公开(公告)号：US20080037167A1

公开(公告)日：2008-02-14

申请号：US11502070

申请日：2006-08-09

申请人： Eric W. Flint ,  Chemgye Hwang ,  Ning Shi ,  Yongjian Sun

发明人： Eric W. Flint ,  Chemgye Hwang ,  Ning Shi ,  Yongjian Sun

IPC分类号： G11B5/187

CPC分类号： G11B5/1871 ,  Y10T29/49021 ,  Y10T29/49032

摘要： Embodiments of the present invention pertain to forming a head with reduced pole tip recession. According to one embodiment, a pole tip element is formed from a platinum containing material. During diamond like carbon (DLC) processing, hydrogen and hydrogen containing compounds are removed from a vacuum plasma processing environment that contains the head so that an amount of material that is removed from the pole tip element and other non-platinum containing elements associated with the head are approximately the same.

摘要翻译： 本发明的实施例涉及形成具有减小的极尖衰退的头部。 根据一个实施例，极尖元件由含铂材料形成。 在类金刚石（DLC）加工过程中，从含有磁头的真空等离子体处理环境中除去含氢和氢的化合物，使得从磁极末端元件除去的材料量和与其相关的其它非铂元素 头大致相同。

公开(公告)号：US07300556B2

公开(公告)日：2007-11-27

申请号：US10651632

申请日：2003-08-29

申请人： Cherngye Hwang ,  Eun Row ,  Ning Shi ,  Eric (Yongjian) Sun

发明人： Cherngye Hwang ,  Eun Row ,  Ning Shi ,  Eric (Yongjian) Sun

IPC分类号： C23C14/34

CPC分类号： C23C28/046 ,  C23C14/024 ,  C23C14/0605 ,  C23C14/165 ,  C23C28/04

摘要： A method of physical vapor deposition (PVD) is disclosed in which xenon is used as the operating gas in the vacuum chamber in the deposition of an adhesion layer, preferably silicon, which allows the adhesion layer to be ultra-thin with improved durability over prior art films. The use of argon as is typical in the prior art results in argon atoms being incorporated into the ultra-thin silicon film with deleterious results. In films that are only several angstroms thick, the contamination of the film with argon or other elements can yield a film with reduced adhesion performance and in some cases noble atoms such as argon can escape the film leaving voids or pinholes. The use of the larger and heavier xenon atoms in the vacuum chamber produces a substantially purer film with reduced risk of voids and pinholes. In a preferred embodiment the use of xenon as the operating gas for deposition of the silicon adhesion layer is combined with the use of a filtered cathodic arc (FCA) process to deposit the protective overcoat, preferably carbon based, on a magnetic recording head.

摘要翻译： 公开了一种物理气相沉积（PVD）的方法，其中在沉积粘合层（优选硅）时，将氙用作真空室中的操作气体，其允许粘附层超薄，同时具有改善的耐久性 艺术电影。 如现有技术中典型的使用氩气导致氩原子被掺入到超薄硅膜中，具有有害的结果。 在只有几埃厚的薄膜中，用氩气或其它元素污染薄膜可能产生具有降低的粘附性能的膜，并且在某些情况下，诸如氩气的贵重原子可以逸出留下空隙或针孔的膜。 在真空室中使用更大和更重的氙原子产生基本上更纯的膜，具有降低的空隙和针孔的风险。 在优选的实施方案中，将氙作为沉积硅粘合层的工作气体的使用与使用过滤的阴极电弧（FCA）方法结合，以将保护性外涂层，优选基于碳的沉积物沉积在磁性记录头上。

公开(公告)号：US20130022840A1

公开(公告)日：2013-01-24

申请号：US13187355

申请日：2011-07-20

申请人： Wen-Chien D. Hsiao ,  Ning Shi ,  Yi Zheng

发明人： Wen-Chien D. Hsiao ,  Ning Shi ,  Yi Zheng

IPC分类号： G11B5/33 ,  C25D5/02 ,  B05D5/12

CPC分类号： C25D5/022 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163 ,  Y10T428/1186

摘要： A method for manufacturing a magnetic write head having a write pole with a tapered leading edge formed on a substrate having a tapered surface and a wrap-around, trailing magnetic shield. The method uses a multi-layer anti-reflective coating prior to formation of the shield so that reflection from the tapered surface of the substrate does not affect the lithography of the mask used to form the trailing shield. The multi-layer antireflective coating is constructed of materials that can be left in the finished head, thereby eliminating problems associated with removal of the anti-reflective coating.

摘要翻译： 一种用于制造具有形成在具有锥形表面的基底上的锥形前缘的写入极和缠绕的磁性磁屏蔽的磁性写入头的制造方法。 该方法在形成屏蔽之前使用多层抗反射涂层，使得来自衬底的锥形表面的反射不影响用于形成后屏蔽的掩模的光刻。 多层抗反射涂层由可以留在成品头中的材料构成，从而消除与去除抗反射涂层有关的问题。

公开(公告)号：US08108985B2

公开(公告)日：2012-02-07

申请号：US11934687

申请日：2007-11-02

申请人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-Chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

发明人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-Chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3166 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T428/11 ,  Y10T428/1186

摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.

