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    Imaging optical system and exposure apparatus
    1.
    发明授权
    Imaging optical system and exposure apparatus 有权
    成像光学系统和曝光装置

    公开(公告)号：US07435984B2

    公开(公告)日：2008-10-14

    申请号：US11456115

    申请日：2006-07-07

    申请人： Koichi Sentoku ,  Gaku Takahashi ,  Hideki Ina ,  Yoshinori Miwa

    发明人： Koichi Sentoku ,  Gaku Takahashi ,  Hideki Ina ,  Yoshinori Miwa

    IPC分类号： G01N21/86

    CPC分类号： G03F7/70883 ,  G02B13/143 ,  G02B17/0844 ,  G03F7/70275 ,  G03F9/7096

    摘要： An imaging optical system for imaging a pattern of an object plane onto an image plane includes a first imaging optical system for imaging at a first imaging position, the first imaging optical system having a magnification α in a vacuum atmosphere, and a second imaging optical system for imaging at a second imaging position, the second imaging optical system having a magnification β in the vacuum atmosphere, wherein when an environment in which the imaging optical system is placed changes from the vacuum atmosphere to an air atmosphere or vise versa, a direction of the first imaging position that moves along an optical axis is opposite to a direction of the second imaging position that moves along the optical axis.

    摘要翻译： 用于将物平面图案成像到图像平面上的成像光学系统包括用于在第一成像位置成像的第一成像光学系统，具有在真空气氛中的α倍的第一成像光学系统和第二成像光学系统 为了在第二成像位置进行成像，第二成像光学系统在真空气氛中具有放大率β，其中当放置成像光学系统的环境从真空气氛改变到空气气氛或反之亦然时，方向 沿着光轴移动的第一成像位置与沿着光轴移动的第二成像位置的方向相反。

    IMAGING OPTICAL SYSTEM AND EXPOSURE APPARATUS
    2.
    发明申请
    IMAGING OPTICAL SYSTEM AND EXPOSURE APPARATUS 有权
    成像光学系统和曝光装置

    公开(公告)号：US20070007471A1

    公开(公告)日：2007-01-11

    申请号：US11456115

    申请日：2006-07-07

    申请人： Koichi SENTOKU ,  Gaku Takahashi ,  Hideki Ina ,  Yoshinori Miwa

    发明人： Koichi SENTOKU ,  Gaku Takahashi ,  Hideki Ina ,  Yoshinori Miwa

    IPC分类号： G01N21/86

    CPC分类号： G03F7/70883 ,  G02B13/143 ,  G02B17/0844 ,  G03F7/70275 ,  G03F9/7096

    摘要： An imaging optical system for imaging a pattern of an object plane onto an image plane includes a first imaging optical system for imaging at a first imaging position, the first imaging optical system having a magnification α in a vacuum atmosphere, and a second imaging optical system for imaging at a second imaging position, the second imaging optical system having a magnification β in the vacuum atmosphere, wherein when an environment in which the imaging optical system is placed changes from the vacuum atmosphere to an air atmosphere or vise versa, a direction of the first imaging position that moves along an optical axis is opposite to a direction of the second imaging position that moves along the optical axis.

    摘要翻译： 用于将物平面图案成像到图像平面上的成像光学系统包括用于在第一成像位置成像的第一成像光学系统，具有在真空气氛中的α倍的第一成像光学系统和第二成像光学系统 为了在第二成像位置进行成像，第二成像光学系统在真空气氛中具有放大率β，其中当放置成像光学系统的环境从真空气氛改变到空气气氛或反之亦然时，方向 沿着光轴移动的第一成像位置与沿着光轴移动的第二成像位置的方向相反。

    Exposure apparatus
    3.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号：US07586582B2

    公开(公告)日：2009-09-08

    申请号：US11462175

    申请日：2006-08-03

    申请人： Hideki Ina ,  Koichi Sentoku ,  Gaku Takahashi ,  Yoshinori Miwa

    发明人： Hideki Ina ,  Koichi Sentoku ,  Gaku Takahashi ,  Yoshinori Miwa

    IPC分类号： G03B27/42

    CPC分类号： G03F9/7026 ,  G03F9/7046 ,  G03F9/7088 ,  G03F9/7096

    摘要： At least one exemplary embodiment is directed to an exposure apparatus which includes a chamber, an evacuating device configured to evacuate the chamber, a sensor configured to measure at least any one of the position and the height of a substrate, and a cover for hermetically sealing at least part of the sensor.

