公开(公告)号：US07449691B2

公开(公告)日：2008-11-11

申请号：US11435128

申请日：2006-05-17

申请人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Tohru Satake ,  Nobuharu Noji ,  Ichirota Nagahama ,  Yuichiro Yamazaki

发明人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Tohru Satake ,  Nobuharu Noji ,  Ichirota Nagahama ,  Yuichiro Yamazaki

IPC分类号： G01N23/00

CPC分类号： H01J37/244 ,  G01N21/9501 ,  G03F1/84 ,  H01J37/285 ,  H01J2237/2441 ,  H01J2237/2446

摘要： A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is disposed at an inside of the different environment, a processing device to process detection signals from the sensor is disposed at an outside of the different environment, and a transmission means transmits detection signals from the sensor to the processing device.

摘要翻译： 一种用于检测样品表面上的精细几何形状的检测装置，其中照射束照射放置在不同于大气的不同环境中的样品，并且由传感器检测从样品发出的二次辐射，并且其中 传感器设置在不同环境的内部，处理来自传感器的检测信号的处理装置设置在不同环境的外部，传输装置将检测信号从传感器传送到处理装置。

公开(公告)号：US07432102B2

公开(公告)日：2008-10-07

申请号：US10472587

申请日：2002-03-22

申请人： Koji Yanai ,  Naomi Sumida ,  Manabu Watanabe ,  Tatsuki Moriya ,  Takeshi Murakami

发明人： Koji Yanai ,  Naomi Sumida ,  Manabu Watanabe ,  Tatsuki Moriya ,  Takeshi Murakami

IPC分类号： C12N1/00 ,  C12P1/00 ,  C12P17/00 ,  C12P15/00 ,  C12P13/00 ,  C12P7/00 ,  C12P7/24 ,  C12P1/02

CPC分类号： C12P17/14 ,  C12N15/52

摘要： An objective of the present invention is to provide a method for producing substance PF1022 derivatives, in particular PF1022-220 and PF1022-260, by a direct fermentation method, and a transformant to be used for this method. According to the present invention, there is provided a transformant producing substance FF1022 derivatives, which can be obtained by introducing a genes involved in a biosynthetic pathway from chorismic acid to p-aminophenylpyruvic acid, including a papA gene encoding 4-amino-4-deoxychorismate synthase. which gene comprises the DNA sequence encoding the amino acid sequence of SEQ ID NO: 2; a papB gene encoding 4-amino-4-deoxyclaismate mutase, which gene comprises the DNA sequence encoding the amino acid sequence of SEQ ID NO: 4; and a papC gene encoding 4-amino-4-deoxyprepbenate dehydrogenase, which gene comprises the DNA sequence encoding the amino acid sequence of SEQ ID NO: 6, into a phenylalanine auxotrophic host induced from an organism that produces a substance PF1022. According to the present invention, there is also provided a process of producing substance PF1022 derivative, comprising steps of culturing the above-mentioned transformant and collecting the substance PF1022 derivatives.

摘要翻译： 本发明的目的是提供通过直接发酵方法生产物质PF1022衍生物，特别是PF1022-220和PF1022-260的方法，以及用于该方法的转化体。 根据本发明，提供了转化体生产物质FF1022衍生物，其可以通过将参与生物合成途径的基因从氯磺酸引入对氨基苯基丙酮酸而获得，包括编码4-氨基-4-脱氧胸苷酸的papA基因 合酶。 该基因包含编码SEQ ID NO：2的氨基酸序列的DNA序列; 编码4-氨基-4-脱氧胆酸酯变位酶的papB基因，该基因包含编码SEQ ID NO：4的氨基酸序列的DNA序列; 和编码4-氨基-4-脱氧降磷酸脱氢酶的papC基因，该基因包含编码SEQ ID NO：6的氨基酸序列的DNA序列，由产生PF1022的生物体诱导的苯丙氨酸营养缺陷型宿主中。 根据本发明，还提供了生产物质PF1022衍生物的方法，包括培养上述转化体并收集物质PF1022衍生物的步骤。

