THROUGH ELECTRODE SUBSTRATE AND MOUNTING SUBSTRATE

    公开(公告)号:US20190259696A1

    公开(公告)日:2019-08-22

    申请号:US16322741

    申请日:2017-08-04

    Abstract: A through electrode substrate includes a substrate provided with a through hole, a through electrode positioned in the through hole, and a first wiring structure including at least a first wiring layer positioned on a first surface of the substrate, and a second wiring layer positioned on the first wiring layer. The first wiring layer and the second wiring layer respectively have an insulation layer and an electroconductive layer. A first insulation layer of the first wiring layer includes at least an organic layer. At least one wiring layer of the first wiring structure includes an inorganic layer having insulation properties, the inorganic layer being positioned to a first side of the organic layer of the first insulation layer of the first wiring layer.

    WIRING BOARD
    3.
    发明公开
    WIRING BOARD 审中-公开

    公开(公告)号:US20240049384A1

    公开(公告)日:2024-02-08

    申请号:US18381789

    申请日:2023-10-19

    CPC classification number: H05K1/0298 B32B15/04 H01L23/40 H05K3/38

    Abstract: A wiring board is disclosed. The wiring board includes a substrate including a first element, a diffusion layer in contact with the substrate and including a first metal element, and a first metal film in contact with the diffusion layer and including a second metal element. The diffusion layer has at least a region including the first element and the first metal element and a region including the first metal element and the second metal element. A concentration of the second metal element in the diffusion layer may decrease as it approaches the substrate in a depth direction. A concentration of the first element in the diffusion layer may decrease as it approaches the first metal film in the depth direction.

    THROUGH ELECTRODE SUBSTRATE AND MOUNTING SUBSTRATE

    公开(公告)号:US20220028772A1

    公开(公告)日:2022-01-27

    申请号:US17497261

    申请日:2021-10-08

    Abstract: A through electrode substrate includes a substrate provided with a through hole, a through electrode positioned in the through hole, and a first wiring structure including at least a first wiring layer positioned on a first surface of the substrate, and a second wiring layer positioned on the first wiring layer. The first wiring layer and the second wiring layer respectively have an insulation layer and an electroconductive layer. A first insulation layer of the first wiring layer includes at least an organic layer. At least one wiring layer of the first wiring structure includes an inorganic layer having insulation properties, the inorganic layer being positioned to a first side of the organic layer of the first insulation layer of the first wiring layer.

    THROUGH ELECTRODE SUBSTRATE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20190080977A1

    公开(公告)日:2019-03-14

    申请号:US16075898

    申请日:2017-02-03

    Abstract: A through electrode substrate includes: a substrate; a first electrode part provided on a first surface side of the substrate; and a second electrode part provided on a second surface side of the substrate. The plurality of holes includes a plurality of first holes and a plurality of second holes. The hole electrode part of each first hole is electrically connected to the first electrode part on the first surface side of the substrate, and the hole electrode part thereof is electrically connected to the second electrode part on the second surface side of the substrate. The electrode part of each second hole is electrically insulated from the first electrode part on the first surface side of the substrate, or the hole electrode part thereof is electrically insulated from the second electrode part on the second surface side of the substrate.

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