METHODS AND SYSTEMS FOR MANUFACTURING SEMICONDUCTOR DEVICES

    公开(公告)号:US20210074671A1

    公开(公告)日:2021-03-11

    申请号:US17099625

    申请日:2020-11-16

    Abstract: A thermocompression bonding (TCB) apparatus can include a wall having a height measured in a first direction and configured to be positioned between a first pressing surface and a second pressing surface of a semiconductor bonding apparatus. The apparatus can include a cavity at least partially surrounded by the wall, the cavity sized to receive a semiconductor substrate and a stack of semiconductor dies positioned between the semiconductor substrate and the first pressing surface, the stack of semiconductor dies and semiconductor substrate having a combined unpressed stack height as measured in the first direction. In some embodiments, the unpressed stack height is greater than the height of the wall, and the wall is configured to be contacted by the first pressing surface to limit movement of the first pressing surface toward the second pressing surface during a semiconductor bonding process.

    Die Features for Self-Alignment During Die Bonding

    公开(公告)号:US20200373252A1

    公开(公告)日:2020-11-26

    申请号:US16993860

    申请日:2020-08-14

    Abstract: A semiconductor device assembly that includes a substrate having a first side and a second side, the first side having at least one dummy pad and at least one electrical pad. The semiconductor device assembly includes a first semiconductor device having a first side and a second side and at least one electrical pillar extending from the second side. The electrical pillar is connected to the electrical pad via solder to form an electrical interconnect. The semiconductor device assembly includes at least one dummy pillar extending from the second side of the first semiconductor device and a liquid positioned between an end of the dummy pillar and the dummy pad. The surface tension of the liquid pulls the dummy pillar towards the dummy pad. The surface tension may reduce or minimize a warpage of the semiconductor device assembly and/or align the dummy pillar and the dummy pad.

    SEMICONDUCTOR DEVICE WITH A LAYERED PROTECTION MECHANISM AND ASSOCIATED SYSTEMS, DEVICES, AND METHODS

    公开(公告)号:US20200219851A1

    公开(公告)日:2020-07-09

    申请号:US16823028

    申请日:2020-03-18

    Abstract: A semiconductor device includes a first die; a second die attached over the first die; a metal enclosure directly contacting and extending between the first die and the second die, wherein the first metal enclosure is continuous and encircles a set of one or more internal interconnects, wherein the first metal enclosure is configured to electrically connect to a first voltage level; and a second metal enclosure directly contacting and extending between the first die and the second die, wherein the second metal enclosure is continuous and encircles the first metal enclosure and is configured to electrically connect to a second voltage level; wherein the first metal enclosure and the second metal enclosure are configured to provide an enclosure capacitance encircling the set of one or more internal interconnects for shielding signals on the set of one or more internal interconnects.

    METHODS OF PROTECTING PERIPHERIES OF IN-PROCESS SEMICONDUCTOR WAFERS AND RELATED IN-PROCESS WAFERS AND SYSTEMS
    80.
    发明申请
    METHODS OF PROTECTING PERIPHERIES OF IN-PROCESS SEMICONDUCTOR WAFERS AND RELATED IN-PROCESS WAFERS AND SYSTEMS 有权
    保护过程中半导体波形外围的方法和相关的过程中的波形和系统

    公开(公告)号:US20160079094A1

    公开(公告)日:2016-03-17

    申请号:US14485973

    申请日:2014-09-15

    Abstract: Methods of processing semiconductor wafers may involve, for example, encapsulating an active surface and each side surface of a wafer of semiconductor material, a plurality of semiconductor devices located on the active surface of the wafer, an exposed side surface of an adhesive material located on a back side surface of the wafer, and at least a portion of a side surface of a carrier substrate secured to the wafer by the adhesive material in an encapsulation material. At least a portion of the side surface of the adhesive material may be exposed by removing at least a portion of the encapsulation material. The carrier substrate may be detached from the wafer. Processing systems and in-process semiconductor wafers are also disclosed.

    Abstract translation: 处理半导体晶片的方法可以包括例如封装半导体材料晶片的活性表面和每个侧表面,位于晶片的有效表面上的多个半导体器件,位于 晶片的背面表面和载体基板的侧表面的至少一部分通过胶粘材料固定在晶片上。 粘合剂材料的侧表面的至少一部分可以通过去除包封材料的至少一部分而暴露。 载体衬底可以从晶片分离。 还公开了处理系统和工艺中半导体晶片。

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