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1.发明授权
公开(公告)号：US4937930A
公开(公告)日：1990-07-03
申请号：US417365
申请日：1989-10-05
CPC分类号： B23P6/00 , H05K3/22 , H05K3/38 , H05K1/0306 , H05K2201/0116 , H05K2201/09036 , H05K2203/1147 , Y10T29/49155 , Y10T29/49986
摘要： A process for hermetically sealing defects in a porous ceramic substrate comprising the steps of evaporating or sputtering a malleable metal layer onto the defective porous ceramic surface, swaging or smearing the malleable metal layer over the defects and depositing a second metal film over the swaged first film to provide a smooth defect free surface.
摘要翻译： 一种用于气密密封多孔陶瓷基板中的缺陷的方法，包括以下步骤：在有缺陷的多孔陶瓷表面上蒸发或溅射可延展的金属层，在缺陷上模锻或涂抹可延展的金属层，并将第二金属膜沉积在模锻的第一膜上 以提供光滑的无缺陷表面。
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2.发明授权
公开(公告)号：US5258236A
公开(公告)日：1993-11-02
申请号：US695368
申请日：1991-05-03
申请人： Gnanalingam Arjavalingam , Alina Deutsch , Fuad E. Doany , Bruce K. Furman , Donald J. Hunt , Chandrasekhar Narayan , Modest M. Oprysko , Sampath Purushothaman , Vincent Ranieri , Stephen Renick , Jane M. Shaw , Janusz S. Wilczynski , David F. Witman
发明人： Gnanalingam Arjavalingam , Alina Deutsch , Fuad E. Doany , Bruce K. Furman , Donald J. Hunt , Chandrasekhar Narayan , Modest M. Oprysko , Sampath Purushothaman , Vincent Ranieri , Stephen Renick , Jane M. Shaw , Janusz S. Wilczynski , David F. Witman
IPC分类号： B23K26/00 , B32B37/00 , H01L21/68 , H01L23/12 , H01L23/15 , H05K3/00 , H05K3/46 , B32B15/04 , H01L29/12
CPC分类号： H01L21/6835 , H01L2221/68345 , H01L2221/68359 , H05K3/0011 , H05K3/46 , Y10T156/1158 , Y10T428/12528 , Y10T428/12549 , Y10T428/12569 , Y10T428/12611
摘要： A method and apparatus for releasing a workpiece from a substrate including providing a substrate which is transparent to a predetermined wavelength of electromagnetic radiation; forming, on the substrate, a separation layer which degrades in response to the predetermined radiation; providing the workpiece on the separation layer; and directing the predetermined radiation at the separation layer through the transparent substrate so as to degrade the separation layer and to separate the workpiece from the substrate.
摘要翻译： 一种用于从衬底释放工件的方法和装置，包括提供对预定波长的电磁辐射是透明的衬底; 在衬底上形成响应于预定辐射而降解的分离层; 在分离层上提供工件; 并且通过透明基板将分离层处的预定辐射引导，以使分离层退化并将工件与基板分离。
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公开(公告)号：US5241423A
公开(公告)日：1993-08-31
申请号：US738971
申请日：1991-08-01
CPC分类号： G02B17/0892 , G02B13/00 , G02B17/08 , G03F7/70225 , G03F7/70791
摘要： An optical system of a NX reduction catadioptric relay lens having sub-half micron resolution over the ultraviolet band width is described. A spherical mirror with a stop at the mirror is used to work at substantially the desired reduction ratio and the desired high numerical aperture sufficient to provide the desired high resolution. A beam splitting cube with appropriate coatings is used to form an accessible image of an object on an image plane. Refracting correctors in the path of the slow beam incident on the mirror and in the path of the fast beam reflected on the mirror are designed to fix the aberrations of the image formed by the mirror. The beam splitter coatings are chosen in such a way that beams reflected from and transmitted therethrough suffer no net aberration as a result of multiple reflections within the thin film beam splitter coatings and therefore are substantially free of aberration, distortion and apodization which would result from the beam splitting surface in the absence of these coatings.
