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1.发明申请ORGANIC MATERIAL, FILM COMPRISING THE SAME AND ELECTRIC DEVICE COMPRISING THE FILM 有权有机材料，包括它的薄膜和包含薄膜的电子装置公开(公告)号：US20100117522A1
公开(公告)日：2010-05-13
申请号：US12476664
申请日：2009-06-02
申请人： Jong-jin PARK , Kwang-hee LEE , Xavier BULLIARD , Yun-hyuk CHOI , Tae-gwan PARK
发明人： Jong-jin PARK , Kwang-hee LEE , Xavier BULLIARD , Yun-hyuk CHOI , Tae-gwan PARK
IPC分类号： H01J1/63 , C08F136/20 , C07H7/04 , B32B15/088 , B32B27/06
CPC分类号： C07H15/18 , H01L51/448 , H01L51/5237 , H01L51/5256 , Y10T428/31681 , Y10T428/31765
摘要： An organic material including a hydrophilic polymer and an organic moiety having a hydroxyl substituted C6-C14 aromatic functional group, the organic moiety binding to an end or a side of the hydrophilic polymer.
摘要翻译： 包括亲水性聚合物和具有羟基取代的C 6 -C 14芳族官能团的有机部分的有机材料，所述有机部分结合到所述亲水性聚合物的末端或侧面。
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2.发明申请METHOD FOR FABRICATING MULTILAYERED ENCAPSULATION THIN FILM HAVING OPTICAL FUNCTIONALITY AND MUTILAYERED ENCAPSULATION THIN FILM FABRICATED BY THE SAME 审中-公开用于制造具有光学功能的多层封装薄膜的方法和由其组合的多层封装薄膜公开(公告)号：US20090305062A1
公开(公告)日：2009-12-10
申请号：US12272381
申请日：2008-11-17
申请人： Yun Hyuk CHOI , Jong Jin PARK , Young Gu LEE , Kwang Hee LEE , Xavier BULLIARD
发明人： Yun Hyuk CHOI , Jong Jin PARK , Young Gu LEE , Kwang Hee LEE , Xavier BULLIARD
CPC分类号： C23C14/352 , B05D1/002 , B05D1/60 , B05D2350/63 , C23C14/0036 , C23C14/081 , Y10T428/31663
摘要： A method for fabrication of a multilayered encapsulation thin film having optical functionality and a multilayered encapsulation thin film fabricated thereof includes a reactive or a non-reactive PVD process using a physical vapor deposition device containing multiple targets in a vacuum chamber is conducted or the above processes are alternately conducted such that the multilayered encapsulation thin film consisting of multiple layers with different densities and refractive indexes may be easily fabricated. In addition, the multilayered encapsulation thin film fabricated by the same has superior ability for inhibiting moisture and/or oxygen penetration sufficient to be used as an encapsulation material, controls a refractive index distribution for multiple layers in fabrication of a multilayered thin film so as to function as an anti-reflection film, and improves light output of a device.
摘要翻译： 制造具有光学功能的多层封装薄膜的方法和其制造的多层封装薄膜包括使用在真空室中含有多个靶的物理气相沉积装置的反应性或非反应性PVD方法或上述方法 交替进行，使得可以容易地制造由具有不同密度和折射率的多层组成的多层包封薄膜。 此外，由其制造的多层封装薄膜具有优异的抑制足以用作封装材料的水分和/或氧气渗透的能力，在多层薄膜的制造中控制多层的折射率分布，从而 作为防反射膜，并且改善了设备的光输出。
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3.发明授权Organic material, film comprising the same and electric device comprising the film 有权有机材料，包含该材料的薄膜和包含该薄膜的电子装置公开(公告)号：US08927116B2
公开(公告)日：2015-01-06
申请号：US12476664
申请日：2009-06-02
申请人： Jong-jin Park , Kwang-hee Lee , Xavier Bulliard , Yun-hyuk Choi , Tae-gwan Park
发明人： Jong-jin Park , Kwang-hee Lee , Xavier Bulliard , Yun-hyuk Choi , Tae-gwan Park
IPC分类号： H01J1/63 , C08F136/20 , C07H7/04 , B32B15/088 , B32B27/06 , C07H15/18 , H01L51/44 , H01L51/52
CPC分类号： C07H15/18 , H01L51/448 , H01L51/5237 , H01L51/5256 , Y10T428/31681 , Y10T428/31765
摘要： An organic material including a hydrophilic polymer and an organic moiety having a hydroxyl substituted C6-C14 aromatic functional group, the organic moiety binding to an end or a side of the hydrophilic polymer.
