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公开(公告)号：US4766033A
公开(公告)日：1988-08-23
申请号：US885210
申请日：1986-07-14
申请人： Isao Yoshimura , Takashi Nakao , Mitsuo Kohno
发明人： Isao Yoshimura , Takashi Nakao , Mitsuo Kohno
CPC分类号： B41N1/245 , Y10S428/91 , Y10T428/26 , Y10T428/27 , Y10T428/2913 , Y10T428/31507 , Y10T428/31746 , Y10T428/31783 , Y10T428/3179 , Y10T428/31913 , Y10T428/3192
摘要： The present invention relates to a highly sensitive heat-sensitive film for stencil. This invention provides a highly heat-sensitive film for stencil, comprising a thermoplastic resin having a coefficient of temperature and melt viscosity (.DELTA.T/.DELTA. log VI) of not more than 100 and a thermal shrinkage (X%) at 100.degree. C. and a thermal shrinkage stress (Y g/mm.sup.2) at 100.degree. C. falling respectively in the ranges of the formulas; 15.ltoreq.X.ltoreq.80 and 75.ltoreq.Y.ltoreq.500; and both falling in the range of the formula; -8X+400.ltoreq.Y.ltoreq.-10X+1000; having a thickness in the range of 0.5 to 15 .mu.m, and excelling in low-energy perforation property.The film of this invention is superior in a low temperature perforation property, capable of being perforated with a low energy thermal head or with a low energy flash irradiation for making a plate; expansion of perforations is small when the film is perforated; and its change with time (dimensional change) is small and its sizes are stable.
摘要翻译： 本发明涉及用于模板的高灵敏度热敏膜。 本发明提供了一种用于模版的高热敏膜，其包含热塑性树脂，其温度系数和熔体粘度（DELTA T / DELTA log VI）不大于100，热收缩率（X％）在100℃。 在100℃下的热收缩应力（Yg / mm2）分别在下式的范围内下降： 15
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公开(公告)号：US4301230A
公开(公告)日：1981-11-17
申请号：US104944
申请日：1979-12-18
CPC分类号： H05K3/064 , G03F7/092 , G03F7/0955 , G03F7/26 , H05K2201/0108 , H05K2203/0783 , H05K2203/1394 , H05K3/0082 , H05K3/0094 , Y10S430/136 , Y10S430/14 , Y10S430/162
摘要： A process for producing an image which comprises the steps of:(1) applying to the surface of a substrate the surface of a photosensitive layer, the other surface of the photosensitive layer being adhered to a substantially transparent film support which is soluble or dispersible in a developer consisting essentially of a liquid capable of substantially dissolving or dispersing therein the areas of the layer other than those having a polymeric image produced by imagewise exposure in the step (2) below;(2) exposing the photosensitive layer, imagewise, to actinic radiation to form a polymeric image in the layer; and(3) washing away with the developer the film support and the areas of the layer other than those having the polymeric image to form an image of a polymeric material on the substrate. The photosensitive element having on its one side the above-mentioned specific film support and the process have a variety of applications and are useful for producing photoresists which are advantageously used for making printed circuit boards.
