公开(公告)号：US20120266840A1

公开(公告)日：2012-10-25

申请号：US13514307

申请日：2010-12-17

申请人： Hideaki Sakurai ,  Takashi Horie

发明人： Hideaki Sakurai ,  Takashi Horie

IPC分类号： F02F1/00

CPC分类号： F01L3/06 ,  F01L1/46 ,  F01L3/20 ,  F01L3/22 ,  F02F1/4235 ,  Y02T10/146

摘要： A cylinder portion configured such that a recess (depression) is formed on an upper edge portion of an inner wall of the cylinder portion to prevent the formation of choke between the inner wall and a side edge of a valve umbrella of an exhaust valve, the recess being formed by depressing the inner wall, and the exhaust valve configured such that a cross section of a head portion of the valve umbrella tapers from an outer peripheral edge of the valve umbrella toward a top of the valve umbrella are included.

摘要翻译： 气缸部分构造成使得凹部（凹陷）形成在气缸部分的内壁的上边缘部分上，以防止在排气门的阀门的内壁和侧边缘之间形成扼流圈， 凹部通过按压内壁而形成，并且排气阀被构造成使得阀伞的头部的截面从阀伞的外周边缘朝向阀伞的顶部逐渐变细。

公开(公告)号：US08956689B2

公开(公告)日：2015-02-17

申请号：US13471796

申请日：2012-05-15

申请人： Toshiaki Watanabe ,  Hideaki Sakurai ,  Nobuyuki Soyama ,  Toshihiro Doi

发明人： Toshiaki Watanabe ,  Hideaki Sakurai ,  Nobuyuki Soyama ,  Toshihiro Doi

IPC分类号： B05D5/12 ,  B32B9/04 ,  H01L49/02 ,  H01L21/02 ,  H01L41/08 ,  H01L41/319 ,  H01L21/28

CPC分类号： H01L21/02197 ,  B05D3/0254 ,  B05D5/00 ,  H01L21/022 ,  H01L21/02282 ,  H01L21/28291 ,  H01L28/55 ,  H01L28/65 ,  H01L28/75 ,  H01L41/0815 ,  H01L41/319 ,  Y10T428/249921 ,  Y10T428/25 ,  Y10T428/26 ,  Y10T428/265

摘要： A method for producing a ferroelectric thin film comprising: coating a composition for forming a ferroelectric thin film on a base electrode of a substrate having a substrate body and the base electrode that has crystal faces oriented in the (111) direction, calcining the coated composition, and subsequently performing firing the coated composition to crystallize the coated composition, and thereby forming a ferroelectric thin film on the base electrode, wherein the method includes formation of an orientation controlling layer by coating the composition on the base electrode, calcining the coated composition, and firing the coated composition, where an amount of the composition coated on the base electrode is controlled such that a thickness of the orientation controlling layer after crystallization is in a range of 35 nm to 150 nm, and thereby controlling the preferential crystal orientation of the orientation controlling layer in the (100) plane.

摘要翻译： 一种铁电薄膜的制造方法，其特征在于，在具有基板主体的基板的基极上涂布形成铁电薄膜的组合物和在（111）方向上取向晶面的基极，煅烧所述涂布组合物 ，然后进行焙烧，使涂布的组合物结晶，使基底电极上形成铁电薄膜，其中，该方法包括通过将该组合物涂布在基极上，煅烧涂布组合物，形成取向控制层， 对涂覆在基极上的组合物的量进行控制，使得结晶后的取向控制层的厚度在35nm〜150nm的范围内，从而控制该涂层组合物的优选结晶取向 （100）平面中的取向控制层。

公开(公告)号：US08891227B2

公开(公告)日：2014-11-18

申请号：US13393908

申请日：2010-09-02

申请人： Hideaki Sakurai ,  Toshiaki Watanabe ,  Nobuyuki Soyama

发明人： Hideaki Sakurai ,  Toshiaki Watanabe ,  Nobuyuki Soyama

IPC分类号： H01G4/06 ,  C01G23/00 ,  C04B35/624 ,  C04B35/47 ,  H01G4/12 ,  H01L21/02 ,  C04B35/468 ,  H01G7/06 ,  H01G4/33 ,  H01L49/02