摘要翻译： 包括亲水性聚合物和具有羟基取代的C 6 -C 14芳族官能团的有机部分的有机材料，所述有机部分结合到亲水性聚合物的末端或侧面。
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4.发明申请GAS BARRIER THIN FILM, ELECTRONIC DEVICE COMPRISING THE SAME, AND METHOD OF PREPARING THE GAS BARRIER THIN FILM 有权气体阻隔薄膜，包含该气膜的电子设备以及制备气体阻隔薄膜的方法公开(公告)号：US20100159255A1
公开(公告)日：2010-06-24
申请号：US12505245
申请日：2009-07-17
申请人： Kwang-hee Lee , Jong-jin Park , Xavier Bulliard , Yun-hyuk Choi
发明人： Kwang-hee Lee , Jong-jin Park , Xavier Bulliard , Yun-hyuk Choi
CPC分类号： H01L21/02304 , C09D183/04 , C09D183/16 , H01L21/02126 , H01L21/02255 , H01L21/3122 , H01L21/3125 , H01L31/0392 , H01L31/048 , H01L51/0097 , H01L51/448 , H01L51/5237 , H01L51/5256 , Y02E10/549 , Y10T428/31663
摘要： A gas barrier thin film having a substrate, an anchoring layer, and an inorganic oxide layer, the anchoring layer including a silicon-containing organic-inorganic composite copolymer comprising a repeating unit of the formula —(SiO)n—, a repeating unit of the formula —(SiR1R2—NR3)m—, and at least one or a combination of repeating units of the formulas wherein at least one of R1, R2, and R3 is independently hydrogen, R1, R2, and R3 are each independently C1-C5 alkyl, C2-C5 alkenyl, C2-C5 alkynyl, C1-C5 alkoxyl, or C6-C15 aryl, R4, R5, R6, and R7 are each independently hydrogen, C1-C3 alkyl, C1-C3 alkoxyl, C3-C10 cycloalkyl, or C6-C15 aryl, R4 and R5 are not simultaneously hydrogen, R6 and R7 are not simultaneously hydrogen, n+m+r=1, 0
摘要翻译： 一种阻气薄膜，其具有基材，锚定层和无机氧化物层，所述锚定层包括含有有机 - 无机复合共聚物，所述有机 - 无机复合共聚物包含式 - （SiO）n - 的重复单元，重复单元 式 - （SiR1R2-NR3）m-，以及下式的重复单元的至少一种或其组合：其中R 1，R 2和R 3中的至少一个独立地为氢，R 1，R 2和R 3各自独立地为C 1〜 C5烷基，C2-C5烯基，C2-C5炔基，C1-C5烷氧基或C6-C15芳基，R4，R5，R6和R7各自独立地为氢，C1-C3烷基，C1-C3烷氧基，C3-C10 环烷基或C6-C15芳基，R4和R5不同时为氢，R6和R7不同时为氢，n + m + r = 1,0.0
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5.发明申请公开(公告)号：US20100112270A1
公开(公告)日：2010-05-06
申请号：US12403871
申请日：2009-03-13
申请人： Xavier BULLIARD , Kwang Hee LEE , Jong Jin PARK , Yun Hyuk CHOI , In Sik IN
发明人： Xavier BULLIARD , Kwang Hee LEE , Jong Jin PARK , Yun Hyuk CHOI , In Sik IN
CPC分类号： C09J7/0221 , C09J7/387 , H01L51/5237 , H01L51/5256 , Y10T428/1059 , Y10T428/239
摘要： A multilayer film is provided. The multilayer film includes a barrier layer and an adhesive layer underlying the barrier layer. The adhesive layer contains a block copolymer that can phase separate into two or more different domains. The multilayer film has good gas and moisture barrier properties and is highly flexible. Therefore, the multilayer film can be effectively used in manufacturing encapsulation structures for electronic devices. In addition, the multilayer film is suitable for use as a substrate for a device. Further provided are a method for producing the multilayer film and an encapsulation structure including the multilayer film.
