公开(公告)号：US20230098467A1

公开(公告)日：2023-03-30

申请号：US17485176

申请日：2021-09-24

Applicant: Intel Corporation

Inventor： Carl H. NAYLOR ,  Kirby MAXEY ,  Kevin P. O'BRIEN ,  Chelsey DOROW ,  Sudarat LEE ,  Ashish Verma PENUMATCHA ,  Shriram SHIVARAMAN ,  Uygar E. AVCI ,  Patrick THEOFANIS ,  Charles MOKHTARZADEH ,  Matthew V. METZ ,  Scott B. CLENDENNING

IPC: H01L27/092 ,  H01L29/24 ,  H01L29/06 ,  H01L29/423 ,  H01L29/76 ,  H01L29/786 ,  H01L21/02 ,  H01L21/8256 ,  H01L29/66

Abstract: Thin film transistors having a spin-on two-dimensional (2D) channel material are described. In an example, an integrated circuit structure includes a first device layer including a first two-dimensional (2D) material layer above a substrate. The first 2D material layer includes molybdenum, sulfur, sodium and carbon. A second device layer including a second 2D material layer is above the substrate. The second 2D material layer includes tungsten, selenium, sodium and carbon.

公开(公告)号：US20230096347A1

公开(公告)日：2023-03-30

申请号：US17485202

申请日：2021-09-24

Applicant: Intel Corporation

Inventor： Kevin P. O'BRIEN ,  Tristan A. TRONIC ,  Anandi ROY ,  Ashish Verma PENUMATCHA ,  Carl H. NAYLOR ,  Kirby MAXEY ,  Sudarat LEE ,  Chelsey DOROW ,  Scott B. CLENDENNING ,  Uygar E. AVCI

IPC: H01L27/092 ,  H01L29/06 ,  H01L29/417 ,  H01L29/423 ,  H01L29/45 ,  H01L29/49 ,  H01L29/786 ,  H01L21/02 ,  H01L21/28 ,  H01L21/8238 ,  H01L29/66

Abstract: Embodiments disclosed herein include semiconductor devices and methods of forming such devices. In an embodiment, a semiconductor device comprises a sheet that is a semiconductor. In an embodiment a length dimension of the sheet and a width dimension of the sheet are greater than a thickness dimension of the sheet. In an embodiment, a gate structure is around the sheet, and a first spacer is adjacent to a first end of the gate structure, and a second spacer adjacent to a second end of the gate structure. In an embodiment, a source contact is around the sheet and adjacent to the first spacer, and a drain contact is around the sheet and adjacent to the second spacer.

公开(公告)号：US20230088101A1

公开(公告)日：2023-03-23

申请号：US17482232

申请日：2021-09-22

Applicant: Intel Corporation

Inventor： Carl H. NAYLOR ,  Kirby MAXEY ,  Kevin P. O'BRIEN ,  Chelsey DOROW ,  Sudarat LEE ,  Ashish Verma PENUMATCHA ,  Uygar E. AVCI ,  Matthew V. METZ ,  Scott B. CLENDENNING

IPC: H01L29/76 ,  H01L29/06 ,  H01L29/24 ,  H01L29/423 ,  H01L29/786 ,  H01L21/02 ,  H01L29/66

Abstract: Thin film transistors having edge-modulated two-dimensional (2D) channel material are described. In an example, an integrated circuit structure includes a device layer including a two-dimensional (2D) material layer above a substrate, the 2D material layer including a center portion and first and second edge portions, the center portion consisting essentially of molybdenum or tungsten and of sulfur or selenium, and the first and second edge portions including molybdenum or tungsten and including tellurium.

公开(公告)号：US20200118616A1

公开(公告)日：2020-04-16

申请号：US16732951

申请日：2020-01-02

Applicant: Intel Corporation

Inventor： Daniel H. MORRIS ,  Uygar E. AVCI ,  Ian A. YOUNG

IPC: G11C11/412 ,  H01L27/11 ,  G11C11/419 ,  G11C8/16

Abstract: One embodiment provides an apparatus. The apparatus includes a first inverter comprising a first pull up transistor and a first pull down transistor; a second inverter cross coupled to the first inverter, the second inverter comprising a second pull up transistor and a second pull down transistor; a first access transistor coupled to the first inverter; and a second access transistor coupled to the second inverter. A gate electrode of one transistor of each inverter comprises a polarization layer.

