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    Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly
    4.
    发明申请
    Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly 有权
    用于进行倾斜聚焦的方法和曝光装置以及由此制造的装置

    公开(公告)号：US20060279718A1

    公开(公告)日：2006-12-14

    申请号：US11441348

    申请日：2006-05-26

    申请人： Arie Den Boef ,  Jacobus Burghoorn ,  Martinus Leenders ,  Uwe Mickan ,  Roeland Vanneer ,  Jan Hauschild

    发明人： Arie Den Boef ,  Jacobus Burghoorn ,  Martinus Leenders ,  Uwe Mickan ,  Roeland Vanneer ,  Jan Hauschild

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70641 ,  G03F7/70283 ,  G03F9/7026 ,  G03F9/7069

    摘要： A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.

    摘要翻译： 执行倾斜聚焦测试的方法包括以下步骤：提供目标物体，使用辐射源提供辐射投影光束，提供反射装置以将投射的投射射束投射到目标部分上，引入第一投射投影 使用倾斜装置将反射装置倾斜到第二取向以提供具有相对于所述第一投影光束的倾斜的第二投影光束，引入第二投射投影 确定目标物体上的第一和第二投影投影光束的横向位移，并根据所述横向偏移确定目标物体相对于投影投影光束的散焦。

    Interferometric alignment system for use in vacuum-based lithographic apparatus
    6.
    发明授权
    Interferometric alignment system for use in vacuum-based lithographic apparatus 失效
    用于基于真空的光刻设备的干涉校准系统

    公开(公告)号：US06507388B2

    公开(公告)日：2003-01-14

    申请号：US09741009

    申请日：2000-12-21

    申请人： Jacobus Burghoorn

    发明人： Jacobus Burghoorn

    IPC分类号： G03B2742

    CPC分类号： G03F9/7096 ,  G03F9/7049

    摘要： In a lithographic apparatus having a movable object table in vacuum, an interferometer-based alignment system for detecting the position of that object table has a passive part in vacuum and an active part outside the vacuum chamber. The active part contains the beam generator, e.g. a laser, and the electronic detectors whilst the passive part contains the illumination and imaging optics. The two parts are coupled by optical fibers. The interferometer may make use of different diffraction orders from measurement and reference gratings and the order separation may be included in the passive part.

    摘要翻译： 在具有真空中的可移动物体台的光刻设备中，用于检测物体台的位置的基于干涉仪的对准系统具有真空中的被动部分和真空室外的活动部分。 有源部分包含波束发生器，例如。 激光器和电子检测器，而被动部件包含照明和成像光学元件。 这两个部分通过光纤耦合。 干涉仪可以利用来自测量和参考光栅的不同的衍射级，并且可以在无源部分中包括顺序分离。