CPC分类号： C04B35/624 ,  C01G23/006 ,  C04B35/4686 ,  C04B35/47 ,  C04B2235/441 ,  C04B2235/6562 ,  H01G4/1227 ,  H01G4/33 ,  H01G7/06 ,  H01L21/02197 ,  H01L21/02282 ,  H01L28/55 ,  Y10T29/435 ,  Y10T428/2495

摘要： In this process of forming a dielectric thin film, when a dielectric thin film represented by Ba1−xSrxTiyO3 (0.2

摘要翻译： 在形成电介质薄膜的方法中，当通过溶胶 - 凝胶法形成由Ba1-xSrxTiyO3（0.2

公开(公告)号：US08501560B2

公开(公告)日：2013-08-06

申请号：US13067800

申请日：2011-06-28

申请人： Hideaki Sakurai ,  Toshiaki Watanabe ,  Nobuyuki Soyama ,  Guillaume Guegan

发明人： Hideaki Sakurai ,  Toshiaki Watanabe ,  Nobuyuki Soyama ,  Guillaume Guegan

IPC分类号： H01L21/8242 ,  H01L21/00 ,  H01L21/20

CPC分类号： H01L28/60 ,  B82Y30/00 ,  C04B35/4682 ,  C04B2235/3213 ,  C04B2235/441 ,  C04B2235/781 ,  C04B2235/785 ,  C04B2235/787 ,  H01G4/01 ,  H01G4/1227 ,  H01G4/33 ,  H01L21/02197 ,  H01L21/02282 ,  H01L28/55 ,  H01L28/65

摘要： A thin film capacitor is characterized by forming a lower electrode, coating a composition onto the lower electrode without applying an annealing process having a temperature of greater than 300° C., drying at a predetermined temperature within a range from ambient temperature to 500° C., and calcining at a predetermined temperature within a range of 500 to 800° C. and higher than a drying temperature. The process from coating to calcining is performed the process from coating to calcining once or at least twice, or the process from coating to drying is performed at least twice, and then calcining is performed once. The thickness of the dielectric thin film formed after the first calcining is 20 to 600 nm. The ratio of the thickness of the lower electrode and the thickness of the dielectric thin film formed after the initial calcining step (thickness of lower electrode/thickness of the dielectric thin film) is preferably in the range 0.10 to 15.0.

摘要翻译： 薄膜电容器的特征在于形成下电极，将组合物涂覆在下电极上，而不施加温度大于300℃的退火工艺，在环境温度至500℃的范围内的预定温度下干燥 并在500〜800℃的范围内的预定温度下煅烧并高于干燥温度。 从涂覆到煅烧的过程进行从涂覆到煅烧一次或至少两次的过程，或者从涂覆到干燥的过程进行至少两次，然后进行一次煅烧。 在第一次煅烧后形成的电介质薄膜的厚度为20〜600nm。 初始煅烧步骤后形成的下部电极的厚度与电介质薄膜的厚度之比（下部电极的厚度/电介质薄膜的厚度）优选在0.10〜15.0的范围内。

公开(公告)号：US20110293305A1

公开(公告)日：2011-12-01

申请号：US13137302

申请日：2011-08-04

申请人： Hideaki Sakurai ,  Masatoshi Terayama

发明人： Hideaki Sakurai ,  Masatoshi Terayama

IPC分类号： G03G15/08

CPC分类号： G03F7/30 ,  G03F1/00 ,  G03F7/3028

摘要： A development method according to an embodiment includes exposing a photosensitive film formed on a substrate at a predetermined exposure amount, carrying out a first development process that develops the exposed photosensitive film at a predetermined first development condition so as to leave the photosensitive film, obtaining a sensitivity information of the photosensitive film from a film thickness reduction of the photosensitive film developed by the first development process and the exposure amount, predicting pattern dimensions of multiple types of patterns to be formed when a second development process is carried out following the first development process from the sensitivity information, and determining a first acceptable range of a development condition in the second development process, determining a second acceptable range of the development condition in the second development process from the first acceptable range and a variation amount of the pattern dimension after the development process between the multiple types of patterns and determining a second development condition in the second development process so as to satisfy both of the first and second acceptable ranges.