公开(公告)号：US07425703B2

公开(公告)日：2008-09-16

申请号：US11058216

申请日：2005-02-16

申请人： Mamoru Nakasuji ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Kenji Watanabe ,  Toshifumi Kimba ,  Kenichi Suematsu

发明人： Mamoru Nakasuji ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Kenji Watanabe ,  Toshifumi Kimba ,  Kenichi Suematsu

IPC分类号： G01N23/225

CPC分类号： H01J37/28 ,  G01N23/225 ,  H01J2237/0635 ,  H01J2237/2817

摘要： An object of the present invention is to provide an electron beam apparatus, in which a plurality of electron beams, e.g., four electron beams, is produced for one optical axis with a relatively high current achieved for each electron beam.Provided is an electron beam apparatus comprising: an electron beam emitter (32) having an electron gun (30), said electron gun (30) disposed along an optical axis (23) and operable to emit a plurality of off-axis electron beams along a direction defined by a certain angle with respect to the optical axis (23); a plurality of apertures (34) disposed at a location offset from the optical axis (23); and an electromagnetic lens (7) for forming a magnetic field between the electron gun (30) and the apertures (34) to control the plurality of off-axis electron beams emitted from the electron gun (30) so that the plurality of off-axis electron beams passes through the apertures (34).

摘要翻译： 本发明的目的是提供一种电子束装置，其中为每个电子束获得的相对高的电流为一个光轴产生多个电子束，例如四个电子束。 本发明提供一种电子束装置，包括：具有电子枪（30）的电子束发射器（32），所述电子枪（30）沿着光轴（23）设置并且可操作以沿着光轴发射多个离轴电子束 相对于光轴（23）限定一定角度的方向; 设置在偏离光轴（23）的位置处的多个孔（34）; 以及用于在电子枪（30）和孔（34）之间形成磁场的电磁透镜（7），以控制从电子枪（30）发射的多个离轴电子束， 轴电子束通过孔（34）。

公开(公告)号：USD576355S1

公开(公告)日：2008-09-02

申请号：US29272475

申请日：2007-02-09

申请人： Takeshi Murakami

设计人： Takeshi Murakami

公开(公告)号：US20080082184A1

公开(公告)日：2008-04-03

申请号：US11890447

申请日：2007-08-06

申请人： Takeshi Murakami

发明人： Takeshi Murakami

IPC分类号： G05B23/00

CPC分类号： G05B19/4184 ,  G05B19/0425 ,  G05B2219/24027 ,  G05B2219/24152 ,  G05B2219/25312 ,  G05B2219/35473 ,  G05B2219/36542 ,  G05B2219/45006 ,  Y02P90/04 ,  Y02P90/14

摘要： An instruction converting unit converts the data form of an instruction of an operation received by a receiving unit to the data form of a safety instrumentation system from the data form of a plant control system. An operation carrying out unit receives the instruction of the operation obtained by the instruction converting unit and an original instruction of the safety instrumentation system to carry out the operations, and preferentially carries out the operation of the original instruction of the safety instrumentation system when both the instructions compete with each other.

摘要翻译： 指令转换单元从工厂控制系统的数据形式将由接收单元接收的操作的指令的数据形式转换为安全仪表系统的数据形式。 操作执行单元接收由指令转换单元获得的操作的指令和安全仪表系统的原始指令以执行操作，并且当两者都执行时，优先执行安全仪表系统的原始指令的操作 指令相互竞争。

公开(公告)号：US20070235644A1

公开(公告)日：2007-10-11

申请号：US11806573

申请日：2007-06-01

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hiroshi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hiroshi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC分类号： G01N23/00