摘要翻译： 一种用于制造图像的方法，包括以下步骤：（1）将感光层的表面施加到基底的表面，感光层的另一表面粘附到可溶或可分散于 基本上由在下面的步骤（2）中能够基本上溶解或分散其中除了具有通过成像曝光产生的聚合物图像的层之外的层的区域的液体的显影剂; （2）将感光层成像曝光于光化辐射以在层中形成聚合物图像; 和（3）用显影剂除去膜载体和不同于具有聚合物图像的那些层的区域，以在基底上形成聚合物材料的图像。 感光元件的一侧具有上述特定的膜支撑体，并且该方法具有各种应用，并且可用于制造有利地用于制造印刷电路板的光致抗蚀剂。
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3.发明授权
公开(公告)号：US4613441A
公开(公告)日：1986-09-23
申请号：US486915
申请日：1983-04-20
申请人： Mitsuo Kohno , Shigeki Katayama , Kazuo Matsuda
发明人： Mitsuo Kohno , Shigeki Katayama , Kazuo Matsuda
IPC分类号： B29C59/00 , B01D67/00 , B01D69/02 , B29C55/00 , B29C67/20 , C08J5/18 , C08J5/22 , C08J9/00 , H01M2/14 , B01D13/04
CPC分类号： B01D67/0027 , B01D69/02 , H01M2/14
摘要： A porous membrane formed of a thermoplastic resin having a critical surface tension of not higher than 35 dyn/cm and having a three-dimensional network structure is provided. Communicating pores having a porosity of at least 60% and an average pore diameter of 0.1 to 2.0 microns are formed in the porous membrane. The strength factor F defined by the following formula is at least 1 as measured in any direction: F=A/[B(1-.alpha.)], wherein A is the tensile strength at break of the membrane, B is the tensile strength at break of a non-porous film formed of the same resin and .alpha. is the porosity fraction of the membrane. The thickness of the porous membrane is 5 to 500 microns. The porous membrane is prepared by a process wherein a porous membrane formed of a thermoplastic resin having a critical surface tension of not higher than 35 dyn/cm and having a three-dimensional network structure including communicating pores having an average pore diameter of 0.05 to 1 micron with a porosity of 30 to 70%, is subjected to a space drawing operation in at least one direction at a temperature between 50.degree. C. lower than the melting or softening point of the thermoplastic resin and 5.degree. C. lower than the melting or softening point of the thermoplastic resin.
摘要翻译： 提供了具有临界表面张力不高于35dyn / cm并具有三维网状结构的由热塑性树脂形成的多孔膜。 在多孔膜中形成孔隙率为至少60％，平均孔径为0.1〜2.0微米的孔。 由以下公式定义的强度因子F至少为1，如在任何方向测量的：F = A / [B（1-α）]，其中A是膜断裂时的拉伸强度，B是在 由相同树脂和α形成的无孔膜的断裂是膜的孔隙率分数。 多孔膜的厚度为5至500微米。 多孔膜通过以下方法制备，其中由具有临界表面张力不高于35dyn / cm的热塑性树脂形成的多孔膜，并且具有包括平均孔径为0.05至1的连通孔的三维网状结构 微孔，孔隙率为30〜70％，在比热塑性树脂的熔点或软化点低50℃以下的温度下，在至少一个方向进行空间拉伸操作，低于熔融 或软化点。
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4.发明授权Biaxially drawn polyhexamethylene adipamide film and process for producing same 失效双轴拉伸聚己二酰己二胺聚酰亚胺薄膜及其制备方法
公开(公告)号：US4352926A
公开(公告)日：1982-10-05
申请号：US149580
申请日：1980-05-14
申请人： Yukinori Matsuoka , Yoshihiko Muto , Mitsuo Kohno
发明人： Yukinori Matsuoka , Yoshihiko Muto , Mitsuo Kohno
IPC分类号： B29C47/88 , B29B7/00 , B29C47/00 , B29C47/92 , B29C49/00 , B29C55/00 , B29C55/28 , B29K77/00 , B29L7/00 , C08G69/26
CPC分类号： B29C47/0009 , B29C47/0026 , B29C47/0057 , B29C47/0059
