公开(公告)号：US20230071592A1

公开(公告)日：2023-03-09

申请号：US18053737

申请日：2022-11-08

Applicant: Gigaphoton Inc.

Inventor： Akira SUWA ,  Kouji KAKIZAKI ,  Masakazu KOBAYASHI ,  Junichi FUJIMOTO ,  Yasufumi KAWASUJI

IPC: H05K3/46 ,  H05K3/40 ,  B23K26/066

Abstract: A laser processing method according to a viewpoint of the present disclosure includes radiating ultraviolet pulse laser light onto a workpiece having a stacked structure in which a conductor layer, an insulating layer, and a sacrificial layer are stacked on each other in the presented order, the pulse laser light radiated from the side facing the sacrificial layer, to change a laser ablation processing mode in the sacrificial layer and form a through hole in the sacrificial layer, radiating the pulse laser light onto the insulating layer through the through hole to form an opening in the insulating layer, and removing the sacrificial layer after the formation of the opening.

公开(公告)号：US20170033527A1

公开(公告)日：2017-02-02

申请号：US15290518

申请日：2016-10-11

Applicant: Gigaphoton Inc.

Inventor： Akira SUWA ,  Kouji KAKIZAKI ,  Hiroaki TSUSHIMA ,  Tomoyuki OHKUBO ,  Hiroshi UMEDA ,  Hisakazu KATSUUMI

IPC: H01S3/097 ,  H01S3/041 ,  H01G4/258 ,  H01G4/14 ,  H01G4/30

CPC classification number: H01S3/09702 ,  H01G4/14 ,  H01G4/18 ,  H01G4/258 ,  H01G4/30 ,  H01S3/0305 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/041 ,  H01S3/097 ,  H01S3/2251 ,  H01S3/2256

Abstract: A gas laser device may include: a laser chamber containing laser gas; a first discharge electrode disposed in the laser chamber; a second discharge electrode disposed to face the first discharge electrode in the laser chamber; and a condenser including a polyimide dielectric and configured to supply power to between the first discharge electrode and the second discharge electrode.

Abstract translation: 气体激光装置可以包括：包含激光气体的激光室; 设置在激光室中的第一放电电极; 第二放电电极，设置成与激光室中的第一放电电极相对; 以及包括聚酰亚胺电介质并且被配置为向第一放电电极和第二放电电极之间供电的电容器。

公开(公告)号：US20200290156A1

公开(公告)日：2020-09-17

申请号：US16889791

申请日：2020-06-01

Applicant: Gigaphoton Inc.

Inventor： Akira SUWA ,  Kouji KAKIZAKI ,  Masakazu KOBAYASHI ,  Osamu WAKABAYASHI

IPC: B23K26/382 ,  B23K26/0622 ,  B23K26/066 ,  B23K26/06 ,  B23K26/04 ,  B23K26/03

Abstract: A laser processing method of performing laser processing on a transparent material that is transparent to ultraviolet light includes: A. a positioning step of performing positioning so that a transfer position of a transfer image is set at a position inside the transparent material at a predetermined depth ΔZsf from a surface of the transparent material in an optical axis direction; B. an irradiation condition acquisition step; C. a determination step of determining whether a maximum fluence of a pulse laser beam at the surface of the transparent material is within a predetermined range based on irradiation conditions; and D. a control step of allowing irradiation with the pulse laser beam when the maximum fluence is determined to be in the predetermined range.

公开(公告)号：US20200209760A1

公开(公告)日：2020-07-02

申请号：US16812784

申请日：2020-03-09

Applicant: Gigaphoton Inc.

Inventor： Koji KAKIZAKI ,  Masakazu KOBAYASHI ,  Akira SUWA ,  Osamu WAKABAYASHI

IPC: G03F7/20 ,  H01S3/225 ,  H01S3/11

Abstract: A laser processing method of performing laser processing on a transparent material that is transparent to ultraviolet light by using a laser processing system includes: performing relative positioning of a transfer position of a transfer image and the transparent material in an optical axis direction of a pulse laser beam so that the transfer position is set at a position inside the transparent material at a predetermined depth ΔZsf from a surface of the transparent material in the optical axis direction; and irradiating the transparent material with the pulse laser beam having a pulse width of 1 ns to 100 ns inclusive and a beam diameter of 10 μm to 150 μm inclusive at the transfer position.

公开(公告)号：US20240173796A1

公开(公告)日：2024-05-30

申请号：US18399043

申请日：2023-12-28

Applicant: Gigaphoton Inc.

Inventor： Yasufumi KAWASUJI ,  Yasuhiro ADACHI ,  Akira SUWA

IPC: B23K26/066 ,  H01L21/48 ,  H01L23/00

CPC classification number: B23K26/066 ,  H01L21/481 ,  H01L24/16 ,  H01L2224/16225

Abstract: A laser processing apparatus forms a hole in a workpiece having a resin layer on a processing surface by irradiating the workpiece with a laser beam discharge-excited between a pair of discharge electrodes, and includes a laser apparatus that outputs the laser beam having a first divergence angle in a discharge direction between the pair of discharge electrodes larger than a second divergence angle in a direction perpendicular to the discharge direction and a laser beam traveling direction, a transfer mask that forms a transfer pattern, an introducing optical system for guiding the laser beam to the transfer mask, a projection optical system that images the transfer pattern on the resin layer, and a divergence angle adjusting optical system that is disposed on an optical path of the laser beam and adjusts a difference between the first divergence angle and the second divergence angle to be reduced.

公开(公告)号：US20180342397A1

公开(公告)日：2018-11-29

申请号：US16055287

申请日：2018-08-06

Applicant: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION ,  GIGAPHOTON INC.

