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    Method of Forming Electrical Interconnects within Insulating Layers that Form Consecutive Sidewalls
    2.
    发明申请
    Method of Forming Electrical Interconnects within Insulating Layers that Form Consecutive Sidewalls 有权
    在形成连续侧壁的绝缘层内形成电气互连的方法

    公开(公告)号：US20090239369A1

    公开(公告)日：2009-09-24

    申请号：US12051223

    申请日：2008-03-19

    申请人： Jae-hak Kim ,  Jing Hui Li ,  Wu Ping Liu ,  Johnny Widodo

    发明人： Jae-hak Kim ,  Jing Hui Li ,  Wu Ping Liu ,  Johnny Widodo

    IPC分类号： H01L21/31 ,  H01L21/44

    CPC分类号： H01L21/31144 ,  H01L21/76802 ,  H01L21/76808 ,  H01L21/76814 ,  H01L2221/1063

    摘要： Methods of forming integrated circuit device having electrical interconnects include forming an electrically insulating layer on a substrate and forming a hard mask on the electrically insulating layer. The hard mask and the electrically insulating layer are selectively etched in sequence using a mask to define an opening therein. This opening, which may be a via hole, exposes inner sidewalls of the hard mask and the electrically insulating layer. The inner sidewall of the hard mask is then recessed relative to the inner sidewall of the electrically insulating layer and a sacrificial reaction layer is formed on the inner sidewall of the electrically insulating layer. This reaction layer operates to recess the inner sidewall of the electrically insulating layer. The reaction layer is then removed to define a wider opening having relatively uniform sidewalls. This wider opening is then filled with an electrical interconnect.

    摘要翻译： 形成具有电互连的集成电路器件的方法包括在衬底上形成电绝缘层并在电绝缘层上形成硬掩模。 使用掩模依次选择性地蚀刻硬掩模和电绝缘层，以在其中限定开口。 该开口（其可以是通孔）暴露硬掩模和电绝缘层的内侧壁。 然后硬掩模的内侧壁相对于电绝缘层的内侧壁凹陷，并且牺牲反应层形成在电绝缘层的内侧壁上。 该反应层操作以使电绝缘层的内侧壁凹陷。 然后去除反应层以限定具有相对均匀侧壁的较宽开口。 然后用更宽的开口填充电互连。

    Method of forming electrical interconnects within insulating layers that form consecutive sidewalls including forming a reaction layer on the inner sidewall
    3.
    发明授权
    Method of forming electrical interconnects within insulating layers that form consecutive sidewalls including forming a reaction layer on the inner sidewall 有权
    在形成连续侧壁的绝缘层内形成电互连的方法，包括在内侧壁上形成反应层

    公开(公告)号：US07687381B2

    公开(公告)日：2010-03-30

    申请号：US12051223

    申请日：2008-03-19

    申请人： Jae-hak Kim ,  Jing Hui Li ,  Wu Ping Liu ,  Johnny Widodo

    发明人： Jae-hak Kim ,  Jing Hui Li ,  Wu Ping Liu ,  Johnny Widodo

    IPC分类号： H01L21/46 ,  H01L21/4763 ,  H01L21/302 ,  H01L21/461

    CPC分类号： H01L21/31144 ,  H01L21/76802 ,  H01L21/76808 ,  H01L21/76814 ,  H01L2221/1063

    摘要： Methods of forming integrated circuit device having electrical interconnects include forming an electrically insulating layer on a substrate and forming a hard mask on the electrically insulating layer. The hard mask and the electrically insulating layer are selectively etched in sequence using a mask to define an opening therein. This opening, which may be a via hole, exposes inner sidewalls of the hard mask and the electrically insulating layer. The inner sidewall of the hard mask is then recessed relative to the inner sidewall of the electrically insulating layer and a sacrificial reaction layer is formed on the inner sidewall of the electrically insulating layer. This reaction layer operates to recess the inner sidewall of the electrically insulating layer. The reaction layer is then removed to define a wider opening having relatively uniform sidewalls. This wider opening is then filled with an electrical interconnect.

