公开(公告)号：US08835844B2

公开(公告)日：2014-09-16

申请号：US12710679

申请日：2010-02-23

申请人： Makoto Ezumi ,  Yoichi Ose ,  Akira Ikegami ,  Hideo Todokoro ,  Tatsuaki Ishijima ,  Takahiro Sato ,  Ritsuo Fukaya ,  Kazunari Asao

发明人： Makoto Ezumi ,  Yoichi Ose ,  Akira Ikegami ,  Hideo Todokoro ,  Tatsuaki Ishijima ,  Takahiro Sato ,  Ritsuo Fukaya ,  Kazunari Asao

IPC分类号： G01N23/04 ,  G01N23/225 ,  H01J37/28 ,  H01J37/244 ,  H01J37/21 ,  H01J37/26

CPC分类号： H01J37/265 ,  G01N23/2251 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0041 ,  H01J2237/216 ,  H01J2237/244 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/2594 ,  H01J2237/2817

摘要： The present invention has the object of providing charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.

摘要翻译： 本发明的目的是提供一种理想的减少带电粒子束装置中的聚焦偏移，放大波动和测量长度误差的带电粒子束照射方法。 为了实现这些目的，在本发明中公开了一种用于在由装载机构加载的情况下用静电静电计测量样品上的电位分布的方法。 公开了另一种测量样品上特定点的局部电荷的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。 公开了另一种用于基于通过测量至少两个带电粒子光学条件下的指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法，然后使用带电粒子束来测量测量尺寸的波动 由于在指定位置处的静电电荷的波动而发生。

公开(公告)号：US08604430B2

公开(公告)日：2013-12-10

申请号：US13366874

申请日：2012-02-06

申请人： Yuko Iwabuchi ,  Hideo Todokoro ,  Hiroyoshi Mori ,  Mitsugu Sato ,  Yasutsugu Usami ,  Mikio Ichihashi ,  Satoru Fukuhara ,  Hiroyuki Shinada ,  Yutaka Kaneko ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Hiroshi Toyama

发明人： Yuko Iwabuchi ,  Hideo Todokoro ,  Hiroyoshi Mori ,  Mitsugu Sato ,  Yasutsugu Usami ,  Mikio Ichihashi ,  Satoru Fukuhara ,  Hiroyuki Shinada ,  Yutaka Kaneko ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Hiroshi Toyama

IPC分类号： H01J37/28

CPC分类号： H01J37/28 ,  G01N23/20 ,  G01N23/2251 ,  G03F7/7065 ,  G06T7/001 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01J37/04 ,  H01J37/20 ,  H01J37/265 ,  H01J2237/04756 ,  H01J2237/20221 ,  H01J2237/2444 ,  H01J2237/24592 ,  H01J2237/2817 ,  H01J2237/31766

摘要： The inspection apparatus disclosed generates an electron beam, an acceleration electrode accelerates the electron beam, a convergence lens converges the electron beam, an electron beam deflector scans the beam over a sample, an objective lens converges the electron beam on the sample, a detector located between the sample and the objective lens detects charged particles emitted from the sample, a power supply applies a retarding voltage to the sample for decelerating the electron beam to the sample, an electrode is disposed between the objective lens and the sample, and a voltage is generated between the sample and the electrode by said electrode, the voltage being determined depending on the sample. The apparatus solves problems encountered in conventional inspection systems.

摘要翻译： 所公开的检查装置产生电子束，加速电极加速电子束，会聚透镜会聚电子束，电子束偏转器扫描样品上的光束，物镜会将电子束会聚在样品上，检测器位于 在样品和物镜之间检测从样品发射的带电粒子，电源向样品施加延迟电压以将电子束减速到样品，电极设置在物镜和样品之间，电压为 通过所述电极在样品和电极之间产生，电压根据样品确定。 该装置解决了常规检测系统遇到的问题。

公开(公告)号：US07977632B2

公开(公告)日：2011-07-12

申请号：US12253476

申请日：2008-10-17

申请人： Hideo Todokoro ,  Makoto Ezumi ,  Yasutsugu Usami

发明人： Hideo Todokoro ,  Makoto Ezumi ,  Yasutsugu Usami

IPC分类号： G21K7/00

CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J2237/0045 ,  H01J2237/0048 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/281 ,  H01J2237/31701

摘要： To make it possible to observe the bottom of a contact hole and internal wires, in observation of the contact hole 102, by scanning it at a predetermined acceleration voltage, the positive charge 106 is formed on the surface of the insulator 101, and the secondary electrons 104 are attracted in the hole by this electric field, and the hole is continuously scanned at an acceleration voltage different from the acceleration voltage, and the sample is observed. When the wires embedded in the insulator are to be observed, by observing the insulator at a predetermined acceleration voltage, an electron beam is allowed to enter the sample, and the sample is continuously scanned at an acceleration voltage different from the acceleration voltage, and hence the existence of wires is reflected as a change in the charge of the surface, and it is observed. In either case, the acceleration voltage before observation is different from the one during observation, and the sample surface is temporarily radiated at an acceleration voltage positively generating a positive or negative charge, and thereafter, the acceleration voltage is returned to a one suited to observation, and the sample is observed.

