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公开(公告)号:US20240420750A1
公开(公告)日:2024-12-19
申请号:US18818295
申请日:2024-08-28
Applicant: Micron Technology, Inc.
Inventor: Kamal M. Karda , Haitao Liu , Karthik Sarpatwari , Durai Vishak Nirmal Ramaswamy , Alessandro Calderoni , Richard E. Fackenthal , Duane R. Mills
IPC: G11C11/404
Abstract: Some embodiments include apparatuses in which one of such apparatus includes a first memory cell including a first transistor having a first channel region coupled between a data line and a conductive region, and a first charge storage structure located between the first data line and the conductive region, and a second transistor having a second channel region coupled to and located between the first data line and the first charge storage structure; a second memory cell including a third transistor having a third channel region coupled between a second data line and the conductive region, and a second charge storage structure located between the second data line and the conductive region, and a fourth transistor having a fourth channel region coupled to and located between the second data line and the second charge storage structure; a conductive line forming a gate of each of the first, second, third, and fourth transistors; and a conductive structure located between the first and second charge storage structures and electrically separated from the conductive region.
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公开(公告)号:US20240331781A1
公开(公告)日:2024-10-03
申请号:US18744335
申请日:2024-06-14
Applicant: Micron Technology, Inc.
Inventor: Nevil N. Gajera , Karthik Sarpatwari , Zhongyuan Lu
CPC classification number: G11C16/3404 , G11C16/10 , G11C16/26 , G11C16/30 , G11C16/3459
Abstract: Systems, methods, and apparatus related to memory devices. In one approach, a memory device has a memory array including memory cells. A controller of the memory device evaluates background leakage in order to select a write voltage to apply to a memory cell when performing a programming operation. The write voltage is dynamically selected from two or more write voltages. These write voltages include a first write voltage that is a normal or default voltage, and a second write voltage that is a boosted write voltage. The controller applies a pre-sensing voltage and pre-read voltage to the memory cell, and determines first and second respective currents that result from applying these voltages. In response to determining that the first current exceeds a first threshold (indicating background leakage), and the second current is below a second threshold that is greater than the first threshold (indicating that the memory cell does not snap), the controller selects the second (boosted) write voltage.
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公开(公告)号:US12106803B2
公开(公告)日:2024-10-01
申请号:US17824776
申请日:2022-05-25
Applicant: Micron Technology, Inc.
Inventor: Yen Chun Lee , Nevil N. Gajera , Karthik Sarpatwari
IPC: G11C11/4074 , G11C13/00 , G11C16/10 , G11C16/26 , G11C16/34
CPC classification number: G11C13/0069 , G11C13/0004 , G11C13/004 , G11C2013/0045 , G11C2013/0057 , G11C2013/0076
Abstract: Systems, methods, and apparatus related to memory devices. In one approach, a memory device has a memory array including memory cells. A controller of the memory device applies multiple pre-read voltages to memory cells prior to performing write operations on the memory cells. The controller applies a first pre-read voltage to determine which of the memory cells have a sensed current that exceeds a threshold. In response to determining that a percentage of the memory cells exceeding the threshold is too low (e.g., below a fixed limit), the controller determines to apply a second pre-read voltage to the memory cells. The second pre-read voltage has a greater magnitude than the first pre-read voltage, and can be applied to ensure greater reliability in properly determining the existing programming state of the memory cells. The controller then applies write voltages to the memory cells as appropriate based on target logic states for each memory cell and the programming mode to be used by the controller.
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公开(公告)号:US12101946B2
公开(公告)日:2024-09-24
申请号:US18387921
申请日:2023-11-08
Applicant: Micron Technology, Inc.
Inventor: Kamal M. Karda , Yi Fang Lee , Haitao Liu , Durai Vishak Nirmal Ramaswamy , Ramanathan Gandhi , Karthik Sarpatwari , Scott E. Sills , Sameer Chhajed
IPC: H10B99/00 , H01L27/092 , H01L27/12 , H01L29/24 , H01L29/267 , H01L29/423 , H01L29/66 , H01L29/786
CPC classification number: H10B99/00 , H01L27/092 , H01L27/1207 , H01L27/1225 , H01L27/124 , H01L27/1255 , H01L27/1259 , H01L29/24 , H01L29/267 , H01L29/42392 , H01L29/66969 , H01L29/78642 , H01L29/7869
Abstract: Some embodiments include an integrated assembly having a first semiconductor material between two regions of a second semiconductor material. The second semiconductor material is a different composition than the first semiconductor material. Hydrogen is diffused within the first and second semiconductor materials. The conductivity of the second semiconductor material increases in response to the hydrogen diffused therein to thereby create a structure having the second semiconductor material as source/drain regions, and having the first semiconductor material as a channel region between the source/drain regions. A transistor gate is adjacent the channel region and is configured to induce an electric field within the channel region. Some embodiments include methods of forming integrated assemblies.
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公开(公告)号:US12069853B2
公开(公告)日:2024-08-20
申请号:US17712674
申请日:2022-04-04
Applicant: Micron Technology, Inc.
