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    Generation of combinatorial patterns by deliberate tilting of a polymer-pen array
    2.
    发明授权
    Generation of combinatorial patterns by deliberate tilting of a polymer-pen array 有权
    通过聚合物笔阵列的有意倾斜来产生组合图案

    公开(公告)号：US08753813B2

    公开(公告)日：2014-06-17

    申请号：US13513618

    申请日：2010-12-02

    申请人： Chad A. Mirkin ,  Adam B. Braunschweig ,  Jinan Chai ,  Dan J. Eichelsdoerfer ,  Louise R. Giam ,  Xing Liao ,  Lu Shin Wong

    发明人： Chad A. Mirkin ,  Adam B. Braunschweig ,  Jinan Chai ,  Dan J. Eichelsdoerfer ,  Louise R. Giam ,  Xing Liao ,  Lu Shin Wong

    IPC分类号： C12Q1/68 ,  C12M1/00 ,  C12M1/34 ,  C12M3/00 ,  B05D3/00

    CPC分类号： G03F7/0002 ,  B01J2219/00387 ,  B82Y10/00 ,  B82Y40/00

    摘要： The disclosure relates to a method of forming a pattern having pattern elements with a plurality of sizes on a substrate surface with a tilted pen array that includes choosing a tilt geometry for a pen array with respect to a substrate, inducing the tilt geometry between the pen array and the substrate surface, and forming a pattern having pattern elements on the substrate surface with the titled pen array, whereby the size of the formed pattern elements varies across the substrate surface along the tilted axis or axes. For example, the tilt geometry is in reference to the substrate surface and comprises a first angle with respect to a first axis of the substrate and a second angle with respect to a second axis of the substrate, the second axis being perpendicular to the first axis, and at least one of the first and second angles being non-zero.

    摘要翻译： 本公开涉及一种在衬底表面上形成具有多个尺寸的图案元件的图案的方法，该倾斜笔阵列包括相对于衬底选择笔阵列的倾斜几何形状，从而引起笔之间的倾斜几何形状 阵列和衬底表面，并且用标称笔阵列在衬底表面上形成具有图形元素的图案，由此形成的图案元素的尺寸沿着倾斜的轴线或轴线跨越衬底表面变化。 例如，倾斜几何形状参考衬底表面并且包括相对于衬底的第一轴线的第一角度和相对于衬底的第二轴线的第二角度，第二轴线垂直于第一轴线 并且第一和第二角度中的至少一个是非零。

    OLIGONUCLEOTIDE SPECIFIC UPTAKE OF NANOCONJUGATES
    3.
    发明申请
    OLIGONUCLEOTIDE SPECIFIC UPTAKE OF NANOCONJUGATES 审中-公开
    纳米结构的寡糖特异性获取

    公开(公告)号：US20130178610A1

    公开(公告)日：2013-07-11

    申请号：US13518443

    申请日：2010-12-23

    申请人： Chad A. Mirkin ,  David A. Giljohann

    发明人： Chad A. Mirkin ,  David A. Giljohann

    IPC分类号： C07H21/00 ,  C07H1/00

    CPC分类号： C12N15/113 ,  A61K47/6923 ,  B82Y5/00 ,  C07H1/00 ,  C07H21/00 ,  C12N2310/11 ,  C12N2310/351

    摘要： The present invention concerns nanoparticles functionalized with an oligonucleotide and a domain for a variety of uses, including but not limited to gene regulation. More specifically, the disclosure provides a nanoparticle that is taken up by a cell at an efficiency different than a nanoparticle functionalized with the same oligonucleotide but does not contain a domain.

    摘要翻译： 本发明涉及用寡核苷酸和用于各种用途的结构域功能化的纳米颗粒，包括但不限于基因调控。 更具体地，本公开提供了纳米颗粒，其以不同于用相同寡核苷酸官能化但不含结构域的纳米颗粒的效率与细胞一起吸收。

    Methods utilizing scanning probe microscope tips and products thereof or produced thereby
    9.
    发明授权
    Methods utilizing scanning probe microscope tips and products thereof or produced thereby 有权
    使用扫描探针显微镜尖端及其产品或由其制造的方法