摘要翻译： 一种用于制造用于垂直磁记录的磁写头的方法。 该方法包括形成写极，然后沉积补充层。 掩模结构可以形成在写极和再填充层上，掩模结构被配置为限定缝合极。 然后可以执行离子铣或反应离子研磨以去除未被掩模结构保护的部分填充层。 然后可以沉积磁性材料以形成限定二次闪光点的缝合写入极。 缝合的杆也可以与电动研磨引导件自对准，以便相对于写入头的空气轴承表面精确地定位二次扩张点的前边缘。

公开(公告)号：US20110146061A1

公开(公告)日：2011-06-23

申请号：US12645323

申请日：2009-12-22

申请人： Shin Funada ,  Quang Le ,  Thomas L. Leong ,  Jui-Lung Li ,  Chang-Man Park ,  Ning Shi ,  Hicham M. Sougrati

发明人： Shin Funada ,  Quang Le ,  Thomas L. Leong ,  Jui-Lung Li ,  Chang-Man Park ,  Ning Shi ,  Hicham M. Sougrati

IPC分类号： G11B5/127

CPC分类号： G11B5/3163 ,  G11B5/112 ,  G11B5/3912 ,  G11B5/398 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49067

摘要： A method for manufacturing a magnetoresistive sensor that results in the sensor having a very flat top magnetic shield. The process involves depositing a plurality of sensor layers and then depositing a thin high density carbon CMP stop layer over the sensor layers and forming a mask over the CMP stop layer. An ion milling is performed to define the sensor. Then a thin insulating layer and magnetic hard bias layer are deposited. A chemical mechanical polishing is performed to remove the mask and a reactive ion etching is performed to remove the remaining carbon CMP stop layer. Because the CMP stop layer is very dense and hard, it can be made very thin. This means that when it is removed by reactive ion etching, there is very little notching over the sensor, thereby allowing the upper shield (deposited there-over) to be very thin.

摘要翻译： 一种用于制造磁阻传感器的方法，其导致传感器具有非常平坦的顶部磁屏蔽。 该过程包括沉积多个传感器层，然后在传感器层上沉积薄的高密度碳CMP停止层，并在CMP停止层上形成掩模。 执行离子铣削来定义传感器。 然后沉积薄的绝缘层和磁性硬偏置层。 进行化学机械抛光以除去掩模，并执行反应离子蚀刻以除去剩余的碳CMP停止层。 因为CMP停止层非常致密且硬，所以可以使其非常薄。 这意味着当通过反应离子蚀刻去除时，在传感器上几乎没有凹口，从而允许上部屏蔽（沉积在其上）非常薄。

公开(公告)号：US20100159259A1

公开(公告)日：2010-06-24

申请号：US12642799

申请日：2009-12-19

申请人： Lex Kosowsky ,  Robert Fleming ,  Ning Shi ,  Junjun Wu

发明人： Lex Kosowsky ,  Robert Fleming ,  Ning Shi ,  Junjun Wu

IPC分类号： B32B15/04 ,  B32B9/04 ,  H01B1/00 ,  H01B1/04

CPC分类号： H01L27/1021 ,  H01C7/105 ,  H01L23/60 ,  H01L23/62 ,  H01L27/0288 ,  H01L2924/0002 ,  H05K1/0257 ,  H05K2201/0738 ,  Y10T428/31504 ,  Y10T428/31678 ,  H01L2924/00

摘要： A composition of VSD material comprises a binder, and one or more types of particles that include a concentration of doped semiconductor particles.

摘要翻译： VSD材料的组合物包括粘合剂和包括掺杂半导体颗粒的浓度的一种或多种类型的颗粒。

公开(公告)号：US20100187483A1

公开(公告)日：2010-07-29

申请号：US12692573

申请日：2010-01-22

申请人： Robert Fleming ,  Ning Shi ,  Pragnya Saraf

发明人： Robert Fleming ,  Ning Shi ,  Pragnya Saraf

IPC分类号： H01B1/22 ,  H01B1/00 ,  H01B1/24 ,  H01B1/20

CPC分类号： H05K1/0257 ,  H05K1/0259 ,  H05K1/0373 ,  H05K2201/0738

摘要： A binder for VSD composition is selected to have enhanced electron mobility in presence of high electric fields.

