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公开(公告)号：US20180351322A1
公开(公告)日：2018-12-06
申请号：US16055656
申请日：2018-08-06
申请人： GIGAPHOTON INC.
CPC分类号： H01S3/134 , G01N21/5907 , G01N33/004 , G01N33/0063 , G03F7/70033 , H01S3/005 , H01S3/0071 , H01S3/034 , H01S3/036 , H01S3/1305 , H01S3/1306 , H01S3/2232 , H01S3/2316
摘要： A laser apparatus according to one aspect of the present disclosure includes a master oscillator configured to output laser light, a plurality of amplifiers each configured to include carbon dioxide as a laser medium and amplify the laser light, a first optical path pipe configured to cover a laser optical path between the amplifiers, a gas supply port configured to supply, into the first optical path pipe, gas having lower carbon dioxide concentration than that of the air, a first carbon dioxide densitometer configured to measure carbon dioxide concentration in the first optical path pipe, and an alarm device configured to issue an alarm when the carbon dioxide concentration measured by the first carbon dioxide densitometer exceeds a preset prescribed value.
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公开(公告)号：US20180241170A1
公开(公告)日：2018-08-23
申请号：US15953835
申请日：2018-04-16
申请人： Gigaphoton Inc.
CPC分类号： H01S3/036 , H01S3/134 , H01S3/2251 , H01S3/2256
摘要： A laser gas purifying system to purify laser gas emitted from a laser apparatus and return purified gas to the laser apparatus may include a first pipe configured to pass the laser gas emitted from the laser apparatus, a purifying apparatus connected to the first pipe and configured to purify the laser gas emitted from the laser apparatus, a second pipe connected to the purifying apparatus and configured to return the purified gas purified by the purifying apparatus to the laser apparatus, and an exhausting device provided in at least one of the first pipe, the purifying apparatus, and the second pipe.
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公开(公告)号：US09954340B2
公开(公告)日：2018-04-24
申请号：US15208637
申请日：2016-07-13
申请人： Gigaphoton Inc.
发明人： Tooru Abe , Takeshi Ohta , Hiroaki Tsushima , Osamu Wakabayashi
IPC分类号： H01S3/22 , H01S3/036 , H01S3/225 , H01S3/10 , H01S3/134 , H01S3/23 , H01S3/097 , H01S3/13 , H01S3/08
CPC分类号： H01S3/036 , H01S3/08009 , H01S3/09702 , H01S3/10046 , H01S3/1305 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： Problem: to suppress the number of times complete gas replacement in a laser chamber.Solution: this excimer laser apparatus may include a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Then, gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
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公开(公告)号：US20180102622A1
公开(公告)日：2018-04-12
申请号：US15836878
申请日：2017-12-10
申请人： Gigaphoton Inc.
发明人： Kouji KAKIZAKI , Akira SUWA , Osamu WAKABAYASHI , Hiroshi UMEDA
CPC分类号： H01S3/2308 , H01S3/005 , H01S3/09702 , H01S3/0971 , H01S3/10007 , H01S3/10015 , H01S3/10038 , H01S3/10069 , H01S3/104 , H01S3/134 , H01S3/2222 , H01S3/225 , H01S3/2316
摘要： The excimer laser device receives data on a target value of pulse energy from an external device and outputs a pulse laser beam. The excimer laser device includes a master oscillator, at least one power amplifier including a chamber provided in an optical path of the pulse laser beam outputted from the master oscillator, a pair of electrodes provided in the chamber, and an electric power source configured to apply voltage to the pair of electrodes, and a controller configured to control the electric power source of one power amplifier of the at least one power amplifier to stop applying the voltage to the pair of electrodes based on the target value of the pulse energy.
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公开(公告)号：US20170346252A1
公开(公告)日：2017-11-30
申请号：US15680474
申请日：2017-08-18
申请人： Gigaphoton Inc.
IPC分类号： H01S3/038 , H01S3/0977 , H01S3/09 , H01S3/225 , H01S3/036
CPC分类号： H01S3/038 , H01S3/032 , H01S3/036 , H01S3/0381 , H01S3/0385 , H01S3/0388 , H01S3/08009 , H01S3/0906 , H01S3/09702 , H01S3/0971 , H01S3/0977 , H01S3/134 , H01S3/225
摘要： An excimer laser chamber device may include: a the laser chamber; a first electrode provided in the laser chamber; a second electrode provided in the laser chamber to face the first electrode; an electrode holder provided in the laser chamber to be connected to a high voltage; at least one connecting terminal including a first anchored portion anchored to the first electrode and a second anchored portion anchored to the electrode holder, the at least one connecting terminal being configured to electrically connect the first electrode and the electrode holder; a guide member held by the electrode holder, the guide member being configured to position the first electrode in a direction substantially perpendicular to both a direction of electric discharge between the first electrode and the second electrode and a longitudinal direction of the first electrode; and an electrode-gap-varying unit configured to move the first electrode in a direction substantially parallel to the direction of electric discharge.
