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1.发明申请CONNECTION BOARD, AND MULTI-LAYER WIRING BOARD, SUBSTRATE FOR SEMICONDUCTOR PACKAGE AND SEMICONDUCTOR PACKAGE USING CONNECTION BOARD, AND MANUFACTURING METHOD THEREOF 有权连接板和多层接线板，用于半导体封装的基板和使用连接板的半导体封装及其制造方法公开(公告)号：US20080010819A1
公开(公告)日：2008-01-17
申请号：US11775294
申请日：2007-07-10
申请人： Hidehiro NAKAMURA , Akishi Nakaso , Shigeharu Arike , Fumio Inoue , Tetsuya Enomoto , Norio Moriike , Kousuke Hiroki
发明人： Hidehiro NAKAMURA , Akishi Nakaso , Shigeharu Arike , Fumio Inoue , Tetsuya Enomoto , Norio Moriike , Kousuke Hiroki
IPC分类号： H05K3/30
CPC分类号： H05K3/4617 , H01L21/4857 , H01L21/486 , H01L23/3128 , H01L23/49822 , H01L23/49827 , H01L24/45 , H01L24/48 , H01L24/73 , H01L2224/32225 , H01L2224/45144 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/92247 , H01L2924/01046 , H01L2924/01078 , H01L2924/01079 , H01L2924/01327 , H01L2924/15183 , H01L2924/15311 , H01L2924/181 , H05K3/0097 , H05K3/06 , H05K3/244 , H05K3/4038 , H05K3/4623 , H05K3/4632 , H05K3/4647 , H05K2201/0141 , H05K2201/0195 , H05K2201/0355 , H05K2201/0361 , H05K2201/096 , H05K2201/10378 , H05K2203/0152 , H05K2203/0156 , H05K2203/0384 , H05K2203/0733 , H05K2203/1536 , Y10T29/49126 , Y10T29/4913 , Y10T29/49147 , Y10T29/49165 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要： The present invention provides a connection board that is formed by an insulating resin composition layer made of one layer or two or more layers and a connection conductor that is formed so as to pass through the insulating resin composition layer in its thickness direction at a position where a conductor circuit is connected, and a multi-layer wiring board, a substrate for semiconductor package and a semiconductor package using the connection board, and methods for manufacturing them.
摘要翻译： 本发明提供一种由一层或两层以上的绝缘树脂组合物层形成的连接板，以及形成为在其绝缘树脂组合物层的厚度方向上形成的连接导体， 连接导体电路，并且使用多层布线板，半导体封装用基板和使用该连接基板的半导体封装，以及其制造方法。
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公开(公告)号：US20080289868A1
公开(公告)日：2008-11-27
申请号：US12182908
申请日：2008-07-30
申请人： Hidehiro Nakamura , Akishi Nakaso , Shigeharu Arike , Fumio Inoue , Tetsuya Enomoto , Norio Moriike , Kousuke Hiroki
发明人： Hidehiro Nakamura , Akishi Nakaso , Shigeharu Arike , Fumio Inoue , Tetsuya Enomoto , Norio Moriike , Kousuke Hiroki
CPC分类号： H05K3/4617 , H01L21/4857 , H01L21/486 , H01L23/3128 , H01L23/49822 , H01L23/49827 , H01L24/45 , H01L24/48 , H01L24/73 , H01L2224/32225 , H01L2224/45144 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/92247 , H01L2924/01046 , H01L2924/01078 , H01L2924/01079 , H01L2924/01327 , H01L2924/15183 , H01L2924/15311 , H01L2924/181 , H05K3/0097 , H05K3/06 , H05K3/244 , H05K3/4038 , H05K3/4623 , H05K3/4632 , H05K3/4647 , H05K2201/0141 , H05K2201/0195 , H05K2201/0355 , H05K2201/0361 , H05K2201/096 , H05K2201/10378 , H05K2203/0152 , H05K2203/0156 , H05K2203/0384 , H05K2203/0733 , H05K2203/1536 , Y10T29/49126 , Y10T29/4913 , Y10T29/49147 , Y10T29/49165 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要： The present invention provides a connection board that is formed by an insulating resin composition layer made of one layer or two or more layers and a connection conductor that is formed so as to pass through the insulating resin composition layer in its thickness direction at a position where a conductor circuit is connected, and a multi-layer wiring board, a substrate for semiconductor package and a semiconductor package using the connection board, and methods for manufacturing them.
