Slurries of abrasive inorganic oxide particles and method for adjusting the abrasiveness of the particles

    公开(公告)号:US06365522B1

    公开(公告)日:2002-04-02

    申请号:US09703403

    申请日:2000-11-01

    Inventor: James Neil Pryor

    Abstract: Autoclaving slurries of porous, inorganic oxide particles results in an increased abrasiveness of the particles as reflected in increased removal rates of a polished substrate at standard polishing conditions in chemical mechanical polishing operations. Slurries having novel abrasion properties, especially for silica-based slurries, are created. The increase in particle abrasivity strongly correlates with a decrease in particle surface area as determined by N2 adsorption (BET method). As a result, methods for obtaining a desired abrasivity for a slurry can be practiced by heating a slurry of inorganic oxide particles to a BET surface area previously identified as associated with the abrasivity desired. The resulting slurries can be used in conventional polishing machinery. The method is particularly suitable for preparing silica-based abrasive slurries.

    Slurries of abrasive inorganic oxide particles and method for adjusting the abrasiveness of the particles
    3.
    发明授权
    Slurries of abrasive inorganic oxide particles and method for adjusting the abrasiveness of the particles 失效
    研磨无机氧化物颗粒的浆料和调整颗粒磨损性的方法

    公开(公告)号:US06294106B1

    公开(公告)日:2001-09-25

    申请号:US09422384

    申请日:1999-10-21

    Inventor: James Neil Pryor

    Abstract: Autoclaving slurries of porous, inorganic oxide particles results in an increased abrasiveness of the particles as reflected in increased removal rates of a polished substrate at standard polishing conditions in chemical mechanical polishing operations. Slurries having novel abrasion properties, especially for silica-based slurries, are created. The increase in particle abrasivity strongly correlates with a decrease in particle surface area as determined by N2 adsorption (BET method). As a result, methods for obtaining a desired abrasivity for a slurry can be practiced by heating a slurry of inorganic oxide particles to a BET surface area previously identified as associated with the abrasivity desired. The resulting slurries can be used in conventional polishing machinery. The method is particularly suitable for preparing silica-based abrasive slurries.

    Abstract translation: 多孔,无机氧化物颗粒的高压灭菌浆料导致颗粒的磨损性增加,这反映在化学机械抛光操作中在标准抛光条件下抛光衬底的去除速率增加。 产生具有新颖磨损性能的浆料,特别是用于二氧化硅基浆料的浆料。 颗粒磨损的增加与通过N 2吸附(BET法)测定的颗粒表面积的降低密切相关。 结果,可以通过将无机氧化物颗粒的浆料加热到预先确定为与所需磨损度相关联的BET表面积来实现用于获得浆料所需的磨损性的方法。 所得到的浆料可用于常规抛光机械。 该方法特别适用于制备二氧化硅基磨料浆料。

    Desiccation using polymer-bound desiccant beads
    4.
    发明授权
    Desiccation using polymer-bound desiccant beads 失效
    使用聚合物键合的干燥剂珠的干燥

    公开(公告)号:US5879764A

    公开(公告)日:1999-03-09

    申请号:US746043

    申请日:1996-11-06

    CPC classification number: B01D53/28 B01J20/183 E06B3/677

    Abstract: Polymer-bound adsorbent beads are usable as a direct replacement for conventional clay-bound beads in insulating glass unit manufacture to eliminate the problem of dusting associated with conventional beads. Polymer-bound beads provide good adsorption and superior crush strength compared to clay-bound adsorbent beads previously used in insulating glass units to desiccate the space between the glass panes. The polymer-bound adsorbent beads may also be used as a substitute for conventional desiccant beads in water adsorption applications such as in bottle stoppers, sachets, blister packaging, etc.

    Abstract translation: 聚合物结合的吸附剂珠可用作绝缘玻璃单元制造中常规粘土结合珠粒的直接替代物,以消除与常规珠粒相关的除尘问题。 聚合物结合的珠子与先前用于中空玻璃单元的粘土结合吸附剂珠相比,提供良好的吸附性和优异的抗压强度,以干燥玻璃板之间的空间。 聚合物结合的吸附剂珠也可以用作水吸附应用中常规干燥剂珠粒的替代物,例如瓶塞,小袋,吸塑包装等。

    Method for adsorbing substances using silica adsorbent on magnetic substrate
    6.
    发明授权
    Method for adsorbing substances using silica adsorbent on magnetic substrate 有权
    使用二氧化硅吸附剂在磁性基材上吸附物质的方法

