Process for Plasma Coating
    6.
    发明申请
    Process for Plasma Coating 审中-公开
    等离子涂层工艺

    公开(公告)号:US20070281108A1

    公开(公告)日:2007-12-06

    申请号:US11662379

    申请日:2005-10-05

    IPC分类号: C08J7/04 C23C16/04

    摘要: The present invention describes a method for plasma coating the inside surface of a polyolefin or a polylactic acid container to provide an effective barrier against gas transmission. The method provides a way to deposit rapidly and uniformly very thin, adherent and nearly defect-free layers of polyorganosiloxane and silicon oxide (or amorphous carbon) on the inner surface of the container to achieve more than an order of magnitude increase in barrier properties.

    摘要翻译: 本发明描述了一种用于等离子体涂覆聚烯烃或聚乳酸容器的内表面以提供有效阻挡气体传输的方法。 该方法提供了在容器的内表面上快速且均匀地沉积非常薄,粘附和几乎无缺陷的聚有机硅氧烷和氧化硅(或无定形碳)层以达到阻挡性能提高一个数量级以上的方式。

    Plasma Enhanced Chemical Vapor Deposition of Metal Oxide
    7.
    发明申请
    Plasma Enhanced Chemical Vapor Deposition of Metal Oxide 审中-公开
    等离子体增强化学气相沉积金属氧化物

    公开(公告)号:US20070212486A1

    公开(公告)日:2007-09-13

    申请号:US11547461

    申请日:2005-05-20

    IPC分类号: C23C16/40

    摘要: A metal oxide coating can be applied to a substrate at a relatively low temperature and at or near atmospheric pressure by carrying a metal oxide precursor and an oxidizing agent through a corona discharge or a dielectric barrier discharge to form the metal oxide and deposit it onto to the substrate.

    摘要翻译: 金属氧化物涂层可以在相对较低的温度和大气压附近的基底上,通过电晕放电或电介质阻挡放电载入金属氧化物前体和氧化剂,形成金属氧化物并将其沉积到 底物。