    摘要翻译： 至少一个示例性实施例涉及一种曝光装置，其包括腔室，被构造成抽空腔室的抽空装置，构造成测量基底的位置和高度中的至少任何一个的传感器，以及用于气密密封的盖 传感器的至少一部分。

    EXPOSURE APPARATUS
    4.
    发明申请
    EXPOSURE APPARATUS 失效
    曝光装置

    公开(公告)号：US20070035708A1

    公开(公告)日：2007-02-15

    申请号：US11462175

    申请日：2006-08-03

    申请人： Hideki Ina ,  Koichi Sentoku ,  Gaku Takahashi ,  Yoshinori Miwa

    发明人： Hideki Ina ,  Koichi Sentoku ,  Gaku Takahashi ,  Yoshinori Miwa

    IPC分类号： G03B27/52

    CPC分类号： G03F9/7026 ,  G03F9/7046 ,  G03F9/7088 ,  G03F9/7096

    摘要： At least one exemplary embodiment is directed to an exposure apparatus which includes a chamber, an evacuating device configured to evacuate the chamber, a sensor configured to measure at least any one of the position and the height of a substrate, and a cover for hermetically sealing at least part of the sensor.

    摘要翻译： 至少一个示例性实施例涉及一种曝光装置，其包括腔室，构造成抽空腔室的抽空装置，构造成测量基底的位置和高度中的至少任何一个的传感器和用于气密密封的盖 传感器的至少一部分。

    Method and program for calculating exposure dose and focus position in exposure apparatus, and device manufacturing method
    5.
    发明授权
    Method and program for calculating exposure dose and focus position in exposure apparatus, and device manufacturing method 失效
    用于计算曝光装置中的曝光剂量和聚焦位置的方法和程序以及装置制造方法

    公开(公告)号：US07771905B2

    公开(公告)日：2010-08-10

    申请号：US11618137

    申请日：2006-12-29

    申请人： Koichi Sentoku ,  Hideki Ina ,  Koji Mikami ,  Yoshiaki Sugimura ,  Hiroto Yoshii ,  Tomoyuki Miyashita

    发明人： Koichi Sentoku ,  Hideki Ina ,  Koji Mikami ,  Yoshiaki Sugimura ,  Hiroto Yoshii ,  Tomoyuki Miyashita

    IPC分类号： G03F9/00

    CPC分类号： G03F7/70641 ,  G03F7/70625

    摘要： A method for calculating an offset of an exposure dose and a focus position in an exposure apparatus that exposes a substrate via an original includes the steps of obtaining information of a shape of a pattern formed on the substrate using the exposure apparatus, calculating a shift amount between a critical dimension contained in the information of the shape of the pattern and a reference value of the critical dimension, and calculating an offset of the focus position based on the information of the shape of the pattern, and calculating the offset of the exposure dose based on the shift amount and the offset of the focus position.

    摘要翻译： 用于计算经由原稿曝光基板的曝光装置中的曝光剂量和聚焦位置的偏移量的方法包括以下步骤：使用曝光装置获得在基板上形成的图案的形状的信息，计算偏移量 在包含在图案形状的信息和临界尺寸的参考值之间的临界尺寸之间，基于图案形状的信息计算焦点位置的偏移量，以及计算曝光剂量的偏移量 基于偏移量和焦点位置的偏移。

    Imprint apparatus and imprint method including dual movable image pick-up device
    6.
    发明授权
    Imprint apparatus and imprint method including dual movable image pick-up device 有权
    印刷装置和压印方法，包括双移动图像拾取装置