    公开(公告)号:US06607667B2

    公开(公告)日:2003-08-19

    申请号:US10234741

    申请日:2002-09-04

    Abstract: Method for Absorbing substances wherein adsorbent particles comprising superparamagnetic and/or low Curie Temperature transition metal-containing cores surrounded by a hydrous siliceous oxide coating can be formed by an aqueous process wherein the core is precipitated from an aqueous solution and a siliceous oxide coating is deposited thereon while complete drying of the core is avoided until after the siliceous oxide is deposited. The resulting siliceous adsorbents exhibit strong superparamagnetic and/or low Curie temperature magnetic properties with low transition metal leachability.

    Abstract translation: 吸收物质的方法,其中包含由含水硅酸氧化物涂层包围的超顺磁性和/或低居里温度过渡金属的芯的吸附剂颗粒可以通过水溶液方法形成,其中芯从水溶液中沉淀并沉积氧化硅膜 直到氧化硅沉积之后避免芯完全干燥。 所得到的硅质吸附剂表现出强的超顺磁性和/或低居里温度磁性,具有低的过渡金属浸出性。

    Slurries of abrasive inorganic oxide particles and method for polishing copper containing surfaces
    7.
    发明授权
    Slurries of abrasive inorganic oxide particles and method for polishing copper containing surfaces 失效
    研磨无机氧化物颗粒的浆料和用于抛光含铜表面的方法

    公开(公告)号:US06447693B1

    公开(公告)日:2002-09-10

    申请号:US09551935

    申请日:2000-04-20

    Inventor: James Neil Pryor

    Abstract: Oxidizing agents are added to slurries of inorganic oxides which have been heated, e.g., autoclaved, to produce abrasive slurries which impart relatively equal polishing rates for conductive metal and insulating layers used to make semiconductor chips. A relatively flexible abrasive slurry in terms of its abrasivity is also provided by this slurry, thereby permitting the modification of a copper polishing slurry's abrasivity when a new insulating material is used to make a chip. When using this method, an increase in particle abrasivity of this slurry can be correlated with a decrease in particle surface area as determined by N2 adsorption (BET method) and abrasivity can be increased (or decreased) by heating the slurry to produce particles with a surface area determined to have the abrasivity desired. The method is particularly suitable for preparing silica-based abrasive slurries and the slurries prepared are particularly useful for polishing chips made with copper conductive circuits and silica-based insulating layers.

    Abstract translation: 将氧化剂加入到已经被加热,例如高压灭菌的无机氧化物的浆料中,以产生对用于制造半导体芯片的导电金属和绝缘层赋予相对相等抛光速率的磨料浆料。 在这种浆料中也提供了相对柔性的磨料浆料,因此当使用新的绝缘材料制成芯片时,可以改变铜抛光浆料的磨损性。 当使用这种方法时,这种浆料的颗粒磨蚀性的增加可以与通过N 2吸附(BET法)测定的颗粒表面积的减小相关联,并且通过加热浆料以产生颗粒,可以增加(或减少)磨损度 确定表面积具有所需的磨损性。 该方法特别适用于制备二氧化硅基磨料浆料,所制备的浆液特别适用于用铜导电电路和二氧化硅基绝缘层制成的抛光芯片。

    Abrasive Particles for Chemical Mechanical Polishing
    9.
    发明申请
    Abrasive Particles for Chemical Mechanical Polishing 审中-公开
    化学机械抛光用磨料颗粒

    公开(公告)号:US20150114928A1

    公开(公告)日:2015-04-30

    申请号:US14067605

    申请日:2013-10-30

    Abstract: An abrasive composition for polishing substrates including a plurality of abrasive particles having a poly-dispersed particle size distribution with median particle size, by volume, being about 20 nanometers to about 100 nanometers; a span value, by volume, being greater than or equal to about 15 nanometers, wherein the fraction of particles greater than about 100 nanometers is less than or equal to about 20% by volume of the abrasive particles.

    Abstract translation: 一种用于抛光基材的磨料组合物,其包括多个具有中等颗粒尺寸(体积)的多分散粒度分布的磨料颗粒为约20纳米至约100纳米; 跨度值(体积)大于或等于约15纳米,其中大于约100纳米的颗粒分数小于或等于磨料颗粒的约20体积%。

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