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    Process for the enzymatic preparation of protected and unprotected di- and oligopeptides in aqueous solutions
    1.
    发明授权
    Process for the enzymatic preparation of protected and unprotected di- and oligopeptides in aqueous solutions 失效
    在水溶液中酶法制备受保护和未保护的二肽和寡肽的方法

    公开(公告)号：US5304470A

    公开(公告)日：1994-04-19

    申请号：US823956

    申请日：1992-01-23

    申请人： Andreas Fischer ,  Alexander Schwarz ,  Christian Wandrey ,  Guenter Knaup ,  Andreas Bommarius ,  Karl-Heinz Drauz

    发明人： Andreas Fischer ,  Alexander Schwarz ,  Christian Wandrey ,  Guenter Knaup ,  Andreas Bommarius ,  Karl-Heinz Drauz

    IPC分类号： C07C229/12 ,  C07K1/00 ,  C07K5/06 ,  C12P21/00 ,  C12P21/02 ,  C07K1/06 ,  C07K1/14

    CPC分类号： C12P21/02

    摘要： Protected and unprotected di- or oligopeptides are synthesized by reacting an N-terminally protected .alpha.-amino acid alkyl ester or peptide alkyl ester of the formula X--E--R.sup.1 with an amino acid or a di- or oligopeptide or a derivative thereof of the formula H.sub.2 N--Q--R.sup.2 in aqueous solution in the presence of a hydrolase, and, removing protective groups from the reaction product separated from the reaction mixture, where E is the residue of an .alpha.-amino acid or of a di- or oligopeptide, R.sup.1 is lower alkyl and X is a group which carries a charge or is polar at the pH values used for the reaction and which increases the solubility by a factor >5 compared with compounds wherein X=H, Q is the residue of an amino acid or of a di- or oligopeptide, and R.sup.2 is an optionally esterified or amidated acid group. In a preferred embodiment, the peptide or (.alpha.-)amino acid ester concentration is greater than 50 mM, wherein in a particularly preferred embodiment, the concentration ranges from 100 to 1000 mM with approximately comparable nucleophile and electrophile concentrations. The preferred substrate/enzyme ratios are >10.sup.5 M/M or >10.sup.3 M/M when papain is employed. Phthalyl, maleyl or citraconyl radicals and their derivatives or N-betainyl compounds are envisaged for use radicals (X) in the electrophilic component.

    摘要翻译： 受保护和未保护的二肽或寡肽通过使N-末端保护的（α） - 氨基酸烷基酯或式XE-R1的肽烷基酯与氨基酸或二肽或其寡肽或其衍生物 在水溶液存在下，在水溶液中制备式H2N-Q-R2，并且从反应混合物中分离出的反应产物中除去保护基团，其中E是（α） - 氨基酸或二 寡肽，R1是低级烷基，X是在用于反应的pH值下带有电荷或极性的基团，并且与其中X = H的化合物相比，其溶解度增加> 5倍，Q是 氨基酸或二肽或寡肽，R2是任选酯化或酰胺化的酸基团。 在优选的实施方案中，肽或（（α） - ）氨基酸酯浓度大于50mM，其中在特别优选的实施方案中，浓度范围为100至1000mM，具有大致相似的亲核试剂和亲电试剂浓度。 当使用木瓜蛋白酶时，优选的底物/酶比率> 105M / M或> 103M / M。 假定邻苯二甲酰基，马来酰基或柠康酰基及其衍生物或N-甜菜碱化合物在亲电子组分中使用基团（X）。

    Methods for preventing plasma un-confinement events in a plasma processing chamber
    2.
    发明授权
    Methods for preventing plasma un-confinement events in a plasma processing chamber 有权

    公开(公告)号：US09928995B2

    公开(公告)日：2018-03-27

    申请号：US12820020

    申请日：2010-06-21

    申请人： Andreas Fischer ,  Rajinder Dhindsa

    发明人： Andreas Fischer ,  Rajinder Dhindsa

    IPC分类号： B23P6/00 ,  H01J37/32

    CPC分类号： H01J37/32495 ,  H01J37/32082 ,  H01J37/32623 ,  Y10T29/49718

    摘要： A method for configuring a plasma processing chamber for preventing a plasma un-confinement event during processing of a substrate from occurring outside of a confined plasma sustaining region is provided. The confined plasma sustaining region is defined by a set of confinement rings surrounding a bottom portion of an electrode is provided. The method includes determining a worst-case Debye length for a plasma generated in the plasma processing chamber during the processing. The method also includes performing at least one of adjusting gaps between any pair of adjacent confinement rings and adding at least one additional confinement ring to ensure that a gap between the any pair of adjacent confinement rings is less than the worst-case Debye length.