    摘要翻译： 形成具有电互连的集成电路器件的方法包括在衬底上形成电绝缘层并在电绝缘层上形成硬掩模。 使用掩模依次选择性地蚀刻硬掩模和电绝缘层，以在其中限定开口。 该开口（其可以是通孔）暴露硬掩模和电绝缘层的内侧壁。 然后硬掩模的内侧壁相对于电绝缘层的内侧壁凹陷，并且牺牲反应层形成在电绝缘层的内侧壁上。 该反应层操作以使电绝缘层的内侧壁凹陷。 然后去除反应层以限定具有相对均匀侧壁的较宽开口。 然后用更宽的开口填充电互连。

    Method of manufacturing semiconductor device including ultra low dielectric constant layer
    4.
    发明申请
    Method of manufacturing semiconductor device including ultra low dielectric constant layer 审中-公开
    包括超低介电常数层的半导体器件的制造方法

    公开(公告)号：US20090280637A1

    公开(公告)日：2009-11-12

    申请号：US12453326

    申请日：2009-05-07

    申请人： Kyoung-woo Lee ,  Hong-jae Shin ,  Jae-hak Kim ,  Jae-ouk Choo

    发明人： Kyoung-woo Lee ,  Hong-jae Shin ,  Jae-hak Kim ,  Jae-ouk Choo

    IPC分类号： H01L21/768

    CPC分类号： H01L21/7682 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02271 ,  H01L21/02282 ,  H01L21/02304 ,  H01L21/02348 ,  H01L21/02351 ,  H01L21/02362 ,  H01L21/31695

    摘要： Provided is a method of manufacturing a semiconductor device. The method employs multi-step removal on a plurality of different porogens included in a low dielectric layer both before and after metal lines are formed, thereby facilitating formation of an ultra low dielectric constant layer which is used as an insulation layer between metal lines of a semiconductor device. The method may include forming an interlayer dielectric layer on a substrate, forming a plurality of porogens in the interlayer dielectric layer, removing a portion of the plurality of porogens in the interlayer dielectric layer to form a plurality of first pores in the interlayer dielectric layer, forming a wiring pattern where the plurality of first pores are formed, and removing the remaining porogens of the plurality of porogens to form a plurality of second pores in the interlayer dielectric layer.

    摘要翻译： 提供一种制造半导体器件的方法。 该方法在形成金属线之前和之后，在包含在低电介质层中的多个不同的致孔剂上采用多步除去，从而有助于形成超低介电常数层，该超低介电常数层用作金属线之间的绝缘层 半导体器件。 该方法可以包括在衬底上形成层间电介质层，在层间电介质层中形成多个致孔剂，去除层间电介质层中的多个致孔剂的一部分，以在层间电介质层中形成多个第一孔， 形成其中形成有多个第一孔的布线图案，并且除去多个致孔剂中剩余的孔隙原，以在层间电介质层中形成多个第二孔。

    Method of manufacturing interconnection line in semiconductor device
    6.
    发明授权
    Method of manufacturing interconnection line in semiconductor device 有权
    在半导体器件中制造互连线的方法

    公开(公告)号：US06828229B2

    公开(公告)日：2004-12-07

    申请号：US10081661

    申请日：2002-02-22

    申请人： Soo-geun Lee ,  Hong-jae Shin ,  Kyoung-woo Lee ,  Jae-hak Kim

    发明人： Soo-geun Lee ,  Hong-jae Shin ,  Kyoung-woo Lee ,  Jae-hak Kim

    IPC分类号： H01L214763

    CPC分类号： H01L21/76808 ,  H01L21/31111 ,  H01L21/31116 ,  H01L21/31144

    摘要： A method of forming an interconnection line in a semiconductor device is provided. A first etching stopper is formed on a lower conductive layer which is formed on a semiconductor substrate. A first interlayer insulating layer is formed on the first etching stopper. A second etching stopper is formed on the first interlayer insulating layer. A second interlayer insulating layer is formed on the second etching stopper. The second interlayer insulating layer, the second etching stopper, and the first interlayer insulating layer are sequentially etched using the first etching stopper as an etching stopping point to form a via hole aligned with the lower conductive layer. A protective layer is formed to protect a portion of the first etching stopper exposed at the bottom of the via hole. A portion of the second interlayer insulating layer adjacent to the via hole is etched using the second etching stopper as an etching stopping point to form a trench connected to the via hole. The protective layer is removed. The portion of the first etching stopper positioned at the bottom of the via hole is removed. An upper conductive layer that fills the via hole and the trench and is electrically connected to the lower conductive layer is formed.

