Organic Thin Film Transistor and Method for Surface Modification of Gate Insulating Layer of Organic Thin Film Transistor
    2.
    发明申请
    Organic Thin Film Transistor and Method for Surface Modification of Gate Insulating Layer of Organic Thin Film Transistor 审中-公开
    有机薄膜晶体管及有机薄膜晶体管栅极绝缘层表面改性方法

    公开(公告)号:US20080315190A1

    公开(公告)日:2008-12-25

    申请号:US12065416

    申请日:2006-08-25

    IPC分类号: H01L51/05 H01L21/312

    摘要: This invention provides an organic thin film transistor, which can realize the modification of the surface of a gate insulating layer not only the case where the gate insulating layer is formed of an oxide, but also the case where the gate insulating layer is formed of a material other than the oxide and consequently can significantly improve transistor characteristics, and a method for surface modification of a gate insulating layer in the organic thin film transistor. In an organic thin film transistor comprising a gate insulating layer, an organic semiconductor layer stacked on the gate insulating layer, and an electrode provided on the organic semiconductor layer, a polyparaxylylene layer formed of a continuous polyparaxylylene film is formed on the surface of the gate insulating layer, between the gate insulating layer and the organic semiconductor layer, so as to face and contact with the organic semiconductor layer.

    摘要翻译: 本发明提供了一种有机薄膜晶体管,其不仅可以实现栅极绝缘层的表面的修改,而且可以实现栅极绝缘层由氧化物形成的情况,而且栅极绝缘层由 因此可以显着提高晶体管的特性,以及在有机薄膜晶体管中对栅极绝缘层进行表面改性的方法。 在栅极绝缘层,堆叠在栅极绝缘层上的有机半导体层和设置在有机半导体层上的电极的有机薄膜晶体管中,在栅极的表面上形成由连续的聚对二甲苯膜形成的聚对二甲苯层 绝缘层,位于栅极绝缘层和有机半导体层之间,以与有机半导体层面对并接触。

    Charged particle beam apparatus
    5.
    发明授权
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号:US08124940B2

    公开(公告)日:2012-02-28

    申请号:US12351523

    申请日:2009-01-09

    摘要: Disclosed herein is a scanning electron microscope having a function for positioning an object point of an objective lens at a defined position even under an electronic optical condition in which it is difficult to accurately control the position of the object point of the objective lens. A deflector is provided to deflect an electron beam in order to detect the object point and located at a desired position of the object point of the objective lens. The deflector is not used to scan a sample with the electron beam. The scanning electron microscope has a function for automatically adjusting the position of the object point to ensure that the object point of the objective lens is located at the position of the object point detection deflector by using a characteristic in which a displacement of an image by the deflector is minimal when the object point is located at the position of the deflector.

    摘要翻译: 这里公开了一种扫描电子显微镜,其具有即使在难以精确地控制物镜的物体的位置的电子光学条件下将物镜的物体点定位在限定位置的功能。 提供偏转器以偏转电子束以便检测物点并且位于物镜的物点的期望位置处。 偏转器不用于用电子束扫描样品。 扫描电子显微镜具有自动调整物点的位置的功能,以通过使用图像的位移由特征来确定物镜的物点位于物点检测偏转器的位置 当物点位于偏转器的位置时,偏转器最小。

    CHARGED PARTICLE BEAM APPARATUS
    6.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 有权
    充电颗粒光束装置

    公开(公告)号:US20090184256A1

    公开(公告)日:2009-07-23

    申请号:US12351523

    申请日:2009-01-09

    IPC分类号: H01J3/14

    摘要: Disclosed herein is a scanning electron microscope having a function for positioning an object point of an objective lens at a defined position even under an electronic optical condition in which it is difficult to accurately control the position of the object point of the objective lens. A deflector is provided to deflect an electron beam in order to detect the object point and located at a desired position of the object point of the objective lens. The deflector is not used to scan a sample with the electron beam. The scanning electron microscope has a function for automatically adjusting the position of the object point to ensure that the object point of the objective lens is located at the position of the object point detection deflector by using a characteristic in which a displacement of an image by the deflector is minimal when the object point is located at the position of the deflector.

    摘要翻译: 这里公开了一种扫描电子显微镜,其具有即使在难以精确地控制物镜的物体的位置的电子光学条件下将物镜的物体点定位在限定位置的功能。 提供偏转器以偏转电子束以便检测物点并且位于物镜的物点的期望位置处。 偏转器不用于用电子束扫描样品。 扫描电子显微镜具有自动调整物点的位置的功能,以通过使用图像的位移由特征来确定物镜的物点位于物点检测偏转器的位置 当物点位于偏转器的位置时,偏转器最小。

    CHARGED PARTICLE BEAM APPARATUS
    8.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 有权
    充电颗粒光束装置

    公开(公告)号:US20140131590A1

    公开(公告)日:2014-05-15

    申请号:US14232279

    申请日:2012-05-28

    IPC分类号: H01J37/153 H01J37/10

    摘要: In recent years, a range of users for a charged particle beam apparatus such as a scanning electron microscope has been broadened. All users want to learn a manual adjustment technology, but it is very difficult to adjust all parameters for observation to have an appropriate value. Therefore, a beginner is unlikely to sufficiently show a performance of an apparatus. This disclosure aims to provide the charged particle beam apparatus including a parameter adjustment practice function for allowing any user to easily learn the manual adjustment technology.In order to solve the above-described problem, there is provided means for practicing a focus adjustment and a stigma adjustment. Control conditions of the focus arrangement of an objective lens, an X-stigmator and a Y-stigmator are set according to the user's operation. According to a group of the focus adjustment, an X-stigma adjustment and a Y-stigma adjustment which are set, a practice-purpose image corresponding to the control conditions is read out from a storage device and is displayed on a screen.

    摘要翻译: 近年来,扫描型电子显微镜等带电粒子束装置的使用范围已经扩大。 所有用户想要学习手动调整技术,但是很难调整所有观察参数以获得适当的值。 因此,初学者不太可能充分显示设备的性能。 本公开旨在提供包括用于允许任何用户容易地学习手动调整技术的参数调整实践功能的带电粒子束装置。 为了解决上述问题,提供了用于实施焦点调整和柱头调节的装置。 根据使用者的操作设定物镜,X形扫描器和Y型标枪器的聚焦结构的控制条件。 根据一组焦点调整,设置了X字样调整和Y字符调整,从存储装置读出与控制条件相对应的实用目的图像,并将其显示在屏幕上。