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公开(公告)号：US20180201570A1
公开(公告)日：2018-07-19
申请号：US15743931
申请日：2016-07-21
发明人： Masatoshi ECHIGO
IPC分类号： C07C69/54 , C07C43/215 , C07C41/09 , C07C67/14 , C08F22/10 , G03F7/16 , G03F7/20 , G03F7/32 , G03F7/11 , C09D135/02 , H01L21/308 , H01L21/311 , C07C41/38 , C07C67/58 , C08F6/10 , G03F7/033 , G03F7/022
CPC分类号： C07C69/54 , C07B61/00 , C07B63/00 , C07C41/01 , C07C41/09 , C07C41/38 , C07C43/215 , C07C67/14 , C07C67/58 , C08F6/10 , C08F20/20 , C08F22/105 , C09D135/02 , G02B1/04 , G03F7/0226 , G03F7/023 , G03F7/033 , G03F7/11 , G03F7/162 , G03F7/168 , G03F7/2037 , G03F7/322 , H01L21/3081 , H01L21/31144
摘要： A compound represented by the following formula (1): wherein R1 is a 2n-valent group having 1 to 60 carbon atoms; R2 to R5 are each independently a linear, branched, or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a group in which a hydrogen atom of a hydroxy group is replaced with a vinylphenylmethyl group, a group selected from the group consisting of groups represented by the following formula (A), a thiol group, or a hydroxy group, wherein at least one of the R2 to the R5 is a group selected from a group represented by the formula (A); m2 and m3 are each independently an integer of 0 to 8; m4 and m5 are each independently an integer of 0 to 9, provided that m2, m3, m4, and m5 are not 0 at the same time; n is an integer of 1 to 4; and p2 to p5 are each independently an integer of 0 to 2:
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公开(公告)号：US20180101097A1
公开(公告)日：2018-04-12
申请号：US15565064
申请日：2016-04-07
CPC分类号： G03F7/11 , C08G8/28 , C08G10/04 , C08G73/06 , C08G73/0644 , C08G73/0655 , G03F7/094 , G03F7/26 , H01L21/0271 , H01L21/0273
摘要： A material for forming an underlayer film for lithography, including a cyanic acid ester compound obtained by cyanation of a modified xylene formaldehyde resin, a composition including the material, and a pattern forming method using the composition.
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公开(公告)号：US20180101096A1
公开(公告)日：2018-04-12
申请号：US15565018
申请日：2016-04-07
IPC分类号： G03F7/11 , C07C261/02 , C07D311/78 , C07C39/15 , C09D173/00 , C09D165/00 , G03F7/16 , G03F7/20 , G03F7/38 , G03F7/32 , G03F7/039 , H01L21/308
CPC分类号： G03F7/11 , C07C39/15 , C07C261/02 , C07D311/78 , C09D165/00 , C09D173/00 , G03F7/039 , G03F7/162 , G03F7/168 , G03F7/2037 , G03F7/322 , G03F7/38 , H01L21/3081 , H01L21/3086
摘要： A material for forming an underlayer film for lithography, in which a compound represented by the following formula (0) is used. (in formula (0), each X independently represents an oxygen atom or a sulfur atom, or a non-crosslinked state, R1 represents a 2n-valent group having 1 to 30 carbon atoms, or a single bond, each R0 independently represents a straight, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, a straight, branched or cyclic alkenyl group having 2 to 30 carbon atoms, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group or a hydroxyl group, the alkyl group, the alkenyl group and the aryl group each optionally include a cyanato group, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group, a hydroxyl group, an ether bond, a ketone bond or an ester bond, each m1 is independently an integer of 0 to 4, in which at least one m1 is an integer of 1 to 4, each m2 is independently an integer of 0 to 3, n is an integer of 1 to 4, and each p is independently 0 or 1.)
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公开(公告)号：US20180095368A1
公开(公告)日：2018-04-05
申请号：US15563263
申请日：2016-03-17
IPC分类号： G03F7/11 , C07C39/367 , C07C41/38 , C07C43/23 , C08F32/08 , C08K5/00 , C08K5/09 , C08K5/07 , H01L21/027
摘要： The present invention provides a compound represented by following formula (1), wherein R1 represents a 2n-valent group having 1 to 30 carbon atoms, each of R2 to R5 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a halogen atom, a thiol group or a hydroxyl group, provided that at least one selected from R1 to R5 represents a group including an iodine atom and at least one R4 and/or at least one R5 represent/represents one or more selected from the group consisting of a hydroxyl group and a thiol group, each of m2 and m3 independently represents an integer of 0 to 8, each of m4 and m5 independently represents an integer of 0 to 9, provided that m4 and m5 do not represent 0 at the same time, n represents an integer of 1 to 4, and each of p2 to p5 independently represents an integer of 0 to 2.
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公开(公告)号：US20180074406A1
公开(公告)日：2018-03-15
申请号：US15560059
申请日：2016-03-02
发明人： Takumi TOIDA , Masatoshi ECHIGO , Takashi SATO , Youko SHIMIZU
IPC分类号： G03F7/039 , C07D311/78
CPC分类号： G03F7/039 , C07D311/78 , G03F7/004 , G03F7/0046 , G03F7/0392 , G03F7/16 , G03F7/20 , G03F7/30
摘要： The resist composition of the present invention contains one or more selected from compounds represented by specific formulae and resins obtained using these as monomers.