摘要翻译： 根据实施方案的显影方法包括以预定曝光量曝光形成在基板上的感光膜，进行在预定的第一显影条件下显影曝光的感光膜以便使感光膜离开的第一显影处理，获得 通过第一显影处理显影的感光性膜的膜厚减少和曝光量的感光性膜的感光度信息，预测在第一显影处理后进行第二显影处理时将形成的多种图案的图案尺寸 根据灵敏度信息，并且确定第二显影处理中的显影条件的第一可接受范围，从第一可接受范围和第二显影处理之后的图案尺寸的变化量确定第二显影处理中的显影条件的第二可接受范围 多种类型的图案之间的显影处理，并且在第二显影处理中确定第二显影条件，以便满足第一和第二可接受范围。

公开(公告)号：US20100212523A1

公开(公告)日：2010-08-26

申请号：US12445964

申请日：2007-10-17

申请人： Hideaki Sakurai ,  Masahito Kaneko ,  Yasuharu Suda ,  Katsuhiko Takeda ,  Hiroyuki Yano

发明人： Hideaki Sakurai ,  Masahito Kaneko ,  Yasuharu Suda ,  Katsuhiko Takeda ,  Hiroyuki Yano

IPC分类号： B41F21/00

CPC分类号： B41F22/00 ,  B41F35/006 ,  B41N7/00 ,  B41N2207/02 ,  B41N2207/04

摘要： A printed item contact member 54 according to the present invention includes: a base material 50; a fixing layer 52 that is formed on the surface of the base material 50 and substantially spherical particles 51 are fixed thereto; and a remarkably thin low-surface-tension coating layer 53 that covers the surface of the fixing layer 52 having the substantially spherical particles 51 fixed thereto and that exhibits release properties with respect to a printed item. The printed item contact member exhibits high ink repellency while maintaining the micro-uneven surface structure and is free from adhesion of yarn waste or dust to the member during cleaning, and therefore can be suitably used as, for example, a member for printing device in contact with the surface of printing paper.

摘要翻译： 根据本发明的印刷品接触构件54包括：基材50; 形成在基材50的表面上的固定层52和大致球形的颗粒51固定在其上; 以及非常薄的低表面张力涂层53，其覆盖固定层52的具有固定在其上的基本上球形的颗粒51的表面，并且相对于印刷品具有脱模性。 印刷品接触构件在保持微不平坦表面结构的同时表现出高的拒油性，并且在清洁期间不会将纱线废弃物或灰尘附着到构件上，因此可以适当地用作例如印刷装置的构件 与打印纸表面接触。

公开(公告)号：US07094522B2

公开(公告)日：2006-08-22

申请号：US10969018

申请日：2004-10-21

申请人： Masamitsu Itoh ,  Ikuo Yoneda ,  Hideaki Sakurai

发明人： Masamitsu Itoh ,  Ikuo Yoneda ,  Hideaki Sakurai

IPC分类号： G03F7/30 ,  G03D15/00

CPC分类号： G03F7/30 ,  Y10S438/906

摘要： A developing method comprises determining in advance the relation of resist dissolution concentration in a developing solution and resist dissolution speed by the developing solution, estimating in advance the resist dissolution concentration where the resist dissolution speed is a desired speed or more from the relation, and developing in a state in which the resist dissolution concentration in the developing solution is the estimated dissolution concentration or less.