摘要： Disclosed is a biaxially drawn polyhexamethylene adipamide film having a relative viscosity of at least 3.2 as measured at 25.degree. C. in aqueous 96% H.sub.2 SO.sub.4, a degree of crystallinity of from 35% to 45%, a birefringence (.DELTA.n) of not more than 0.006, as determined at any point in its entire area, and an initial modulus of elasticity in tension of at least 230 kg/mm.sup.2 as determined in ay direction across substantially its entire area. The film may be produced by a process wherein molten polyhexamethylene adipamide is extruded through a circular die gap and the tubular extrudate is brought in sliding contact with the outer periphery of an inside mandrel, thereby to be cooled, which process is characterized in that polyhexamethylene adipamide having a relative viscosity of from 3.3 to 5.0, as measured at 25.degree. C. in aqueous 96% H.sub.2 SO.sub.4, is used; the tubular extrudate formed therefrom is cooled at a cooling rate (X.degree. C./sec.) satisfying the following formula with respect to the relative viscosity of the polymer used,-100.times..eta.rel+1,200
摘要翻译： 公开了一种双轴拉伸的聚己二酰己二胺聚酰胺薄膜，其在25℃，96％H 2 SO 4水溶液中的相对粘度至少为3.2，结晶度为35％至45％，双折射（DELTA n）不超过 大于0.006，如在其整个区域中的任何点所确定的，并且在基本上其整个区域上沿ay方向确定的至少230kg / mm 2的初始拉伸弹性弹性模量。 该膜可以通过其中熔融聚己二酰己二胺通过圆形模头间隙挤出并且管状挤出物与内芯轴的外周滑动接触从而被冷却的方法制备，该方法的特征在于聚己二酰己二胺 使用在25℃在96％H 2 SO 4水溶液中测得的相对粘度为3.3至5.0的相对粘度; 由此形成的管状挤出物以相对于所使用的聚合物的相对粘度满足下列公式的冷却速度（X℃/秒）冷却，-100x eta rel + 1,200
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公开(公告)号：US4956540A
公开(公告)日：1990-09-11
申请号：US385894
申请日：1989-07-26
摘要： There is disclosed an arc spot welding apparatus comprising a welding power supplying unit, a wire feeder connected to the welding power supplying unit by a control cable and an arc spot welding torch connected to the wire feeder by a torch cable which is operable by operating an operation switch arranged on a holder thereof to be held by an operator being characterized in that the welding torch is comprised of a nozzle assembly providing a nozzle and a power supply element, a torch holder assembly and a torch body assembly connecting said nozzle assembly and said torch holder assembly which is formed to have a length so that the operator can operate said welding torch in a standing posture.
摘要翻译： 公开了一种电弧点焊设备，其包括焊接供电单元，通过控制电缆连接到焊接供电单元的送丝机，以及通过手电筒电缆连接到送丝机的电弧点焊手电筒， 操作开关，布置在其保持器上以由操作者保持，其特征在于，所述焊炬包括提供喷嘴和电源元件的喷嘴组件，焊炬夹持器组件和连接所述喷嘴组件和所述喷嘴组件的炬体组件 焊枪保持器组件形成为具有使操作员能够以站立姿态操作所述焊炬的长度。
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公开(公告)号：US4252966A
公开(公告)日：1981-02-24
申请号：US956267
申请日：1978-10-31
申请人： Yukinori Matsuoka , Yoshihiko Muto , Mitsuo Kohno
发明人： Yukinori Matsuoka , Yoshihiko Muto , Mitsuo Kohno
IPC分类号： B29C47/88 , B29B7/00 , B29C47/00 , B29C47/92 , B29C49/00 , B29C55/00 , B29C55/28 , B29K77/00 , B29L7/00 , C08G69/46
CPC分类号： B29C47/0009 , B29C47/0026 , B29C47/0057 , B29C47/0059
摘要： Disclosed is a biaxially drawn polyhexamethylene adipamide film having a relative viscosity of at least 3.2 as measured at 25.degree. C. in aqueous 96% H.sub.2 SO.sub.4, a degree of crystallinity of from 35% to 45%, a birefringence (.DELTA.n) of not more than 0.006, as determined at any point in its entire area, and an initial modulus of elasticity in tension of at least 230 kg/mm.sup.2 as determined in any direction across substantially its entire area. The film may be produced by a process wherein molten polyhexamethylene