公开(公告)号：US09390803B2

公开(公告)日：2016-07-12

申请号：US14849029

申请日：2015-09-09

Applicant: Sun-il Shim ,  Jae-Hoon Jang ,  Donghyuk Chae ,  Youngho Lim ,  Hansoo Kim ,  Jaehun Jeong

Inventor： Sun-il Shim ,  Jae-Hoon Jang ,  Donghyuk Chae ,  Youngho Lim ,  Hansoo Kim ,  Jaehun Jeong

IPC: G11C16/10 ,  G11C16/12 ,  G11C16/04 ,  G11C16/34 ,  G11C16/08 ,  G11C16/14 ,  G11C16/26 ,  H01L27/115

CPC classification number: G11C16/3459 ,  G11C16/0483 ,  G11C16/08 ,  G11C16/10 ,  G11C16/12 ,  G11C16/14 ,  G11C16/26 ,  G11C16/3418 ,  H01L27/1157 ,  H01L27/11582

Abstract: Nonvolatile memory devices, operating methods thereof, and memory systems including the same. A nonvolatile memory device may include a memory cell array and a word line driver. The memory cell array may include a plurality of memory cells. The word line driver may be configured to apply word line voltages to a plurality of word lines connected to the plurality of memory cells, respectively. Magnitudes of the word line voltages may be determined according to locations of the plurality of word lines.

公开(公告)号：US20140016413A1

公开(公告)日：2014-01-16

申请号：US14029100

申请日：2013-09-17

Applicant: Jinman HAN ,  Sunil SHIM ,  Hansoo KIM ,  Jae-Hoon JANG ,  Byoungkeun SON

Inventor： Jinman HAN ,  Sunil SHIM ,  Hansoo KIM ,  Jae-Hoon JANG ,  Byoungkeun SON

IPC: G11C16/04

CPC classification number: G11C16/04 ,  G11C16/10 ,  G11C16/16 ,  G11C16/3418 ,  H01L27/11578 ,  H01L27/11582 ,  H01L29/7926

Abstract: Provided is a method of operating a nonvolatile memory device that includes a substrate and memory blocks having a plurality of memory cells stacked along a direction perpendicular to the substrate. The method includes: reading data from a selected sub block among sub blocks of a selected memory block and selectively refreshing each sub block of the selected memory block in response to the reading of the selected sub block, wherein each sub block of the selected memory block is separately erased.

Abstract translation: 提供了一种操作包括基板的非易失性存储器件的方法和具有沿着垂直于衬底的方向堆叠的多个存储单元的存储器块。 该方法包括：响应于所选择的子块的读取，从所选择的存储器块的子块中读取选定的子块的数据并选择刷新所选存储块的每个子块，其中所选存储块的每个子块 被单独擦除。

公开(公告)号：US20120098048A1

公开(公告)日：2012-04-26

申请号：US13221380

申请日：2011-08-30

Applicant: Byeong-In CHOE ,  Jae-Hoon JANG ,  Sun-Il SHIM ,  Han-Soo KIM ,  Jin-Man HAN

Inventor： Byeong-In CHOE ,  Jae-Hoon JANG ,  Sun-Il SHIM ,  Han-Soo KIM ,  Jin-Man HAN

IPC: H01L29/792 ,  H01L21/20

CPC classification number: H01L27/11582 ,  H01L29/7926

Abstract: A vertical memory device includes a channel, a ground selection line (GSL), word lines and a string selection line (SSL). The channel extends in a first direction substantially perpendicular to a top surface of a substrate, and a thickness of the channel is different according to height. The GSL, the word lines and the SSL are sequentially formed on a sidewall of the channel in the first direction and spaced apart from each other.

