Abstract:
An electron-beam generator comprises a cathode with a thermionic emitter, an anode and an electromagnetic system means; opposite said thermionic emitter there is disposed an additional electrode maintained at a negative potential relative to said anode; the electromagnetic system means establishes a magnetic field with the lines of force thereof curved through an angle close to or exceeding 90*; the cathode, anode, additional electrode and electromagnetic system means are disposed with respect to one another in such a manner as to act upon the electron beam in the direction of the curve of the magnetic field lines and to bend the electron beam in the plane of the magnetic field lines through an angle larger than said angle of curvature of the magnetic field lines by a value close to or exceeding 90*, with the result that in an acceleration area the electron beam travels across, and, upon completion of the acceleration phase, along the lines of force of the magnetic field. The electron-beam generator may be employed in electron-beam furnaces for vacuum heating and melting of metals, as well as in ultra-high frequency instruments and amplifiers wherein the electron beam interacts with the electromagnetic field.
Abstract:
This disclosure deals with the shaping of a longitudinal spacecharge-limited line of electrons into a substantially uniform electron density curtain, accelerating the same along field lines that expand the curtain, and then passing the expanded curtain through a longitudinal window for irradiation purposes and the like.
Abstract:
An electron gun for heating materials in vacuo, including an electron beam source, an electron lens, a deflector, yoke means connecting the deflector and winding means.
Abstract:
An electron gun transforms a round beam of electrons into a sheet beam by employing a pair of curved deflecting plates positioned between two spaced anodes of a final unipotential lens of the gun.
Abstract:
An electrode apparatus for an ion implantation system has a base plate having a base plate aperture and at least one securement region. A securement apparatus is associated with each securement region, and a plurality of electrode rods are selectively coupled to the base plate by the securement apparatus. The plurality of electrode rods have a predetermined shape to define an optical region that is associated with the base plate aperture. An electrical coupling electrically connects to the plurality of electrode rods and is configured to electrically connect to an electrical potential. The plurality of electrode rods have a predetermined shape configured to define a path of a charged particle passing between the plurality of electrode rods based on the electrical potential. The plurality of electrode rods can define a suppressor or ground electrode downstream of an extraction aperture of an ion source.
Abstract:
The present disclosure relates to integrating microdevices into a system substrate. In particular it relates to measuring microdevices using an electron beam method using one or several tips as Ebeam sources. The disclosure further outlines methods to target Ebeams effectively to produce an optimum result with minimal damage to adjacent microdevices and components.
Abstract:
An ion generator includes an arc chamber defining a plasma generation space, and a cathode which emits thermoelectrons toward the plasma generation space. The arc chamber includes a box-shaped main body having an opening, and a slit member mounted to cover the opening and provided with a front slit. An inner surface of the main body is exposed to the plasma generation space made of a refractory metal material. The slit member includes an inner member made of graphite and an outer member made of another refractory metal material. The outer member includes an outer surface exposed to an outside of the arc chamber. The inner member includes an inner surface exposed to the plasma generation space, and an opening portion which forms the front slit extending from the inner surface of the inner member to the outer surface of the outer member.
Abstract:
A Schottky thermal field emitter (TFE) source integrated with a beam splitter by a standoff, which supports the beam splitter above the Schottky TFE extractor faceplate by a distance of 0.05 mm to 2 mm. The beam splitter includes a microhole array integrated with the standoff and being disposed opposite the extractor faceplate, the microhole array having a plurality of microholes that split the electron beam generated by the Schottky TFE into a plurality of beamlets. The support and extractor may be fabricated from the same material or from different materials. The support may be formed from a high temperature resistive material, which causes a potential difference between the extractor and the microhole array. This potential difference creates positively charged electrostatic lenses at the microholes, which increases current in the individual beamlets. Voltage on the microarray plate may be varied to achieve a high beamlet current.
Abstract:
An electron source according to the present disclosure includes a columnar portion made of a first material having an electron emission characteristic; and a tubular portion that is disposed to surround the columnar portion and made of a second material having a higher work function than the first material, wherein a hole that extends in a direction from one end face toward the other end face and has a substantially circular cross-sectional shape is formed in the tubular portion, and the columnar portion has a substantially triangular or substantially quadrangular cross-sectional shape and is fixed to the tubular portion in an abutting engagement with an inner surface of the hole.
Abstract:
This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.