Fabrication method of semiconductor integrated circuit device and its testing apparatus
    5.
    发明授权
    Fabrication method of semiconductor integrated circuit device and its testing apparatus 有权
    半导体集成电路器件及其测试装置的制造方法

    公开(公告)号:US06696849B2

    公开(公告)日:2004-02-24

    申请号:US09964708

    申请日:2001-09-28

    IPC分类号: G01R3102

    CPC分类号: G01R31/2831

    摘要: A testing apparatus and a fabricating method of a semiconductor integrated circuit device for reducing the fabrication cost by placing, in the wafer level burn-in, divided contactors in equally contact with the full surface of wafer, enabling repair of each contactor and improving the yield of contactors. The cassette structure of the mechanical pressurizing system in the testing apparatus is structured with a plurality of divided silicon contactor blocks and a guide frame for integrating these blocks and employs the wafer full surface simultaneous contact system of the divided contactor integration type. Each probe of the silicon contactor is equally placed in contact in the predetermined pressure with each test pad of each chip of the test wafer by mechanically pressuring each silicon contactor block which moves individually, the test control signal is supplied to each chip and this test result signal is obtained for the wafer level burn-in test.

    摘要翻译: 一种半导体集成电路器件的测试装置和制造方法,用于通过在晶片级老化中放置与晶片的整个表面均匀接触的分割的接触器来降低制造成本,从而能够修复每个接触器并提高产量 的接触器。 测试装置中的机械加压系统的盒式结构由多个分开的硅接触器块和用于集成这些块的引导框架构成,并且采用分开的接触器一体化型的晶片全表面同时接触系统。 硅接触器的每个探针通过机械加压每个单独移动的硅接触器块,将测试控制信号提供给每个芯片,并且测试结果与测试晶片的每个芯片的每个测试焊盘等同地以预定压力接触 获得晶片级老化测试信号。