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3.发明授权公开(公告)号：US08028402B2
公开(公告)日：2011-10-04
申请号：US11775294
申请日：2007-07-10
申请人： Hidehiro Nakamura , Akishi Nakaso , Shigeharu Arike , Fumio Inoue , Tetsuya Enomoto , Norio Moriike , Kousuke Hiroki
发明人： Hidehiro Nakamura , Akishi Nakaso , Shigeharu Arike , Fumio Inoue , Tetsuya Enomoto , Norio Moriike , Kousuke Hiroki
CPC分类号： H05K3/4617 , H01L21/4857 , H01L21/486 , H01L23/3128 , H01L23/49822 , H01L23/49827 , H01L24/45 , H01L24/48 , H01L24/73 , H01L2224/32225 , H01L2224/45144 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/92247 , H01L2924/01046 , H01L2924/01078 , H01L2924/01079 , H01L2924/01327 , H01L2924/15183 , H01L2924/15311 , H01L2924/181 , H05K3/0097 , H05K3/06 , H05K3/244 , H05K3/4038 , H05K3/4623 , H05K3/4632 , H05K3/4647 , H05K2201/0141 , H05K2201/0195 , H05K2201/0355 , H05K2201/0361 , H05K2201/096 , H05K2201/10378 , H05K2203/0152 , H05K2203/0156 , H05K2203/0384 , H05K2203/0733 , H05K2203/1536 , Y10T29/49126 , Y10T29/4913 , Y10T29/49147 , Y10T29/49165 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要： Disclosed is a manufacturing method of a multi-layer wiring board, which method includes: preparing connection boards, the connection boards having respectively an insulating resin composition layer, a connection conductor formed so as to pass through the insulating resin composition layer and a conductor circuit formed on the insulating resin composition layer and connected to the connection conductor; aligning the connection boards; and laminating the aligned connection boards by heating and pressing, so that the connection conductors, or the connection conductor and the conductor circuit, are conductively connected with each other, and the connection boards are mechanically connected with each other by the insulating resin composition layer. The connection boards are formed by specified processing, including use of a three-layer composite metallic layer.
摘要翻译： 公开了一种多层布线板的制造方法，该方法包括：准备连接板，连接板分别具有绝缘树脂组合物层，形成为穿过绝缘树脂组合物层的连接导体和导体电路 形成在绝缘树脂组合物层上并连接到连接导体; 对准连接板; 并且通过加热和压制层叠对准的连接板，使得连接导体或连接导体和导体电路彼此导电连接，并且连接板通过绝缘树脂组合物层彼此机械连接。 连接板通过特定的加工形成，包括使用三层复合金属层。
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4.发明申请Connection board, and multi-layer wiring board, substrate for semiconductor package and semiconductor package using connection board, and manufacturing method thereof 审中-公开连接板和多层布线板，半导体封装用基板和使用连接板的半导体封装及其制造方法公开(公告)号：US20090008141A1
公开(公告)日：2009-01-08
申请号：US12230564
申请日：2008-09-02
申请人： Hidehiro Nakamura , Akishi Nakaso , Shigeharu Arike , Fumio Inoue , Tetsuya Enomoto , Norio Moriike , Kousuke Hiroki
发明人： Hidehiro Nakamura , Akishi Nakaso , Shigeharu Arike , Fumio Inoue , Tetsuya Enomoto , Norio Moriike , Kousuke Hiroki
CPC分类号： H05K3/4617 , H01L21/4857 , H01L21/486 , H01L23/3128 , H01L23/49822 , H01L23/49827 , H01L24/45 , H01L24/48 , H01L24/73 , H01L2224/32225 , H01L2224/45144 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/92247 , H01L2924/01046 , H01L2924/01078 , H01L2924/01079 , H01L2924/01327 , H01L2924/15183 , H01L2924/15311 , H01L2924/181 , H05K3/0097 , H05K3/06 , H05K3/244 , H05K3/4038 , H05K3/4623 , H05K3/4632 , H05K3/4647 , H05K2201/0141 , H05K2201/0195 , H05K2201/0355 , H05K2201/0361 , H05K2201/096 , H05K2201/10378 , H05K2203/0152 , H05K2203/0156 , H05K2203/0384 , H05K2203/0733 , H05K2203/1536 , Y10T29/49126 , Y10T29/4913 , Y10T29/49147 , Y10T29/49165 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要： The present invention provides a connection board that is formed by an insulating resin composition layer made of one layer or two or more layers and a connection conductor that is formed so as to pass through the insulating resin composition layer in its thickness direction at a position where a conductor circuit is connected, and a multi-layer wiring board, a substrate for semiconductor package and a semiconductor package using the connection board, and methods for manufacturing them.