Inventor： Hiroshi IKENOUE ,  Akira SUWA ,  Osamu WAKABAYASHI

IPC: H01L21/285 ,  H01S5/06

CPC classification number: H01L21/228 ,  B23K26/0006 ,  B23K26/0604 ,  B23K26/0622 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/066 ,  B23K26/0676 ,  B23K26/0732 ,  B23K26/0861 ,  B23K26/1224 ,  B23K26/354 ,  B23K2101/34 ,  B23K2101/40 ,  B23K2103/172 ,  B23K2103/18 ,  B23K2103/54 ,  H01L21/268

Abstract: A laser doping device includes: a solution supply system configured to supply a solution containing dopant to a doping region; a pulse laser system configured to output pulse laser light including a plurality of pulses, the pulse laser light transmitting through the solution; a first control unit configured to control a number of pulses of the pulse laser light for allowing the doping region to be irradiated, and to control a fluence of the pulse laser light in the doping region; and a second control unit configured to control a flow velocity of the solution so as to move bubbles, from the doping region, occurring in the solution every time of irradiation with the pulse.

公开(公告)号：US20240154381A1

公开(公告)日：2024-05-09

申请号：US18408770

申请日：2024-01-10

Applicant: Gigaphoton Inc.

Inventor： Junichi FUJIMOTO ,  Akira SUWA

IPC: H01S3/097 ,  H01S3/038 ,  H01S3/041 ,  H01S3/22

CPC classification number: H01S3/09702 ,  H01S3/038 ,  H01S3/041 ,  H01S3/2207

Abstract: A gas laser apparatus includes a voltage application circuit, a chamber device that includes an electrode and is configured to output light generated when a voltage is applied to the electrode from the voltage application circuit, a first pallet that includes a mounting surface on which the chamber device and the voltage application circuit are disposed in parallel with each other, and a housing unit in and out of which the first pallet is movable by movement in an in-plane direction of the mounting surface.

公开(公告)号：US20180102622A1

公开(公告)日：2018-04-12

申请号：US15836878

申请日：2017-12-10

Applicant: Gigaphoton Inc.

Inventor： Kouji KAKIZAKI ,  Akira SUWA ,  Osamu WAKABAYASHI ,  Hiroshi UMEDA

IPC: H01S3/097 ,  H01S3/23 ,  H01S3/038 ,  H01S3/10 ,  H01S3/13 ,  H01S3/134 ,  H01S3/225

CPC classification number: H01S3/2308 ,  H01S3/005 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/10007 ,  H01S3/10015 ,  H01S3/10038 ,  H01S3/10069 ,  H01S3/104 ,  H01S3/134 ,  H01S3/2222 ,  H01S3/225 ,  H01S3/2316

Abstract: The excimer laser device receives data on a target value of pulse energy from an external device and outputs a pulse laser beam. The excimer laser device includes a master oscillator, at least one power amplifier including a chamber provided in an optical path of the pulse laser beam outputted from the master oscillator, a pair of electrodes provided in the chamber, and an electric power source configured to apply voltage to the pair of electrodes, and a controller configured to control the electric power source of one power amplifier of the at least one power amplifier to stop applying the voltage to the pair of electrodes based on the target value of the pulse energy.

公开(公告)号：US20170248782A1

公开(公告)日：2017-08-31

申请号：US15594849

申请日：2017-05-15

Applicant: Gigaphoton Inc.

Inventor： Kouji KAKIZAKI ,  Akira SUWA ,  Osamu WAKABAYASHI

IPC: G02B26/10 ,  H01L21/02 ,  H01L27/12 ,  G21K5/08 ,  G21K5/10

CPC classification number: G02B26/10 ,  B23K26/0676 ,  B23K26/352 ,  G02B26/101 ,  G02B26/12 ,  G21K5/08 ,  G21K5/10 ,  G21K2201/067 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/02592 ,  H01L21/0268 ,  H01L21/02686 ,  H01L21/02691 ,  H01L27/1285

Abstract: A laser irradiation device may include: a laser device configured to emit a pulse laser beam; beam scan optics configured to allocate the pulse laser beam emitted from the laser device to optical paths; beam homogenizers provided in the respective optical paths, each of the beam homogenizers being configured to homogenize distribution of light intensity of the pulse laser beam allocated to a corresponding optical path of the optical paths; and a controller configured to control the beam scan optics to allocate, for each pulse, the pulse laser beam emitted from the laser device to the corresponding optical path of the optical paths.

公开(公告)号：US20240058894A1

公开(公告)日：2024-02-22

申请号：US18487994

申请日：2023-10-16

Applicant: Gigaphoton Inc.

Inventor： Akira SUWA ,  Osamu WAKABAYASHI ,  Masashi SHIMBORI ,  Masakazu KOBAYASHI

IPC: B23K26/14 ,  B23K26/12

CPC classification number: B23K26/1462 ,  B23K26/126

Abstract: A laser processing apparatus according to the present disclosure includes a placement base on which a processing receiving object is placed, an optical system that guides laser light to the processing receiving object, a gas supply port via which a gas is supplied to a laser light irradiated region of the processing receiving object, a gas recovery port via which the supplied gas is recovered, a mover that moves the irradiated region, and a controller that controls, in accordance with the moving direction of the irradiated region, the direction of the flow of the gas flowing from the gas supply port to the gas recovery port, and the controller changes the direction of the gas flow in response to a change in the moving direction of the irradiated region in such a way that the gas flows in the direction opposite the moving direction of the irradiated region.