Abstract translation: 垂直存储器件包括通道，接地选择线（GSL），字线和字符串选择线（SSL）。 通道沿基本上垂直于基板的顶表面的第一方向延伸，并且通道的厚度根据高度而不同。 GSL，字线和SSL顺序地形成在通道的第一方向的侧壁上并且彼此间隔开。

公开(公告)号：US20120009767A1

公开(公告)日：2012-01-12

申请号：US13236000

申请日：2011-09-19

Applicant: Young-Chul JANG ,  Won-Seok Cho ,  Jae-Hoon Jang ,  Soon-Moon Jung ,  Yang-Soo Son ,  Min-Sung Song

Inventor： Young-Chul JANG ,  Won-Seok Cho ,  Jae-Hoon Jang ,  Soon-Moon Jung ,  Yang-Soo Son ,  Min-Sung Song

IPC: H01L21/20

CPC classification number: H01L27/0688 ,  H01L27/105 ,  H01L27/11519 ,  H01L27/11526 ,  H01L27/11529 ,  H01L27/11551

Abstract: A semiconductor device includes a semiconductor substrate including a first region having a cell region and a second region having a peripheral circuit region, first transistors on the semiconductor substrate, a first protective layer covering the first transistors, a first insulation layer on the first protective layer, a semiconductor pattern on the first insulation layer in the first region, second transistors on the semiconductor pattern, a second protective layer covering the second transistors, the second protective layer having a thickness greater than that of the first protective layer, and a second insulation layer on the second protective layer and the first insulation layer of the second region.

Abstract translation: 半导体器件包括：半导体衬底，包括具有单元区域的第一区域和具有外围电路区域的第二区域;半导体衬底上的第一晶体管;覆盖第一晶体管的第一保护层;第一保护层上的第一绝缘层; ，第一区域中的第一绝缘层上的半导体图案，半导体图案上的第二晶体管，覆盖第二晶体管的第二保护层，第二保护层的厚度大于第一保护层的厚度，第二绝缘层 在第二保护层和第二区域的第一绝缘层上。

公开(公告)号：US08048727B2

公开(公告)日：2011-11-01

申请号：US12687545

申请日：2010-01-14

Applicant: Jae-Hoon Jang ,  Soon-Moon Jung ,  Young-Seop Rah ,  Han-Byung Park

Inventor： Jae-Hoon Jang ,  Soon-Moon Jung ,  Young-Seop Rah ,  Han-Byung Park

IPC: H01L21/00

CPC classification number: H01L27/11 ,  H01L27/0688 ,  H01L27/105 ,  H01L27/1116

Abstract: An SRAM device includes a substrate having at least one cell active region in a cell array region and a plurality of peripheral active regions in a peripheral circuit region, a plurality of stacked cell gate patterns in the cell array region, and a plurality of peripheral gate patterns disposed on the peripheral active regions in the peripheral circuit region. Metal silicide layers are disposed on at least one portion of the peripheral gate patterns and on the semiconductor substrate near the peripheral gate patterns, and buried layer patterns are disposed on the peripheral gate patterns and on at least a portion of the metal silicide layers and the portions of the semiconductor substrate near the peripheral gate patterns. An etch stop layer and a protective interlayer-insulating layer are disposed around the peripheral gate patterns and on the cell array region. Methods of forming an SRAM device are also disclosed.

Abstract translation: SRAM器件包括：在单元阵列区域中具有至少一个单元有源区和外围电路区中的多个外围有源区，单元阵列区中的多个堆叠单元栅极图案和多个外围栅极的基板 设置在外围电路区域的外围有源区上的图案。 金属硅化物层设置在外围栅极图案的至少一部分上以及半导体衬底附近的外围栅极图案上，并且掩埋层图案设置在外围栅极图案和金属硅化物层的至少一部分上，并且 半导体衬底在周边栅极图案附近的部分。 蚀刻停止层和保护性层间绝缘层设置在周围栅极图案和电池阵列区域周围。 还公开了形成SRAM器件的方法。

公开(公告)号：US20110163411A1

公开(公告)日：2011-07-07

申请号：US13049495

申请日：2011-03-16

Applicant: Young-Chul Jang ,  Ki-Nam Kim ,  Soon-Moon Jung ,  Jae-Hoon Jang

Inventor： Young-Chul Jang ,  Ki-Nam Kim ,  Soon-Moon Jung ,  Jae-Hoon Jang

IPC: H01L27/08

CPC classification number: H01L27/105 ,  H01L21/8221 ,  H01L27/0688 ,  H01L27/115 ,  H01L27/11521 ,  H01L27/11524 ,  H01L27/11526 ,  H01L27/11529 ,  H01L27/11551

Abstract: A nonvolatile memory device includes a semiconductor substrate having a first well region of a first conductivity type, and at least one semiconductor layer formed on the semiconductor substrate. A first cell array is formed on the semiconductor substrate, and a second cell array formed on the semiconductor layer. The semiconductor layer includes a second well region of the first conductivity type having a doping concentration greater than a doping concentration of the first well region of the first conductivity type. As the doping concentration of the second well region is increased, a resistance difference may be reduced between the first and second well regions.