摘要翻译： 为了可以观察接触孔和内部电线的底部，在观察接触孔102时，通过以预定的加速电压扫描，正电荷106形成在绝缘体101的表面上，次级 电子104通过该电场被吸引在孔中，并且以与加速电压不同的加速电压连续地扫描孔，并且观察样品。 当要观察嵌入在绝缘体中的电线时，通过以预定的加速电压观察绝缘体，允许电子束进入样品，并且以不同于加速电压的加速电压连续扫描样品，因此 电线的存在被反映为表面电荷的变化，并且被观察。 在任一种情况下，观察前的加速电压与观察期间的加速电压不同，并且以正向或正负电荷的正电荷的加速电压暂时照射样品表面，然后将加速电压恢复为适合于观察的加速电压 ，并观察样品。

公开(公告)号：US07838827B2

公开(公告)日：2010-11-23

申请号：US11987018

申请日：2007-11-26

申请人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

发明人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

IPC分类号： H01J37/05

CPC分类号： H01J37/05 ,  H01J37/153 ,  H01J37/28

摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

摘要翻译： 本发明提供一种扫描电子显微镜，该扫描电子显微镜由能够高分辨率，单色化能量和降低色差的单色仪组成，而不会显着降低一次电子束的电流强度。 扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场，以聚焦电子束，然后通过狭缝限制能量宽度，并且安装相同形状的另一对扇形磁场和电场 在与包含狭缝的表面形成对称镜的位置处。 该结构用于抵消物点和对称镜位置的能量分散，并通过会聚透镜系统空间收缩点聚光点光束，提高扫描电子显微镜的图像分辨率。

公开(公告)号：US07800059B2

公开(公告)日：2010-09-21

申请号：US12073359

申请日：2008-03-04

申请人： Mitsugu Sato ,  Atsushi Takane ,  Takashi Iizumi ,  Tadashi Otaka ,  Hideo Todokoro ,  Satoru Yamaguchi ,  Kazutaka Nimura

发明人： Mitsugu Sato ,  Atsushi Takane ,  Takashi Iizumi ,  Tadashi Otaka ,  Hideo Todokoro ,  Satoru Yamaguchi ,  Kazutaka Nimura

IPC分类号： G01N23/22 ,  H01J37/26 ,  H01J37/28 ,  G21K7/00

CPC分类号： G01N23/22 ,  H01J37/222 ,  H01J37/28

摘要： An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed.In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.

摘要翻译： 本发明的目的是提供一种在抑制由于带电粒子束的照射引起的充电的影响被抑制的情况下，能够高精度地实现视区域位移的抑制的样本图像形成方法和带电粒子束装置 。 为了实现上述目的，本发明提供一种通过在样品上扫描带电粒子束并基于从样品发射的二次信号形成图像来形成样品图像的方法，该方法包括以下步骤：形成多个 通过叠加通过多个扫描时间获得的多个图像的合成图像; 以及通过校正多个合成图像之间的位置偏移并叠加多个合成图像来形成另一个合成图像，以及用于实现上述方法的带电粒子束装置。

公开(公告)号：US07700918B2

公开(公告)日：2010-04-20

申请号：US12076355

申请日：2008-03-17

申请人： Makoto Ezumi ,  Yoichi Ose ,  Akira Ikegami ,  Hideo Todokoro ,  Tatsuaki Ishijima ,  Takahiro Sato ,  Ritsuo Fukaya ,  Kazunari Asao

发明人： Makoto Ezumi ,  Yoichi Ose ,  Akira Ikegami ,  Hideo Todokoro ,  Tatsuaki Ishijima ,  Takahiro Sato ,  Ritsuo Fukaya ,  Kazunari Asao

IPC分类号： G01N23/00 ,  H01J37/28 ,  G01R19/00

CPC分类号： H01J37/265 ,  G01N23/2251 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0041 ,  H01J2237/216 ,  H01J2237/244 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/2594 ,  H01J2237/2817

摘要： The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.

摘要翻译： 本发明的目的是提供一种理想的用于减少带电粒子束装置中的聚焦偏移，放大波动和测量长度误差的带电粒子束照射方法。 为了实现这些目的，在本发明中公开了一种用于在由装载机构加载的情况下用静电静电计测量样品上的电位分布的方法。 公开了另一种测量样品上特定点的局部电荷的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。 公开了另一种用于基于通过测量至少两个带电粒子光学条件下的指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法，然后使用带电粒子束来测量测量尺寸的波动 由于在指定位置处的静电电荷的波动而发生。

公开(公告)号：US20080265161A1

公开(公告)日：2008-10-30

申请号：US12144060

申请日：2008-06-23

申请人： Hisaya Murakoshi ,  Masaki Hasegawa ,  Hideo Todokoro

发明人： Hisaya Murakoshi ,  Masaki Hasegawa ,  Hideo Todokoro

IPC分类号： G21K7/00

CPC分类号： H01J37/29 ,  H01J37/147 ,  H01J2237/1508 ,  H01J2237/2538 ,  H01J2237/28

摘要： An electron microscope includes an electron source, a stage for mounting a specimen, an illuminating lens system that illuminates an electron beam onto the specimen, an imaging lens system that forms a specimen image using a reflecting electron beam of the illuminating electron beam, a beam separator that separates the illuminating electron beam and the reflecting electron beam, a control unit that controls current to be supplied to the beam separator; and a switching unit which enables switching between a first mode and a second mode. The control unit changes a value of the current to be supplied to the beam separator when switching from the first mode to the second mode.

