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    Charged particle microscope and measurement image correction method thereof
    84.
    发明授权
    Charged particle microscope and measurement image correction method thereof 有权
    带电粒子显微镜及其测量图像校正方法

    公开(公告)号：US08957959B2

    公开(公告)日：2015-02-17

    申请号：US13981326

    申请日：2011-11-02

    Applicant: Shuangqi Dong ,  Norio Sato ,  Susumu Koyama

    Inventor： Shuangqi Dong ,  Norio Sato ,  Susumu Koyama

    IPC: H01J37/26 ,  H04N5/217 ,  H01J37/22 ,  G21K7/00

    CPC classification number: H04N5/217 ,  H01J37/222 ,  H01J37/26 ,  H01J2237/153

    Abstract: A charged particle microscope corrects distortion in an image caused by effects of drift in the sampling stage by measuring the correction reference image in a shorter time than the observation image, making corrections by comparing the shape of the observation image with the shape of the correction reference image, and reducing distortion in the observation images. The reference image for distortion correction is measured at the same position and magnification as when acquiring images for observation. In order to reduce effects from drift, the reference image is at this time measured within a shorter time than the essential observation image. The shape of the observation image is corrected by comparing the shapes of the reference image and observation image, and correcting the shape of the observation image to match the reference image.

    Abstract translation: 带电粒子显微镜通过在比观察图像更短的时间内测量校正参考图像来校正由采样阶段的漂移效应引起的图像中的失真，通过将观察图像的形状与校正基准的形状进行比较来进行校正 图像，减少观察图像的失真。 与获取观察图像时相同的位置和倍率测量用于失真校正的参考图像。 为了减少漂移的影响，此时在比基本观察图像更短的时间内测量参考图像。 通过比较参考图像和观察图像的形状以及校正观察图像的形状以匹配参考图像来校正观察图像的形状。

    Scanning electron microscope and scanning transmission electron microscope
    85.
    发明授权
    Scanning electron microscope and scanning transmission electron microscope 有权
    扫描电子显微镜和扫描透射电子显微镜

    公开(公告)号：US08878130B2

    公开(公告)日：2014-11-04

    申请号：US14232526

    申请日：2012-07-19

    Applicant: Hiromi Inada ,  Kuniyasu Nakamura

    Inventor： Hiromi Inada ,  Kuniyasu Nakamura

    IPC: H01J37/26 ,  H01J37/28 ,  H01J37/244 ,  H01J37/153 ,  H01J37/21 ,  G01N23/22

    CPC classification number: H01J37/263 ,  G01N23/2206 ,  H01J37/153 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0455 ,  H01J2237/0492 ,  H01J2237/153 ,  H01J2237/1532 ,  H01J2237/21 ,  H01J2237/221 ,  H01J2237/225 ,  H01J2237/226 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2611 ,  H01J2237/2802

    Abstract: A scanning transmission electron microscope according to the present invention includes an electron lens system having a small spherical aberration coefficient for enabling three-dimensional observation of a 0.1 nm atomic size structure. The scanning transmission electron microscope according to the present invention also includes an aperture capable of changing an illumination angle; an illumination electron lens system capable of changing the probe size of an electron beam probe and the illumination angle; a secondary electron detector (9); a transmission electron detector (13); a forward scattered electron beam detector (12); a focusing unit (16); an image processor for identifying image contrast; an image processor for computing image sharpness; a processor for three-dimensional reconstruction of an image; and a mixer (18) for mixing a secondary electron signal and a specimen forward scattered electron signal.

    Abstract translation: 根据本发明的扫描透射电子显微镜包括具有小球面像差系数的电子透镜系统，用于实现0.1nm原子尺寸结构的三维观察。 根据本发明的扫描透射电子显微镜还包括能够改变照明角度的孔; 能够改变电子束探头的探头尺寸和照明角度的照明电子透镜系统; 二次电子检测器（9）; 透射电子检测器（13）; 前向散射电子束检测器（12）; 聚焦单元（16）; 用于识别图像对比度的图像处理器; 用于计算图像清晰度的图像处理器; 用于图像的三维重建的处理器; 以及用于混合二次电子信号和样本前向散射电子信号的混合器（18）。

    Electron microscope
    86.
    发明授权
    Electron microscope 有权
    电子显微镜

    公开(公告)号：US08742342B2

    公开(公告)日：2014-06-03

    申请号：US13505951

    申请日：2010-11-01

    Applicant: Nobuhiro Okai ,  Yasunari Sohda

    Inventor： Nobuhiro Okai ,  Yasunari Sohda

    IPC: H01J37/04 ,  H01J37/145 ,  H01J37/14

    CPC classification number: H01J37/04 ,  H01J37/026 ,  H01J37/14 ,  H01J37/145 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/0044 ,  H01J2237/121 ,  H01J2237/153

    Abstract: A scanning electron microscope suppresses a beam drift by reducing charging on a sample surface while suppressing resolution degradation upon observation of an insulator sample. An electron microscope includes an electron source and an objective lens that focuses an electron beam emitted from the electron source, which provides an image using a secondary signal generated from the sample irradiated with the electron beam. A magnetic body with a continuous structure and an inside diameter larger than an inside diameter of an upper pole piece that forms the objective lens is provided between the objective lens and the sample.

