公开(公告)号：US09057967B2

公开(公告)日：2015-06-16

申请号：US12512754

申请日：2009-07-30

申请人： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar Van Santen

发明人： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar Van Santen

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

摘要翻译： 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 投影系统，被配置为将图案化的光束投影到基板的目标部分上; 被配置为保持所述基板的基板台，所述基板台包括支撑表面，所述支撑表面被构造成支撑所述投影系统与所述基板和位于所述基板台上的物体中的至少一个之间的中间板，并且不与所述至少一个 的基材和物体; 以及液体供应系统，其构造成在所述投影系统和所述基板和所述物体中的至少一个之间的空间中提供待投射所述光束的液体。

公开(公告)号：US09025127B2

公开(公告)日：2015-05-05

申请号：US13242221

申请日：2011-09-23

申请人： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

发明人： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

IPC分类号： B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

摘要翻译： 在光刻投影装置中，液体供应系统将液体保持在投影系统和基板之间的空间中。 液体供应系统还可以包括去矿化单元，蒸馏单元，去烃化单元，UV辐射源和/或构造成净化液体的过滤器。 可以提供气体减少装置以减少液体的气体含量。 可以使用添加装置将化学物质添加到液体中以抑制生命形态生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得寿命的增长可能降低。

公开(公告)号：US09013679B2

公开(公告)日：2015-04-21

申请号：US13641069

申请日：2011-03-18

申请人： Dzmitry Labetski ,  Erik Roelof Loopstra ,  Antonius Theodorus Wilhelmus Kempen

发明人： Dzmitry Labetski ,  Erik Roelof Loopstra ,  Antonius Theodorus Wilhelmus Kempen

IPC分类号： G02B5/08 ,  G03F7/20 ,  G21K5/04

CPC分类号： G02B5/08 ,  G03F7/20 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  G21K5/04

摘要： A collector mirror assembly includes a collector mirror that includes a reflective surface and a hole having an edge. The hole extends through the reflective surface. The assembly also includes a tubular body having an inner surface and an outer surface. The tubular body is constructed and arranged to guide a gas flow in a direction substantially transverse to the reflective surface. The outer surface of the tubular body and the edge of the hole form an opening arranged to guide a further gas flow that diverges with respect the gas flow substantially transverse to the reflective surface.

摘要翻译： 收集器反射镜组件包括收集器反射镜，其包括反射表面和具有边缘的孔。 孔延伸穿过反射表面。 组件还包括具有内表面和外表面的管状体。 管状体被构造和布置成沿着基本横向于反射表面的方向引导气流。 管状体的外表面和孔的边缘形成开口，该开口布置成引导相对于基本上横向于反射表面的气流发散的另外的气流。

公开(公告)号：US08953144B2

公开(公告)日：2015-02-10

申请号：US13240867

申请日：2011-09-22

申请人： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

发明人： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

IPC分类号： G03B27/52 ,  G03B27/42 ,  B01D61/02 ,  B01D61/24 ,  G03F7/20 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

公开(公告)号：US08797503B2

公开(公告)日：2014-08-05

申请号：US13149404

申请日：2011-05-31

申请人： Joeri Lof ,  Antonius Theodorus Anna Maria Derksen ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Antonius Theodorus Anna Maria Derksen ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

摘要： In a lithographic apparatus, a liquid supply system to provide a liquid to a space between the table and an optical element and to contact a surface of the optical element, the space having a cross-sectional area smaller than the area of the substrate, the liquid supply system comprising a liquid confinement structure extending along at least a part of a boundary of the space between the optical element surface and the table, wherein at least part of the liquid confinement structure is positioned between the optical element surface and the table, the at least part of the liquid confinement structure has an aperture through which the patterned beam can pass, the liquid confinement structure comprises an inlet to supply the liquid to the space above the aperture, and the liquid confinement structure comprises an outlet to remove the liquid, supplied by the inlet, from the space below the aperture.