摘要翻译： 一种显影方法包括：预先确定显影液中的抗蚀剂溶解浓度与显影液的抵抗溶解速度的关系，提前估计抗蚀剂溶解浓度，其中抗蚀剂溶解速度为所需速度或更高的关系，显影 在显影液中的抗蚀剂溶解浓度为估计的溶解浓度以下的状态。

公开(公告)号：US07001086B2

公开(公告)日：2006-02-21

申请号：US10968992

申请日：2004-10-21

申请人： Masamitsu Itoh ,  Ikuo Yoneda ,  Hideaki Sakurai

发明人： Masamitsu Itoh ,  Ikuo Yoneda ,  Hideaki Sakurai

IPC分类号： G03D5/04 ,  G03F7/30 ,  B08B5/04 ,  B65D3/00

CPC分类号： G03F7/30 ,  Y10S438/906

摘要： A developing method comprises determining in advance the relation of resist dissolution concentration in a developing solution and resist dissolution speed by the developing solution, estimating in advance the resist dissolution concentration where the resist dissolution speed is a desired speed or more from the relation, and developing in a state in which the resist dissolution concentration in the developing solution is the estimated dissolution concentration or less.

公开(公告)号：US06978715B2

公开(公告)日：2005-12-27

申请号：US10393397

申请日：2003-03-21

申请人： Yasuharu Suda ,  Hideaki Sakurai ,  Toyoaki Yasui ,  Toyoshi Ohto

发明人： Yasuharu Suda ,  Hideaki Sakurai ,  Toyoaki Yasui ,  Toyoshi Ohto

IPC分类号： B41C1/10 ,  B41N3/00

CPC分类号： B41N3/006 ,  B41C1/10 ,  B41C1/1083 ,  B41P2227/70

摘要： A printing press, and an apparatus and a process for regenerating a printing plate can repetitiously reuse the same printing plate and shorten time for decomposition of image areas formed by a hydrophobic organic compound under irradiation with activating light to delete the image areas. A process for regenerating a printing plate including a photosensitive layer, formed on the surface of a substrate, having a photocatalyst exhibits hydrophilicity responsive to activating light having energy higher than the photocatalyst's band-gap energy, and one or more hydrophobic image areas, formed on the surface of the photosensitive layer and operable to hold ink, comprises the steps of: removing ink remaining on the printing plate; hydrophilizing the surface of the printing plate by irradiating with the activating light and by heating the printing plate to delete the hydrophobic image areas; and applying an organic compound onto the printing plate.

摘要翻译： 印刷机以及用于再生印版的装置和方法可以重复使用相同的印版，并且缩短用激活光照射下由疏水性有机化合物形成的图像区域的分解时间，以删除图像区域。 一种用于再生含有光敏层的印刷板的方法，其具有光催化剂的基板表面上，具有响应于活化具有高于光催化剂的带隙能量的光的光的亲水性，以及一个或多个疏水性图像区域，形成在 感光层的表面可操作以保持油墨，包括以下步骤：去除留在印版上的油墨; 通过照射活化光使印版的表面亲水化并通过加热印版去除疏水图像区域; 并将有机化合物施加到印刷版上。

公开(公告)号：US20050100824A1

公开(公告)日：2005-05-12

申请号：US10962490

申请日：2004-10-13

申请人： Yasuharu Suda ,  Hideaki Sakurai ,  Toyoshi Ohto

发明人： Yasuharu Suda ,  Hideaki Sakurai ,  Toyoshi Ohto

IPC分类号： G03F7/004 ,  B41C1/10 ,  B41N1/14 ,  G03F7/00

CPC分类号： B41C1/1025 ,  B41C2201/04 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/20 ,  B41C2210/24 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165

摘要： A coating fluid for printing plates which can be suitably used to make printing plates that permit images to be written in response to input digital data and that can be easily regenerated and reused. This coating fluid for. printing plates comprises at least a carrier liquid, thermoplastic resin particles and an IR absorber, and the IR absorber has a decomposition starting temperature higher than the melt starting temperature of the thermoplastic resin particles.

摘要翻译： 用于印版的涂布液，其可适用于制造印刷版，其允许根据输入的数字数据写入图像，并且可以容易地再生和重复使用。 这种涂层液为。 印版至少包含载液，热塑性树脂颗粒和IR吸收剂，IR吸收剂的分解开始温度高于热塑性树脂颗粒的熔融起始温度。