摘要翻译： 选择用于VSD组合物的粘合剂以在存在高电场的情况下具有增强的电子迁移率。

公开(公告)号：US20060286292A1

公开(公告)日：2006-12-21

申请号：US11151626

申请日：2005-06-13

申请人： Ming Jiang ,  Ning Shi ,  Sue Zhang ,  Yi Zheng

发明人： Ming Jiang ,  Ning Shi ,  Sue Zhang ,  Yi Zheng

IPC分类号： B05D5/12 ,  C23C16/00

CPC分类号： G11B5/3106 ,  C23C28/00 ,  C23C28/322 ,  C23C28/341 ,  C23C28/343 ,  C23C28/345 ,  C23C28/347 ,  C23C28/42 ,  G11B5/3163

摘要： An improved method of fabricating thin-film magnetic recording heads is disclosed. For the method, one or more layers for a feature (such as a read element, a write element, etc) are deposited and patterned. A layer of adhesion material is then deposited on the layers of the feature. The adhesion material provides better adhesion to a Diamond-Like Carbon (DLC) layer and to the underlying feature surface, such as monolithic Silicon (Si) or Titanium (Ti). A layer of DLC material is then deposited on the layer of adhesion material. The steps of depositing the layer of adhesion material and the layer of DLC material are repeated more than one time. Thus, more than one set of alternating layers of adhesion material and DLC material are deposited on the layers of the feature to form a multi-layer protective coating on the feature.

摘要翻译： 公开了一种制造薄膜磁记录头的改进方法。 对于该方法，一个或多个特征层（如读取元素，写入元件等）被沉积和图案化。 然后将一层粘合材料沉积在特征层上。 粘合材料提供对类金刚石碳（DLC）层和底层特征表面（例如单片硅（Si）或钛（Ti））的更好的附着力。 然后将DLC材料层沉积在粘合材料层上。 沉积粘合材料层和DLC材料层的步骤重复一次以上。 因此，多于一组交替层的粘合材料和DLC材料沉积在特征层上，以在该特征上形成多层保护涂层。

公开(公告)号：US20060044678A1

公开(公告)日：2006-03-02

申请号：US10930377

申请日：2004-08-30

申请人： Eric Flint ,  Ning Shi ,  Qui-Fan Xiao

发明人： Eric Flint ,  Ning Shi ,  Qui-Fan Xiao

IPC分类号： G11B5/187

CPC分类号： G11B5/3163 ,  G11B5/3106

摘要： A method for applying a protective layer to an electronic device such as the ABS of a slider, magnetic head, etc. for reducing paramagnetic deadlayer thickness includes selecting an etching angle for minimizing formation of a paramagnetic deadlayer at an interface of an electronic device and an adhesive layer subsequently formed on the electronic device, etching a surface of an electronic device at the selected angle, the selected angle being less than about 75 degrees from an imaginary line extending perpendicular to the surface, forming an adhesive layer on the etched surface of the electronic device, and forming a protective layer on the adhesive layer. A magnetic head formed by the process is also disclosed.

摘要翻译： 将保护层施加到诸如滑块，磁头等的ABS的用于降低顺磁性层的厚度的电子设备的方法包括选择蚀刻角度以最小化在电子设备的界面处形成顺磁性残留层 随后形成在电子设备上的粘合剂层，以选定的角度蚀刻电子器件的表面，所选择的角度距离垂直于该表面延伸的假想线小于约75度，在该蚀刻表面上形成粘合剂层 电子器件，并在粘合剂层上形成保护层。 还公开了通过该方法形成的磁头。

公开(公告)号：US20050264933A1

公开(公告)日：2005-12-01

申请号：US10857586

申请日：2004-05-28

申请人： Ning Shi ,  Xiao Wu ,  Hong Zhang

发明人： Ning Shi ,  Xiao Wu ,  Hong Zhang

IPC分类号： G11B5/147 ,  G11B5/187 ,  G11B5/31

CPC分类号： G11B5/3136 ,  G11B5/187 ,  G11B5/3106 ,  G11B5/3133

摘要： A magnetic recording head with reduced thermally induced protrusion. In one embodiment, a thermal expansion constraining layer comprising silicon dioxide for instance overlays a magnetic recording head. The thermal expansion constraining layer has a very low coefficient of thermal expansion. A sealant layer comprising aluminum oxide overlays the thermal expansion constraining layer. The thermal expansion constraining layer prevents deleterious deformation of underlying head structures that can degrade performance of a storage system. The sealant layer protects the thermal expansion constraining layer from propagation of surface defects therein by protection from shock, including shock during fabrication, as well as moisture, increasing manufacturing yield and reliability.

摘要翻译： 具有减少的热诱导突起的磁记录头。 在一个实施例中，包括二氧化硅的热膨胀约束层例如覆盖磁记录头。 热膨胀约束层具有非常低的热膨胀系数。 包含氧化铝的密封剂层覆盖热膨胀约束层。 热膨胀约束层防止潜在的头部结构的有害变形，这会降低存储系统的性能。 密封剂层通过防止冲击，包括制造期间的冲击以及湿气，提高制造产量和可靠性而保护热膨胀约束层免受其中的表面缺陷的传播。