公开(公告)号：US20190243662A1

公开(公告)日：2019-08-08

申请号：US16384715

申请日：2019-04-15

Applicant: Intel Corporation

Inventor： Vaidyanathan KAUSHIK ,  Daniel H. MORRIS ,  Uygar E. AVCI ,  Ian A. YOUNG ,  Tanay KARNIK ,  Huichi LIU

IPC: G06F9/445 ,  G06F1/26 ,  H03K19/0185

CPC classification number: G06F9/445 ,  G06F1/26 ,  G06F1/324 ,  G06F1/3296 ,  G06F9/4411 ,  H03K19/018585

Abstract: Described is an apparatus which comprises: a first electrical path comprising at least one driver and receiver; and a second electrical path comprising at least one driver and receiver, wherein the first and second electrical paths are to receive a same input signal, wherein the first electrical path and the second electrical path are parallel to one another and have substantially the same propagation delays, and wherein the second electrical path is enabled during a first operation mode and disabled during a second operation mode.

公开(公告)号：US20180226407A1

公开(公告)日：2018-08-09

申请号：US15727918

申请日：2017-10-09

Applicant: Intel Corporation

Inventor： Peter L.D. CHANG ,  Uygar E. AVCI ,  David KENCKE ,  Ibrahim BAN

IPC: H01L27/108 ,  H01L29/78 ,  H01L29/49 ,  H01L29/06 ,  H01L29/51

CPC classification number: H01L27/10802 ,  H01L21/28008 ,  H01L21/823821 ,  H01L21/823828 ,  H01L21/823857 ,  H01L21/823878 ,  H01L21/823892 ,  H01L27/0924 ,  H01L27/0928 ,  H01L27/108 ,  H01L27/10826 ,  H01L27/10844 ,  H01L27/10879 ,  H01L27/1203 ,  H01L29/0649 ,  H01L29/0653 ,  H01L29/16 ,  H01L29/495 ,  H01L29/4966 ,  H01L29/51 ,  H01L29/517 ,  H01L29/66477 ,  H01L29/66795 ,  H01L29/78 ,  H01L29/7841 ,  H01L29/785 ,  H01L29/7851 ,  Y10S257/903

Abstract: A method for fabricating floating body memory cells (FBCs), and the resultant FBCs where gates favoring different conductivity type regions are used is described. In one embodiment, a p type back gate with a thicker insulation is used with a thinner insulated n type front gate. Processing, which compensates for misalignment, which allows the different oxide and gate materials to be fabricated is described.

公开(公告)号：US20180151578A1

公开(公告)日：2018-05-31

申请号：US15576269

申请日：2015-06-26

Applicant: INTEL CORPORATION

Inventor： Uygar E. AVCI ,  Daniel H. MORRIS ,  Ian A. YOUNG ,  Stephen M. RAMEY

IPC: H01L27/11521 ,  H01L29/788 ,  H01L29/78 ,  H01L27/11526 ,  H01L27/02 ,  H01L29/49 ,  H01L21/28 ,  H01L29/66 ,  G11C16/04 ,  G11C16/10 ,  G11C16/26 ,  G11C16/14

CPC classification number: H01L27/11521 ,  G11C16/0408 ,  G11C16/0433 ,  G11C16/10 ,  G11C16/14 ,  G11C16/26 ,  H01L21/28079 ,  H01L21/28088 ,  H01L21/28273 ,  H01L21/76224 ,  H01L27/0207 ,  H01L27/0886 ,  H01L27/11519 ,  H01L27/11526 ,  H01L27/11558 ,  H01L29/0649 ,  H01L29/4916 ,  H01L29/495 ,  H01L29/4966 ,  H01L29/66795 ,  H01L29/66825 ,  H01L29/78 ,  H01L29/7851 ,  H01L29/788 ,  H01L29/7881

Abstract: Embodiments of the present disclosure provide techniques and configurations for semi-volatile embedded memory with between-fin floating gates. In one embodiment, an apparatus includes a semiconductor substrate and a floating-gate memory structure formed on the semiconductor substrate including a bitcell having first, second, and third fin structures extending from the substrate, an oxide layer disposed between the first and second fin structures and between the second and third fin structures, a gate of a first transistor disposed on the oxide layer and coupled with and extending over a top of the first fin structure, and a floating gate of a second transistor disposed on the oxide layer between the second and third fin structures. Other embodiments may be described and/or claimed.