公开(公告)号：US08451650B2

公开(公告)日：2013-05-28

申请号：US13524809

申请日：2012-06-15

申请人： Fernando Gonzalez ,  Chandra V. Mouli

发明人： Fernando Gonzalez ,  Chandra V. Mouli

IPC分类号： G11C11/24

CPC分类号： G11C11/401 ,  G11C11/405 ,  G11C11/408 ,  G11C11/409 ,  H01L27/0705 ,  H01L27/108 ,  H01L27/10802 ,  H01L29/66666 ,  H01L29/7841

摘要： A capacitor-less memory cell, memory device, system and process of forming the capacitor-less memory cell includes forming the memory cell in an active area of a substantially physically isolated portion of the bulk semiconductor substrate. A pass transistor is formed on the active area for coupling with a word line. The capacitor-less memory cell further includes a read/write enable transistor vertically configured along at least one vertical side of the active area and operable during a reading of a logic state with the logic state being stored as charge in a floating body area of the active area, causing different determinable threshold voltages for the pass transistor.

摘要翻译： 无电容器的存储单元，存储器件，系统和形成无电容器的存储单元的工艺包括在体半导体衬底的基本上物理隔离的部分的有源区中形成存储单元。 在有源区上形成传输晶体管，用于与字线耦合。 无电容器存储单元还包括沿着有效区域的至少一个垂直侧垂直配置的读/写使能晶体管，并且在逻辑状态的读取期间可操作，逻辑状态被存储为电荷的浮动体区域 有效区域，导致传输晶体管的不同可确定的阈值电压。

公开(公告)号：US08374037B2

公开(公告)日：2013-02-12

申请号：US13186796

申请日：2011-07-20

申请人： Parag Banerjee ,  Terry Gafron ,  Fernando Gonzalez

发明人： Parag Banerjee ,  Terry Gafron ,  Fernando Gonzalez

IPC分类号： G11C16/10

CPC分类号： H01L27/228 ,  G11C11/161 ,  G11C11/1659 ,  G11C11/1675 ,  G11C16/0483 ,  H01L27/11521

摘要： A semiconductor magnetic memory device has a magnetic tunneling junction formed over a memory cell. The memory cell has a control gate surrounded by a floating gate. The floating gate is coupled to the magnetic tunneling junction through a pinning layer that maintains the magnetic orientation of the lower magnetic layer of the junction. A current through a selected word line, coupled to the control gate, generates a first magnetic field. A current through a cell select line generates a second magnetic field that is orthogonal to the first magnetic field. This changes the magnetic orientation of the upper magnetic layer of the junction to lower its resistance, thus allowing a write/erase voltage on a program/erase line to program/erase the floating gate.

摘要翻译： 半导体磁存储器件具有形成在存储单元上的磁性隧道结。 存储单元具有由浮动栅极包围的控制门。 浮动栅极通过钉扎层耦合到磁性隧道结，该钉扎层保持结的下部磁性层的磁性取向。 耦合到控制栅极的选定字线的电流产生第一磁场。 通过单元选择线的电流产生与第一磁场正交的第二磁场。 这改变了结的上部磁性层的磁性取向以降低其电阻，从而允许编程/擦除线上的写入/擦除电压对浮动栅极进行编程/擦除。

公开(公告)号：US20120258577A1

公开(公告)日：2012-10-11

申请号：US13524809

申请日：2012-06-15

申请人： Fernando Gonzalez ,  Chandra V. Mouli

发明人： Fernando Gonzalez ,  Chandra V. Mouli

IPC分类号： H01L21/8239

CPC分类号： G11C11/401 ,  G11C11/405 ,  G11C11/408 ,  G11C11/409 ,  H01L27/0705 ,  H01L27/108 ,  H01L27/10802 ,  H01L29/66666 ,  H01L29/7841

摘要： A capacitor-less memory cell, memory device, system and process of forming the capacitor-less memory cell includes forming the memory cell in an active area of a substantially physically isolated portion of the bulk semiconductor substrate. A pass transistor is formed on the active area for coupling with a word line. The capacitor-less memory cell further includes a read/write enable transistor vertically configured along at least one vertical side of the active area and operable during a reading of a logic state with the logic state being stored as charge in a floating body area of the active area, causing different determinable threshold voltages for the pass transistor.

