Nitride semiconductor device and method for fabricating the same
    71.
    发明授权
    Nitride semiconductor device and method for fabricating the same 有权
    氮化物半导体器件及其制造方法

    公开(公告)号:US08344423B2

    公开(公告)日:2013-01-01

    申请号:US13360275

    申请日:2012-01-27

    IPC分类号: H01L29/66

    摘要: A nitride semiconductor device includes: a first nitride semiconductor layer; a second nitride semiconductor layer formed on the first nitride semiconductor layer and having a wider band gap than the first nitride semiconductor layer; and a third nitride semiconductor layer formed on the second nitride semiconductor layer. A region of the third nitride semiconductor layer located below the gate electrode is formed with a control region having a p-type conductivity, and a region of the third nitride semiconductor layer located between the gate electrode and each of the source electrode and the drain electrode is formed with a high resistive region having a higher resistance than the that of the control region.

    摘要翻译: 氮化物半导体器件包括:第一氮化物半导体层; 形成在所述第一氮化物半导体层上并且具有比所述第一氮化物半导体层更宽的带隙的第二氮化物半导体层; 以及形成在所述第二氮化物半导体层上的第三氮化物半导体层。 位于栅电极下方的第三氮化物半导体层的区域形成有具有p型导电性的控制区域,以及位于栅电极与源电极和漏极之间的第三氮化物半导体层的区域 形成有具有比控制区域更高的电阻的高电阻区域。

    Schottky barrier diode and integrated circuit using the same
    74.
    发明授权
    Schottky barrier diode and integrated circuit using the same 有权
    肖特基势垒二极管和集成电路使用相同

    公开(公告)号:US07375407B2

    公开(公告)日:2008-05-20

    申请号:US11271833

    申请日:2005-11-14

    IPC分类号: H01L29/47

    CPC分类号: H01L29/66143 H01L29/872

    摘要: A Schottky barrier diode includes a first semiconductor layer and a second semiconductor layer successively formed above a substrate; and a high-resistance region formed in the first semiconductor layer and the second semiconductor layer and having higher resistance than the first semiconductor layer and the second semiconductor layer. A Schottky electrode and an ohmic electrode spaced from each other are formed on the second semiconductor layer in a portion surrounded with the high-resistance region.

    摘要翻译: 肖特基势垒二极管包括依次形成在衬底上的第一半导体层和第二半导体层; 以及形成在第一半导体层和第二半导体层中并且具有比第一半导体层和第二半导体层更高的电阻的高电阻区域。 彼此间隔开的肖特基电极和欧姆电极在被高电阻区域包围的部分中形成在第二半导体层上。

    Nitride semiconductor device
    75.
    发明申请
    Nitride semiconductor device 有权
    氮化物半导体器件

    公开(公告)号:US20070170463A1

    公开(公告)日:2007-07-26

    申请号:US11647218

    申请日:2006-12-29

    IPC分类号: H01L31/00

    摘要: A nitride semiconductor device includes: a first semiconductor layer made of first nitride semiconductor; a second semiconductor layer formed on a principal surface of the first semiconductor layer and made of second nitride semiconductor having a bandgap wider than that of the first nitride semiconductor; a control layer selectively formed on, or above, an upper portion of the second semiconductor layer and made of third nitride semiconductor having a p-type conductivity; source and drain electrodes formed on the second semiconductor layer at respective sides of the control layer; a gate electrode formed on the control layer; and a fourth semiconductor layer formed on a surface of the first semiconductor layer opposite to the principal surface, having a potential barrier in a valence band with respect to the first nitride semiconductor and made of fourth nitride semiconductor containing aluminum.

    摘要翻译: 氮化物半导体器件包括:由第一氮化物半导体制成的第一半导体层; 第二半导体层,其形成在第一半导体层的主表面上并且由具有比第一氮化物半导体的带隙宽的第二氮化物半导体构成; 选择性地形成在所述第二半导体层的上部并且由上述第二半导体层的上部制成的具有p型导电性的第三氮化物半导体的控制层; 源极和漏极,形成在控制层的相应侧上的第二半导体层上; 形成在所述控制层上的栅电极; 以及形成在与所述主表面相对的所述第一半导体层的表面上的第四半导体层,所述第四半导体层相对于所述第一氮化物半导体具有价带中的势垒,并且由包含铝的第四氮化物半导体制成。

    Resonator and filter using the same
    78.
    发明申请
    Resonator and filter using the same 失效
    谐振器和滤波器使用相同

    公开(公告)号:US20060038636A1

    公开(公告)日:2006-02-23

    申请号:US11194460

    申请日:2005-08-02

    IPC分类号: H03H9/58

    摘要: An acoustic resonator includes: a substrate; a resonator film which is supported above the main surface of the substrate and includes a piezoelectric film and a pair of a top electrode and a bottom electrode which are formed on part of the top surface and part of the bottom surface of the piezoelectric film, respectively, to face each other via the piezoelectric film; and a support which is formed on the main surface of the substrate to support the resonator film from below. A resonance cavity is provided in part of a region between the substrate and the resonator film below at least a portion of part of the resonator film where the top electrode and the bottom electrode coincide with each other and an isolation cavity is provided in other part of said region where the support and the resonance cavity do not exist.

    摘要翻译: 声谐振器包括:基板; 一种谐振膜,其被支撑在基板的主表面上方,分别包括压电膜和一对顶电极和底电极,它们分别形成在压电膜的顶表面和底表面的一部分上 通过压电膜相互面对; 以及形成在基板的主表面上以从下方支撑谐振膜的支撑体。 谐振腔被设置在基板和谐振器膜之间的区域的一部分的下方,在谐振膜的至少一部分之上,其中顶部电极和底部电极彼此重合,并且在另一部分中设置隔离腔 所述区域不存在支撑和谐振腔。

    Field-effect transistor, bipolar transistor, and methods of fabricating the same
    80.
    发明授权
    Field-effect transistor, bipolar transistor, and methods of fabricating the same 失效
    场效应晶体管,双极晶体管及其制造方法

    公开(公告)号:US06548838B1

    公开(公告)日:2003-04-15

    申请号:US09666157

    申请日:2000-09-19

    IPC分类号: H01L310328

    摘要: A field-effect transistor of the present invention has first semiconductor layers disposed in at least two regions located above a substrate and spaced apart in a direction parallel to a substrate surface, second semiconductor layers disposed on the respective first semiconductor layers to protrude from the respective side surfaces of the first semiconductor layers, and ohmic electrodes disposed on the respective second semiconductor layers. The field-effect transistor also has a gate electrode formed by self alignment relative to the ohmic electrodes, which is disposed in a region located above the substrate and lying between the first semiconductor layers in spaced relation to the respective side surfaces of the first semiconductor layers.

    摘要翻译: 本发明的场效应晶体管具有位于基板上方的至少两个区域中的第一半导体层,并且在平行于衬底表面的方向上间隔开,第二半导体层设置在相应的第一半导体层上以从相应的 第一半导体层的侧表面和设置在相应的第二半导体层上的欧姆电极。 场效应晶体管还具有通过相对于欧姆电极进行自对准而形成的栅电极,该欧姆电极设置在位于衬底上方的区域中,并且位于第一半导体层之间,与第一半导体层的相应侧表面间隔开 。