摘要翻译： 描述了在紫外线带宽上具有半微米分辨率的NX还原反射折射中继透镜的光学系统。 使用在镜子处具有止动件的球面镜以基本上所需的减小比率和足以提供所需高分辨率的期望的高数值孔径进行工作。 使用具有适当涂层的分束立方体在图像平面上形成物体的可访问图像。 入射在反射镜上的慢光束和在反射镜上反射的快光束的路径中的光束的折射校正器设计成固定由反射镜形成的图像的像差。 选择分束器涂层，使得从薄膜分束器涂层中反射并从其透射的光束不会因薄膜分束器涂层内的多次反射而产生净像差，因此基本上不会产生像差，畸变和变迹 在没有这些涂层的情况下分束表面。
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公开(公告)号：US06654164B1
公开(公告)日：2003-11-25
申请号：US10059557
申请日：2002-01-29
申请人： Janusz S. Wilczynski
发明人： Janusz S. Wilczynski
IPC分类号： G02B1700
CPC分类号： G02B17/0892 , G02B17/0804 , G02B17/0856 , G03F7/70225
摘要： A lens design having two concave mirrors or Mangins and a turning mirror is disclosed. The optical axis of the concave elements are approximately coplanar and intersect on a turning mirror, and the normal to the surface of the turning mirror bisects the angle between the two optical axis.
摘要翻译： 公开了具有两个凹面镜或者Mangins和转向镜的透镜设计。 凹形元件的光轴近似共面并在转向镜上相交，并且转向镜的表面的法线平分两个光轴之间的角度。
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公开(公告)号：US5495397A
公开(公告)日：1996-02-27
申请号：US54110
申请日：1993-04-27
CPC分类号： H05K3/4641 , H01L25/0652 , H05K1/145 , H01L2224/48091 , H01L2924/01014 , H01L2924/01046 , H01L2924/01078 , H01L2924/01079 , H01L2924/09701 , H01L2924/10253 , H01L2924/19041 , H05K1/053 , H05K1/056 , H05K2201/068 , H05K2201/09309 , H05K2201/09718 , H05K3/3436 , H05K3/4608 , Y10S428/901 , Y10T428/24802 , Y10T428/24917 , Y10T428/24926
摘要： A three dimensional packaging architecture for ultimate high performance computers and methods for fabricating thereof are described. The package allows very dense packaging of multiple integrated circuit chips for minimum communication distances and maximum clock speeds of the computer. The packaging structure is formed from a plurality of subassemblies. Each subassembly is formed from a substrate which has on at least one side thereof at least one integrated circuit device. Between adjacent subassemblies there is disposed a second substrate. There are electrical interconnection members to electrically interconnect contact locations on the subassembly to contact locations on the second substrate. The electrical interconnection members can be solder mounds, wire bonds and the like. The first substrate provides electrical signal intercommunication between the electronic devices and each subassembly. The second substrate provides ground and power distribution to the plurality of subassemblies. Optionally, the outer surfaces of the structure that can be disposed a cube of memory chips.