摘要翻译： 无电容器的存储单元，存储器件，系统和形成无电容器的存储单元的工艺包括在体半导体衬底的基本上物理隔离的部分的有源区中形成存储单元。 在有源区上形成传输晶体管，用于与字线耦合。 无电容器存储单元还包括沿着有效区域的至少一个垂直侧垂直配置的读/写使能晶体管，并且在逻辑状态的读取期间可操作，逻辑状态被存储为电荷的浮动体区域 有效区域，导致传输晶体管的不同可确定的阈值电压。

公开(公告)号：US20110080783A1

公开(公告)日：2011-04-07

申请号：US12966430

申请日：2010-12-13

申请人： Parag Banerjee ,  Terry Grafron ,  Fernando Gonzalez

发明人： Parag Banerjee ,  Terry Grafron ,  Fernando Gonzalez

IPC分类号： G11C11/15

CPC分类号： H01L27/228 ,  G11C11/161 ,  G11C11/1659 ,  G11C11/1675 ,  G11C16/0483 ,  H01L27/11521

摘要： A semiconductor magnetic memory device has a magnetic tunneling junction formed over a memory cell. The memory cell has a control gate surrounded by a floating gate. The floating gate is coupled to the magnetic tunneling junction through a pinning layer that maintains the magnetic orientation of the lower magnetic layer of the junction. A current through a selected word line, coupled to the control gate, generates a first magnetic field. A current through a cell select line generates a second magnetic field that is orthogonal to the first magnetic field. This changes the magnetic orientation of the upper magnetic layer of the junction to lower its resistance, thus allowing a write/erase voltage on a program/erase line to program/erase the floating gate.

摘要翻译： 半导体磁存储器件具有在存储单元上形成的磁隧道结。 存储单元具有由浮动栅极包围的控制栅极。 浮动栅极通过钉扎层耦合到磁性隧道结，该钉扎层保持结的下部磁性层的磁性取向。 耦合到控制栅极的选定字线的电流产生第一磁场。 通过单元选择线的电流产生与第一磁场正交的第二磁场。 这改变了结的上部磁性层的磁性取向以降低其电阻，从而允许编程/擦除线上的写入/擦除电压对浮动栅极进行编程/擦除。

公开(公告)号：US07749860B2

公开(公告)日：2010-07-06

申请号：US09392034

申请日：1999-09-08

申请人： Fernando Gonzalez ,  David Chapek ,  Ranshir P. S. Thakur

发明人： Fernando Gonzalez ,  David Chapek ,  Ranshir P. S. Thakur

IPC分类号： H01L21/764 ,  H01L29/00

CPC分类号： H01L21/76237

摘要： The present invention relates to a method for forming an isolation trench structure in a semiconductor substrate without causing deleterious topographical depressions in the upper surface thereof which cause current and charge leakage to an adjacent active area. The inventive method forms a pad oxide upon a semiconductor substrate, and then forms a nitride layer on the pad oxide. The nitride layer is patterned with a mask and etched to expose a portion of the pad oxide layer and to protect an active area in the semiconductor substrate that remains covered with the nitride layer. A second dielectric layer is formed substantially conformably over the pad oxide layer and the remaining portions of the first dielectric layer. A spacer etch is then carried out to form a spacer from the second dielectric layer. The spacer is in contact with the remaining portion of the first dielectric layer. An isolation trench etch follows the spacer etch. An optional thermal oxidation of the surfaces in the isolation trench may be performed, which may optionally be followed by doping of the bottom of the isolation trench to further isolate neighboring active regions on either side of the isolation trench. A conformal layer is formed substantially conformably over the spacer, over the remaining portions of the first dielectric layer, and substantially filling the isolation trench. Planarization of the conformal layer follows, either by CMP or by etchback or by a combination thereof. An isolation trench filled with a structure results. The resulting structure has a flange and shaft, the cross-section of which has a nail shape in cross-section.