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76.发明授权公开(公告)号：US09831628B2
公开(公告)日：2017-11-28
申请号：US15503996
申请日：2015-08-14
申请人： Cymer, LLC
发明人： Kevin O'Brien , Joshua Thornes , Michael Borrello
CPC分类号： H01S3/036 , H01S3/0014 , H01S3/104 , H01S3/13 , H01S3/134 , H01S3/22 , H01S3/2207 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2308
摘要： A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser is disclosed. The laser is fired at low power, and the gas in the amplifier laser chamber bled if necessary until the discharge voltage meets or exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased to a burst pattern that approximates the expected operation of the laser, and the amplifier chamber gas bled again if necessary until the voltage and an output energy meet or exceed minimum values, or until the pressure is less than a minimum value. The gas in the master oscillator chamber is then bled if necessary until the output energy of the master oscillator meets or falls below a maximum value, again without dropping the pressure in the chamber below the minimum value. While the pressure is adjusted, bandwidth is also measured and adjusted to stay within a desired range. Once the target values are provided, the process runs quickly without manual interaction.
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公开(公告)号：US09590380B2
公开(公告)日：2017-03-07
申请号：US15040121
申请日：2016-02-10
申请人： FANUC CORPORATION
发明人： Akihiko Nishio
CPC分类号： H01S3/036 , H01S3/041 , H01S3/0943 , H01S3/104 , H01S3/1067 , H01S3/134 , H01S3/22
摘要： There was the problem that the pressure of the laser medium rises from the target value by the heat when generating laser light. The laser oscillator includes a controller, laser medium flow path, resonator part, blower, pressure detecting part, laser medium supply-exhaust part, and temporary stop command part. The controller controls the resonator part to stop to generate laser light if a temporary stop is commanded, controls the blower 18 to slow the rotational speed of the blower from the first rotational speed to the second rotational speed, and controls the laser medium supply-exhaust part so that the pressure is the second target value lower than the pressure at the time when the rotational speed of the blower is the second rotational speed.
摘要翻译： 存在当产生激光时激光介质的压力从目标值通过热量升高的问题。 激光振荡器包括控制器，激光介质流路，谐振器部分，鼓风机，压力检测部分，激光介质供给排气部分和临时停止命令部分。 如果命令临时停止，控制器控制谐振器部分停止产生激光，控制鼓风机18将鼓风机的旋转速度从第一转速减慢到第二转速，并控制激光介质供给排气 使得压力是比鼓风机的转速为第二转速时的压力低的第二目标值。
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公开(公告)号：US20160359291A1
公开(公告)日：2016-12-08
申请号：US15240162
申请日：2016-08-18
申请人： Gigaphoton Inc.
CPC分类号： H01S3/038 , G03F7/70025 , H01S3/0014 , H01S3/036 , H01S3/08009 , H01S3/09705 , H01S3/0971 , H01S3/1305 , H01S3/134 , H01S3/225
摘要： A gas laser apparatus includes a chamber containing a laser gas, a pair of electrodes disposed within the chamber, a fan disposed within the chamber, a motor connected to a rotating shaft of the fan, and a rotating speed control unit configured to control a rotating speed of the fan based on a wear-out parameter of the pair of electrodes.
摘要翻译： 气体激光装置包括：包含激光气体的腔室，设置在腔室内的一对电极;设置在腔室内的风扇;与风扇的旋转轴连接的电动机;以及旋转速度控制单元， 基于该对电极的磨损参数来确定风扇的速度。
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公开(公告)号：US20160190763A1
公开(公告)日：2016-06-30
申请号：US15060148
申请日：2016-03-03
申请人： GIGAPHOTON INC.
CPC分类号： H01S3/038 , H01S3/08009 , H01S3/134 , H01S3/225
摘要： There may be provided a laser apparatus including: an optical resonator including an output coupler; a laser chamber containing a laser medium and disposed in an optical path inside the optical resonator; a pair of discharge electrodes disposed inside the laser chamber; an electrode gap varying section configured to vary a gap between the discharge electrodes; a laser beam measurement section disposed in an optical path of a laser beam outputted from the output coupler, the laser beam resulting from electric discharge between the discharge electrodes; and a controller configured to control the gap between the discharge electrodes through activating the electrode gap varying section, based on a beam parameter of the laser beam measured by the laser beam measurement section.
摘要翻译： 可以提供一种激光装置，包括：包括输出耦合器的光谐振器; 包含激光介质并设置在光学谐振器内的光路中的激光室; 设置在激光室内的一对放电电极; 电极间隙变化部，被配置为改变所述放电电极之间的间隙; 设置在从输出耦合器输出的激光束的光路中的激光束测量部分，由放电电极之间的放电产生的激光束; 以及控制器，被配置为基于由激光束测量部测量的激光束的光束参数来激活电极间隙变化部分来控制放电电极之间的间隙。
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公开(公告)号：US20160161859A1
公开(公告)日：2016-06-09
申请号：US15014149
申请日：2016-02-03
申请人： Cymer, LLC
发明人： Rahul Ahlawat
IPC分类号： G03F7/20
CPC分类号： H01S3/104 , H01S3/036 , H01S3/09705 , H01S3/0971 , H01S3/10069 , H01S3/1055 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2308 , H01S2301/02
摘要： A pulsed light beam emitted from an optical source is received, the pulsed light beam being associated with a temporal repetition rate; a frequency of a disturbance in the optical source is determined, the frequency being an aliased frequency that varies with the temporal repetition rate of the pulsed light beam; a correction waveform is generated based on the aliased frequency; and the disturbance in the optical source is compensated by modifying a characteristic of the pulsed light beam based on the generated correction waveform.
摘要翻译： 接收从光源发射的脉冲光束，脉冲光束与时间重复率相关联; 确定光源中的干扰频率，该频率是随着脉冲光束的时间重复率而变化的混叠频率; 基于混叠频率产生校正波形; 并且通过基于产生的校正波形修改脉冲光束的特性来补偿光源中的干扰。
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