摘要翻译： 本发明提供一种由一层或两层以上的绝缘树脂组合物层形成的连接板，以及形成为在其绝缘树脂组合物层的厚度方向上形成的连接导体， 连接导体电路，并且使用多层布线板，半导体封装用基板和使用该连接基板的半导体封装，以及其制造方法。
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5.发明申请Connection substrate, multi-layer wiring board using the connection substrate, substrate for semiconductor package, and methods for manufacturing them 审中-公开连接基板，使用连接基板的多层布线板，半导体封装用基板及其制造方法公开(公告)号：US20060162956A1
公开(公告)日：2006-07-27
申请号：US10500119
申请日：2002-12-24
申请人： Hidehiro Nakamura , Akishi Nakaso , Shigeharu Arike , Fumio Inoue , Tetsduya Enomoto , Norio Moriike , Kousuke Hiroki
发明人： Hidehiro Nakamura , Akishi Nakaso , Shigeharu Arike , Fumio Inoue , Tetsduya Enomoto , Norio Moriike , Kousuke Hiroki
CPC分类号： H05K3/4617 , H01L21/4857 , H01L21/486 , H01L23/3128 , H01L23/49822 , H01L23/49827 , H01L24/45 , H01L24/48 , H01L24/73 , H01L2224/32225 , H01L2224/45144 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/92247 , H01L2924/01046 , H01L2924/01078 , H01L2924/01079 , H01L2924/01327 , H01L2924/15183 , H01L2924/15311 , H01L2924/181 , H05K3/0097 , H05K3/06 , H05K3/244 , H05K3/4038 , H05K3/4623 , H05K3/4632 , H05K3/4647 , H05K2201/0141 , H05K2201/0195 , H05K2201/0355 , H05K2201/0361 , H05K2201/096 , H05K2201/10378 , H05K2203/0152 , H05K2203/0156 , H05K2203/0384 , H05K2203/0733 , H05K2203/1536 , Y10T29/49126 , Y10T29/4913 , Y10T29/49147 , Y10T29/49165 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要： The present invention provides a connection board that is formed by an insulating resin composition layer made of one layer or two or more layers and a connection conductor that is formed so as to pass through the insulating resin composition layer in its thickness direction at a position where a conductor circuit is connected, and a multi-layer wiring board, a substrate for semiconductor package and a semiconductor package using the connection board, and methods for manufacturing them.
摘要翻译： 本发明提供一种由一层或两层以上的绝缘树脂组合物层形成的连接板，以及形成为在其绝缘树脂组合物层的厚度方向上形成的连接导体， 连接导体电路，并且使用多层布线板，半导体封装用基板和使用该连接基板的半导体封装，以及其制造方法。
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公开(公告)号：US20080096046A1
公开(公告)日：2008-04-24
申请号：US11908329
申请日：2006-03-10
申请人： Tomoaki Yamashita , Yasuo Inoue , Masaharu Matsuura , Toyoki Ito , Akira Shimizu , Fumio Inoue , Akishi Nakaso
发明人： Tomoaki Yamashita , Yasuo Inoue , Masaharu Matsuura , Toyoki Ito , Akira Shimizu , Fumio Inoue , Akishi Nakaso
CPC分类号： H05K3/385 , C23C8/02 , C23C8/40 , C23C22/63 , C23C28/00 , C23C28/321 , C23C28/322 , C23C28/345 , H01L2224/16225 , H01L2224/32225 , H01L2224/45144 , H01L2224/48091 , H01L2224/73204 , H01L2224/73265 , H01L2924/15311 , H01L2924/181 , H05K3/384 , H05K3/389 , H05K3/4644 , H05K2201/0347 , H05K2201/0373 , H05K2203/0315 , H05K2203/1157 , Y10T428/12438 , Y10T428/12771 , Y10T428/12875 , Y10T428/12903 , Y10T428/12993 , Y10T428/24917 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要： A method of treating the surface of copper is provided to ensure adhesive strength between the surface of copper and an insulating layer without forming irregularities exceeding 1 μm on the surface of copper and to improve insulation reliability between wirings. A copper whose surface is treated by the above surface treating method is also provided. The method of treating the surface of copper comprises the surface of copper comprising the steps of: forming a metal nobler than copper discretely on the surface of copper; and subsequently oxidizing the surface of copper by using an alkaline solution containing an oxidant.
