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24 条记录 (耗时 0.026 秒)

    Light-sensitive o-quinonediazide printing plate with oxonol dye
    3.
    发明授权
    Light-sensitive o-quinonediazide printing plate with oxonol dye 失效
    光敏邻醌醌二叠氮化合物印版与氧杂菁染料

    公开(公告)号：US4497888A

    公开(公告)日：1985-02-05

    申请号：US506268

    申请日：1983-06-21

    申请人： Akira Nishioka ,  Yoshimasa Aotani ,  Kotaro Yamasue

    发明人： Akira Nishioka ,  Yoshimasa Aotani ,  Kotaro Yamasue

    IPC分类号： G03C1/00 ,  G03C1/72 ,  G03F7/00 ,  G03F7/004 ,  G03F7/105 ,  G03C1/60 ,  G03C1/94 ,  G03F7/08

    CPC分类号： G03F7/105

    摘要： A light-sensitive printing plate precursor is disclosed. The printing plate precursor is comprised of an aluminum support base having provided on a grained and anodized surface. The surface is coated with a layer which is comprised of a positive working light-sensitive composition and an oxonol dye. The printing plate has high printing durability, high water retention ability and high color stain resistance. When used the plate precursor provides an image having high contrast. The plate precursor forms less color stain than conventional plates whether used with a fresh developing solution or a fatigued developing solution. The plate precursor does not result in causing uneven development when using manual development methods.

    摘要翻译： 公开了一种感光印版前体。 印版前体由设置在颗粒和阳极氧化表面上的铝支撑基底组成。 该表面涂覆有由正性工作感光组合物和氧杂菁染料组成的层。 印版具有高印刷耐久性，高保水性和高耐污染性。 当使用时，板前体提供具有高对比度的图像。 无论是使用新鲜的显影液还是疲劳的显影液，平板前体形成的染色剂比常规平板少。 当使用手动开发方法时，板前体不会导致不均匀的发展。

    Plate making processing for using negative working light-sensitive lithographic plate requiring no dampening solution
    4.
    发明授权
    Plate making processing for using negative working light-sensitive lithographic plate requiring no dampening solution 失效
    使用不需要润版液的负性工作感光平版印版的制版处理

    公开(公告)号：US4642283A

    公开(公告)日：1987-02-10

    申请号：US711861

    申请日：1985-03-14

    申请人： Hiroshi Takahashi ,  Yasuhisa Narutomi ,  Yoshimasa Aotani ,  Keisuke Shiba

    发明人： Hiroshi Takahashi ,  Yasuhisa Narutomi ,  Yoshimasa Aotani ,  Keisuke Shiba

    IPC分类号： G03F7/00 ,  G03F7/022 ,  G03F7/075 ,  G03F7/08

    CPC分类号： G03F7/0226 ,  G03F7/0752

    摘要： A negative working light-sensitive lithographic plate requiring no dampening solution and a plate making process are described, the negative working light-sensitive lithographic plate comprising a support having, in sequence, on said support, (A) a light-sensitive layer containing (1) an o-quinonediazide compound and (2) a coupling component which causes a diazo coupling reaction under a basic environment, and (B) a silicone rubber layer, and the plate making process comprising imagewise exposing the negative working light-sensitive lithographic plate and developing said exposed plate to obtain a lithographic plate requiring no dampening solution, wherein a step of processing with base is carried out after imagewise exposure.

    摘要翻译： 描述了不需要润版溶液和制版工艺的负工作光敏平版印刷版，负工作光敏平版印刷版包括依次在所述载体上的载体，（A）含有（ 1）邻醌二叠氮化合物和（2）在碱性环境下引起重氮偶合反应的偶联组分和（B）硅橡胶层，制版工艺包括将负性光敏平版印版 并显影所述暴露的板以获得不需要润版溶液的平版印刷版，其中在成像曝光之后进行用碱处理的步骤。

