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    Production of microstructure elements
    5.
    发明授权
    Production of microstructure elements 失效
    微结构元素的生产

    公开(公告)号：US5302421A

    公开(公告)日：1994-04-12

    申请号：US87902

    申请日：1993-07-09

    申请人： Peter Hoessel ,  Gerhard Hoffmann

    发明人： Peter Hoessel ,  Gerhard Hoffmann

    IPC分类号： B01J19/00 ,  B29C35/08 ,  B29C59/16 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  H01L21/027 ,  B05D5/12

    CPC分类号： G03F7/039 ,  B01J19/0093 ,  B29C59/16 ,  G03F7/16 ,  G03F7/2039 ,  B01J2219/00783 ,  B01J2219/00833 ,  B29C2035/0844 ,  Y10S430/168

    摘要： A process for the production of microstructure elements having structure depths of from several .mu.m into the mm range by imagewise irradiation of polymers with X-rays and removal of the areas of the polymers which have been irradiated imagewise, comprises applying the polymers, before the imagewise irradiation, to an electroconductive substrate in a layer thickness of from several .mu.m into the mm range by melting under pressure, thus firmly anchoring the polymers.The process according to the invention is particularly suitable for the production of microstructure elements having structure depths of from 3 to 2000 .mu.m and lateral dimensions of less than 10 .mu.m.

    摘要翻译： 通过用X射线成像照射聚合物并去除已经成像照射的聚合物的区域，通过将结构深度从几μm制成到mm范围内的微结构元件的制造方法包括在 通过在压力下熔融，将层厚度从几μm到mm范围内的导电性基板，从而牢固地锚定聚合物。 根据本发明的方法特别适用于生产具有3至2000μm结构深度和小于10μm的横向尺寸的微结构元件。

    Use of cationic polyurethanes and polyureas as ingredients of cosmetic preparations
    7.
    发明授权
    Use of cationic polyurethanes and polyureas as ingredients of cosmetic preparations 失效
    使用阳离子聚氨酯和聚脲作为化妆品制剂的成分

    公开(公告)号：US06335003B1

    公开(公告)日：2002-01-01

    申请号：US08424527

    申请日：1995-05-30

    申请人： Son Nguyen Kim ,  Axel Sanner ,  Karin Sperling-Vietmeier ,  Peter Hoessel

    发明人： Son Nguyen Kim ,  Axel Sanner ,  Karin Sperling-Vietmeier ,  Peter Hoessel

    IPC分类号： A61K711

    CPC分类号： C08G18/603 ,  A61K8/87 ,  A61K47/34 ,  A61Q5/06 ,  C08G18/0814 ,  C08G18/4277 ,  C08G18/4283

    摘要： Cationic polyurethanes and polyureas formed from (a) at least one diisocyanate or reaction product thereof with one or more compounds containing two or more active hydrogen atoms per molecule, and (b) at least one diol, primary or secondary amino alcohol, primary or secondary diamine or primary or secondary triamine each with one or more tertiary, quaternary or protonated tertiary amine nitrogen atoms and having a glass transition temperature of at least 25 ° C. and an amine number of from 50 to 200, based on the non-quaternized or -protonated compounds, or other salts of these polyurethanes and polyureas, are useful as ingredients of cosmetic and pharmaceutical preparations.

    摘要翻译： 由（a）至少一种二异氰酸酯或其反应产物与每分子含有两个或多个活性氢原子的一种或多种化合物形成的阳离子聚氨酯和聚脲，和（b）至少一种二醇，伯或仲氨基醇，伯或仲 二胺或伯或仲三胺各自具有一个或多个叔胺，季铵或质子化叔胺氮原子，并且玻璃化转变温度为至少25℃，胺数为50至200，基于非季铵化或 - 质子化合物或这些聚氨酯和聚脲的其它盐可用作化妆品和药物制剂的成分。

    Self-bonding enamel solution for heat-resistant coatings
    8.
    发明授权
    Self-bonding enamel solution for heat-resistant coatings 失效
    自粘式ENAMEL解决方案用于耐热涂料