    摘要翻译： 提供了一种在半导体器件中形成互连线的方法。 在形成在半导体衬底上的下导电层上形成第一蚀刻阻挡层。 在第一蚀刻停止件上形成第一层间绝缘层。 在第一层间绝缘层上形成第二蚀刻阻挡层。 在第二蚀刻停止件上形成第二层间绝缘层。 使用第一蚀刻停止器作为蚀刻停止点，依次蚀刻第二层间绝缘层，第二蚀刻停止层和第一层间绝缘层，以形成与下导电层对准的通孔。 形成保护层以保护暴露在通孔底部的第一蚀刻终止部分。 使用第二蚀刻停止器蚀刻与通孔相邻的第二层间绝缘层的一部分作为蚀刻停止点，以形成连接到通孔的沟槽。 保护层被去除。 位于通孔底部的第一蚀刻停止部分被去除。 形成填充通孔和沟槽并与下导电层电连接的上导电层。

    System and method for displaying received data using separate device
    7.
    发明申请
    System and method for displaying received data using separate device 有权
    使用单独设备显示接收到的数据的系统和方法

    公开(公告)号：US20060151593A1

    公开(公告)日：2006-07-13

    申请号：US11324585

    申请日：2006-01-04

    申请人： Jae-hak Kim

    发明人： Jae-hak Kim

    IPC分类号： G06F17/00

    CPC分类号： H04L51/14

    摘要： A method and apparatus for displaying received data using a separate device that makes a user's receiving terminal, that has received only a unique code of data, transmit the unique code to a separate display device connected to the Internet, and which makes the display device access a server, in which the data is stored, and display the data corresponding to the unique code. The apparatus displays received data using a code generation unit for generating a first unique code that matches metadata received from a data server that stores the data and the metadata, a first communication unit for transmitting the first unique code to a receiving terminal, and a second communication unit for receiving a second unique code from a display device and transmitting the stored metadata that matches the first unique code to the display device if the first unique code corresponds to the second unique code.

    摘要翻译： 一种用于使用仅接收唯一的数据代码的用户接收终端的独立设备来显示接收的数据的方法和装置，将唯一的代码发送到连接到因特网的单独的显示设备，并且使显示设备访问 存储数据的服务器，并显示对应于唯一代码的数据。 该装置使用代码生成单元显示接收到的数据，该代码生成单元用于生成与从存储数据和元数据的数据服务器接收的元数据相匹配的第一唯一码，用于将第一唯一码发送到接收终端的第一通信单元， 通信单元，用于从显示设备接收第二唯一代码，并且如果所述第一唯一码对应于所述第二唯一码，则将与所述第一唯一码匹配的所存储的元数据发送到所述显示设备。

    System and method for displaying received data using separate device
    9.
    发明授权
    System and method for displaying received data using separate device 有权
    使用单独设备显示接收到的数据的系统和方法

    公开(公告)号：US07690557B2

    公开(公告)日：2010-04-06

    申请号：US11324585

    申请日：2006-01-04

    申请人： Jae-hak Kim

    发明人： Jae-hak Kim

    IPC分类号： G06F17/00

    CPC分类号： H04L51/14

    摘要： A method and apparatus for displaying received data using a separate device that makes a user's receiving terminal, that has received only a unique code of data, transmit the unique code to a separate display device connected to the Internet, and which makes the display device access a server, in which the data is stored, and display the data corresponding to the unique code. The apparatus displays received data using a code generation unit for generating a first unique code that matches metadata received from a data server that stores the data and the metadata, a first communication unit for transmitting the first unique code to a receiving terminal, and a second communication unit for receiving a second unique code from a display device and transmitting the stored metadata that matches the first unique code to the display device if the first unique code corresponds to the second unique code.

    摘要翻译： 一种用于使用仅接收唯一的数据代码的用户接收终端的独立设备来显示接收的数据的方法和装置，将唯一的代码发送到连接到因特网的单独的显示设备，并且使显示设备访问 存储数据的服务器，并显示对应于唯一代码的数据。 该装置使用代码生成单元显示接收到的数据，该代码生成单元用于生成与从存储数据和元数据的数据服务器接收的元数据相匹配的第一唯一码，用于将第一唯一码发送到接收终端的第一通信单元， 通信单元，用于从显示设备接收第二唯一代码，并且如果所述第一唯一码对应于所述第二唯一码，则将与所述第一唯一码匹配的所存储的元数据发送到所述显示设备。