    公开(公告)号：US07531821B2

    公开(公告)日：2009-05-12

    申请号：US11851006

    申请日：2007-09-06

    申请人： Nobuhito Suehira ,  Junichi Seki ,  Hideki Ina ,  Koichi Sentoku

    发明人： Nobuhito Suehira ,  Junichi Seki ,  Hideki Ina ,  Koichi Sentoku

    IPC分类号： G01N21/86

    CPC分类号： G03F9/7088 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7003 ,  G03F9/7042 ,  G06K9/325

    摘要： An imprint apparatus, comprising a first holder for holding a mold having an imprint pattern; a second holder for holding a workpiece to which the imprint pattern is transferred; a first illumination system for irradiating a mark for determining a position of the mold and a mark for determining a position of the workpiece with light; a first and second optical systems for imaging the marks for the mold and workpiece at a first and second observation points respectively; an imaging optical system; a first and second image pick-up devices for observing the marks for the mold and workpiece respectively; and at least one of a first drive mechanism for moving the first image pick-up device while following movement of the first observation point and a second drive mechanism for moving the second image pick-up device while following movement of the second observation point.

    摘要翻译： 一种压印装置，包括用于保持具有印记图案的模具的第一保持器; 用于保持印刷图案被转印到的工件的第二保持器; 用于照射用于确定模具的位置的标记的第一照明系统和用于用光确定工件的位置的标记; 第一和第二光学系统，用于分别在第一和第二观察点成像用于模具和工件的标记; 成像光学系统; 分别用于观察模具和工件的标记的第一和第二图像拾取装置; 以及用于在跟随第一观察点的移动的同时移动第一图像拾取装置的第一驱动机构和用于在第二观察点的移动之前移动第二图像拾取装置的第二驱动机构中的至少一个。

    Measurement method and apparatus, exposure apparatus, and device fabrication method
    8.
    发明申请
    Measurement method and apparatus, exposure apparatus, and device fabrication method 有权
    测量方法和装置，曝光装置和装置制造方法

    公开(公告)号：US20050270504A1

    公开(公告)日：2005-12-08

    申请号：US11142964

    申请日：2005-06-01

    申请人： Atsushi Takagi ,  Hideki Ina ,  Koichi Sentoku ,  Hiroshi Morohoshi

    发明人： Atsushi Takagi ,  Hideki Ina ,  Koichi Sentoku ,  Hiroshi Morohoshi

    IPC分类号： G03F7/20 ,  G03B27/68 ,  H01L21/027

    CPC分类号： G03F7/706

    摘要： A measurement method for measuring a distortion of a projection optical system that projects a pattern, used by an exposure apparatus that exposes the reticle pattern onto an object to be exposed, the measurement method includes the steps of a first exposing step for exposing a mark pattern onto the object to be exposed, the mark pattern having a mark on or near an optical axis of the projection optical system and a mark beside the optical axis, and being arranged at a position of the reticle, a second exposing step for only exposing a mark on or near the optical axis of the projection optical system in the mark pattern, measuring step for measuring a shape of the mark formed on the object to be exposed via the first and second exposing steps, and calculating step for calculating the distortion of the projection optical system from the shape of the mark measured by the measuring step.

    摘要翻译： 一种测量方法，用于测量投影光学系统的变形，所述投影光学系统将曝光所述掩模版图案的曝光装置所使用的图案投影到待曝光的物体上，所述测量方法包括以下步骤：第一曝光步骤，用于曝光标记图案 在待曝光的物体上，标记图案在投影光学系统的光轴上或其附近具有标记，并且在光轴旁边具有标记，并且被布置在光罩的位置处，第二曝光步骤仅用于曝光 在标记图案中的投影光学系统的光轴上或附近标记的测量步骤，用于测量经由第一和第二曝光步骤在待曝光的物体上形成的标记的形状的测量步骤，以及用于计算第 投影光学系统从由测量步骤测量的标记的形状。