adipamide is extruded through a circular die gap and the tubular extrudate is brought in sliding contact with the outer periphery of an inside mandrel, thereby to be cooled, which process is characterized in that polyhexamethylene adipamide having a relative viscosity of from 3.3 to 5.0, as measured at 25.degree. C. in aqueous 96% H.sub.2 SO.sub.4, is used; the tubular extrudate formed therefrom is cooled at a cooling rate (X.degree. C./sec.) satisfying the following formula with respect to the relative viscosity of the polymer used,-100.times..eta.rel+1,200
摘要翻译： 公开了一种双轴拉伸的聚己二酰己二胺聚酰胺薄膜，其在25℃，96％H 2 SO 4水溶液中的相对粘度至少为3.2，结晶度为35％至45％，双折射（DELTA n）不超过 大于0.006，如在其整个区域中的任何点所确定的，并且在基本上其整个区域上的任何方向上确定的至少230kg / mm 2的初始弹性弹性模量为至少230kg / mm 2。 该膜可以通过其中熔融聚己二酰己二胺通过圆形模头间隙挤出并且管状挤出物与内芯轴的外周滑动接触从而被冷却的方法制备，该方法的特征在于聚己二酰己二胺 使用在25℃在96％H 2 SO 4水溶液中测得的相对粘度为3.3至5.0的相对粘度; 由此形成的管状挤出物以相对于所使用的聚合物的相对粘度满足下列公式的冷却速度（X℃/秒）冷却，-100x eta rel + 1,200
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公开(公告)号：US5744380A
公开(公告)日：1998-04-28
申请号：US806310
申请日：1997-02-26
CPC分类号： C30B13/00 , C30B15/00 , C30B29/06 , Y10S117/904 , Y10S438/974
摘要： There is provided a high quality epitaxial water on which the density of microscopic defects in the epitaxial layer is reduced to keep the GOI thereof sufficiently high and to reduce a leakage current at the P-N junction thereof when devices are incorporated, to thereby improve the yield of such devices. In an epitaxial wafer obtained by forming an epitaxial layer on a substrate, the density of IR laser scatterers is 5.times.10.sup.5 pieces/cm.sup.3 or less throughout the epitaxial layer.
摘要翻译： 提供了一种高质量的外延水，其中外延层中的微观缺陷密度降低，以保持GOI足够高，并且当装置结合时，其PN结处的漏电流减小，从而提高了产量 这样的设备。 在通过在衬底上形成外延层获得的外延晶片中，IR激光散射体的密度在整个外延层中为5×10 5个/ cm 3以下。
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公开(公告)号：US4211560A
公开(公告)日：1980-07-08
申请号：US923763
申请日：1978-07-11
CPC分类号： H05K3/064 , G03F7/092 , G03F7/0955 , G03F7/26 , H05K2201/0108 , H05K2203/0783 , H05K2203/1394 , H05K3/0082 , H05K3/0094 , Y10S430/136 , Y10S430/14 , Y10S430/162
摘要： A process for producing an image which comprises the steps of:(1) applying to the surface of a substrate the surface of a photosensitive layer, the other surface of the photosensitive layer being adhered to a substantially transparent film support which is soluble or dispersible in a developer consisting essentially of a liquid capable of substantially dissolving or dispersing therein the areas of the layer other than those having a polymeric image produced by imagewise exposure in the step (2) below;(2) exposing the photosensitive layer, imagewise, to actinic radiation to form a polymeric image in the layer; and(3) washing away with the developer the film support and the areas of the layer other than those having the polymeric image to form an image of a polymeric material on the substrate. The photosensitive element having on its one side the above-mentioned specific film support and the process have a variety of applications and are useful for producing photoresists which are advantageously used for making printed circuit boards.
