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240 条记录 (耗时 0.034 秒)

    System, method, and computer program product for user password reset
    82.
    发明申请
    System, method, and computer program product for user password reset 审中-公开
    系统，方法和计算机程序产品用于用户密码重置

    公开(公告)号：US20060095785A1

    公开(公告)日：2006-05-04

    申请号：US10978217

    申请日：2004-10-29

    申请人： John White

    发明人： John White

    IPC分类号： H04K1/00

    CPC分类号： G06F21/305 ,  G06F21/31 ,  G06F2221/2131 ,  G06F2221/2149

    摘要： A system, method, and computer program product utilizing a default user ID, such as “help,” that has no assigned password. When the user logs into the computer using this ID, their login is “captured” and a crippled windows manager is started along with a web browser pointed to a specific URL. The user has no ability to manipulate the operating system, the local file system, or even the web browser. All the user is able to do is interact with the automated reset page(s) on the network authentication server. Once the user has completed her password reset and closed the browser, the user's web session is logged out and the user can now log in with her new password and her original userid.

    摘要翻译： 使用默认用户ID的系统，方法和计算机程序产品，例如没有分配密码的“帮助”。 当用户使用此ID登录到计算机时，他们的登录名被“捕获”，并且启动了一个残缺的Windows管理器以及指向特定URL的Web浏览器。 用户无法操纵操作系统，本地文件系统甚至Web浏览器。 所有用户能够做的是与网络认证服务器上的自动重置页面进行交互。 一旦用户完成密码重置并关闭浏览器，用户的网络会话将被注销，用户现在可以使用她的新密码和她的原始用户名登录。

    Method and apparatus for dechucking a substrate
    85.
    发明申请
    Method and apparatus for dechucking a substrate 有权
    剥离基板的方法和装置

    公开(公告)号：US20060034032A1

    公开(公告)日：2006-02-16

    申请号：US10919457

    申请日：2004-08-16

    申请人： John White ,  Wendell Blonigan

    发明人： John White ,  Wendell Blonigan

    IPC分类号： H01T23/00

    CPC分类号： H01L21/6831 ,  C23C16/4586 ,  C23C16/5096

    摘要： A method and apparatus for dechucking a substrate is provided. In one embodiment, a processing chamber is provided that includes a grounded chamber body having a substrate support assembly disposed in an interior volume. A dechucking circuit selectively couples the substrate support assembly to ground or to a power source. In another embodiment of the invention, a method for dechucking a substrate includes the steps of completing a plasma process on a substrate disposed on a grounded substrate support assembly, disconnecting the substrate support assembly from ground, and applying a dechucking voltage to the substrate support assembly.

    摘要翻译： 提供了一种用于去除基板的方法和装置。 在一个实施例中，提供了处理室，其包括接地室主体，其具有设置在内部容积中的基板支撑组件。 解扣电路将衬底支撑组件选择性地耦合到地或电源。 在本发明的另一个实施例中，一种用于对基板进行去夹套的方法包括以下步骤：在设置在接地的基板支撑组件上的基板上完成等离子体处理，将基板支撑组件从地面断开，以及向基板支撑组件施加脱扣电压 。

    Fluid conditioning system and method
    87.
    发明申请
    Fluid conditioning system and method 有权

    公开(公告)号：US20060006106A1

    公开(公告)日：2006-01-12

    申请号：US11179309

    申请日：2005-07-11

    申请人： John White

    发明人： John White

    IPC分类号： C02F1/02 ,  C02F1/48

    CPC分类号： F02M27/045 ,  C02F1/481 ,  C02F1/482

    摘要： An exemplary method and system for reducing or eliminating the formation of solid precipitates/deposits of a flowing fluid, such as oil, or for reducing or eliminating existing solid precipitates/deposits contained in a flowing fluid, is provided. A fluid conditioning system and method are provided, along with a magnetic fluid conditioner that provides numerous magnetic field transitions through a magnetic flux density in the flow path of the fluid to reduce the formation of precipitates/deposits. A recirculating system using the invention may be set up to reduce deposits, such as paraffin in oil, by circulating oil through a pump, a magnetic fluid conditioner, a tank, and, in one embodiment, and a heater until the deposits/precipitates have been transitioned from a solid to a liquid. A multi-pole magnet, such as an eight-pole magnet, may be used in an embodiment of the present invention to increase the effectiveness of the present invention.

    Plasma uniformity control by gas diffuser hole design
    88.
    发明申请
    Plasma uniformity control by gas diffuser hole design 有权
    通过气体扩散器孔设计的等离子体均匀性控制

    公开(公告)号：US20050251990A1

    公开(公告)日：2005-11-17

    申请号：US10889683

    申请日：2004-07-12

    申请人： Soo Young Choi ,  John White ,  Qunhua Wang ,  Li Hou ,  Ki Kim ,  Shinichi Kurita ,  Tae Won ,  Suhail Anwar ,  Beom Park ,  Robin Tiner

    发明人： Soo Young Choi ,  John White ,  Qunhua Wang ,  Li Hou ,  Ki Kim ,  Shinichi Kurita ,  Tae Won ,  Suhail Anwar ,  Beom Park ,  Robin Tiner

    IPC分类号： H01L21/02 ,  C23C16/00 ,  C23C16/34 ,  C23C16/44 ,  C23C16/455 ,  C23C16/505 ,  C23C16/509 ,  C23F1/00 ,  H01J37/32 ,  H01L21/205

    CPC分类号： H01J37/3244 ,  C23C16/345 ,  C23C16/455 ,  C23C16/45565 ,  C23C16/5096 ,  H01J37/32082 ,  H01J37/32091 ,  H01J37/32541 ,  H01J37/32596 ,  H01J2237/327 ,  H01J2237/3321 ,  H01J2237/3323 ,  H01J2237/3325 ,  Y10T29/49885 ,  Y10T29/49996

    摘要： Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can also be created computer numerically controlled machining. Diffuser plates with gradually increasing diameters, depths and surface areas of the hollow cathode cavities from the center to the edge of the diffuser plate have been shown to produce improved uniformities of film thickness and film properties.

