摘要:
A light-sensitive printing plate precursor is disclosed. The printing plate precursor is comprised of an aluminum support base having provided on a grained and anodized surface. The surface is coated with a layer which is comprised of a positive working light-sensitive composition and an oxonol dye. The printing plate has high printing durability, high water retention ability and high color stain resistance. When used the plate precursor provides an image having high contrast. The plate precursor forms less color stain than conventional plates whether used with a fresh developing solution or a fatigued developing solution. The plate precursor does not result in causing uneven development when using manual development methods.
摘要:
A negative working light-sensitive composition and a lithographic printing plate using the composition are described. The printing plate is comprised of a hydrophilic support and a thin layer of a negative working light-sensitive composition on the support. The light-sensitive composition contains a light-sensitive diazo compound and a compound capable of increasing absorption over the light-sensitive wavelength region of the composition with increasing exposure time.
摘要:
The photosensitive resin composition of the present invention comprises an admixture of 5 to 100 weight parts of a photosensitive material having the following general formula (A) and 100 weight parts of an alkali-soluble resin:General formula (A) ##STR1## where R.sub.1 to R.sub.8 each independently represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxyl group, an aralkyl group, an aryl group, an amino group, a monoalkylamino group, a dialkylamino group, an acylamino group, an alkylcarbamoyl group, an arylcarbamoyl group, an alkylsulfamoyl group, an arylsulfamoyl group, a carboxyl group, a cyano group, a nitro group, an acyl group, an alkyloxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, or --OD, --N(R)--D (where R represents a hydrogen atom or an alkyl group, and D represents a 1,2-napthoquinoediazide-5-sulfonyl group or a 1,2-napthoquinoediazide-4-sulfonyl group), and at least one of R.sub.1 to R.sub.8 represents --OD or --N(R)--D; R.sub.9 to R.sub.12 each independently represents a hydrogen atom, a lower alkyl group, or R.sub.9 and R.sub.10 and/or R.sub.11 and R.sub.12 may form a ring; R.sub.13 to R.sub.14 each independently represents a hydrogen atom, a lower alkyl group, or R.sub.13 or R.sub.14 and any of R.sub.15 or R.sub.16 may form a ring, whereas at least one of R.sub.13 to R.sub.16 is a substitution group other than hydrogen; and Z represents an oxygen atom or a single bond.
摘要:
A negative working light-sensitive lithographic plate requiring no dampening solution and a plate making process are described, the negative working light-sensitive lithographic plate comprising a support having, in sequence, on said support, (A) a light-sensitive layer containing (1) an o-quinonediazide compound and (2) a coupling component which causes a diazo coupling reaction under a basic environment, and (B) a silicone rubber layer, and the plate making process comprising imagewise exposing the negative working light-sensitive lithographic plate and developing said exposed plate to obtain a lithographic plate requiring no dampening solution, wherein a step of processing with base is carried out after imagewise exposure.
摘要:
A photopolymerizable composition is described, which comprises a polymerizable compound containing at least one ethylenically unsaturated double bond and a photopolymerization initiator wherein the photopolymerization initiator is a combination of a 3-keto-substituted cumarin compound and an active halogeno compound. This composition can be easily cured by irradiation with radiation and, therefore, is very useful in the preparation of light-sensitive materials.
摘要:
A positive-working light-sensitive composition comprises a diazonium salt represented by the following general formula (I) and an alkali-soluble polymer: ##STR1## wherein R.sup.1 represents a substituted or unsubstituted alkyl group having 3 to 18 carbon atoms; R.sup.2 represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted phenoxy group or a halogen atom; A represents an organic group; X.sup.-- represents a counterion or an anion; n is an integer ranging from 1 to 4 and m is an integer ranging from 1 to 3, provided that the sum of n and m is equal to 4. The positive-working light-sensitive composition has high sensitivity and can ensure the formation of clear images.
摘要翻译:正性工作感光性组合物包含由以下通式(I)表示的重氮盐和碱溶性聚合物:其中R 1表示取代或未取代的碳原子数为3〜18的烷基; R 2表示氢原子,取代或未取代的烷基,取代或未取代的芳基,取代或未取代的烷氧基,取代或未取代的苯氧基或卤素原子; A代表有机基团; X-表示抗衡离子或阴离子; n为1〜4的整数,m为1〜3的整数,n和m之和等于4.正性感光性组合物的灵敏度高,可以确保 清晰的图像。
摘要:
A photopolymerizable composition is described, comprising an addition polymerizable unsaturated compound having at least two ethylenically unsaturated double bonds per molecule, a photopolymerization initiator, and a binder, wherein said binder is a copolymer represented by formula (I) ##STR1## wherein Ar.sup.1 and Ar.sup.2 each represent a substituted or unsubstituted phenyl group; and n.sub.1, n.sub.2, n.sub.3, and n.sub.4 each represents mol % of the respective repeating unit, wherein n.sub.1 is from 0 to about 70; n.sub.2 is from 0 to about 70; n.sub.3 is from about 5 to 50; and n.sub.4 is from about 5 to 50; provided that n.sub.1 and n.sub.2 are not 0 at the same time, the sum of n.sub.3 and n.sub.4 is from about 30 to 80. The composition is useful as an alkali-developable light-sensitive layer which provides a photosensitive dry film resist having excellent performance characteristics.
摘要翻译:描述了一种可光聚合的组合物,其包含每分子具有至少两个烯属不饱和双键的加聚性不饱和化合物,光聚合引发剂和粘合剂,其中所述粘合剂是由式(I)表示的共聚物,其中 Ar 1和Ar 2各自表示取代或未取代的苯基; n1,n2,n3,n4分别表示各重复单元的摩尔%,n1为0〜约70。 n2为0至约70; n3为约5〜50; n4为约5〜50; 条件是n1和n2同时不为0,n3和n4的和为约30至80.该组合物可用作碱显影光敏层,其提供具有优异性能特征的光敏干膜抗蚀剂 。
摘要:
A stabilized photosensitive composition comprising a leuco dye, a photooxidizing agent, and further a 2,4-dihydroxybenzaldoxime which is suitable for use in lithography, photoresists, etc., for obtaining visible contrast between the exposed and unexposed areas.
摘要:
A photopolymerizable composition is described, comprising components (i) a compound having at least one addition-polymerizable ethylenically unsaturated bond, (ii) a compound represented by the following formula (I): ##STR1## and (iii) an activating agent which generates an active radical upon light irradiation in the co-presence of component (ii). The substituents in formula (I) are defined in the specification.
摘要:
Microcapsules are disclosed containing (a) a vinyl compound which has at least two polymerizable, ethylenically unsaturated groups linked to each other through a linking group comprising a chemical bond capable of being split by the action of an acid, (b) a thermal polymerization initiator, and (c) one or more compounds capable of producing acid when irradiated with actinic radiation.A light-sensitive recording material is also disclosed, which has on its support the above-described microcapsules or a thermally cured product thereof.