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    Magnetron executing planetary motion adjacent a sputtering target
    1.
    发明授权
    Magnetron executing planetary motion adjacent a sputtering target 有权
    磁控管在溅射靶附近执行行星运动

    公开(公告)号：US07169271B2

    公开(公告)日：2007-01-30

    申请号：US10862257

    申请日：2004-06-07

    申请人： Ilyoung Richard Hong ,  James Tsung ,  Daniel Clarence Lubben ,  Peijun Ding ,  Nirmalya Maity

    发明人： Ilyoung Richard Hong ,  James Tsung ,  Daniel Clarence Lubben ,  Peijun Ding ,  Nirmalya Maity

    IPC分类号： C23C14/35

    CPC分类号： H01J37/3455 ,  C23C14/345 ,  C23C14/35 ,  C23C14/355 ,  H01J37/3405 ,  H01J37/3408

    摘要： A small magnet assembly is scanned in a retrograde planetary or epicyclic path about the back of a target being plasma sputtered including an orbital rotation about the center axis of the target and a planetary rotation about another axis rotating about the target center axis. The magnet assembly passes through the target center, thus allowing full target coverage. A properly chosen ratio of the two rotations about respective axes produces a much slower magnet velocity near the target periphery than at the target center. A geared planetary mechanism includes a rotating drive plate, a fixed center gear, and an idler and a follower gear rotatably supported in the drive plane supporting a cantilevered magnet assembly on the side of the drive plate facing the target. A belted planetary mechanism includes a fixed center capstan, a follower pulley supporting the magnet assembly, and a belt wrapped around them.

    摘要翻译： 小型磁体组件在逆行星行星或行星路径周围围绕目标物的背面进行扫描，等离子体溅射包括围绕靶的中心轴线的轨道旋转和围绕目标中心轴线旋转的另一轴线的行星旋转。 磁铁组件通过目标中心，从而允许全目标覆盖。 相对于相应轴的两个旋转的适当选择的比率在目标周边附近产生比在目标中心附近更慢的磁体速度。 齿轮行星机构包括旋转驱动板，固定中心齿轮和惰轮以及可驱动地支撑在驱动平面上的悬臂磁体组件的驱动平面中的从动齿轮。 带式行星机构包括固定中心绞盘，支撑磁体组件的从动轮和缠绕在其上的带。

    Small scanned magentron
    2.
    发明授权
    Small scanned magentron 有权
    小扫描魔术师

    公开(公告)号：US07807030B2

    公开(公告)日：2010-10-05

    申请号：US11610849

    申请日：2006-12-14

    申请人： Ilyoung Richard Hong ,  James Tsung ,  Daniel Clarence Lubben ,  Peijun Ding ,  Nirmalya Maity

    发明人： Ilyoung Richard Hong ,  James Tsung ,  Daniel Clarence Lubben ,  Peijun Ding ,  Nirmalya Maity

    IPC分类号： C23C14/35

    CPC分类号： H01J37/3455 ,  C23C14/345 ,  C23C14/35 ,  C23C14/355 ,  H01J37/3405 ,  H01J37/3408

    摘要： A small magnet assembly having a magnet assembly of area less than 10% of the target area, is scanned in a retrograde planetary or epicyclic path about the back of a target being plasma sputtered including an orbital rotation about the center axis of the target and a planetary rotation about another axis rotating about the target center axis. The magnet assembly passes through the target center, thus allowing full target coverage. A properly chosen ratio of the two rotations about respective axes produces a much slower magnet velocity near the target periphery than at the target center. A geared planetary mechanism includes a rotating drive plate, a fixed center gear, and an idler and a follower gear rotatably supported in the drive plane supporting a cantilevered magnet assembly on the side of the drive plate facing the target.

    摘要翻译： 具有面积小于目标区域的10％的磁体组件的小型磁体组件沿着包括围绕靶的中心轴线的轨道旋转的等离子体溅射的靶的背面以逆行星行星或行星路径扫描， 围绕围绕目标中心轴线旋转的另一轴线的行星旋转。 磁铁组件通过目标中心，从而允许全目标覆盖。 相对于相应轴的两个旋转的适当选择的比率在目标周边附近产生比在目标中心附近更慢的磁体速度。 齿轮行星机构包括旋转驱动板，固定中心齿轮和惰轮以及可驱动地支撑在驱动平面上的悬臂磁体组件的驱动平面中的从动齿轮。

    Small planetary magnetron
    3.
    发明授权
    Small planetary magnetron 有权
    小行星磁控管

    公开(公告)号：US06841050B2

    公开(公告)日：2005-01-11

    申请号：US10152494

    申请日：2002-05-21

    申请人： Ilyoung Richard Hong ,  James Tsung ,  Daniel Clarence Lubben ,  Peijun Ding ,  Nirmalya Maity

    发明人： Ilyoung Richard Hong ,  James Tsung ,  Daniel Clarence Lubben ,  Peijun Ding ,  Nirmalya Maity

    IPC分类号： C23C14/32 ,  C23C14/35 ,  H01J37/34

    CPC分类号： H01J37/3455 ,  C23C14/345 ,  C23C14/35 ,  C23C14/355 ,  H01J37/3405 ,  H01J37/3408

    摘要： A small magnet assembly is scanned in a retrograde planetary or epicyclic path about the back of a target being plasma sputtered including an orbital rotation about the center axis of the target and a planetary rotation about another axis rotating about the target center axis. The magnet assembly passes through the target center, thus allowing full target coverage. A properly chosen ratio of the two rotations about respective axes produces a much slower magnet velocity near the target periphery than at the target center. A geared planetary mechanism includes a rotating drive plate, a fixed center gear, and an idler and a follower gear rotatably supported in the drive plane supporting a cantilevered magnet assembly on the side of the drive plate facing the target. A belted planetary mechanism includes a fixed center capstan, a follower pulley supporting the magnet assembly, and a belt wrapped around them.

