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    High repetition rate laser produced plasma EUV light source
    3.
    发明申请
    High repetition rate laser produced plasma EUV light source 有权

    公开(公告)号：US20050205810A1

    公开(公告)日：2005-09-22

    申请号：US10803526

    申请日：2004-03-17

    申请人： Robert Akins ,  Richard Sandstrom ,  William Partlo ,  Igor Fomenkov ,  Thomas Steiger ,  John Algots ,  Norbert Bowering ,  Robert Jacques ,  Frederick Palenschat ,  Jun Song

    发明人： Robert Akins ,  Richard Sandstrom ,  William Partlo ,  Igor Fomenkov ,  Thomas Steiger ,  John Algots ,  Norbert Bowering ,  Robert Jacques ,  Frederick Palenschat ,  Jun Song

    IPC分类号： G01J1/00 ,  G03F7/20 ,  H01J65/04 ,  H05G2/00

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

    EUV light source
    6.
    发明申请
    EUV light source 有权

    公开(公告)号：US20050199829A1

    公开(公告)日：2005-09-15

    申请号：US10900839

    申请日：2004-07-27

    申请人： William Partlo ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  David Myers ,  Ian Oliver ,  John Viatella ,  Robert Jacques

    发明人： William Partlo ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  David Myers ,  Ian Oliver ,  John Viatella ,  Robert Jacques

    IPC分类号： G03F7/20 ,  G21K1/06 ,  H01J35/20 ,  H05G2/00 ,  H01J65/04

    CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

    Method and apparatus for gas discharge laser bandwidth and center wavelength control
    9.
    发明申请
    Method and apparatus for gas discharge laser bandwidth and center wavelength control 有权
    气体放电激光带宽和中心波长控制的方法和装置

    公开(公告)号：US20060114958A1

    公开(公告)日：2006-06-01

    申请号：US11254282

    申请日：2005-10-20

    申请人： Fedor Trintchouk ,  Robert Jacques

    发明人： Fedor Trintchouk ,  Robert Jacques

    IPC分类号： H01S3/22

    CPC分类号： H01S3/1055 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70041 ,  H01S3/08072 ,  H01S3/097 ,  H01S3/10069 ,  H01S3/225

    摘要： A gas discharge laser system bandwidth control mechanism and method of operation for controlling bandwidth in a laser output light pulse generated in the gas discharge laser system is disclosed which may comprise a bandwidth controller which may comprise an active bandwidth adjustment mechanism; a controller actively controlling the active bandwidth adjustment mechanism utilizing an algorithm implementing bandwidth thermal transient correction based upon a model of the impact of laser system operation on the wavefront of the laser light pulse being generated and line narrowed in the laser system as it is incident on the bandwidth adjustment mechanism. The controller algorithm may comprises a function of the power deposition history in at least a portion of an optical train of the gas discharge laser system, e.g., a linear function, e.g., a combination of a plurality of decay functions each comprising a respective decay time constant and a respective coefficient.

    摘要翻译： 公开了一种气体放电激光器系统带宽控制机构和用于控制在气体放电激光器系统中产生的激光输出光脉冲中的带宽的操作方法，其可以包括带宽控制器，其可以包括有源带宽调整机构; 控制器主动地控制有源带宽调整机制，利用实现带宽热瞬变校正的算法，该算法基于激光系统操作对激光系统中产生的激光光脉冲的波前的影响的模型，并且在激光系统中入射时产生线窄 带宽调整机制。 控制器算法可以包括在气体放电激光系统的光学系列的至少一部分中的功率沉积历史的功能，例如线性函数，例如多个衰减函数的组合，每个衰减函数包括相应的衰减时间 常数和相应的系数。

    Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
    10.
    发明申请
    Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control 有权
    多室准分子或分子氟气放电激光氟注射控制

    公开(公告)号：US20050094698A1

    公开(公告)日：2005-05-05

    申请号：US10953100

    申请日：2004-09-29

    申请人： Herve Besaucele ,  Wayne Dunstan ,  Toshihiko Ishihara ,  Robert Jacques ,  Fedor Trintchouk

    发明人： Herve Besaucele ,  Wayne Dunstan ,  Toshihiko Ishihara ,  Robert Jacques ,  Fedor Trintchouk

    IPC分类号： H01S3/036 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

    CPC分类号： H01S3/036 ,  H01S3/225 ,  H01S3/2316 ,  H01S3/2366

    摘要： A multi-chambered excimer or molecular halogen gas discharge laser system comprising at least one oscillator chamber and at least one amplifier chamber producing oscillator output laser light pulses that are amplified in the at least one power chamber, having a fluorine injection control system and a method of using same is disclosed, which may comprise: a halogen gas consumption estimator: estimating the amount of halogen gas that has been consumed in one of the at least one oscillator chamber based upon at least a first operating parameter of one of the least one oscillator chamber and the at least one amplifier chamber, and the difference between a second operating parameter of the at least one oscillator chamber and the at least one amplifier chamber, and estimating the amount of halogen gas that has been consumed in the other of the at least one oscillator chamber and the at least one amplifier chamber based upon at least a third operating parameter of the other of the at least one oscillator chamber and the at least one amplifier chamber, and producing an output representative of an estimated halogen gas consumption in the at least one oscillator chamber and of the halogen gas consumption in the at least one amplifier chamber, and a halogen gas injection controller determining the amount of halogen gas injection for the at least one oscillator chamber and the at least one amplifier chamber based upon the estimated fluorine consumption outputs from the fluorine consumption estimator and a cost function comprising a plurality of weighted injection decision determinations.

    摘要翻译： 一种多腔准分子或分子卤素气体放电激光系统，包括至少一个振荡器室和至少一个产生振荡器的放大器室输出在至少一个功率室中放大的激光脉冲，具有氟注入控制系统和方法 其中可以包括：卤素气体消耗估计器：基于至少一个振荡器之一的至少一个振荡器中的至少一个振荡器的至少一个振荡器的至少第一操作参数来估计在所述至少一个振荡器腔室中的一个中消耗的卤素气体的量 室和至少一个放大器室，以及所述至少一个振荡器室和所述至少一个放大器室的第二操作参数之间的差异，并且估计至少在另一个中消耗的卤素气体的量 基于所述至少一个的另一个的至少第三操作参数，所述至少一个振荡器室和所述至少一个放大器室 e振荡器室和所述至少一个放大器室，并且产生代表所述至少一个振荡器室中的估计的卤素气体消耗量的输出和所述至少一个放大器室中的卤素气体消耗量，以及卤素气体注入控制器确定 基于来自氟消耗估计器的估计的氟消耗量输出和包括多个加权喷射判定确定的成本函数，至少一个振荡室和至少一个放大器室的卤素气体喷射量。