摘要:
A configuration memory cell (“CRAM”) for a field programmable gate array (“FPGA”) integrated circuit (“IC”) device is given increased resistance to single event upset (“SEU”). A portion of the gate structure of the input node of the CRAM is increased in size relative to the nominal size of the remainder of the gate structure. Part of the enlarged gate structure is located capacitively adjacent to an N-well region of the IC, and another part is located capacitively adjacent to a P-well region of the IC. This arrangement gives the input node increased capacitance to resist SEU, regardless of the logical level of the input node. The invention is also applicable to any node of any type of memory cell for which increased resistance to SEU is desired.
摘要:
A configuration memory cell (“CRAM”) for a field programmable gate array (“FPGA”) integrated circuit (“IC”) device is given increased resistance to single event upset (“SEU”). A portion of the gate structure of the input node of the CRAM is increased in size relative to the nominal size of the remainder of the gate structure. Part of the enlarged gate structure is located capacitively adjacent to an N-well region of the IC, and another part is located capacitively adjacent to a P-well region of the IC. This arrangement gives the input node increased capacitance to resist SEU, regardless of the logical level of the input node. The invention is also applicable to any node of any type of memory cell for which increased resistance to SEU is desired.
摘要:
A configuration memory cell (“CRAM”) for a field programmable gate array (“FPGA”) integrated circuit (“IC”) device is given increased resistance to single event upset (“SEU”). A portion of the gate structure of the input node of the CRAM is increased in size relative to the nominal size of the remainder of the gate structure. Part of the enlarged gate structure is located capacitively adjacent to an N-well region of the IC, and another part is located capacitively adjacent to a P-well region of the IC. This arrangement gives the input node increased capacitance to resist SEU, regardless of the logical level of the input node. The invention is also applicable to any node of any type of memory cell for which increased resistance to SEU is desired.
摘要:
According to this invention there is provided a method of processing material such as organically coated waste and organic materials including biomass, industrial waste, municipal solid waste and sludge, the method comprising: attaching a material container cartridge containing material to be processed to a processing chamber; heating the material in a reduced oxygen atmosphere in the processing chamber to produce gas; channeling the gas from the processing chamber to a treatment chamber in which they are heated to destroy any VOC's therein; recirculating gas from the treatment chamber back into the processing chamber; and in a first mode of operation modifying the moisture content of the gas recirculating from the treatment chamber to the processing chamber by passing it through a second material container cartridge containing material to be processed.
摘要:
Aspects of the invention include 2′ protected nucleoside monomers that are protected at the 2′ site with thiocarbon protecting groups. Thiocarbon protecting groups of interest include thiocarbonate, thionocarbonate, dithiocarbonate groups, as well as thionocarbamate protecting groups. Aspects of the invention further include nucleic acids that include the protecting groups of the invention, as well as methods of synthesizing nucleic acids using the protecting groups of the invention.
摘要:
A lockable package includes an outer sleeve defined by connected first and second panels, the sleeve having at least one open end. An inner container is slidable within the sleeve, and having a first portion joined to a second portion, wherein at least one of a height and a width of the first portion is less than a corresponding height and width of the second portion. A difference between one of the height and the width of the first portion and the corresponding height and width of the second portion defines a ridge. A locking assembly is provided at the at least one open end of the sleeve and is configured to releasably engage the ridge, wherein the inner container is removable through the open end of the sleeve by disengaging the locking assembly from the ridge.
摘要:
A programmable logic device (“PLD”) is augmented with programmable clock data recover (“CDR”) circuitry to allow the PLD to communicate via any of a large number of CDR signaling protocols. The CDR circuitry may be integrated with the PLD, or it may be wholly or partly on a separate integrated circuit. The circuitry may be capable of CDR input, CDR output, or both. The CDR capability may be provided in combination with other non-CDR signaling capability such as non-CDR low voltage differential signaling (“LVDS”). The circuitry may be part of a larger system.
摘要:
A composition for treating fabric includes about 0.1 to about 10.0% cross linking agent, about 0.1 to about 5.0% polyolefin, about 0.1 to about 0.5% wetting agent, about 0.0 to about 8.0% aminofunctional silicone, about 0.0 to about 6.0% ionizing agent, about 0.0 to about 2.0% catalyst and any remainder as a carrier. The composition has a pH of between about 2.0 to about 4.0 and at least some aminofunctional silicone and/or ionizing agent is provided.
摘要:
There is provided a rinse added composition for the conditioning of fabric in a rinse, whereby the composition comprises a fabric softener active, a suds suppressing system and a surfactant scavenger, characterized in that the composition has a suds reduction value of at least about 90% and is free from visible flocs when used in the presence of residual detergent surfactant.
摘要:
A nitridation treated stainless steel article (such as a bipolar plate for a proton exchange membrane fuel cell) having lower interfacial contact electrical resistance and better corrosion resistance than an untreated stainless steel article is disclosed. The treated stainless steel article has a surface layer including nitrogen-modified chromium-base oxide and precipitates of chromium nitride formed during nitridation wherein oxygen is present in the surface layer at a greater concentration than nitrogen. The surface layer may further include precipitates of titanium nitride and/or aluminum oxide. The surface layer in the treated article is chemically heterogeneous surface rather than a uniform or semi-uniform surface layer exclusively rich in chromium, titanium or aluminum. The precipitates of titanium nitride and/or aluminum oxide are formed by the nitriding treatment wherein titanium and/or aluminum in the stainless steel are segregated to the surface layer in forms that exhibit a low contact resistance and good corrosion resistance.