摘要翻译： 一种用于制造图像的方法，包括以下步骤：（1）将感光层的表面施加到基底的表面，感光层的另一表面粘附到可溶或可分散于 基本上由在下面的步骤（2）中能够基本上溶解或分散其中除了具有通过成像曝光产生的聚合物图像的层之外的层的区域的液体的显影剂; （2）将感光层成像曝光于光化辐射以在层中形成聚合物图像; 和（3）用显影剂除去膜载体和不同于具有聚合物图像的那些层的区域，以在基底上形成聚合物材料的图像。 感光元件的一侧具有上述特定的膜支撑体，并且该方法具有各种应用，并且可用于制造有利地用于制造印刷电路板的光致抗蚀剂。
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9.发明授权Dust cover superior in transparency for photomask reticle use and process for producing the same 失效用于光掩模掩模版使用的透明度优异的防尘罩及其制造方法
公开(公告)号：US4657805A
公开(公告)日：1987-04-14
申请号：US749623
申请日：1985-06-13
申请人： Yasunori Fukumitsu , Mitsuo Kohno
发明人： Yasunori Fukumitsu , Mitsuo Kohno
IPC分类号： B32B27/30 , G03F1/00 , G03F1/62 , H01L21/027 , B32B7/02
CPC分类号： G03F1/62 , B32B27/30 , Y10T428/24967 , Y10T428/31544
摘要： In a dust cover for photomask reticle purposes which consists essentially of a supporting frame and a thin film bonded to a surface of the frame, the dust cover is improved in transparency by constructing at least the outermost layers of the thin film with thin films of a fluoropolymer which exhibits an average transmittance of at least 90% for rays of wavelengths from 240 to 290 nm and an average transmittance of at least 93.5% for rays of wavelengths from 290 to 500 nm, when having a thickness of 10 .mu.m, and has a refractive index of up to 1.42.
摘要翻译： PCT No.PCT / JP84 / 00485 Sec。 371日期：1985年6月13日 102（e）1985年6月13日PCT PCT Filed于1984年10月12日。在用于光掩模掩模版目的的防尘罩中，基本上由支撑框架和结合到框架表面的薄膜组成，防尘罩被改进 通过用含氟聚合物的薄膜构成至少最外层的薄膜，其透射率对于240〜290nm的波长的平均透射率至少为90％，平均透射率至少为93.5％，对于 波长为290〜500nm，厚度为10μm，折射率高达1.42。
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10.发明授权
公开(公告)号：US4409339A
公开(公告)日：1983-10-11
申请号：US194341
申请日：1980-10-06
申请人： Kazuo Matsuda , Mitsuo Kohno , Yoshinao Doi
发明人： Kazuo Matsuda , Mitsuo Kohno , Yoshinao Doi
CPC分类号： B01D67/0093 , B01D67/003 , B01D69/02 , B01D69/08 , B01D71/26
摘要： A sulfonated polyolefin porous membrane containing sulfonic groups in an amount, in terms of exchange capacity, of 0.05 to 1 milliequivalent per gram of the sulfonated polyolefin and having a porosity of 30 to 85% and an average pore diameter of 0.05 to 1.mu. has been found to be excellent in water permeability, removal capability, water-permeability retention, mechanical strength and elongation, etc. The porous membrane of the present invention may advantageously be employed as a fine microfilter or the like. The porous membrane of the present invention may be easily prepared by treating with a sulfonating agent a polyolefin porous membrane preferably containing an inorganic filler which is subsequently extracted from the membrane.
摘要翻译： 已经有一个磺化聚烯烃多孔膜，其中磺酸基的交换能力为每克磺化聚烯烃0.05至1毫当量，孔隙率为30至85％，平均孔径为0.05至1微米 发现透水性，去除能力，透水性保持性，机械强度和伸长率等都是优异的。本发明的多孔膜可以有利地用作微细过滤器等。 本发明的多孔膜可以通过用磺化剂处理优选含有随后从膜中提取的无机填料的聚烯烃多孔膜来容易地制备。
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