摘要:
The invention relates to a cosmetic product containing at least one water-soluble copolymer which is obtained by radical copolymerization of acrylamide and/or methacrylamide and other water-soluble a,β-ethylenically unsaturated compounds which are copolymerizable therewith, optionally in the presence of a water-soluble polymeric graft base.
摘要:
Cationic polyurethanes and polyureas formed from (a) at least one diisocyanate or reaction product thereof with one or more compounds containing two or more active hydrogen atoms per molecule, and (b) at least one diol, primary or secondary amino alcohol, primary or secondary diamine or primary or secondary triamine each with one or more tertiary, quaternary or protonated tertiary amine nitrogen atoms and having a glass transition temperature of at least 25 ° C. and an amine number of from 50 to 200, based on the non-quaternized or -protonated compounds, or other salts of these polyurethanes and polyureas, are useful as ingredients of cosmetic and pharmaceutical preparations.
摘要:
A process for producing a polymer/metal or polymer/semiconductor composite having an adhesive layer between the polymer and the metal or between the polymer and the semiconductor in which a layer of at least two different chemical elements is applied to the metal or semiconductor by vapor-deposition or cathode sputtering, then selectively or partially removing at least one chemical element of this layer in an etching process, and then applying the polymer.
摘要:
Self-bonding enamel solutions containA) from 5 to 80% by weight of a copolyamide composed of units which are derived fromA.sub.1) organic dicarboxylic acids ##STR1## where R.sup.1 is an aliphatic radical of 1 to 20 carbon atoms or an aromatic radical of 5 to 25 carbon atoms,andA.sub.2) a mixture of diisocyanates, consisting ofa.sub.21) from 20 to 95 mol % of a diisocyanate of the general formulaOCN--R.sup.2 --NCO where R.sup.2 is an aromatic radical of 5 to 25 carbon atoms,a.sub.22) from 5 to 70 mol % of a diisocyanate of the general formulaOCN--R.sup.3 --NCO where R.sup.3 is ##STR2## or a linear aliphatic radical of 3 to 30 carbon atoms which is substituted by 1 to 3 C.sub.1 -C.sub.4 -alkyl groups and R.sup.4 and R.sup.5 independently of one another are each C.sub.1 -C.sub.4 -alkyl or hydrogen, anda.sub.23) from 0 to 20 mol % of a diisocyanate of the general formulaOCN--(CH.sub.2).sub.y --NCO where y is an integer of from 1 to 20, andB) from
摘要:
The present invention relates to a cosmetic composition which comprises at least one water-soluble or water-dispersible copolymer which is obtainable by free-radical copolymerization of at least one N-vinyllactam, at least one anionogenic monomer and optionally further α,β-ethylenically unsaturated compounds copolymerizable therewith, in the presence of a polymer component with repeat units which have ether groups or which are derived from vinyl alcohol.
摘要:
The invention relates to a process for producing microstructure elements having structure depths of from several .mu.m to the mm region by imagewise irradiation of polymers with X-rays, where the polymers employed are aliphatic polyesters.
摘要:
A process for the production of micromoldings having a high aspect ratio by imagewise irradiation of a polymer with high-energy, parallel radiation from an X-ray source employs, as the polymer, a homo- or copolyoxymethylene.
摘要:
A process for the production of microstructure elements having structure depths of from several .mu.m into the mm range by imagewise irradiation of polymers with X-rays and removal of the areas of the polymers which have been irradiated imagewise, comprises applying the polymers, before the imagewise irradiation, to an electroconductive substrate in a layer thickness of from several .mu.m into the mm range by melting under pressure, thus firmly anchoring the polymers.The process according to the invention is particularly suitable for the production of microstructure elements having structure depths of from 3 to 2000 .mu.m and lateral dimensions of less than 10 .mu.m.
摘要:
A process for the production of micromoldings having a high aspect ratio by imagewise irradiation of a polymer with high-energy, parallel radiation from an X-ray source employs, as the polymer, a copolymer comprising SO.sub.2 and one or more ethylenically unsaturated organic compounds.