摘要翻译： 提供多层膜。 多层膜包括阻挡层和位于阻挡层下面的粘合剂层。 粘合剂层含有可相分离成两个或多个不同结构域的嵌段共聚物。 多层膜具有良好的气体和水分阻隔性能，并且具有高度灵活性。 因此，多层膜可以有效地用于制造电子器件的封装结构。 此外，多层膜适合用作器件的基板。 还提供了制造多层膜的方法和包括多层膜的封装结构。
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6.发明授权Gas barrier thin film, electronic device comprising the same, and method of preparing the gas barrier thin film 有权气体阻隔薄膜，包含该阻气薄膜的电子设备以及制备阻气薄膜的方法公开(公告)号：US09368746B2
公开(公告)日：2016-06-14
申请号：US12505245
申请日：2009-07-17
申请人： Kwang-hee Lee , Jong-jin Park , Xavier Bulliard , Yun-hyuk Choi
发明人： Kwang-hee Lee , Jong-jin Park , Xavier Bulliard , Yun-hyuk Choi
IPC分类号： C09D183/08 , H01L31/048 , H01L51/52 , C09D183/04 , C09D183/16 , H01L31/0392 , H01L51/00 , H01L51/44 , H01L21/312
CPC分类号： H01L21/02304 , C09D183/04 , C09D183/16 , H01L21/02126 , H01L21/02255 , H01L21/3122 , H01L21/3125 , H01L31/0392 , H01L31/048 , H01L51/0097 , H01L51/448 , H01L51/5237 , H01L51/5256 , Y02E10/549 , Y10T428/31663
摘要： A gas barrier thin film having a substrate, an anchoring layer, and an inorganic oxide layer, the anchoring layer including a silicon-containing organic-inorganic composite copolymer comprising a repeating unit of the formula —(SiO)n—, a repeating unit of the formula —(SiR1R2—NR3)m—, and at least one or a combination of repeating units of the formulas wherein at least one of R1, R2, and R3 is independently hydrogen, R1, R2, and R3 are each independently C1-C5 alkyl, C2-C5 alkenyl, C2-C5 alkynyl, C1-C5 alkoxyl, or C6-C15 aryl, R4, R5, R6, and R7 are each independently hydrogen, C1-C3 alkyl, C1-C3 alkoxyl, C3-C10 cycloalkyl, or C6-C15 aryl, R4 and R5 are not simultaneously hydrogen, R6 and R7 are not simultaneously hydrogen, n+m+r=1, 0
摘要翻译： 一种阻气薄膜，其具有基材，锚定层和无机氧化物层，所述锚定层包括含有有机 - 无机复合共聚物，所述有机 - 无机复合共聚物包含式 - （SiO）n - 的重复单元，重复单元 式 - （SiR1R2-NR3）m-，以及下式的重复单元的至少一种或其组合：其中R 1，R 2和R 3中的至少一个独立地为氢，R 1，R 2和R 3各自独立地为C 1〜 C5烷基，C2-C5烯基，C2-C5炔基，C1-C5烷氧基或C6-C15芳基，R4，R5，R6和R7各自独立地为氢，C1-C3烷基，C1-C3烷氧基，C3-C10 环烷基或C6-C15芳基，R4和R5不同时为氢，R6和R7不同时为氢，n + m + r = 1,0.0
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公开(公告)号：US09056331B2
公开(公告)日：2015-06-16
申请号：US12350620
申请日：2009-01-08
申请人： Kwang Hee Lee , Xavier Bulliard , Jong Jin Park , Yun Hyuk Choi
发明人： Kwang Hee Lee , Xavier Bulliard , Jong Jin Park , Yun Hyuk Choi
IPC分类号： B32B3/00 , B32B9/00 , B05D7/00 , C23C14/34 , B05D7/04 , B05D5/08 , C23C14/02 , C23C14/08 , C23C14/10 , B05D3/02
CPC分类号： B05D7/04 , B05D3/0254 , B05D5/083 , C23C14/024 , C23C14/081 , C23C14/10 , C23C18/1212 , C23C18/1216 , C23C18/122 , C23C18/1225 , C23C18/1254 , C23C18/1275 , Y10T428/24612
摘要： Disclosed herein are a thin layer having a composition gradient and a method for the production of the thin layer. According to the method, the thin layer is produced by subjecting a mixture of one or more organic materials and one or more inorganic materials to a sol-gel process. The composition gradient and the surface energy of the thin layer are controlled during production, leaving no interfacial failure defects.