    公开(公告)号：US08187673B2

    公开(公告)日：2012-05-29

    申请号：US11933251

    申请日：2007-10-31

    申请人： Chad A. Mirkin ,  Richard Piner ,  Seunghun Hong

    发明人： Chad A. Mirkin ,  Richard Piner ,  Seunghun Hong

    IPC分类号： B05D3/00

    CPC分类号： B82B3/00 ,  B05D1/007 ,  B05D1/185 ,  B05D1/26 ,  G01Q80/00 ,  G03F7/0002 ,  G03F7/165 ,  Y10S977/849 ,  Y10S977/853 ,  Y10S977/854 ,  Y10S977/855 ,  Y10S977/856 ,  Y10S977/857 ,  Y10S977/86 ,  Y10S977/88 ,  Y10S977/884 ,  Y10S977/885 ,  Y10S977/886 ,  Y10S977/895 ,  Y10T428/24802

    摘要： The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). DPN utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substrate as “ink.” Capillary transport of molecules from the SPM tip to the solid substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN, including submicrometer combinatorial arrays, and kits, devices and software for performing DPN. The invention further provides a method of performing AFM imaging in air. The method comprises coating an AFM tip with a hydrophobic compound, the hydrophobic compound being selected so that AFM imaging performed using the coated AFM tip is improved compared to AFM imaging performed using an uncoated AFM tip. Finally, the invention provides AFM tips coated with the hydrophobic compounds.

    摘要翻译： 本发明提供了称为“浸笔”纳米光刻（DPN）的光刻方法。 DPN使用扫描探针显微镜（SPM）尖端（例如，原子力显微镜（AFM）尖端）作为“笔”，固态基底（例如，金）作为“纸”，并且具有化学亲和力的分子 固体底物作为“墨水”。DPN中使用分子从SPM尖端到固体基质的毛细管转运，以直接写入由亚微米尺寸的相对小的分子集合组成的图案，使得DPN可用于制造 各种微米级和纳米级器件。 本发明还提供由DPN图案化的衬底，包括亚微米组合阵列，以及用于执行DPN的试剂盒，装置和软件。 本发明还提供了一种在空气中进行AFM成像的方法。 该方法包括用疏水性化合物涂覆AFM尖端，选择疏水性化合物，使得与使用未涂覆的AFM尖端进行的AFM成像相比，使用涂覆的AFM尖端进行的AFM成像得到改善。 最后，本发明提供涂覆有疏水化合物的AFM尖端。

    Beam Pen Lithography
    10.
    发明申请
    Beam Pen Lithography 有权
    光笔平版印刷

    公开(公告)号：US20110305996A1

    公开(公告)日：2011-12-15

    申请号：US13202142

    申请日：2010-02-18

    申请人： Chad A. Mirkin ,  Gengfeng Zheng ,  Fengwei Huo

    发明人： Chad A. Mirkin ,  Gengfeng Zheng ,  Fengwei Huo

    IPC分类号： G03F7/20 ,  B05D3/12 ,  G03F7/26 ,  G01N21/01 ,  G01Q70/06

    CPC分类号： G03F7/2051 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70466 ,  G03F7/70525 ,  G03F7/70958

    摘要： The disclosure relates to methods of beam pen lithography using a tip array having a plurality of transparent, elastomeric, reversibly-deformable tips coated with a blocking layer and apertures defined in the blocking layer to expose tip ends of the tips in the array. The tip array can be used to perform a photolithography process in which the tips are illuminated with a radiation that is channeled through the tips and out the apertures to expose a photosensitive substrate. Also disclosed are tip arrays formed of polymers and gels, apparatus including the tip arrays and radiation sources, and related apparatus for selectively masking tips in the tip array from radiation emitted from the radiation source.

    摘要翻译： 本公开涉及使用具有多个透明，弹性，可逆变形的尖端的尖端阵列的光笔笔光刻方法，所述尖端涂覆有阻挡层和限定在阻挡层中的孔，以暴露阵列中尖端的尖端。 尖端阵列可以用于执行光刻工艺，其中尖端被通过尖端引导的辐射照射并且出射孔以暴露感光基底。 还公开了由聚合物和凝胶形成的尖端阵列，包括尖端阵列和辐射源的装置以及用于从辐射源发射的辐射中选择性地遮蔽尖端阵列中的尖端的相关装置。