromagnetic system means; opposite said thermionic emitter there is disposed an additional electrode maintained at a negative potential relative to said anode; the electromagnetic system means establishes a magnetic field with the lines of force thereof curved through an angle close to or exceeding 90*; the cathode, anode, additional electrode and electromagnetic system means are disposed with respect to one another in such a manner as to act upon the electron beam in the direction of the curve of the magnetic field lines and to bend the electron beam in the plane of the magnetic field lines through an angle larger than said angle of curvature of the magnetic field lines by a value close to or exceeding 90*, with the result that in an acceleration area the electron beam travels across, and, upon completion of the acceleration phase, along the lines of force of the magnetic field. The electron-beam generator may be employed in electron-beam furnaces for vacuum heating and melting of metals, as well as in ultra-high frequency instruments and amplifiers wherein the electron beam interacts with the electromagnetic field.

    Abstract translation: 电子束发生器包括具有热离子发射器的阴极,阳极和电磁系统装置; 相对于所述热离子发射器设置相对于所述阳极保持在负电位的附加电极; 电磁系统装置建立一个磁场,其力线弯曲成接近或超过90度的角度; 阴极,阳极,附加电极和电磁系统装置相对于彼此设置成在磁场线的曲线方向上作用于电子束并使电子束在平面内弯曲 磁场线的磁场线大于磁场线的曲率大于接近或超过90°的角度,结果是在加速区域内电子束传播,并且在完成加速阶段后 ,沿着磁场的力线。 电子束发生器可以用于电子束炉中,用于金属的真空加热和熔化,以及在电子束与电磁场相互作用的超高频仪器和放大器中。

    Apparatus for and method of producing an energetic electron curtain
    62.
    发明授权
    Apparatus for and method of producing an energetic electron curtain 失效
    用于生产电动电子幕的装置和方法

    公开(公告)号:US3702412A

    公开(公告)日:1972-11-07

    申请号:US3702412D

    申请日:1971-06-16

    CPC classification number: H01J37/063 H01J33/00

    Abstract: This disclosure deals with the shaping of a longitudinal spacecharge-limited line of electrons into a substantially uniform electron density curtain, accelerating the same along field lines that expand the curtain, and then passing the expanded curtain through a longitudinal window for irradiation purposes and the like.

    Abstract translation: 本公开涉及将纵向空间电荷限制的电子线形成为基本上均匀的电子密度帘幕,沿着扩展窗帘的场线加速其,然后使膨胀的窗帘通过用于照射目的的纵向窗口, 类似。

    WIRE OR ROD SHAPED EXTRACTION ELECTRODE OPTICS

    公开(公告)号:US20240145213A1

    公开(公告)日:2024-05-02

    申请号:US17977537

    申请日:2022-10-31

    CPC classification number: H01J37/3171 H01J37/063

    Abstract: An electrode apparatus for an ion implantation system has a base plate having a base plate aperture and at least one securement region. A securement apparatus is associated with each securement region, and a plurality of electrode rods are selectively coupled to the base plate by the securement apparatus. The plurality of electrode rods have a predetermined shape to define an optical region that is associated with the base plate aperture. An electrical coupling electrically connects to the plurality of electrode rods and is configured to electrically connect to an electrical potential. The plurality of electrode rods have a predetermined shape configured to define a path of a charged particle passing between the plurality of electrode rods based on the electrical potential. The plurality of electrode rods can define a suppressor or ground electrode downstream of an extraction aperture of an ion source.

    Ion generator and ion implanter
    67.
    发明授权

    公开(公告)号:US11848170B2

    公开(公告)日:2023-12-19

    申请号:US17836109

    申请日:2022-06-09

    Inventor: Syuta Ochi

    Abstract: An ion generator includes an arc chamber defining a plasma generation space, and a cathode which emits thermoelectrons toward the plasma generation space. The arc chamber includes a box-shaped main body having an opening, and a slit member mounted to cover the opening and provided with a front slit. An inner surface of the main body is exposed to the plasma generation space made of a refractory metal material. The slit member includes an inner member made of graphite and an outer member made of another refractory metal material. The outer member includes an outer surface exposed to an outside of the arc chamber. The inner member includes an inner surface exposed to the plasma generation space, and an opening portion which forms the front slit extending from the inner surface of the inner member to the outer surface of the outer member.

    Schottky thermal field emitter with integrated beam splitter

    公开(公告)号:US11699564B2

    公开(公告)日:2023-07-11

    申请号:US17078681

    申请日:2020-10-23

    Inventor: Victor Katsap

    CPC classification number: H01J37/073 H01J37/063 H01J37/12

    Abstract: A Schottky thermal field emitter (TFE) source integrated with a beam splitter by a standoff, which supports the beam splitter above the Schottky TFE extractor faceplate by a distance of 0.05 mm to 2 mm. The beam splitter includes a microhole array integrated with the standoff and being disposed opposite the extractor faceplate, the microhole array having a plurality of microholes that split the electron beam generated by the Schottky TFE into a plurality of beamlets. The support and extractor may be fabricated from the same material or from different materials. The support may be formed from a high temperature resistive material, which causes a potential difference between the extractor and the microhole array. This potential difference creates positively charged electrostatic lenses at the microholes, which increases current in the individual beamlets. Voltage on the microarray plate may be varied to achieve a high beamlet current.

    ELECTRON SOURCE, METHOD FOR MANUFACTURING SAME, EMITTER, AND DEVICE INCLUDING SAME

    公开(公告)号:US20230215679A1

    公开(公告)日:2023-07-06

    申请号:US17996469

    申请日:2021-04-14

    CPC classification number: H01J9/042 H01J1/16 H01J37/063

    Abstract: An electron source according to the present disclosure includes a columnar portion made of a first material having an electron emission characteristic; and a tubular portion that is disposed to surround the columnar portion and made of a second material having a higher work function than the first material, wherein a hole that extends in a direction from one end face toward the other end face and has a substantially circular cross-sectional shape is formed in the tubular portion, and the columnar portion has a substantially triangular or substantially quadrangular cross-sectional shape and is fixed to the tubular portion in an abutting engagement with an inner surface of the hole.

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