    Plasma ignition and sustaining methods and apparatuses
    3.
    发明授权
    Plasma ignition and sustaining methods and apparatuses 有权
    等离子体点火和维持方法和装置

    公开(公告)号：US09174296B2

    公开(公告)日：2015-11-03

    申请号：US12908459

    申请日：2010-10-20

    申请人： Neil Martin Paul Benjamin ,  Andreas Fischer

    发明人： Neil Martin Paul Benjamin ,  Andreas Fischer

    IPC分类号： B23K9/00 ,  B23K10/00 ,  B23K9/013

    CPC分类号： H01J37/32541 ,  B23K9/013 ,  B23K10/00 ,  B23K2101/40 ,  H01J37/3211

    摘要： An apparatus for generating plasma including a plasma generating vessel and a coil having a coil length and a first set of partially enclosing, longitudinally oriented conductive (PELOC) fingers and a second set of PELOC fingers. The PELOC finger sets are oriented along a longitudinal axis of the vessel with each partially enclosing a periphery of the vessel. The two sets of PELOC fingers are oriented fingertips facing fingertips and separated by an inter-set distance that is less than the coil length.

    摘要翻译： 一种用于产生等离子体的装置，包括等离子体发生容器和具有线圈长度的线圈和第一组部分封闭的纵向导电（PELOC）指状物和第二组PELOC指状物。 PELOC手指组沿着容器的纵向轴线定向，每个部分包围容器的周边。 两组PELOC手指是面向指尖的定向指尖，并且以小于线圈长度的间隔距离分开。

    Integrated capacitive and inductive power sources for a plasma etching chamber
    4.
    发明授权
    Integrated capacitive and inductive power sources for a plasma etching chamber 有权
    用于等离子体蚀刻室的集成电容和感应电源

    公开(公告)号：US08911590B2

    公开(公告)日：2014-12-16

    申请号：US11363703

    申请日：2006-02-27

    申请人： Rajinder Dhindsa ,  Mukund Srinivasan ,  Kenji Takeshita ,  Alexei Marakhtanov ,  Andreas Fischer

    发明人： Rajinder Dhindsa ,  Mukund Srinivasan ,  Kenji Takeshita ,  Alexei Marakhtanov ,  Andreas Fischer

    IPC分类号： H01L21/306 ,  C23C16/00 ,  H01J37/32

    CPC分类号： H01J37/32862 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32642

    摘要： Broadly speaking, the embodiments of the present invention provide an improved chamber cleaning mechanism. The present invention can also be used to provide additional knobs to tune the etch processes. In one embodiment, a plasma processing chamber configured to generate a plasma includes a bottom electrode assembly with an bottom electrode, wherein the bottom electrode is configured to receive a substrate. The plasma processing chamber includes a top electrode assembly with a top electrode and an inductive coil surrounding the top electrode. The inductive coil is configured to convert a gas into a plasma within a region defined within the chamber, wherein the region is outside an area defined above a top surface of the bottom electrode.

    摘要翻译： 广义而言，本发明的实施例提供了一种改进的室清洁机构。 本发明还可以用于提供附加的旋钮来调整蚀刻工艺。 在一个实施例中，构造成产生等离子体的等离子体处理室包括具有底部电极的底部电极组件，其中底部电极被配置为容纳衬底。 等离子体处理室包括具有顶部电极的顶部电极组件和围绕顶部电极的感应线圈。 感应线圈被配置为将气体转变成在腔室内限定的区域内的等离子体，其中该区域位于限定在底部电极的顶表面之上的区域之外。

    Method for the direct amination of hydrocarbons into amino hydrocarbons, including electrochemical separation of hydrogen and electrochemical reaction of the hydrogen into water
    6.
    发明授权
    Method for the direct amination of hydrocarbons into amino hydrocarbons, including electrochemical separation of hydrogen and electrochemical reaction of the hydrogen into water 有权
    将烃直接胺化成氨基烃的方法，包括氢的电化学分离和氢的电化学反应进入水中

    公开(公告)号：US08642810B2

    公开(公告)日：2014-02-04

    申请号：US13383014

    申请日：2010-07-07

    申请人： Petr Kubanek ,  Alexander Panchenko ,  Andreas Fischer ,  Thomas Heidemann

    发明人： Petr Kubanek ,  Alexander Panchenko ,  Andreas Fischer ,  Thomas Heidemann

    IPC分类号： C07C209/02

    CPC分类号： C07C209/02 ,  B01D2255/00 ,  B01D2256/16 ,  B01D2257/108 ,  C25B3/00 ,  Y02P20/582 ,  C07C211/46

    摘要： Process for the direct amination of hydrocarbons to aminohydrocarbons by reaction of a feed stream E comprising at least one hydrocarbon and at least one aminating reagent to form a reaction mixture R comprising aminohydrocarbon and hydrogen in a reaction zone RZ and electrochemical separation of at least part of the hydrogen formed in the reaction from the reaction mixture R by means of a gastight membrane-electrode assembly having at least one selectively proton-conducting membrane and at least one electrode catalyst on each side of the membrane, where at least part of the hydrogen is oxidized to protons at the anode catalyst on the retentate side of the membrane and the protons pass through the membrane and on the permeate side are reacted with oxygen to form water, where the oxygen originates from an oxygen-comprising stream O which is brought into contact with the permeate side of the membrane, over the cathode catalyst.