摘要翻译： 提供一种处理铜表面的方法，以确保铜表面和绝缘层之间的粘合强度，而不会在铜表面上形成超过1um的凹凸，并提高布线之间的绝缘可靠性。 还提供了通过上述表面处理方法处理其表面的铜。 处理铜的表面的方法包括铜的表面，包括以下步骤：在铜的表面上离散地形成比铜更贵的金属; 然后通过使用含有氧化剂的碱性溶液氧化铜的表面。
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公开(公告)号：US07588835B2
公开(公告)日：2009-09-15
申请号：US11908329
申请日：2006-03-10
申请人： Tomoaki Yamashita , Yasuo Inoue , Masaharu Matsuura , Toyoki Ito , Akira Shimizu , Fumio Inoue , Akishi Nakaso
发明人： Tomoaki Yamashita , Yasuo Inoue , Masaharu Matsuura , Toyoki Ito , Akira Shimizu , Fumio Inoue , Akishi Nakaso
CPC分类号： H05K3/385 , C23C8/02 , C23C8/40 , C23C22/63 , C23C28/00 , C23C28/321 , C23C28/322 , C23C28/345 , H01L2224/16225 , H01L2224/32225 , H01L2224/45144 , H01L2224/48091 , H01L2224/73204 , H01L2224/73265 , H01L2924/15311 , H01L2924/181 , H05K3/384 , H05K3/389 , H05K3/4644 , H05K2201/0347 , H05K2201/0373 , H05K2203/0315 , H05K2203/1157 , Y10T428/12438 , Y10T428/12771 , Y10T428/12875 , Y10T428/12903 , Y10T428/12993 , Y10T428/24917 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要： A method of treating the surface of copper is provided to ensure adhesive strength between the surface of copper and an insulating layer without forming irregularities exceeding 1 μm on the surface of copper and to improve insulation reliability between wirings. A copper whose surface is treated by the above surface treating method is also provided. The method of treating the surface of copper comprises the surface of copper comprising the steps of: forming a metal nobler than copper discretely on the surface of copper; and subsequently oxidizing the surface of copper by using an alkaline solution containing an oxidant.
摘要翻译： 提供一种处理铜表面的方法，以确保铜表面和绝缘层之间的粘合强度，而不会在铜表面上形成超过1um的凹凸，并提高布线之间的绝缘可靠性。 还提供了通过上述表面处理方法处理其表面的铜。 处理铜的表面的方法包括铜的表面，包括以下步骤：在铜的表面上离散地形成比铜更贵的金属; 然后通过使用含有氧化剂的碱性溶液氧化铜的表面。
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公开(公告)号：US20110147072A1
公开(公告)日：2011-06-23
申请号：US13060095
申请日：2009-06-17
申请人： Tomoaki Yamashita , Sumiko Nakajima , Sadao Itou , Fumio Inoue , Shigeharu Arike
发明人： Tomoaki Yamashita , Sumiko Nakajima , Sadao Itou , Fumio Inoue , Shigeharu Arike
CPC分类号： C23F1/18 , C23F1/02 , H01L2224/16225 , H01L2224/48091 , H01L2224/73204 , H01L2224/73265 , H01L2924/181 , H05K3/384 , H05K3/385 , H05K2203/0315 , H05K2203/1157 , Y10T29/49982 , Y10T428/12438 , Y10T428/12771 , Y10T428/24917 , H01L2924/00012 , H01L2924/00014
摘要： An object of the present invention is to provide a copper surface treatment method capable of keeping certainly a bonding strength between a copper surface and a resist, or between a copper surface and an insulating resin without forming irregularities having sizes of more than 1 μm on the copper surface, and a copper treated with the method. The surface treatment method, comprising: a first step of forming, on a copper surface, a nobler metal than the copper discretely; a second step, subsequent to the first step, of forming copper oxide on the copper surface by oxidation with an alkaline solution containing an oxidizing agent; and third step of dissolving the copper oxide so as to be removed, thereby forming irregularities on the copper surface.