    Abstract translation: 扫描电子显微镜通过减少对样品表面的充电而抑制光束偏移，同时在观察绝缘体样品时抑制分辨率劣化。 电子显微镜包括电子源和物镜，其聚焦从电子源发射的电子束，其使用从照射电子束的样品产生的二次信号来提供图像。 在物镜和样品之间设置具有连续结构且内径大于形成物镜的上极片的内径的磁体。

    Electron Beam Apparatus
    87.
    发明申请
    Electron Beam Apparatus 有权
    电子束装置

    公开(公告)号：US20130146766A1

    公开(公告)日：2013-06-13

    申请号：US13817086

    申请日：2011-07-07

    Applicant: Takashi Ohshima ,  Michio Hatano ,  Hideo Morishita

    Inventor： Takashi Ohshima ,  Michio Hatano ,  Hideo Morishita

    IPC: H01J37/26

    CPC classification number: H01J37/261 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/153 ,  H01J2237/202 ,  H01J2237/20207 ,  H01J2237/20221

    Abstract: The present invention provides an electron beam apparatus comprising a means for visualizing an axial displacement of a retarding electric field, and a means for adjusting axial displacement. The axial displacement visualizing means includes a reflective plate (6), and an optical system (2,3) for converging a secondary electron beam (9) on the reflective plate (6), and the axial displacement adjusting means includes an incline rotation mechanism (8) for a sample stage (5). With this configuration, in electron beam apparatuses such as SEM and the like, such problems as visual field displacement caused by displacement of the axial symmetry of the electric field between an objective lens (3) and a sample (4) and inability to measure secondary electrons and reflected electrons that provide desired information can be eliminated.

    Abstract translation: 本发明提供了一种电子束装置，包括用于使延迟电场的轴向位移可视化的装置和用于调节轴向位移的装置。 轴向位移可视化装置包括反射板（6）和用于会聚反射板（6）上的二次电子束（9）的光学系统（2,3），并且轴向位移调节装置包括倾斜旋转机构 （8）用于样品台（5）。 利用这种结构，在诸如SEM等的电子束装置中，存在由物镜（3）和样品（4）之间的电场的轴对称位移引起的视野位移的问题，并且不能测量次级 可以消除提供所需信息的电子和反射电子。

    Method and apparatus for reducing substrate edge effect during inspection
    89.
    发明授权
    Method and apparatus for reducing substrate edge effect during inspection 有权
    在检查过程中降低基板边缘效应的方法和装置

    公开(公告)号：US08294094B1

    公开(公告)日：2012-10-23

    申请号：US13211206

    申请日：2011-08-16

    Applicant: Yan Zhao ,  Jack Jau ,  Yi-Xiang Wang

    Inventor： Yan Zhao ,  Jack Jau ,  Yi-Xiang Wang

    IPC: G01N23/00 ,  G21K7/00

    CPC classification number: G01N23/225 ,  G01N2223/611 ,  H01J2237/0048 ,  H01J2237/153 ,  H01J2237/2817

    Abstract: An apparatus and method are introduced in this invention to reduce the edge effect of a substrate that causes image variation or distortion due to applied substrate bias. An edge plate with an edge effect eliminator are provided such that substrate is inspected by a charged particle beam can capture images without distortion at substrate edge.

    Abstract translation: 在本发明中引入了一种装置和方法，以减少由于所施加的衬底偏压导致图像变化或失真的衬底的边缘效应。 提供具有边缘效应消除器的边缘板，使得通过带电粒子束检查基板可以在基板边缘处捕获图像而不失真。

    Apparatus and method for ion beam implantation using scanning and spot beams
    90.
    发明授权
    Apparatus and method for ion beam implantation using scanning and spot beams 有权
    使用扫描和点光束进行离子束注入的装置和方法

    公开(公告)号：US08044375B2

    公开(公告)日：2011-10-25

    申请号：US12661480

    申请日：2010-03-18

    Applicant: Jiong Chen

    Inventor： Jiong Chen

    IPC: H01J37/317

    CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/1475 ,  H01J2237/153 ,  H01J2237/166 ,  H01J2237/24528 ,  H01J2237/24542 ,  H01J2237/30433 ,  H01J2237/30483

    Abstract: An ion implantation apparatus with multiple operating modes is disclosed. The ion implantation apparatus has an ion source and an ion extraction means for forming a converging beam on AMU-non-dispersive plane therefrom. The ion implantation apparatus includes magnetic scanner prior to a magnetic analyzer for scanning the beam on the non-dispersive plane, the magnetic analyzer for selecting ions with specific mass-to-charge ratio to pass through a mass slit to project onto a substrate. A rectangular quadruple magnet is provided to collimate the scanned ion beam and fine corrections of the beam incident angles onto a target. A deceleration or acceleration system incorporating energy filtering is at downstream of the beam collimator. A two-dimensional mechanical scanning system for scanning the target is disclosed, in which a beam diagnostic means is build in.

    Abstract translation: 公开了一种具有多种工作模式的离子注入装置。 离子注入装置具有离子源和用于在其AMU非分散平面上形成会聚束的离子提取装置。 离子注入装置包括在用于扫描非分散平面上的束的磁分析仪之前的磁扫描器，用于选择具有特定质荷比的离子的磁分析器通过质量狭缝以投射到基底上。 提供矩形四极磁体以准直扫描的离子束并将光束入射角精细校正到目标上。 结合能量过滤的减速或加速系统位于射束准直仪的下游。 公开了一种用于扫描目标的二维机械扫描系统，其中构建了光束诊断装置。

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