    Photosensitive resin composition utilizing 1,2-naphthoquinone diazide compound having spirobichroman or spirobiindane ring
    5.
    发明授权
    Photosensitive resin composition utilizing 1,2-naphthoquinone diazide compound having spirobichroman or spirobiindane ring 失效
    利用具有螺二双胍或螺二茚环的1,2-萘醌二叠氮化合物的感光树脂组合物

    公开(公告)号：US5358824A

    公开(公告)日：1994-10-25

    申请号：US118590

    申请日：1993-09-10

    申请人： Shiro Tan ,  Yasunori Takata ,  Yoshimasa Aotani ,  Fumiyuki Nishiyama

    发明人： Shiro Tan ,  Yasunori Takata ,  Yoshimasa Aotani ,  Fumiyuki Nishiyama

    IPC分类号： G03F7/022 ,  H01L21/027 ,  H01L21/30 ,  G03F7/023

    CPC分类号： G03F7/022

    摘要： The photosensitive resin composition of the present invention comprises an admixture of 5 to 100 weight parts of a photosensitive material having the following general formula (A) and 100 weight parts of an alkali-soluble resin:General formula (A) ##STR1## where R.sub.1 to R.sub.8 each independently represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxyl group, an aralkyl group, an aryl group, an amino group, a monoalkylamino group, a dialkylamino group, an acylamino group, an alkylcarbamoyl group, an arylcarbamoyl group, an alkylsulfamoyl group, an arylsulfamoyl group, a carboxyl group, a cyano group, a nitro group, an acyl group, an alkyloxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, or --OD, --N(R)--D (where R represents a hydrogen atom or an alkyl group, and D represents a 1,2-napthoquinoediazide-5-sulfonyl group or a 1,2-napthoquinoediazide-4-sulfonyl group), and at least one of R.sub.1 to R.sub.8 represents --OD or --N(R)--D; R.sub.9 to R.sub.12 each independently represents a hydrogen atom, a lower alkyl group, or R.sub.9 and R.sub.10 and/or R.sub.11 and R.sub.12 may form a ring; R.sub.13 to R.sub.14 each independently represents a hydrogen atom, a lower alkyl group, or R.sub.13 or R.sub.14 and any of R.sub.15 or R.sub.16 may form a ring, whereas at least one of R.sub.13 to R.sub.16 is a substitution group other than hydrogen; and Z represents an oxygen atom or a single bond.

    摘要翻译： 本发明的感光性树脂组合物含有5〜100重量份的具有下列通式（A）的感光材料和100重量份碱溶性树脂的混合物：通式（A）表示氢原子， 羟基，卤素原子，烷基，烷氧基，芳烷基，芳基，氨基，单烷基氨基，二烷基氨基，酰氨基，烷基氨基甲酰基，芳基氨基甲酰基，烷基氨磺酰基 基团，芳基氨磺酰基，羧基，氰基，硝基，酰基，烷氧基羰基，芳氧基羰基，酰氧基或-OD，-N（R）-D（其中R表示 氢原子或烷基，D表示1,2-萘基叠氮基-5-磺酰基或1,2-萘醌亚叠氮基-4-磺酰基），R 1至R 8中的至少一个表示-OD或-N（ R）-D; R9至R12各自独立地表示氢原子，低级烷基或R9和R10和/或R11和R12可以形成环; R 13〜R 14各自独立地表示氢原子，低级烷基或R 13或R 14，R 15或R 16中的任一个可以形成环，而R 13〜R 16中的至少一个为氢以外的取代基。 Z表示氧原子或单键。

    Positive-working light-sensitive composition containing diazonium salt and novolak resin
    7.
    发明授权
    Positive-working light-sensitive composition containing diazonium salt and novolak resin 失效
    含有重氮盐和酚醛清漆树脂的正性感光组合物

    公开(公告)号：US5370965A

    公开(公告)日：1994-12-06

    申请号：US987781

    申请日：1992-12-09

    申请人： Shunichi Kondo ,  Mitsumasa Tsuchiya ,  Sadao Ishige ,  Takekatsu Sugiyama ,  Toshifumi Inno ,  Yoshimasa Aotani