摘要翻译： 本发明的目的是提供一种铜表面处理方法，其能够确保铜表面和抗蚀剂之间或铜表面与绝缘树脂之间的结合强度，而不会形成尺寸大于1μm的凹凸 铜表面和用该方法处理的铜。 表面处理方法，包括：在铜表面上离开形成比铜更贵的金属的第一步骤; 在第一步骤之后的第二步，通过用含有氧化剂的碱性溶液氧化在铜表面上形成氧化铜; 以及将氧化铜溶解以除去的第三步骤，从而在铜表面上形成凹凸。
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公开(公告)号：US08809696B2
公开(公告)日：2014-08-19
申请号：US13060095
申请日：2009-06-17
申请人： Tomoaki Yamashita , Sumiko Nakajima , Sadao Itou , Fumio Inoue , Shigeharu Arike
发明人： Tomoaki Yamashita , Sumiko Nakajima , Sadao Itou , Fumio Inoue , Shigeharu Arike
IPC分类号： H05K1/00
CPC分类号： C23F1/18 , C23F1/02 , H01L2224/16225 , H01L2224/48091 , H01L2224/73204 , H01L2224/73265 , H01L2924/181 , H05K3/384 , H05K3/385 , H05K2203/0315 , H05K2203/1157 , Y10T29/49982 , Y10T428/12438 , Y10T428/12771 , Y10T428/24917 , H01L2924/00012 , H01L2924/00014
摘要： An object of the present invention is to provide a copper surface treatment method capable of keeping certainly a bonding strength between a copper surface and a resist, or between a copper surface and an insulating resin without forming irregularities having sizes of more than 1 μm on the copper surface, and a copper treated with the method. The surface treatment method, comprising: a first step of forming, on a copper surface, a nobler metal than the copper discretely; a second step, subsequent to the first step, of forming copper oxide on the copper surface by oxidation with an alkaline solution containing an oxidizing agent; and third step of dissolving the copper oxide so as to be removed, thereby forming irregularities on the copper surface.
摘要翻译： 本发明的目的是提供一种铜表面处理方法，其能够确保铜表面和抗蚀剂之间或铜表面与绝缘树脂之间的结合强度，而不会形成尺寸大于1μm的凹凸 铜表面和用该方法处理的铜。 表面处理方法，包括：在铜表面上离开形成比铜更贵的金属的第一步骤; 在第一步骤之后的第二步，通过用含有氧化剂的碱性溶液氧化在铜表面上形成氧化铜; 以及将氧化铜溶解以除去的第三步骤，从而在铜表面上形成凹凸。
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10.发明授权Substrate for holding a chip of semi-conductor package, semi-conductor package, and fabrication process of semi-conductor package 失效用于保持半导体封装芯片，半导体封装和半导体封装的制造工艺的衬底公开(公告)号：US06236108B1
公开(公告)日：2001-05-22
申请号：US09541041
申请日：2000-03-31
申请人： Yoshiki Sota , Koji Miyata , Toshio Yamazaki , Fumio Inoue , Hidehiro Nakamura , Yoshiaki Tsubomatsu , Yasuhiko Awano , Shigeki Ichimura , Masami Yusa , Yorio Iwasaki
发明人： Yoshiki Sota , Koji Miyata , Toshio Yamazaki , Fumio Inoue , Hidehiro Nakamura , Yoshiaki Tsubomatsu , Yasuhiko Awano , Shigeki Ichimura , Masami Yusa , Yorio Iwasaki
IPC分类号： H01L23495
CPC分类号： H01L23/4985 , H01L24/45 , H01L24/48 , H01L24/73 , H01L24/97 , H01L2224/32225 , H01L2224/45144 , H01L2224/48091 , H01L2224/48227 , H01L2224/48465 , H01L2224/73265 , H01L2224/83192 , H01L2224/97 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01019 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/01077 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/07802 , H01L2924/12042 , H01L2924/15183 , H01L2924/15311 , H01L2924/181 , H01L2224/83 , H01L2224/85 , H01L2224/92247 , H01L2924/00 , H01L2924/00012 , H01L2924/00015 , H01L2224/05599
摘要： A semiconductor packaging chip-supporting substrate of the present invention comprises an insulating supporting substrate, wiring provided on the substrate, and an insulating film provided on the wiring. The wiring each have i) an inner connection that connects to a semiconductor chip electrode and ii) a semiconductor chip-mounting region. An opening is also provided in the insulating supporting substrate at its part where each of the wiring is formed on the insulating supporting substrate, which is the part where an outer connection conducting to the inner connection is provided. The insulating film is formed at the part on which the semiconductor chip is mounted, covering the semiconductor chip-mounting region of the wiring.
摘要翻译： 本发明的半导体封装芯片支撑基板包括绝缘支撑基板，设置在基板上的布线和设置在布线上的绝缘膜。 布线各自具有i）连接到半导体芯片电极的内部连接，以及ii）半导体芯片安装区域。 在绝缘支撑基板的一部分上还设置有开口，其中每个布线形成在绝缘支撑基板上，绝缘支撑基板是设置有内部连接的外部连接的部分。 绝缘膜形成在安装有半导体芯片的部分，覆盖布线的半导体芯片安装区域。
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