摘要翻译： 描述了用于最终高性能计算机的三维封装架构及其制造方法。 该封装允许非常密集的多个集成电路芯片的封装，以实现计算机的最小通信距离和最大时钟速度。 包装结构由多个子组件形成。 每个子组件由至少一个侧面上至少有一个集成电路器件的衬底形成。 在相邻的子组件之间设置有第二衬底。 存在电互连构件以将子组件上的接触位置电互连到第二衬底上的接触位置。 电气互连构件可以是焊料堆，引线接合等。 第一基板在电子设备和每个子组件之间提供电信号互通。 第二基板提供对多个子组件的接地和功率分配。 可选地，结构的外表面可以设置成存储芯片的立方体。
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6.发明授权Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations 失效具有两个子系统的光学系统分别校正奇异像差并一起校正均匀像差
公开(公告)号：US5052763A
公开(公告)日：1991-10-01
申请号：US575043
申请日：1990-08-28
CPC分类号： G02B17/0892 , G02B13/26 , G02B17/008 , G02B17/08 , G02B27/0025 , G03F7/70225 , G03F7/70275
摘要： An optical system having a substantially flat image field is disclosed. The optical system is formed from optical subsystems wherein an input optical subsystem forms an intermediate image has a curvature which compensates that from the remaining optical components of the system to result in a substantially flat image for the optical system. Preferably the optical elements preceding the intermediate image and the optical elements succeeding the intermediate image are separately corrected for odd aberrations. The optical elements preceding the intermediate image and the optical elements succeeding the intermediate image compensate for each other and result in a substantially aberration free flat image for the optical system. The optical system preferably contains an input optical subsystem and an output optical subsystem wherein the input optical subsystem is a catadioptric system and wherein the output optical system is a dioptric system. Most preferably the input optical system is a 1X catadioptric system and the output optical system is an NX dioptric system. The optical systems of the present invention are used for subquarter micron photolithography tools for microelectronic fabrication, such as scanners and steppers.
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7.发明授权Method for fabricating multi-layer thin film structure having a separation layer 失效具有分离层的多层薄膜结构的制造方法
公开(公告)号：US5534094A
公开(公告)日：1996-07-09
申请号：US314789
申请日：1994-09-29
申请人： Gnanalingam Arjavalingam , Alina Deutsch , Fuad E. Doany , Bruce K. Furman , Donald J. Hunt , Chandrasekhar Narayan , Modest M. Oprysko , Sampath Purushothaman , Vincent Ranieri , Stephen Renick , Jane M. Shaw , Janusz S. Wilczynski , David F. Witman
发明人： Gnanalingam Arjavalingam , Alina Deutsch , Fuad E. Doany , Bruce K. Furman , Donald J. Hunt , Chandrasekhar Narayan , Modest M. Oprysko , Sampath Purushothaman , Vincent Ranieri , Stephen Renick , Jane M. Shaw , Janusz S. Wilczynski , David F. Witman
CPC分类号： H01L21/6835 , H01L2221/68345 , H01L2221/68359 , H05K3/0011 , H05K3/46 , Y10T156/1158 , Y10T428/12528 , Y10T428/12549 , Y10T428/12569 , Y10T428/12611
摘要： A method and apparatus for releasing a workpiece from a substrate including providing a substrate which is transparent to a predetermined wavelength of electromagnetic radiation; forming, on the substrate, a separation layer which degrades in response to the predetermined radiation; providing the workpiece on the separation layer; and directing the predetermined radiation at the separation layer through the transparent substrate so as to degrade the separation layer and to separate the workpiece from the substrate.
摘要翻译： 一种用于从衬底释放工件的方法和装置，包括提供对预定波长的电磁辐射是透明的衬底; 在衬底上形成响应于预定辐射而降解的分离层; 在分离层上提供工件; 并且通过透明基板将分离层处的预定辐射引导，以使分离层退化并将工件与基板分离。
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公开(公告)号：US5401934A
公开(公告)日：1995-03-28
申请号：US28022
申请日：1993-03-08
CPC分类号： B23K26/066
摘要： A lens system for a laser scanning apparatus which incorporates two transfer lenses in tandem. The transfer lenses include angular reflecting mirrors, correction lenses, and concave mirrors. The transfer lenses are located between the projection mask and the target of the scanning apparatus wherein the laser beam passed through the projection mask is reflected by an angularly disposed mirror through the first correction lens onto the first concave mirror where it is reflected back through the first correction lens and onto another angularly disposed mirror where the beam is sent to and back from the second concave mirror through the second correction lens and then onto the target.