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

摘要翻译： 电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

公开(公告)号：US20070200569A1

公开(公告)日：2007-08-30

申请号：US11723591

申请日：2007-03-21

申请人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

发明人： Kenji Watanabe ,  Tohru Satake ,  Nobuharu Noji ,  Takeshi Murakami ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama ,  Atsushi Onishi

IPC分类号： G01R31/305

CPC分类号： G01R31/305

摘要： Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface and a secondary optical system 30 serving for detecting secondary electrons emanating from said sample surface to form an image of the sample surface. The inspection is carried out on the sample surface, S, by irradiating the electron beam to the sample surface, and after the extraction of a defective region in the sample based on the inspection, the extracted defective region is once again applied with the irradiation of the electron beam so as to provide a magnification or a detailed observation of the defective region.

公开(公告)号：US07247848B2

公开(公告)日：2007-07-24

申请号：US10445826

申请日：2003-05-28

申请人： Mamoru Nakasuji ,  Tohru Satake ,  Kenji Watanabe ,  Takeshi Murakami ,  Nobuharu Noji ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Toshifumi Kimba ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima ,  Toru Takagi ,  Naoto Kihara ,  Hiroshi Nishimura

发明人： Mamoru Nakasuji ,  Tohru Satake ,  Kenji Watanabe ,  Takeshi Murakami ,  Nobuharu Noji ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Toshifumi Kimba ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima ,  Toru Takagi ,  Naoto Kihara ,  Hiroshi Nishimura

IPC分类号： H01L21/66 ,  G01N23/00 ,  H01J37/153

CPC分类号： H01J37/185 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

摘要： The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.

摘要翻译： 本发明提供了一种用于评价样品表面的电子束装置，其具有用于用一次电子束照射样品的初级电光系统，检测系统和用于引导从二次电子束发射的二次电子束 通过将一次电子束照射到检测系统的样品表面。

公开(公告)号：US20070152657A1

公开(公告)日：2007-07-05

申请号：US10586990

申请日：2005-01-18

申请人： Toshikazu Yabe ,  Takeshi Murakami ,  Nariaki Aihara ,  Toshimi Takajo

发明人： Toshikazu Yabe ,  Takeshi Murakami ,  Nariaki Aihara ,  Toshimi Takajo

IPC分类号： G01P3/48

CPC分类号： F16C19/186 ,  F16C33/7879 ,  F16C41/007 ,  F16C2326/02 ,  F16J15/326 ,  G01P3/443 ,  G01P3/487

摘要： A magnet portion 27 of a magnetic encoder 26 includes a magnetic member and a resin, and a highly reliable magnetic encoder 26 having a high magnetic property and enabling to detect a rotational number with high accuracy, and a hub unit bearing 2a are provided. Further, the resin is preferably a thermoplastic resin and further preferably includes a thermoplastic resin including a soft segment in a molecule. Further, the magnetic encoder 26 further includes a fixed member 25 attached with the magnet portion 27 and comprising a magnetic material, and the magnet portion 27 and the fixed member 25 are bonded by an adhering agent including at least one of a phenolic resin based and an epoxy resin based.

摘要翻译： 磁性编码器26的磁体部分27包括磁性部件和树脂，以及具有高磁性能并且能够高精度地检测转速的高度可靠的磁性编码器26和轮毂单元轴承2a。 此外，树脂优选为热塑性树脂，并且还优选包括分子中包含软链段的热塑性树脂。 此外，磁编码器26还包括安装有磁体部分27并包括磁性材料的固定构件25，并且磁体部分27和固定构件25通过粘合剂粘合，所述粘合剂包括酚醛树脂基和 基于环氧树脂。

公开(公告)号：US07223973B2

公开(公告)日：2007-05-29

申请号：US11037084

申请日：2005-01-19

申请人： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

发明人： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

IPC分类号： G01N23/225

CPC分类号： H01J37/222 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/082 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L2224/48227 ,  H01L2924/01019 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01078 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/3025 ,  H01L2924/00

摘要： A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.