Non-cyanide electroless gold plating solution and process for electroless gold plating
    5.
    发明申请
    Non-cyanide electroless gold plating solution and process for electroless gold plating 失效
    非氰化物镀金镀液及无电镀金工艺

    公开(公告)号:US20060062927A1

    公开(公告)日:2006-03-23

    申请号:US11226132

    申请日:2005-09-14

    CPC classification number: C23C18/54 H05K3/244

    Abstract: The present invention provides a non-cyanide electroless gold plating solution free from a cyanide compound, comprising, as a completing agent of gold, a compound represented by the formula shown below or a salt thereof: X—(CH2)n—SH wherein n is 2 or 3 and X is SO3H or NH2, and having a pH value of 7 or less. The invention also provides a process for electroless gold plating using the non-cyanide electroless gold plating solution.

    Abstract translation: 本发明提供一种不含氰化物的非氰化物无电镀金液,其包含作为金完成剂的由下述式表示的化合物或其盐

    Antilock brake device
    6.
    发明授权
    Antilock brake device 失效
    防抱死制动装置

    公开(公告)号:US5884987A

    公开(公告)日:1999-03-23

    申请号:US678103

    申请日:1996-07-11

    CPC classification number: G05D17/02 B60T8/17616 B60T8/17636

    Abstract: In an antilock brake device, a determining function of which the sign varies when a wheel slip ratio is identical to a target value, and a switching function comprising an integral term which is a time integral of the determining function, are set, and a brake torque target value is determined so that it is proportional to the switching function. Alternatively, the brake torque target value computed according to the determining function is corrected according to a wheel angular acceleration. In this way, a brake torque or the wheel slip ratio between a road surface and tires is precisely controlled.

    Abstract translation: 在防抱死制动装置中,设定当车轮滑移比与目标值相同时符号变化的确定功能,以及包括作为确定功能的时间积分的积分项的切换功能,并且制动器 确定转矩目标值,使其与开关功能成比例。 或者,根据确定功能计算的制动转矩目标值根据车轮角加速度来校正。 以这种方式,精确地控制了路面和轮胎之间的制动扭矩或车轮滑移率。

    Copper strike plating bath
    9.
    发明申请
    Copper strike plating bath 审中-公开
    铜触电镀浴

    公开(公告)号:US20060027462A1

    公开(公告)日:2006-02-09

    申请号:US11197263

    申请日:2005-08-05

    CPC classification number: C25D5/34 C25D3/40

    Abstract: A copper strike plating bath comprising a copper cyanide compound and one or more of salts of inorganic acids and salts of organic acids. The copper cyanide compound is preferably sodium copper cyanide, potassium copper cyanide or a mixture thereof.

    Abstract translation: 包含氰化铜化合物和一种或多种无机酸盐和有机酸盐的铜触镀浴。 氰化铜化合物优选为氰化铜钠,氰化钾铜或其混合物。

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