摘要翻译： 在光刻设备中，液体供应系统将液体提供到工作台与光学元件之间的空间并与光学元件的表面相接触，该空间的横截面积小于衬底的面积， 液体供应系统包括沿着光学元件表面和工作台之间的空间的边界的至少一部分延伸的液体限制结构，其中液体限制结构的至少一部分位于光学元件表面和工作台之间， 所述液体限制结构的至少一部分具有所述图案化束可以穿过的孔，所述液体限制结构包括将所述液体供应到所述孔上方的空间的入口，并且所述液体限制结构包括用于除去所述液体的出口， 由入口提供，从孔下方的空间。

公开(公告)号：US20140192337A1

公开(公告)日：2014-07-10

申请号：US14236299

申请日：2012-07-24

申请人： Arno Jan Bleeker ,  Erik Roelof Loopstra ,  Harmen Klaas Van Der Schoot ,  Danny Maria Hubertus Philips ,  Ruud Antonius Catharina Maria Beerens

发明人： Arno Jan Bleeker ,  Erik Roelof Loopstra ,  Harmen Klaas Van Der Schoot ,  Danny Maria Hubertus Philips ,  Ruud Antonius Catharina Maria Beerens

IPC分类号： G03F7/20

CPC分类号： G03F7/70641 ,  G03F7/7005 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70308 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70825

摘要： A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power.

摘要翻译： 一种具有可编程图案形成装置和投影系统的光刻设备。 可编程图案形成装置被配置为提供多个辐射束。 投影系统具有配置成将多个辐射束投影到基板上的透镜组阵列。 投影系统还包括对应于透镜组阵列的透镜组的光路中的焦点调节器。 焦点调节器具有基本上为零光功率的光学元件。

公开(公告)号：US08755032B2

公开(公告)日：2014-06-17

申请号：US13063139

申请日：2009-07-21

申请人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Vladimir Mihailovitch Krivtsun ,  Gerardus Hubertus Petrus Maria Swinkels ,  Dzmitry Labetski

发明人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Vladimir Mihailovitch Krivtsun ,  Gerardus Hubertus Petrus Maria Swinkels ,  Dzmitry Labetski

IPC分类号： G03B27/54 ,  G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70033 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/003

摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.

摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括位于燃料将被辐射束接触以形成等离子体的位置处的等离子体形成位置，被配置为允许气体离开辐射源的出口以及至少部分地位于内部的污染阱 出口。 污染阱被配置成捕集在形成等离子体时产生的碎屑颗粒。

公开(公告)号：US08730485B2

公开(公告)日：2014-05-20

申请号：US12948533

申请日：2010-11-17

申请人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Emiel Jozef Melanie Eussen ,  Erik Roelof Loopstra

发明人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Emiel Jozef Melanie Eussen ,  Erik Roelof Loopstra

IPC分类号： G01B11/14 ,  G03B27/42 ,  G03F7/20 ,  G01D5/38

CPC分类号： G03F7/70775 ,  G01D5/38

摘要： A position measurements system to measure a position of a movable object with respect to another object includes two or more one dimensional (1D) encoder heads mounted on one of the movable object and the other object and each capable of emitting a measurement beam along a measurement direction, one or more reference targets mounted on the other of the movable object and the other object, each reference target including a planar surface with a grid or grating to cooperate with the two or more one dimensional (1D) encoder heads, and a processor to calculate a position of the object on the basis of outputs of the two or more 1D encoder heads, wherein the measurement direction of each of the two or more 1D encoder heads is non-perpendicular to the planar surface of the respective reference target.

摘要翻译： 用于测量可移动物体相对于另一物体的位置的位置测量系统包括安装在可移动物体和另一物体之一上的两个或更多个一维（1D）编码器头，并且每个能够沿测量发射测量光束 方向，安装在可移动物体和另一物体另一个上的一个或多个参考目标，每个参考目标包括具有格栅或光栅的平面，以与两个或更多个一维（1D）编码器头配合，以及处理器 基于两个或更多个1D编码器头的输出来计算物体的位置，其中两个或更多个1D编码器头中的每一个的测量方向与相应参考目标的平面不垂直。

公开(公告)号：US08634056B2

公开(公告)日：2014-01-21

申请号：US13186991

申请日：2011-07-20

申请人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Richard Joseph Bruls ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Ronald Walther Jeanne Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Franciscus Sengers

发明人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Richard Joseph Bruls ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Ronald Walther Jeanne Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Franciscus Sengers

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

摘要翻译： 公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。

公开(公告)号：US08629971B2

公开(公告)日：2014-01-14

申请号：US12766609

申请日：2010-04-23

申请人： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

发明人： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

摘要翻译： 在光刻投影装置中，液体供应系统将液体保持在投影系统和基板之间的空间中。 液体供应系统还可以包括去矿化单元，蒸馏单元，去烃化单元，UV辐射源和/或构造成净化液体的过滤器。 可以提供气体减少装置以减少液体的气体含量。 可以使用添加装置将化学物质添加到液体中以抑制生命形态生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得寿命的增长可能降低。