    摘要翻译： 小型磁体组件在逆行星行星或行星路径周围围绕目标物的背面进行扫描，等离子体溅射包括围绕靶的中心轴线的轨道旋转和围绕目标中心轴线旋转的另一轴线的行星旋转。 磁铁组件通过目标中心，从而允许全目标覆盖。 相对于相应轴的两个旋转的适当选择的比率在目标周边附近产生比在目标中心附近更慢的磁体速度。 齿轮行星机构包括旋转驱动板，固定中心齿轮和惰轮以及可驱动地支撑在驱动平面上的悬臂磁体组件的驱动平面中的从动齿轮。 带式行星机构包括固定中心绞盘，支撑磁体组件的从动轮和缠绕在其上的带。

    Method and system for mask handling in high productivity chamber
    4.
    发明授权
    Method and system for mask handling in high productivity chamber 有权
    高生产率室中面罩处理方法和系统

    公开(公告)号：US08317925B2

    公开(公告)日：2012-11-27

    申请号：US13169257

    申请日：2011-06-27

    申请人： Rick Endo ,  Kurt Weiner ,  James Tsung

    发明人： Rick Endo ,  Kurt Weiner ,  James Tsung

    IPC分类号： C23C16/458 ,  C23C16/00

    CPC分类号： H01L21/67225 ,  C23C16/042 ,  H01L21/6719 ,  H01L21/68742 ,  Y10S206/832

    摘要： A structure for independently supporting a wafer and a mask in a processing chamber is provided. The structure includes a set of extensions for supporting the wafer and a set of extensions supporting the mask. The set of extensions for the wafer and the set of extensions for the mask enable independent movement of the wafer and the mask. In one embodiment, the extensions are affixed to an annular ring which is capable of moving in a vertical direction within the processing chamber. A processing chamber, a mask, and a method for combinatorially processing a substrate are also provided.

    摘要翻译： 提供了用于在处理室中独立地支撑晶片和掩模的结构。 该结构包括一组用于支撑晶片的延伸部和一组支撑该掩模的延伸部。 用于晶片的一组扩展和用于掩模的一组扩展使得能够独立地移动晶片和掩模。 在一个实施例中，延伸部固定到能够在处理室内沿垂直方向移动的环形环。 还提供了处理室，掩模和用于组合处理衬底的方法。

    Method and system for mask handling in high productivity chamber
    7.
    发明授权
    Method and system for mask handling in high productivity chamber 有权
    高生产率室中面罩处理方法和系统

    公开(公告)号：US07993461B2

    公开(公告)日：2011-08-09

    申请号：US11754999

    申请日：2007-05-30

    申请人： Rick Endo ,  Kurt Weiner ,  James Tsung

    发明人： Rick Endo ,  Kurt Weiner ,  James Tsung

    IPC分类号： H01L21/306

    CPC分类号： H01L21/67225 ,  C23C16/042 ,  H01L21/6719 ,  H01L21/68742 ,  Y10S206/832

    摘要： A structure for independently supporting a wafer and a mask in a processing chamber is provided. The structure includes a set of extensions for supporting the wafer and a set of extensions supporting the mask. The set of extensions for the wafer and the set of extensions for the mask enable independent movement of the wafer and the mask. In one embodiment, the extensions are affixed to an annular ring which is capable of moving in a vertical direction within the processing chamber. A processing chamber, a mask, and a method for combinatorially processing a substrate are also provided.

    摘要翻译： 提供了用于在处理室中独立地支撑晶片和掩模的结构。 该结构包括一组用于支撑晶片的延伸部和一组支撑该掩模的延伸部。 用于晶片的一组扩展和用于掩模的一组扩展使得能够独立地移动晶片和掩模。 在一个实施例中，延伸部固定到能够在处理室内沿垂直方向移动的环形环。 还提供了处理室，掩模和用于组合处理衬底的方法。

    Design of hardware features to facilitate arc-spray coating applications and functions
    9.
    发明授权
    Design of hardware features to facilitate arc-spray coating applications and functions 有权
    设计硬件功能，方便电弧喷涂应用和功能

    公开(公告)号：US06797131B2

    公开(公告)日：2004-09-28

    申请号：US10293641

    申请日：2002-11-12

    申请人： Alan Barry Liu ,  Chien-Shiung Tzou ,  James Tsung

    发明人： Alan Barry Liu ,  Chien-Shiung Tzou ,  James Tsung

    IPC分类号： C23C1434

    CPC分类号： C23C14/564 ,  C23C4/00 ,  C23C4/01 ,  C23C4/02 ,  C23C14/50

    摘要： A method and apparatus for forming a coating on a sputter chamber workpiece. The apparatus generally includes a sputter chamber having at least one workpiece. The at least one workpiece generally includes one or more trenches formed therein, the trenches being configured to define an arc spray coating region. The method generally includes forming one or more trenches in the workpiece, the trenches defining a coating region and applying a metal coating to the coating region by arc spraying.

    摘要翻译： 一种用于在溅射室工件上形成涂层的方法和装置。 该设备通常包括具有至少一个工件的溅射室。 所述至少一个工件通常包括形成在其中的一个或多个沟槽，所述沟槽构造成限定电弧喷涂层区域。 该方法通常包括在工件中形成一个或多个沟槽，沟槽限定涂覆区域，并通过电弧喷涂将金属涂层施加到涂覆区域。