摘要翻译： 本文公开了具有组成梯度的薄层和用于制造薄层的方法。 根据该方法，通过将一种或多种有机材料和一种或多种无机材料的混合物进行溶胶 - 凝胶法来制备薄层。 薄层的组成梯度和表面能在生产过程中受到控制，不会产生界面破坏缺陷。
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公开(公告)号：US08815404B2
公开(公告)日：2014-08-26
申请号：US12241976
申请日：2008-09-30
申请人： Kwang Hee Lee , Xavier Bulliard , Yi Yeol Lyu , Hyeon Jin Shin , Yun Hyuk Choi
发明人： Kwang Hee Lee , Xavier Bulliard , Yi Yeol Lyu , Hyeon Jin Shin , Yun Hyuk Choi
CPC分类号： C09D183/16 , C08G77/045 , C08G77/16 , C08G77/18 , C08G77/62 , C08J7/042 , C08J2381/06 , C08J2483/04 , C08J2483/16 , C09D183/04 , Y10T428/31663
摘要： Disclosed herein is a protective film. The protective film is produced by alternate coating of a polysilazane-based polymer and a flexible polysiloxane-based polymer. The polysilazane-based polymer is cured at low temperature to form silica, thereby achieving high hardness and high light transmittance. The protective film has improved interfacial adhesion between the respective coating films, which prevents permeation of moisture and oxygen. In addition, the protective film can be easily produced by low-temperature wet processes. Also disclosed herein is an encapsulation material comprising the protective film.
摘要翻译： 本文公开了保护膜。 保护膜通过交替涂覆聚硅氮烷基聚合物和柔性聚硅氧烷基聚合物来制备。 聚硅氮烷基聚合物在低温下固化形成二氧化硅，从而实现高硬度和高透光率。 保护膜具有改善各涂膜之间的界面粘合，防止水分和氧气渗透。 此外，通过低温湿法可以容易地制造保护膜。 本文还公开了包含保护膜的包封材料。
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9.发明授权Composition for radical polymerization and method of forming pattern using the composition 失效用于自由基聚合的组合物和使用该组合物形成图案的方法公开(公告)号：US08445178B2
公开(公告)日：2013-05-21
申请号：US12479151
申请日：2009-06-05
申请人： Jong-jin Park , Kwang-hee Lee , Xavier Bulliard , Yun-hyuk Choi , Kwang-sup Lee
发明人： Jong-jin Park , Kwang-hee Lee , Xavier Bulliard , Yun-hyuk Choi , Kwang-sup Lee
CPC分类号： G03F7/031 , G03F7/033 , G03F7/2053
摘要： A composition for radical polymerization includes a photosensitive material, a photoinitiator, a solvent, and a material for adjusting a size of a pattern. A method of forming a pattern using the composition is also disclosed.
摘要翻译： 用于自由基聚合的组合物包括感光材料，光引发剂，溶剂和用于调节图案尺寸的材料。 还公开了使用该组合物形成图案的方法。
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10.发明申请COMPOSITION FOR RADICAL POLYMERIZATION AND METHOD OF FORMING PATTERN USING THE COMPOSITION 失效用于放射性聚合的组合物和使用组合物形成图案的方法公开(公告)号：US20100119976A1
公开(公告)日：2010-05-13
申请号：US12479151
申请日：2009-06-05
申请人： Jong-jin Park , Kwang-hee Lee , Xavier Bulliard , Yun-hyuk Choi , Kwang-sup Lee
发明人： Jong-jin Park , Kwang-hee Lee , Xavier Bulliard , Yun-hyuk Choi , Kwang-sup Lee
CPC分类号： G03F7/031 , G03F7/033 , G03F7/2053
摘要： A composition for radical polymerization includes a photosensitive material, a photoinitiator, a solvent, and a material for adjusting a size of a pattern. A method of forming a pattern using the composition is also disclosed.
摘要翻译： 用于自由基聚合的组合物包括感光材料，光引发剂，溶剂和用于调节图案尺寸的材料。 还公开了使用该组合物形成图案的方法。
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