摘要翻译： 本发明涉及一种用于在半导体衬底中形成隔离沟槽结构的方法，而不会在其上表面造成有害的地形凹陷，这导致电流和电荷泄漏到相邻的有效区域。 本发明的方法在半导体衬底上形成衬垫氧化物，然后在衬底氧化物上形成氮化物层。 用掩模对氮化物层进行图案化并蚀刻以暴露焊盘氧化物层的一部分并保护半导体衬底中保留被氮化物层覆盖的有源区。 第二电介质层基本上顺应地形成在焊盘氧化物层和第一电介质层的剩余部分上。 然后进行间隔物蚀刻以从第二介电层形成间隔物。 间隔物与第一电介质层的剩余部分接触。 隔离沟蚀刻遵循间隔物蚀刻。 可以执行隔离沟槽中的表面的可选热氧化，其可以任选地随后掺杂隔离沟槽的底部以进一步隔离隔离沟槽的任一侧上的相邻有源区。 在第一介电层的剩余部分上基本上顺应地形成保形层，并基本上填充隔离沟槽。 通过CMP或通过回蚀或其组合，可以平铺保形层。 填充结构的隔离沟槽结果。 所得到的结构具有法兰和轴，其横截面具有指甲形状的横截面。

公开(公告)号：US07563666B2

公开(公告)日：2009-07-21

申请号：US11869012

申请日：2007-10-09

申请人： Fernando Gonzalez ,  Tyler A. Lowrey ,  Trung Tri Doan ,  Raymond A. Turi ,  Graham R. Wolstenholme

发明人： Fernando Gonzalez ,  Tyler A. Lowrey ,  Trung Tri Doan ,  Raymond A. Turi ,  Graham R. Wolstenholme

IPC分类号： H01L21/8234

CPC分类号： H01L21/02667 ,  H01L21/02532 ,  H01L21/2022 ,  H01L27/0814 ,  H01L27/101 ,  H01L27/1021 ,  H01L27/24 ,  H01L29/6609 ,  H01L29/66136 ,  H01L29/861 ,  H01L45/04 ,  H01L45/145 ,  Y10S257/903 ,  Y10S257/91 ,  Y10S438/979

摘要： Semiconductor structures and methods of making a vertical diode structure are provided. The vertical diode structure may have associated therewith a diode opening extending through an insulation layer and contacting an active region on a silicon wafer. A titanium silicide layer may be formed over the interior surface of the diode opening and contacting the active region. The diode opening may initially be filled with an amorphous silicon plug that is doped during deposition and subsequently recrystallized to form large grain polysilicon. The silicon plug has a top portion that may be heavily doped with a first type dopant and a bottom portion that may be lightly doped with a second type dopant. The top portion may be bounded by the bottom portion so as not to contact the titanium silicide layer. In one embodiment of the vertical diode structure, a programmable resistor contacts the top portion of the silicon plug and a metal line contacts the programmable resistor.

