INTEGRATION SCHEME FOR HIGH GAIN FET IN STANDARD CMOS PROCESS
    2.
    发明申请
    INTEGRATION SCHEME FOR HIGH GAIN FET IN STANDARD CMOS PROCESS 审中-公开
    标准CMOS工艺中高增益FET的集成方案

    公开(公告)号:US20070099386A1

    公开(公告)日:2007-05-03

    申请号:US11163791

    申请日:2005-10-31

    IPC分类号: H01L21/336 H01L29/788

    CPC分类号: H01L29/66659 H01L21/26586

    摘要: A method for fabricating high gain FETs that substantially reduces or eliminates unwanted variation in device characteristics caused by using a prior art shadow masking process is provided. The inventive method employs a blocking mask that at least partially extends over the gate region wherein after extension and halo implants an FET having an asymmetric halo region asymmetric extension regions or a combination thereof is fabricated. The inventive method thus provides high gain FETs in which the variation of device characteristics is substantially reduced. The present invention also relates to the resulting asymmetric high gain FET device that is fabricated utilizing the method of the present invention.

    摘要翻译: 提供了一种制造高增益FET的方法,其基本上减少或消除了由使用现有技术的阴影掩蔽处理引起的器件特性的不必要的变化。 本发明的方法采用阻挡掩模,其在栅极区域上至少部分地延伸,其中在延伸和卤素注入之后,制造具有不对称卤素区域不对称延伸区域或其组合的FET。 因此,本发明的方法提供了高增益FET,其中器件特性的变化显着降低。 本发明还涉及利用本发明的方法制造的非对称高增益FET器件。

    RESISTOR TUNING
    4.
    发明申请
    RESISTOR TUNING 有权
    电阻调谐

    公开(公告)号:US20050230785A1

    公开(公告)日:2005-10-20

    申请号:US10709115

    申请日:2004-04-14

    IPC分类号: H01C17/26 H01L29/76

    CPC分类号: H01C17/267

    摘要: A structure for resistors and the method for tuning the same. The resistor comprises an electrically conducting region coupled to a liner region. Both the electrically conducting region and the liner region are electrically coupled to first and second contact regions. A voltage difference is applied between the first and second contact regions. As a result, a current flows between the first and second contact regions in the electrically conducting region. The voltage difference and the materials of the electrically conducting region and the liner region are such that electromigration occurs only in the electrically conducting region. As a result, a void region within the electrically conducting region expands in the direction of the flow of the charged particles constituting the current. Because the resistor loses a conducting portion of the electrically conducting region to the void region, the resistance of the resistor is increased (i.e., tuned).

    摘要翻译: 电阻器结构及其调谐方法。 电阻器包括耦合到衬垫区域的导电区域。 导电区域和衬里区域都电耦合到第一和第二接触区域。 在第一和第二接触区域之间施加电压差。 结果,电流在导电区域中的第一和第二接触区域之间流动。 导电区域和衬垫区域的电压差和材料使得电迁移仅在导电区域中发生。 结果,导电区域内的空隙区域在构成电流的带电粒子的流动方向上膨胀。 因为电阻器将导电区域的导电部分损失到空隙区域,电阻器的电阻增加(即调谐)。

    METHOD OF FABRICATING A PRECISION BURIED RESISTOR
    6.
    发明申请
    METHOD OF FABRICATING A PRECISION BURIED RESISTOR 有权
    制造精密电阻器的方法

    公开(公告)号:US20070194390A1

    公开(公告)日:2007-08-23

    申请号:US11276282

    申请日:2006-02-22

    IPC分类号: H01L29/76

    摘要: The present invention provides a semiconductor structure including a buried resistor with improved control, in which the resistor is fabricated in a region of a semiconductor substrate beneath a well region that is also present in the substrate. In accordance with the present invention, the inventive structure includes a semiconductor substrate containing at least a well region; and a buried resistor located in a region of the semiconductor substrate that is beneath said well region. The present invention also provides a method of fabricating such a structure in which a deep ion implantation process is used to form the buried resistor and a shallower ion implantation process is used in forming the well region.

    摘要翻译: 本发明提供一种包括具有改进控制的掩埋电阻器的半导体结构,其中电阻器制造在半导体衬底的也存在于衬底中的阱区域下方的区域中。 根据本发明,本发明的结构包括至少含有一个阱区的半导体衬底; 以及位于半导体衬底的位于所述阱区之下的区域中的掩埋电阻器。 本发明还提供一种制造这样的结构的方法,其中使用深离子注入工艺来形成掩埋电阻器,并且在形成阱区域中使用较浅的离子注入工艺。

    RESISTOR TUNING
    9.
    发明申请
    RESISTOR TUNING 审中-公开
    电阻调谐

    公开(公告)号:US20070187800A1

    公开(公告)日:2007-08-16

    申请号:US11737304

    申请日:2007-04-19

    IPC分类号: H01L29/00 H01L21/20

    CPC分类号: H01C17/267

    摘要: A structure for resistors and the method for tuning the same. The resistor comprises an electrically conducting region coupled to a liner region. Both the electrically conducting region and the liner region are electrically coupled to first and second contact regions. A voltage difference is applied between the first and second contact regions. As a result, a current flows between the first and second contact regions in the electrically conducting region. The voltage difference and the materials of the electrically conducting region and the liner region are such that electromigration occurs only in the electrically conducting region. As a result, a void region within the electrically conducting region expands in the direction of the flow of the charged particles constituting the current. Because the resistor loses a conducting portion of the electrically conducting region to the void region, the resistance of the resistor is increased (i.e., tuned).

    摘要翻译: 电阻器结构及其调谐方法。 电阻器包括耦合到衬垫区域的导电区域。 导电区域和衬里区域都电耦合到第一和第二接触区域。 在第一和第二接触区域之间施加电压差。 结果,电流在导电区域中的第一和第二接触区域之间流动。 导电区域和衬垫区域的电压差和材料使得电迁移仅在导电区域中发生。 结果,导电区域内的空隙区域在构成电流的带电粒子的流动方向上膨胀。 因为电阻器将导电区域的导电部分损失到空隙区域,电阻器的电阻增加(即调谐)。