    摘要翻译： 提供了用于在处理室中分配气体的气体扩散板的实施例。 气体分配板包括具有上游侧和下游侧的扩散板，以及在扩散板的上游侧和下游侧之间通过的多个气体通路。 气体通道包括在下游侧的中空阴极腔，以增强等离子体电离。 延伸到下游端的气体通道的空心阴极腔的深度，直径，表面积和密度可以从扩散板的中心到边缘逐渐增加，以改善衬底上的膜厚度和性能均匀性 。 从扩散板的中心到边缘的直径，深度和表面积的增加可以通过向下游侧弯曲扩散板，然后在凸出的下游侧加工出来。 扩散板的弯曲可以通过热处理或真空工艺来实现。 从扩散板的中心到边缘的直径，深度和表面积的增加也可以用计算机数字控制加工。 具有从扩散板的中心到边缘的中空阴极腔的直径逐渐增加，深度和表面积逐渐增大的扩散板已被证明可以产生改善的膜厚度和膜性质的均匀性。

    Growth of carbon nanotubes at low temperature
    89.
    发明申请
    Growth of carbon nanotubes at low temperature 审中-公开
    碳纳米管在低温下生长

    公开(公告)号：US20050233263A1

    公开(公告)日：2005-10-20

    申请号：US10827915

    申请日：2004-04-20

    申请人： Beom Park ,  Soo Choi ,  John White

    发明人： Beom Park ,  Soo Choi ,  John White

    IPC分类号： C01B31/02 ,  C30B25/00 ,  C30B29/02 ,  C30B29/60 ,  G03F7/00

    CPC分类号： B82Y40/00 ,  B82Y30/00 ,  C01B32/162 ,  C01B2202/36 ,  C30B25/005 ,  C30B29/02 ,  C30B29/605

    摘要： A method for depositing carbon nanotubes on a large substrate is provided. The carbon nanotubes are deposited on a plasma treated transition metal layer on a substrate. In one aspect, the transition metal layer is treated with a plasma of argon or a mixture of nitrogen and hydrogen. The carbon nanotubes are deposited by thermal chemical vapor deposition at a substrate temperature of between about 400° C. and about 450° C.

    摘要翻译： 提供了一种在大型基板上沉积碳纳米管的方法。 将碳纳米管沉积在基板上的等离子体处理的过渡金属层上。 一方面，用等离子体氩或氮和氢的混合物处理过渡金属层。 通过热化学气相沉积在约400℃至约450℃的衬底温度下沉积碳纳米管。

    Showerhead mounting to accommodate thermal expansion
    90.
    发明申请
    Showerhead mounting to accommodate thermal expansion 有权
    淋浴头安装，以适应热膨胀

    公开(公告)号：US20050183827A1

    公开(公告)日：2005-08-25

    申请号：US11063454

    申请日：2005-02-23

    申请人： John White ,  William Sterling

    发明人： John White ,  William Sterling

    IPC分类号： C23C16/455 ,  C23C16/44 ,  C23C16/513 ,  C23F1/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/3065

    CPC分类号： C23C16/45565 ,  H01J37/3244 ,  H01J37/32522

    摘要： Methods and apparatus for accommodating thermal expansion of a showerhead. In a first aspect of the invention, the showerhead is movably supported by resting a rim of the showerhead on a support shelf. In a second aspect, the showerhead is suspended from the chamber wall by a plurality of hangers that are connected to the showerhead, the chamber wall, or both by pins that slide within slots so as to permit the hangers to slide radially to accommodate thermal expansion of the showerhead in the radial direction. In a third aspect, the showerhead is suspended from the wall of the vacuum chamber by a plurality of rods or flexible wires. In a fourth aspect, the showerhead is connected near its perimeter to a second material having a greater thermal expansion coefficient than the showerhead. In a fifth aspect, a heater is mounted behind the showerhead to reduce the termperature differential between the top and bottom surfaces of the showerhead or to reduce heat transfer from the workpiece to the showerhead.

    摘要翻译： 用于容纳喷头的热膨胀的方法和装置。 在本发明的第一方面，喷头通过将喷头的边缘放置在支撑架上而被可移动地支撑。 在第二方面，喷头通过多个悬挂器从室壁悬挂，多个悬挂器通过在槽内滑动的销连接到喷头，室壁或两者，以允许吊架径向滑动以适应热膨胀 的喷头在径向方向。 在第三方面，喷头通过多个杆或柔性线悬挂在真空室的壁上。 在第四方面，喷头在其周边附近连接到具有比喷头更大的热膨胀系数的第二材料。 在第五方面，一种加热器被安装在淋浴喷头之后，以降低喷淋头的顶表面和底表面之间的温差，或减少从工件到喷头的热传递。