    公开(公告)号：US5059660A

    公开(公告)日：1991-10-22

    申请号：US521030

    申请日：1990-05-09

    申请人： Peter Hoessel ,  Hans Schupp ,  Klaus Lienert ,  Helmut Lehmann

    发明人： Peter Hoessel ,  Hans Schupp ,  Klaus Lienert ,  Helmut Lehmann

    IPC分类号： C08G18/75 ,  C08G18/34 ,  C08G18/60 ,  C08G18/72 ,  C08G18/80 ,  C09D5/25 ,  C09D175/00 ,  C09D175/04 ,  H01B3/30

    CPC分类号： H01B3/302 ,  C08G18/341 ,  C08G18/603 ,  C08G18/724 ,  C08G18/8074 ,  H01B3/305

    摘要： Self-bonding enamel solutions containA) from 5 to 80% by weight of a copolyamide composed of units which are derived fromA.sub.1) organic dicarboxylic acids ##STR1## where R.sup.1 is an aliphatic radical of 1 to 20 carbon atoms or an aromatic radical of 5 to 25 carbon atoms,andA.sub.2) a mixture of diisocyanates, consisting ofa.sub.21) from 20 to 95 mol % of a diisocyanate of the general formulaOCN--R.sup.2 --NCO where R.sup.2 is an aromatic radical of 5 to 25 carbon atoms,a.sub.22) from 5 to 70 mol % of a diisocyanate of the general formulaOCN--R.sup.3 --NCO where R.sup.3 is ##STR2## or a linear aliphatic radical of 3 to 30 carbon atoms which is substituted by 1 to 3 C.sub.1 -C.sub.4 -alkyl groups and R.sup.4 and R.sup.5 independently of one another are each C.sub.1 -C.sub.4 -alkyl or hydrogen, anda.sub.23) from 0 to 20 mol % of a diisocyanate of the general formulaOCN--(CH.sub.2).sub.y --NCO where y is an integer of from 1 to 20, andB) from

    摘要翻译： 自粘搪瓷溶液包含A）5至80重量％的由衍生自A1）有机二羧酸的单体组成的共聚酰胺，其中R 1是1至20个碳原子的脂族基团或芳族基团的芳族基团 5〜25个碳原子，A2）二异氰酸酯的混合物，由以下组分组成：a）20〜95摩尔％的通式为OCN-R2-NCO的二异氰酸酯，其中R 2为5〜25个碳原子的芳族基团，a22 ）5〜70摩尔％的通式为OCN-R3-NCO的二异氰酸酯，其中R 3为3或3个碳原子的直链脂族基团，其被1至3个C 1 -C 4 - 烷基取代， R 4和R 5彼此独立地各自为C 1 -C 4烷基或氢，和a 23）0至20摩尔％的通式为OCN-（CH 2）y -NCO的二异氰酸酯，其中y为1至 20和B）在有机溶剂或溶剂混合物中的<0.5至30重量％的封端二异氰酸酯或多异氰酸酯。

    Cosmetic agent containing at least one copolymer having N-vinyllactam units
    9.
    发明授权
    Cosmetic agent containing at least one copolymer having N-vinyllactam units 失效
    含有至少一种具有N-乙烯基内酰胺单元的共聚物的化妆品

    公开(公告)号：US07459148B2

    公开(公告)日：2008-12-02

    申请号：US10497164

    申请日：2002-12-10

    申请人： Son Nguyen-Kim ,  Peter Hoessel ,  Walter Schunter

    发明人： Son Nguyen-Kim ,  Peter Hoessel ,  Walter Schunter

    IPC分类号： A61Q5/00 ,  A61Q5/06 ,  A61Q7/00 ,  A61K8/73

    CPC分类号： A61Q5/12 ,  A61K8/817 ,  A61K8/8182 ,  A61K8/87 ,  A61Q5/02 ,  A61Q5/06 ,  A61Q19/00

    摘要： The present invention relates to a cosmetic composition which comprises at least one water-soluble or water-dispersible copolymer which is obtainable by free-radical copolymerization of at least one N-vinyllactam, at least one anionogenic monomer and optionally further α,β-ethylenically unsaturated compounds copolymerizable therewith, in the presence of a polymer component with repeat units which have ether groups or which are derived from vinyl alcohol.

    摘要翻译： 本发明涉及化妆品组合物，其包含至少一种水溶性或水分散性共聚物，其可通过至少一种N-乙烯基内酰胺，至少一种阴离子发生单体和任选的另外的α，β-烯属的自由基共聚获得 在具有醚基团或衍生自乙烯醇的重复单元的聚合物组分的存在下，可与其共聚的不饱和化合物。