Abstract translation: 非易失性存储器件包括具有第一导电类型的第一阱区和形成在半导体衬底上的至少一个半导体层的半导体衬底。 第一单元阵列形成在半导体衬底上，第二单元阵列形成在半导体层上。 半导体层包括第一导电类型的第二阱区，其具有大于第一导电类型的第一阱区的掺杂浓度的掺杂浓度。 随着第二阱区域的掺杂浓度增加，可以在第一和第二阱区域之间减小电阻差。

公开(公告)号：US20110018036A1

公开(公告)日：2011-01-27

申请号：US12636912

申请日：2009-12-14

Applicant: Sung-min Hwang ,  Han-soo Kim ,  Won-seok CHO ,  Jae-hoon Jang ,  Sun-il Shim ,  Jae-hun Jeong ,  Ki-hyun Kim

Inventor： Sung-min Hwang ,  Han-soo Kim ,  Won-seok CHO ,  Jae-hoon Jang ,  Sun-il Shim ,  Jae-hun Jeong ,  Ki-hyun Kim

IPC: H01L27/085

CPC classification number: G11C5/06 ,  H01L23/5283 ,  H01L27/112 ,  H01L27/115 ,  H01L27/11517

Abstract: A vertical non-volatile memory device is structured/fabricated to include a substrate, groups of memory cell strings each having a plurality of memory transistors distributed vertically so that the memory throughout multiple layers on the substrate, integrated word lines coupled to sets of the memory transistors, respectively, and stacks of word select lines. The memory transistors of each set are those transistors, of one group of the memory cell strings, which are disposed in the same layer above the substrate. The word select lines are respectively connected to the integrated word lines.

Abstract translation: 垂直非易失性存储器件被构造/制造成包括衬底，每组具有多个垂直分布的存储器晶体管的存储单元串组，使得衬底上多层的存储器，与存储器组合耦合的集成字线 晶体管和字选择线的堆叠。 每组的存储晶体管是一组存储单元串的晶体管，它们设置在衬底上方的相同层中。 字选择线分别连接到集成字线。

公开(公告)号：US20100240209A1

公开(公告)日：2010-09-23

申请号：US12792912

申请日：2010-06-03

Applicant: Jae-Hun Jeong ,  Ki-Nam Kim ,  Soon-Moon Jung ,  Jae-Hoon Jang

Inventor： Jae-Hun Jeong ,  Ki-Nam Kim ,  Soon-Moon Jung ,  Jae-Hoon Jang

IPC: H01L21/28

CPC classification number: H01L21/26506 ,  H01L27/115 ,  H01L27/11521 ,  H01L27/11568 ,  H01L29/167 ,  H01L29/34 ,  H01L29/40114 ,  H01L29/40117 ,  H01L29/7883 ,  H01L29/792

Abstract: Provided are semiconductor devices and methods of forming the same. The semiconductor devices include a substrate further including a hydrogen implantation layer and a gate structure formed on the hydrogen implantation layer to include a first insulating layer, a charge storage layer, a second insulating layer and a conductive layer.