Inventor: Kamal M. Karda , Karthik Sarpatwari , Durai Vishak Nirmal Ramaswamy , Haitao Liu
IPC: H10B12/00
Abstract: Some embodiments include apparatuses and methods of forming the apparatuses. One of the apparatuses includes a memory cell and first, second, and third data lines located over a substrate. The memory cell includes a first transistor and a second transistor. The first transistor includes a charge storage structure located on a first level of the apparatus, and a first channel region electrically separated from the charge storage structure. The second transistor includes a second channel region located on a second level of the apparatus and electrically coupled to the charge storage structure. The first and second data lines are located on a third level of the apparatus and electrically coupled to the first channel region. The first level is between the substrate and the third level. The third data line is electrically coupled to the second channel region and electrically separated from the first channel region.
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公开(公告)号:US20240188273A1
公开(公告)日:2024-06-06
申请号:US18521273
申请日:2023-11-28
Applicant: Micron Technology, Inc.
Inventor: Kamal M. Karda , Durai Vishak Nirmal Ramaswamy , Haitao Liu , Karthik Sarpatwari
IPC: H10B12/00 , G11C11/405 , G11C11/4096
CPC classification number: H10B12/00 , G11C11/405 , G11C11/4096
Abstract: Some embodiments include apparatuses and methods of using the apparatuses. One of the apparatuses includes first, second, and third conductive structures, each having a length in a first direction, first and second memory cells spaced apart from each other in a second direction perpendicular to the first direction, first conductive regions, and second conductive regions. Each of the first and second memory cells includes a first semiconductor portion located on a first level of the apparatus and coupled to the third conductive structure and one of the first and second conductive structures, a second semiconductor portion located on a second level of the apparatus and coupled to one of the first and second conductive structures. The first conductive regions are opposite the first and second semiconductor portions, respectively, of the first memory cell. Second conductive regions are opposite the first and second semiconductor portions, respectively, of the second memory cell.
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公开(公告)号:US11923007B2
公开(公告)日:2024-03-05
申请号:US18049855
申请日:2022-10-26
Applicant: Micron Technology, Inc.
Inventor: Karthik Sarpatwari , Fabio Pellizzer , Jessica Chen , Nevil Gajera
IPC: G11C13/00
CPC classification number: G11C13/0069 , G11C13/0004 , G11C13/0038
Abstract: Methods, systems, and devices for dirty write on power off are described. In an example, the described techniques may include writing memory cells of a device according to one or more parameters (e.g., reset current amplitude), where each memory cell is associated with a storage element storing a value based on a material property associated with the storage element. Additionally, the described techniques may include identifying, after writing the memory cells, an indication of power down for the device and refreshing, before the power down of the device, a portion of the memory cells based on identifying the indication of the power down for the device. In some cases, refreshing includes modifying at least one of the one or more parameters for a write operation for the portion of the memory cells.
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公开(公告)号:US20240047356A1
公开(公告)日:2024-02-08
申请号:US18234602
申请日:2023-08-16
Applicant: Micron Technology, Inc.
Inventor: Kamal M. Karda , Karthik Sarpatwari , Haitao Liu , Durai Vishak Nirmal Ramaswamy
IPC: H01L23/528 , H01L29/24 , G11C5/06 , H10B12/00
CPC classification number: H01L23/5286 , H01L29/24 , G11C5/063 , H10B12/01 , H10B12/20
Abstract: Some embodiments include apparatuses and methods of forming the apparatuses. One of the apparatuses includes a data line, a memory cell coupled to the data line, a ground connection, and a conductive line. The memory cell includes a first transistor and a second transistor. The first transistor includes a first region electrically coupled to the data line, and a charge storage structure electrically separated from the first region. The second transistor includes a second region electrically coupled to the charge storage structure and the data line. The ground connection is coupled to the first region of the first transistor. The conductive line is electrically separated from the first and second regions and spans across part of the first region of the first transistor and part of the second region of the second transistor and forming a gate of the first and second transistors.
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公开(公告)号:US11894078B2
公开(公告)日:2024-02-06
申请号:US17825941
申请日:2022-05-26
Applicant: Micron Technology, Inc.
Inventor: Karthik Sarpatwari , Xuan-Anh Tran , Jessica Chen , Jason A. Durand , Nevil N. Gajera , Yen Chun Lee
CPC classification number: G11C16/3459 , G11C16/102 , G11C16/26 , G11C16/30 , G11C16/3404
Abstract: Methods, systems, and devices for accessing a multi-level memory cell are described. The memory device may perform a read operation that includes pre-read portion and a read portion to access the multi-level memory cell. During the pre-read portion, the memory device may apply a plurality of voltages to a plurality of memory cells to identify a likely distribution of memory cells storing a first logic state. During the read portion, the memory device may apply a first read voltage to a memory cell based on performing the pre-read portion. The memory device may apply a second read voltage to the memory cell during the read portion that is based on the first read voltage. The memory device may determine the logic state stored by the memory cell based on applying the first read voltage and the second read voltage.
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公开(公告)号:US11875867B2
公开(公告)日:2024-01-16
申请号:US17545335
申请日:2021-12-08
Applicant: Micron Technology, Inc.
Inventor: Zhongyuan Lu , Karthik Sarpatwari , Nevil N. Gajera
CPC classification number: G11C29/42 , G11C29/1201 , G11C29/12005 , G11C29/20 , G11C29/4401
Abstract: A memory device can include multiple memory cells and a processing device operatively coupled with the memory device to perform operations including grouping the memory cells into a groups based on a metric reflecting an electrical distance of a memory cell from a voltage source, and determining, for each group, a respective share of write operations, wherein the share of write operations is related to an aggregate value of the metric for memory cells of the group. The operations can also include distributing the write operations to each group according to the share of write operations determined for the group.
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