SEMICONDUCTOR PACKAGE WITH THROUGH SILICON VIA INTERCONNECT
    4.
    发明申请
    SEMICONDUCTOR PACKAGE WITH THROUGH SILICON VIA INTERCONNECT 有权
    具有通过互连的硅的半导体封装

    公开(公告)号:US20130270670A1

    公开(公告)日:2013-10-17

    申请号:US13855873

    申请日:2013-04-03

    Applicant: MEDIATEK INC.

    Abstract: The invention provides a semiconductor package with a through silicon via (TSV) interconnect. An exemplary embodiment of the semiconductor package with a TSV interconnect includes a semiconductor substrate, having a front side and a back side. A contact array is disposed on the front side of the semiconductor substrate. An isolation structure is disposed in the semiconductor substrate, underlying the contact array. The TSV interconnect is formed through the semiconductor substrate, overlapping with the contact array and the isolation structure.

    Abstract translation: 本发明提供一种具有通硅通孔(TSV)互连的半导体封装。 具有TSV互连的半导体封装的示例性实施例包括具有前侧和后侧的半导体衬底。 接触阵列设置在半导体衬底的前侧。 隔离结构设置在半导体衬底中,位于接触阵列的下面。 TSV互连通过半导体衬底形成,与接触阵列和隔离结构重叠。

    THERMAL VIA ARRANGEMENT FOR MULTI-CHANNEL SEMICONDUCTOR DEVICE

    公开(公告)号:US20180138104A1

    公开(公告)日:2018-05-17

    申请号:US15800611

    申请日:2017-11-01

    Applicant: MEDIATEK INC.

    Abstract: The invention provides a semiconductor device. The semiconductor device includes a gate structure over fin structures arranged in parallel. Each of the fin structures has a drain portion and a source portion on opposite sides of the gate structure. A drain contact structure is positioned over the drain portions of the fin structures. A source contact structure is positioned over the source portions of the fin structures. A first amount of drain via structures is electrically connected to the drain contact structure. A second amount of source via structures is electrically connected to the source contact structure. The sum of the first amount and the second amount is greater than or equal to 2, and the sum of the first amount and the second amount is less than or equal to two times the amount of fin structures.

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