摘要翻译： 电子显微镜包括电子源，用于安装样本的台，将样品照射电子束的照明透镜系统，使用照射电子束的反射电子束形成标本图像的成像透镜系统，光束 分离器，其分离照明电子束和反射电子束;控制单元，其控制供给到光束分离器的电流; 以及能够在第一模式和第二模式之间切换的切换单元。 当从第一模式切换到第二模式时，控制单元改变要提供给分束器的电流的值。

公开(公告)号：US07411190B2

公开(公告)日：2008-08-12

申请号：US11450459

申请日：2006-06-12

申请人： Hiroshi Makino ,  Hisaya Murakoshi ,  Hiroyuki Shinada ,  Hideo Todokoro

发明人： Hiroshi Makino ,  Hisaya Murakoshi ,  Hiroyuki Shinada ,  Hideo Todokoro

IPC分类号： H01J37/301

CPC分类号： H01J37/292 ,  G01N23/04 ,  H01J2237/2817

摘要： An inspection apparatus comprising an electron emitting unit for sequentially emitting an electron beam in the direction of an inspection area of a sample; a deceleration unit for drawing back the electron beam in the vicinity of the inspection area; an imaging unit for forming images of the drawing back electron beam on multiple different image forming conditions; an image detecting unit for capturing the electron beam that formed an image corresponding to each image forming condition; and an image processing unit for comparing the images on different image forming conditions with one another to detect a defect in the inspection area.

摘要翻译： 一种检查装置，包括：电子发射单元，用于沿试样的检查区域的方向依次发射电子束; 减速单元，用于在检查区域附近拉回电子束; 用于在多个不同的图像形成条件下形成背面电子束的图像的成像单元; 图像检测单元，用于捕获形成与每个图像形成条件相对应的图像的电子束; 以及图像处理单元，用于将不同图像形成条件上的图像彼此进行比较，以检测检查区域中的缺陷。

公开(公告)号：US07385196B2

公开(公告)日：2008-06-10

申请号：US10911480

申请日：2004-08-05

申请人： Goroku Shimoma ,  Tadashi Otaka ,  Mitsugu Sato ,  Hideo Todokoro ,  Shunichi Watanabe ,  Tadanori Takahashi ,  Masahiro Kawawa ,  Masanori Gunji ,  Terumichi Nishino

发明人： Goroku Shimoma ,  Tadashi Otaka ,  Mitsugu Sato ,  Hideo Todokoro ,  Shunichi Watanabe ,  Tadanori Takahashi ,  Masahiro Kawawa ,  Masanori Gunji ,  Terumichi Nishino

IPC分类号： H01J37/28

CPC分类号： H01J37/28 ,  H01J2237/2814

摘要： A width-measurement method of reducing or eliminating an error in measurement of a width of an object on a sample resulting from the dimension of the beam diameter, wherein a width-measured value of the object to be width-measured which has been obtained on the basis of a secondary signal obtained from secondary particles emitted from the sample having thereon the object to be width-measured is corrected with a value with respect to a dimension value of a beam diameter.

摘要翻译： 一种宽度测量方法，用于减少或消除由光束直径尺寸导致的样品宽度测量误差，其中宽度测量对象的宽度测量值已经在 从其上具有待宽度测量对象的样品发射的二次粒子获得的二次信号的基础用相对于束直径的尺寸值的值进行校正。

公开(公告)号：US07375323B2

公开(公告)日：2008-05-20

申请号：US11655946

申请日：2007-01-22

申请人： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

发明人： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

IPC分类号： G21K1/08 ,  H01J3/14

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1501 ,  H01J2237/1534 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/31793

摘要： An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

摘要翻译： 提供具有使用多极透镜的像差校正器的电子束装置。 电子束装置具有能够进行像差校正器的操作的扫描模式和用于禁止像差校正器的操作的扫描模式，并且每个像差校正器，聚光透镜等的操作被控制，使得 物镜的物体在任一种扫描模式下都不会改变。 如果在两种模式中的样本的二次电子图像之间进行比较，则图像缩放因子和焦点保持不变，并且可以通过清楚地仅识别像差校正器的效果来进行评估和调整。 这减少了由于像差校正器固有的轴向对准缺陷而长时间调整光轴所需的时间以及像差校正器之外的不同于彼此混合的部分的轴向对准缺陷所需的时间。