摘要翻译： 一种用于激光扫描装置的透镜系统，其包括串联的两个传输透镜。 传输透镜包括角度反射镜，校正透镜和凹面镜。 传输透镜位于投影掩模和扫描装置的目标之间，其中通过投影掩模的激光束被通过第一校正透镜的角度布置的反射镜反射到第一凹面镜上，在第一凹面反射镜中反射回第一 校正透镜和另一个角度布置的反射镜，其中光束通过第二校正透镜从第二凹面镜发射到背面并且然后到达目标。
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公开(公告)号：US5159172A
公开(公告)日：1992-10-27
申请号：US564007
申请日：1990-08-07
IPC分类号： G02B17/00 , G02B17/02 , G02B17/08 , G02B19/00 , G02B27/18 , G03F7/20 , H01L21/027 , H01L21/30 , H01S3/101
CPC分类号： G02B17/008 , G02B17/026 , G02B17/08 , G02B17/0856 , G02B17/0892 , G02B17/0896 , G02B19/0028 , G02B19/0047 , G02B19/0095 , G03F7/70225 , G03F7/70358
摘要： An optical system having a plurality of substantially planar reflecting surfaces and a plurality of curved reflecting surfaces providing an optical projection system which can scan a mask object onto an image plane by having the mask and copy substrate substantially fixed in position relative to each other and either simultaneously moving the mask and copy substrate in the same direction or maintaining the mask and image plane substantially stationary and fixed with respect to each other while scanning the optical system. The optical system uses one wavelength of an electromagnetic radiation to align the mask to the copy substrate and another wavelength of electromagnetic radiation to form the image of the mask on the copy substrate. The apparatus can be used as a laser ablation optical tool to laser ablate the image of a mask onto the copy substrate, as an inspection tool, as a photolithographic and for other related applications. The projection lens is a modified Dyson type lens.
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公开(公告)号：US4595295A
公开(公告)日：1986-06-17
申请号：US684432
申请日：1984-12-20
申请人： Janusz S. Wilczynski
发明人： Janusz S. Wilczynski
CPC分类号： G03F9/70
摘要： An alignment system is described for lithographic proximity printing apparatus wherein the wafer and lithographic mask are each individually aligned with a third element. An alignment mask carries an alignment pattern corresponding to an alignment mark on the microcircuit wafer and also carries an alignment pattern corresponding to an alignment mark on the proximity printing mask. In one embodiment, the alignment mask is illuminated from the back side by alignment radiation (which need not be visible light) and the alignment patterns carried by the alignment mask are imaged onto the corresponding wafer and proximity printing mask alignment marks. Since the projected alignment patterns are spatially separated at the alignment mask one of the alignment patterns is conveniently shifted in effective optical position to compensate for the difference in axial position of the wafer and printing mask alignment marks. When a projected alignment pattern image correlates with (i.e., overlays) the corresponding alignment mark, reflected or scattered light leaving the alignment mark is either at a maximum or at a minimum (i.e., an extremum) depending upon the system configuration. A light splitter deflects some of the light coming from each of the alignment marks to individual light intensity monitors, such as photomultipliers. Alignment of the wafer and printing mask has been achieved when both intensity monitors reach the correct extremum simultaneously (or reach the midpoint of the correct extremum if the extremum is not sharp).
摘要翻译： 描述了用于光刻邻近打印设备的对准系统，其中晶片和光刻掩模各自与第三元件对准。 对准掩模携带对应于微电路晶片上的对准标记的对准图案，并且还携带对应于邻近印刷掩模上的对准标记的对准图案。 在一个实施例中，通过对准辐射（其不需要是可见光）从背面照射对准掩模，并且由对准掩模承载的对准图案被成像到相应的晶片和接近印刷掩模对准标记上。 由于投影的对准图案在对准掩模处空间分离，所以对准图案之一方便地在有效的光学位置移位以补偿晶片的轴向位置和印刷掩模对准标记的差异。 当投影的对准图案图像与对应的对准标记相关（即，重叠）时，取决于系统配置，离开对准标记的反射或散射光处于最大值或最小值（即极值）。 光分离器将来自每个对准标记的一些光偏转到各个光强度监视器，例如光电倍增管。 当两个强度监测器同时达到正确的极值时（或者如果极值不清楚则达到正确极值的中点），已经实现了晶片和印刷掩模的对准。
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