Decal transfer lithography
    5.
    发明申请
    Decal transfer lithography 有权
    贴片转印光刻

    公开(公告)号:US20060084012A1

    公开(公告)日:2006-04-20

    申请号:US10965279

    申请日:2004-10-14

    IPC分类号: G03F7/00

    摘要: A method of making a microstructure includes selectively activating a portion of a surface of a silicon-containing elastomer, contacting the activated portion with a substance, and bonding the activated portion and the substance, such that the activated portion of the surface and the substance in contact with the activated portion are irreversibly attached. The selective activation may be accomplished by positioning a mask on the surface of the silicon-containing elastomer, and irradiating the exposed portion with UV radiation.

    摘要翻译: 制造微结构的方法包括选择性地激活含硅弹性体的表面的一部分,使活化部分与物质接触,并且将活化部分和物质接合,使得表面的活化部分和物质的活性部分 与活化部分的接触不可逆地附着。 选择性激活可以通过将掩模定位在含硅弹性体的表面上,并用UV辐射照射暴露部分来实现。