摘要翻译： 提供了制造垂直二极管结构的半导体结构和方法。 垂直二极管结构可以具有延伸穿过绝缘层并接触硅晶片上的有源区的二极管开口。 硅化钛层可以形成在二极管开口的内表面上并与活性区接触。 二极管开口最初可以填充非晶硅插塞，其在沉积期间被掺杂并随后重结晶以形成大晶粒多晶硅。 硅插头具有可以重掺杂第一类型掺杂剂的顶部部分和可以轻掺杂第二类型掺杂剂的底部部分。 顶部可以由底部限定，以便不与硅化钛层接触。 在垂直二极管结构的一个实施例中，可编程电阻器接触硅插头的顶部并且金属线接触可编程电阻器。

公开(公告)号：US07557048B2

公开(公告)日：2009-07-07

申请号：US11472950

申请日：2006-06-21

申请人： Kunal R. Parekh ,  Chandra V. Mouli ,  M. Ceredig Roberts ,  Fernando Gonzalez

发明人： Kunal R. Parekh ,  Chandra V. Mouli ,  M. Ceredig Roberts ,  Fernando Gonzalez

IPC分类号： H01L21/31

CPC分类号： H01L21/76801 ,  H01L21/76829 ,  H01L21/76834 ,  H01L21/823462 ,  H01L21/823481 ,  H01L29/6656 ,  H01L29/6659 ,  H01L29/7833 ,  H01L29/785

摘要： The invention includes methods of forming and/or passivating semiconductor constructions. In particular aspects, various oxides of a semiconductor substrate can be formed by exposing semiconductive material of the substrate to deuterium-enriched steam. In other aspects, a semiconductor construction is passivated by subjecting the construction to an anneal at a temperature of greater than or equal to 350° C. while exposing the construction to a deuterium-enriched ambient.

摘要翻译： 本发明包括形成和/或钝化半导体结构的方法。 在具体方面，半导体衬底的各种氧化物可以通过将衬底的半导体材料暴露于富氘蒸汽来形成。 在其他方面，半导体结构通过在大于或等于350℃的温度下对该结构进行退火而钝化，同时将构造暴露于富氘化环境。

公开(公告)号：US07276756B2

公开(公告)日：2007-10-02

申请号：US11207649

申请日：2005-08-18

申请人： Fernando Gonzalez

发明人： Fernando Gonzalez

IPC分类号： H01L29/76

CPC分类号： H01L27/1082 ,  H01L27/10858 ,  H01L27/10873 ,  H01L27/10888 ,  H01L27/10891 ,  H01L27/1203 ,  Y10S257/907

摘要： The invention includes a method of forming an array of memory cells. A series of capacitor constructions is formed, with the individual capacitor constructions having storage nodes. The capacitor constructions are defined to include a first set of capacitor constructions and a second set of capacitor constructions. A series of electrically conductive transistor gates are formed over the capacitor constructions and in electrical connection with the capacitor constructions. The transistor gates are defined to include a first set that is in electrical connection with the storage nodes of the first set of capacitor constructions, and a second set that is in electrical connection with the storage nodes of the second set of capacitor constructions. A first conductive line is formed over the transistor gates and in electrical connection with the first set of transistor gates, and a second conductive line is formed over the first conductive line and in electrical connection with the second set of transistor gates. The invention also includes an array of memory cells.

摘要翻译： 本发明包括形成存储单元阵列的方法。 形成一系列电容器结构，各个电容器结构具有存储节点。 电容器结构被定义为包括第一组电容器结构和第二组电容器结构。 一系列导电晶体管栅极形成在电容器结构上并与电容器结构电连接。 晶体管栅极被定义为包括与第一组电容器结构的存储节点电连接的第一组，以及与第二组电容器结构的存储节点电连接的第二组。 第一导电线形成在晶体管栅极上并与第一组晶体管栅极电连接，并且第二导线形成在第一导线上并与第二组晶体管栅极电连接。 本发明还包括一组存储单元。

公开(公告)号：US20070035027A1

公开(公告)日：2007-02-15

申请号：US11471236

申请日：2006-06-20

申请人： Fernando Gonzalez ,  Gurtej Sandhu ,  Mike Violette

发明人： Fernando Gonzalez ,  Gurtej Sandhu ,  Mike Violette

IPC分类号： H01L23/52

CPC分类号： H01L21/76804 ,  H01L21/28518 ,  H01L21/76895 ,  H01L21/76897 ,  H01L27/10 ,  H01L27/2409 ,  H01L27/2463 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/144 ,  H01L45/1675 ,  H01L45/1683