    摘要翻译： 通过包含至少一种烃和至少一种氨化试剂的进料流E的反应将碳氢化合物直接胺化成氨基烃的方法，以在反应区RZ中形成包含氨基烃和氢的反应混合物R，并且将至少部分 通过具有至少一个选择性质子传导膜和至少一个电极催化剂的气密膜电极组件在反应混合物R的反应中形成的氢，其中至少部分氢是 在阳极催化剂上在膜的滞留侧氧化成质子，并且质子通过膜并且在渗透侧与氧气反应以形成水，其中氧源自与氧接触的含氧物流O 与膜的渗透侧在阴极催化剂上。

    PLASMA CONFINEMENT STRUCTURES IN PLASMA PROCESSING SYSTEMS AND METHODS THEREOF
    7.
    发明申请
    PLASMA CONFINEMENT STRUCTURES IN PLASMA PROCESSING SYSTEMS AND METHODS THEREOF 有权
    等离子体处理系统中的等离子体配合结构及其方法

    公开(公告)号：US20140007413A1

    公开(公告)日：2014-01-09

    申请号：US14022111

    申请日：2013-09-09

    申请人： Eric Hudson ,  Andreas Fischer

    发明人： Eric Hudson ,  Andreas Fischer

    IPC分类号： C23C16/00 ,  C23F1/00

    CPC分类号： C23C16/00 ,  C23F1/00 ,  H01J37/32082 ,  H01J37/32623

    摘要： A method for manufacturing a plasma processing system is provided. The method includes providing a movable plasma-facing structure configured to surround a plasma that is generated during processing of a substrate. The method also includes disposing a movable electrically conductive structure outside of the movable plasma-facing structure, wherein both structures configured to be deployed and retracted as a single unit to facilitate handling of the substrate. The movable electrically conductive structure is radio frequency (RF) grounded during the plasma processing. During processing, the RF current from the plasmas flows to the movable electrically conductive structure through the movable plasma-facing structure during the plasma processing. The method further includes coupling a set of conductive straps to the movable electrically conductive structure. The set of conductive straps accommodates the movable electrically conductive structure when it is deployed and retracted while providing the RF current a low impedance path to ground.

    摘要翻译： 提供了一种制造等离子体处理系统的方法。 该方法包括提供构造成围绕在衬底的处理期间产生的等离子体的可移动等离子体面向结构。 该方法还包括将可移动导电结构设置在可移动等离子体面向结构的外部，其中两个结构构造成作为单个单元展开和缩回以便于处理基板。 可移动导电结构是在等离子体处理期间接地的射频（RF）。 在处理期间，来自等离子体的RF电流在等离子体处理期间通过可移动等离子体面向结构流动到可移动导电结构。 该方法还包括将一组导电带耦合到可移动导电结构。 一组导电带在展开和缩回时容纳可移动的导电结构，同时为RF电流提供一个低阻抗地线路径。

    Edge ring assembly with dielectric spacer ring
    9.
    发明授权
    Edge ring assembly with dielectric spacer ring 有权
    边缘环组件与介质隔离环

    公开(公告)号：US08500953B2

    公开(公告)日：2013-08-06

    申请号：US12415114

    申请日：2009-03-31

    申请人： Jeremy Chang ,  Andreas Fischer ,  Babak Kadkhodayan

    发明人： Jeremy Chang ,  Andreas Fischer ,  Babak Kadkhodayan

    IPC分类号： C23F1/00 ,  H01L21/306

    CPC分类号： H01L21/467 ,  H01J37/32623 ,  Y10T29/4973

    摘要： An edge ring assembly surrounds a substrate support surface in a plasma etching chamber. The edge ring assembly comprises an edge ring and a dielectric spacer ring. The dielectric spacer ring, which surrounds the substrate support surface and which is surrounded by the edge ring in the radial direction, is configured to insulate the edge ring from the baseplate. Incorporation of the edge ring assembly around the substrate support surface can decrease the buildup of polymer at the underside and along the edge of a substrate and increase plasma etching uniformity of the substrate.

    摘要翻译： 边缘环组件围绕等离子体蚀刻室中的衬底支撑表面。 边缘环组件包括边缘环和介电隔离环。 围绕基板支撑表面并且沿着径向方向被边缘环包围的介电间隔环构造成使边缘环与基板绝缘。 边缘环组件围绕衬底支撑表面的结合可以降低聚合物在衬底的下侧和沿着衬底边缘的聚集，并增加衬底的等离子体蚀刻均匀性。