Abstract translation: 提供半导体器件及其形成方法。 半导体器件包括还包括氢注入层和在氢注入层上形成的包括第一绝缘层，电荷存储层，第二绝缘层和导电层的栅极结构的衬底。

公开(公告)号：US07795651B2

公开(公告)日：2010-09-14

申请号：US12024459

申请日：2008-02-01

Applicant: Jae-Hun Jeong ,  Ki-Nam Kim ,  Soon-Moon Jung ,  Jae-Hoon Jang

Inventor： Jae-Hun Jeong ,  Ki-Nam Kim ,  Soon-Moon Jung ,  Jae-Hoon Jang

IPC: H01L31/112

CPC classification number: H01L27/10802 ,  H01L21/8221 ,  H01L27/0688 ,  H01L27/108 ,  H01L27/10844 ,  H01L27/1203 ,  H01L29/7841

Abstract: A one transistor DRAM device includes: a substrate with an insulating layer, a first semiconductor layer provided on the insulating layer and including a first source region and a first region which are in contact with the insulating layer and a first floating body between the first source region and the first drain region, a first gate pattern to cover the first floating body, a first interlayer dielectric to cover the first gate pattern, a second semiconductor layer provided on the first interlayer dielectric and including a second source region and a second drain region which are in contact with the first interlayer dielectric and a second floating body between the second source region and the second drain region, and a second gate pattern to cover the second floating body.

Abstract translation: 一个晶体管DRAM器件包括：具有绝缘层的衬底，设置在绝缘层上的第一半导体层，包括与绝缘层接触的第一源极区域和第一区域以及第一源极 区域和第一漏极区域，覆盖第一浮动体的第一栅极图案，覆盖第一栅极图案的第一层间电介质，设置在第一层间电介质上并包括第二源极区域和第二漏极区域的第二半导体层 其与第一层间电介质接触，第二浮动体与第二源极区和第二漏极区之间接触，第二栅极图案覆盖第二浮体。

公开(公告)号：US20090233405A1

公开(公告)日：2009-09-17

申请号：US12474896

申请日：2009-05-29

Applicant: Hoo-Sung Cho ,  Soon-Moon Jung ,  Won-Seok Cho ,  Jong-Hyuk Kim ,  Jae-Hun Jeong ,  Jae-Hoon Jang

Inventor： Hoo-Sung Cho ,  Soon-Moon Jung ,  Won-Seok Cho ,  Jong-Hyuk Kim ,  Jae-Hun Jeong ,  Jae-Hoon Jang

IPC: H01L21/336

CPC classification number: H01L27/11524 ,  H01L27/0688 ,  H01L27/11551

Abstract: Methods of forming a NAND-type nonvolatile memory device include: forming first common drains and first common sources alternatively in an active region which is defined in a semiconductor substrate and extends one direction, forming a first insulating layer covering an entire surface of the semiconductor substrate, patterning the first insulating layer to form seed contact holes which are arranged at regular distance and expose the active region, forming a seed contact structure filling each of the seed contact holes and a semiconductor layer disposed on the first insulating layer and contacting the seed contact structures, patterning the semiconductor layer to form a semiconductor pattern which extends in the one direction and is disposed over the active region, forming second common drains and second common sources disposed alternatively in the semiconductor pattern in the one direction, forming a second insulating layer covering an entire surface of the semiconductor substrate, forming a source line pattern continuously penetrating the second insulating layer, the semiconductor pattern and the first insulating layer, the source line pattern being connected with the first and second common sources, wherein a grain boundary of the semiconductor layer is positioned at a center between the one pair of seed contact structures adjacent to each other, and is positioned over the first common drain or the first common source.

Abstract translation: 形成NAND型非易失性存储器件的方法包括：在半导体衬底中限定的有源区域中交替形成第一公共漏极和第一公共源，并延伸一个方向，形成覆盖半导体衬底的整个表面的第一绝缘层 图案化第一绝缘层以形成以规则距离布置的暴露有源区域的种子接触孔，形成填充每个种子接触孔的种子接触结构以及设置在第一绝缘层上并接触种子接触的半导体层 结构，图案化所述半导体层以形成在所述一个方向上延伸并设置在所述有源区上方的半导体图案，形成沿所述一个方向交替设置在所述半导体图案中的第二公共漏极和第二公共源，形成第二绝缘层覆盖层 半导体衬底的整个表面 使源极线图案连续地穿过第二绝缘层，半导体图案和第一绝缘层，源极线图案与第一和第二共用源连接，其中半导体层的晶界位于第二绝缘层之间的中心 一对种子接触结构彼此相邻，并且位于第一公共漏极或第一公共源的上方。