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76.发明申请公开(公告)号：US20180074402A1
公开(公告)日：2018-03-15
申请号：US15560458
申请日：2016-03-02
发明人： Takumi TOIDA , Masatoshi ECHIGO , Takashi SATO , Youko SHIMIZU
IPC分类号： G03F7/004 , G03F7/038 , G03F7/20 , G03F7/32 , C07C39/14 , C07C39/17 , C07C39/42 , C07C39/225 , C07C37/20 , C07D311/78 , C07D311/96
CPC分类号： G03F7/0045 , C07B61/00 , C07C37/20 , C07C39/14 , C07C39/17 , C07C39/225 , C07C39/42 , C07D311/78 , C07D311/92 , C07D311/96 , C08G61/12 , G03F7/004 , G03F7/038 , G03F7/0382 , G03F7/2039 , G03F7/327
摘要： The present invention is a compound represented by the following general formula (1).
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公开(公告)号：US20180065930A1
公开(公告)日：2018-03-08
申请号：US15557747
申请日：2016-03-09
IPC分类号： C07D209/86 , C07D405/04 , C08G61/12 , G03F7/11
摘要： A compound represented by the following formula (1). (in formula (1), each X independently represents an oxygen atom, a sulfur atom, or non-crosslinking, each R1 is independently selected from the group consisting of a hydrogen atom, a halogen group, a nitro group, an amino group, a hydroxyl group, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms and combinations thereof, in which the alkyl group, the alkenyl group and the aryl group may have an ether bond, a ketone bond or an ester bond, each R2 independently represents a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, a thiol group or a hydroxyl group, in which at least one R2 represents a group having a hydroxyl group or a thiol group, each m is independently an integer of 1 to 7, each p is independently 0 or 1, each q is independently an integer of 0 to 4, and n is 0 or 1.)
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公开(公告)号：US20180029968A1
公开(公告)日：2018-02-01
申请号：US15550207
申请日：2016-02-12
IPC分类号： C07C43/275 , C07C41/38 , G03F7/11 , C07C43/235 , C08G8/10
CPC分类号： C07C43/275 , C07C41/38 , C07C43/205 , C07C43/235 , C08G8/00 , C08G8/10 , G03F7/094 , G03F7/11 , G03F7/16 , G03F7/20 , G03F7/30
摘要： A compound represented by the following formula (1). (in formula (1), R1 represents a 2n-valent group having 1 to 30 carbon atoms, R2 to R5 each independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group or a hydroxyl group, provided that at least one R4 and/or at least one R5 represents an alkoxy group having 1 to 30 carbon atoms, m2 and m3 are each independently an integer of 0 to 8, m4 and m5 are each independently an integer of 0 to 9, provided that m4 and m5 are not 0 at the same time, n is an integer of 1 to 4, and p2 to p5 are each independently an integer of 0 to 2.)
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公开(公告)号：US20170349564A1
公开(公告)日：2017-12-07
申请号：US15539560
申请日：2015-12-14
IPC分类号： C07D311/78 , G03F7/20 , G03F7/16 , G03F7/11 , C09D161/06 , G03F7/30 , C08G8/08
摘要： A compound represented by the following formula (1): wherein each X independently represents an oxygen atom or a sulfur atom, or non-crosslinking, R1 represents a single bond or a 2n-valent group having 1 to 30 carbon atoms, the group may have an alicyclic hydrocarbon group, a double bond, a hetero atom, or an aryl group having 6 to 30 carbon atoms, each R2 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, an aryloxy group having 6 to 30 carbon atoms, or a hydroxyl group, in which at least one R2 represents an alkoxy group having 1 to 30 carbon atoms or an aryloxy group having 6 to 30 carbon atoms, each m is independently an integer of 1 to 6, each p is independently 0 or 1, and n is an integer of 1 to 4.
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80.发明申请公开(公告)号：US20170227849A1
公开(公告)日：2017-08-10
申请号：US15502456
申请日：2015-07-31
IPC分类号： G03F7/11 , C09D7/00 , G03F7/16 , G03F7/20 , H01L21/308 , G03F7/38 , G03F7/039 , G03F7/004 , H01L21/027 , H01L21/311 , C09D179/04 , G03F7/32
CPC分类号： G03F7/11 , C07C261/02 , C09D7/20 , C09D179/04 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/0752 , G03F7/091 , G03F7/094 , G03F7/162 , G03F7/168 , G03F7/2037 , G03F7/322 , G03F7/38 , H01L21/027 , H01L21/0274 , H01L21/3081 , H01L21/3086 , H01L21/31116 , H01L21/31144
摘要： The composition for forming an underlayer film for lithography according to the present invention contains a compound represented by a specific formula (1) and 20 to 99% by mass of a solvent component (S), in which 27 to 100% by mass of the compound represented by the formula (1) is included in a component (A) other than the solvent component (S).
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