    发明人： Shunichi Kondo ,  Mitsumasa Tsuchiya ,  Sadao Ishige ,  Takekatsu Sugiyama ,  Toshifumi Inno ,  Yoshimasa Aotani

    IPC分类号： G03F7/016 ,  G03F7/021

    CPC分类号： G03F7/016

    摘要： A positive-working light-sensitive composition comprises a diazonium salt represented by the following general formula (I) and an alkali-soluble polymer: ##STR1## wherein R.sup.1 represents a substituted or unsubstituted alkyl group having 3 to 18 carbon atoms; R.sup.2 represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted phenoxy group or a halogen atom; A represents an organic group; X.sup.-- represents a counterion or an anion; n is an integer ranging from 1 to 4 and m is an integer ranging from 1 to 3, provided that the sum of n and m is equal to 4. The positive-working light-sensitive composition has high sensitivity and can ensure the formation of clear images.

    摘要翻译： 正性工作感光性组合物包含由以下通式（I）表示的重氮盐和碱溶性聚合物：其中R 1表示取代或未取代的碳原子数为3〜18的烷基; R 2表示氢原子，取代或未取代的烷基，取代或未取代的芳基，取代或未取代的烷氧基，取代或未取代的苯氧基或卤素原子; A代表有机基团; X-表示抗衡离子或阴离子; n为1〜4的整数，m为1〜3的整数，n和m之和等于4.正性感光性组合物的灵敏度高，可以确保 清晰的图像。

    Photopolymerizable composition on polyethylene terephthalate film support
    8.
    发明授权
    Photopolymerizable composition on polyethylene terephthalate film support 失效
    聚对苯二甲酸乙二醇酯薄膜载体上的可光聚合组合物

    公开(公告)号：US4876173A

    公开(公告)日：1989-10-24

    申请号：US240455

    申请日：1988-09-02

    申请人： Kazuo Maemoto ,  Masayuki Iwasaki ,  Minoru Maeda ,  Yoshimasa Aotani

    发明人： Kazuo Maemoto ,  Masayuki Iwasaki ,  Minoru Maeda ,  Yoshimasa Aotani

    IPC分类号： G03C1/00 ,  C08F265/04 ,  G03F7/033 ,  G03F7/038

    CPC分类号： G03F7/033 ,  C08F265/04 ,  Y10S430/111

    摘要： A photopolymerizable composition is described, comprising an addition polymerizable unsaturated compound having at least two ethylenically unsaturated double bonds per molecule, a photopolymerization initiator, and a binder, wherein said binder is a copolymer represented by formula (I) ##STR1## wherein Ar.sup.1 and Ar.sup.2 each represent a substituted or unsubstituted phenyl group; and n.sub.1, n.sub.2, n.sub.3, and n.sub.4 each represents mol % of the respective repeating unit, wherein n.sub.1 is from 0 to about 70; n.sub.2 is from 0 to about 70; n.sub.3 is from about 5 to 50; and n.sub.4 is from about 5 to 50; provided that n.sub.1 and n.sub.2 are not 0 at the same time, the sum of n.sub.3 and n.sub.4 is from about 30 to 80. The composition is useful as an alkali-developable light-sensitive layer which provides a photosensitive dry film resist having excellent performance characteristics.

    摘要翻译： 描述了一种可光聚合的组合物，其包含每分子具有至少两个烯属不饱和双键的加聚性不饱和化合物，光聚合引发剂和粘合剂，其中所述粘合剂是由式（I）表示的共聚物，其中 Ar 1和Ar 2各自表示取代或未取代的苯基; n1，n2，n3，n4分别表示各重复单元的摩尔％，n1为0〜约70。 n2为0至约70; n3为约5〜50; n4为约5〜50; 条件是n1和n2同时不为0，n3和n4的和为约30至80.该组合物可用作碱显影光敏层，其提供具有优异性能特征的光敏干膜抗蚀剂 。