摘要： A memory device wherein a diode is serially connected to a programmable resistor and is in electrical communication with a buried digit line. An electrically conductive plug is electrically interposed between the digit line and a strapping layer, thereby creating a double metal scheme wherein the strapping layer is a second metal layer overlying metal wordlines. In a method of a first embodiment the strapping material is electrically connected to the digit line through a planar landing pad overlying the conductive plug. An insulative material is sloped to the planar landing pad in order to provide a surface conducive to the formation of the strapping material. In a method of a second embodiment diodes are formed, each having a maximum width equal to f, which is equal to the minimum photolithographic limit of the photolithographic equipment being used, and distanced one from the other along a length of the digit line by a maximum distance equal to f, at least portions of the diodes are masked; at least a portion of an insulative material interposed between two diodes is removed to expose the buried digit line; and the conductive plug is formed in contact with the exposed portion of the buried digit line. After the formation of a programmable resistor in series with the diode a wordline is formed in electrical communication with each of the programmable resistors, and an insulative layer is formed overlying each wordline. Next an insulative spacer layer is deposited and etched to expose the conductive plug. The strapping layer is then formed overlying and in contact with the conductive plug.

摘要翻译： 一种存储器件，其中二极管串联连接到可编程电阻并与埋地数字线电连通。 导电插头电插入数字线和捆扎层之间，从而产生双金属方案，其中捆扎层是覆盖金属字线的第二金属层。 在第一实施例的方法中，捆扎材料通过覆盖在导电插塞上的平面着陆垫电连接到数字线。 绝缘材料倾斜到平面着陆垫，以提供有利于形成捆扎材料的表面。 在第二实施例的方法中，形成二极管，每个二极管具有等于f的最大宽度，其等于所使用的光刻设备的最小光刻极限，并且沿着数字线的长度彼此间隔一个 最大距离等于f，至少部分二极管被遮蔽; 插入在两个二极管之间的绝缘材料的至少一部分被去除以露出掩埋的数字线; 并且导电插塞形成为与掩埋的数字线的暴露部分接触。 在与二极管串联形成可编程电阻器之后，形成与每个可编程电阻器电连通的字线，并且在每个字线上形成绝缘层。 接下来，沉积和蚀刻绝缘间隔层以暴露导电插塞。 然后将捆扎层覆盖并与导电塞接触。

公开(公告)号：US20070032035A1

公开(公告)日：2007-02-08

申请号：US11545252

申请日：2006-10-10

申请人： D. Durcan ,  Trung Doan ,  Roger Lee ,  Fernando Gonzalez ,  Er-Xuan Ping

发明人： D. Durcan ,  Trung Doan ,  Roger Lee ,  Fernando Gonzalez ,  Er-Xuan Ping

IPC分类号： H01L21/20

CPC分类号： H01L28/91 ,  H01L27/10811 ,  H01L27/10817 ,  H01L27/10852 ,  H01L27/10888 ,  H01L28/65 ,  Y10S257/905

摘要： Disclosed is a container capacitor structure and method of constructing it. An etch mask and etch are used to expose portions of an exterior surface of electrode (“bottom electrodes”) of the container capacitor structure. The etch provides a recess between proximal pairs of container capacitor structures, which recess is available for forming additional capacitance. Accordingly, a capacitor dielectric and a top electrode are formed on and adjacent to, respectively, both an interior surface and portions of the exterior surface of the first electrode. Advantageously, surface area common to both the first electrode and second electrodes is increased over using only the interior surface, which provides additional capacitance without a decrease in spacing for clearing portions of the capacitor dielectric and the second electrode away from a contact hole location. Furthermore, such clearing of the capacitor dielectric and the second electrode portions may be done at an upper location of a substrate assembly in contrast to clearing at a bottom location of a contact via.